| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/25/2005 | WO2005078776A1 Pattern forming process |
| 08/25/2005 | WO2005078775A1 Measurement method, transfer characteristic measurement method, exposure device adjustment method, and device manufacturing method |
| 08/25/2005 | WO2005078774A1 Exposure method and system, and device production method |
| 08/25/2005 | WO2005078773A1 Imaging optical system, exposure system, and exposure method |
| 08/25/2005 | WO2005078532A1 Volume hologram recording material and volume hologram recording medium |
| 08/25/2005 | WO2005078531A1 Volume hologram recording material and volume hologram recording medium |
| 08/25/2005 | WO2005078528A2 Source optimization for image fidelity and throughput |
| 08/25/2005 | WO2005078527A1 Image enhancement for multiple exposure beams |
| 08/25/2005 | WO2005078526A1 A system for positioning a product |
| 08/25/2005 | WO2005078525A2 Immersion lithography technique and product using a protection layer covering the resist |
| 08/25/2005 | WO2005078524A1 Curable resin composition, color filter and liquid crystal display |
| 08/25/2005 | WO2005078523A1 Polymer pattern and metal film pattern, metal pattern, plastic mold using thereof, and method of the forming the same |
| 08/25/2005 | WO2005078522A2 Illumination system for a microlithographic projection exposure apparatus |
| 08/25/2005 | WO2005078521A2 Method for providing a thin film having a chemical composition that is spatially structured on a micrometric or nanometric scale on a substrate |
| 08/25/2005 | WO2005078382A1 Apparatus and method for super-resolution optical microscopy |
| 08/25/2005 | WO2005077135A2 Method and appartus for high speed thickness mapping of patterned thin films |
| 08/25/2005 | WO2005077032A2 Uv radiation blocking protective layers compatible with thick film pastes |
| 08/25/2005 | WO2005076935A2 Wavelength filtering in nanolithography |
| 08/25/2005 | WO2005043245A3 Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors |
| 08/25/2005 | WO2005010619A3 Lithographic projection apparatus, purge gas supply system and gas purging |
| 08/25/2005 | WO2005008747A3 Methods and systems for inspection of wafers and reticles using designer intent data |
| 08/25/2005 | WO2005006026A3 Using isotopically specified fluids as optical elements |
| 08/25/2005 | US20050188342 Method of determining the overlay accuracy of multiple patterns formed on a semiconductor wafer |
| 08/25/2005 | US20050188341 Mask data correction method, photomask manufacturing method, computer program, optical image prediction method, resist pattern shape prediction method, and semiconductor device manufacturing method |
| 08/25/2005 | US20050187311 coating resins comprising aromatic cyanates and addition polymers on circuit substrates, then curing with light and heat to form insulation layer with improved surface smoothness and excellent dielectric properties |
| 08/25/2005 | US20050187308 photopolymerization in the presence of photoinitiators and photosensitizers, to form graft polymers or copolymers capable of inhibiting light loss by light scattering and having improved diffraction efficiency |
| 08/25/2005 | US20050187118 Cleaning solution, method for cleaning semiconductor substrate using the same, and method for forming metal wiring |
| 08/25/2005 | US20050186803 Method of manufacturing semiconductor device |
| 08/25/2005 | US20050186785 Device manufacturing method and substrate |
| 08/25/2005 | US20050186716 Load-lock technique |
| 08/25/2005 | US20050186692 Method and device for correcting SLM stamp image imperfections |
| 08/25/2005 | US20050186517 Overlay correction by reducing wafer slipping after alignment |
| 08/25/2005 | US20050186516 Barrier film material and pattern formation method using the same |
| 08/25/2005 | US20050186515 Lithographic patterning of a first layer, photografting a liquid crystal polymer to the substrate and then coupling a protein or peptide to the polymer; implantalbe microelectromechanical systems; increased flexibility and efficiency; supercritical solvents do not dissolve template |
| 08/25/2005 | US20050186514 Use of Perfluoro-n-alkanes in vacuum ultraviolet applications |
| 08/25/2005 | US20050186513 Radiation transparent to ultraviolet radiation, high symmetry molecules, degree of polarization is larger than 0.9; semiconductors for microelectronic circuits; microelectromechanical systems; perfluoroneopentane, tetra(trifluorosilyl)methane, tetra(trifluoromethyl)silane, tetra(trifluorosilyl)silane |
| 08/25/2005 | US20050186512 Fabrication of a high resolution biological molecule detection device |
| 08/25/2005 | US20050186510 Liquid transfer articles and method for producing the same using digital imaging photopolymerization |
| 08/25/2005 | US20050186509 Lithographic apparatus and device manufacturing method |
| 08/25/2005 | US20050186508 Stereolithographic resin composition comprising photo-curable component, sol-gel resin and filler and stereolithographic method using the same |
| 08/25/2005 | US20050186507 A photoacid generator and a blend of two distinct phenolic resins, each with different photoacid labile groups, and each with low polydispersity values; high image resolution; lithography |
| 08/25/2005 | US20050186506 Positive resist composition and pattern forming method using the same |
| 08/25/2005 | US20050186505 Positive resist composition for immersion exposure and method of pattern formation with the same |
| 08/25/2005 | US20050186504 Mixture of addition polymer and cyanine dye, sensitivity, storability of unprocessed stock, surface yellowing (stain) resistance, and light fixation |
| 08/25/2005 | US20050186503 Resist composition for immersion exposure and pattern formation method using the same |
| 08/25/2005 | US20050186502 Directly photodefinable polymer compositions and methods thereof |
| 08/25/2005 | US20050186501 Addition polymer containing an unsaturated aromatic sulfonamide compound, unsaturated aromatic ether and acrylated resin; exposure to light; forming pattern |
| 08/25/2005 | US20050186500 Method of making and structuring a photoresist |
| 08/25/2005 | US20050186491 Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM |
| 08/25/2005 | US20050186490 Wordline structures including stabilized 193nm resist |
| 08/25/2005 | US20050186489 Color filter materials, color filters, manufacturing method and image sensor |
| 08/25/2005 | US20050186486 Method for correcting mask pattern, exposure mask, and mask producing method |
| 08/25/2005 | US20050186421 Adhesive film functionalizing color compensation and near infrared ray (NIR) blocking and plasma display panel filter using the same |
| 08/25/2005 | US20050186405 Microcontact printing method using imprinted nanostructure and nanostructure thereof |
| 08/25/2005 | US20050186304 Molding apparatus and molding method |
| 08/25/2005 | US20050186064 Positioning apparatus and exposure apparatus |
| 08/25/2005 | US20050185998 Automatic development method of photosensitive lithographic printing plate and automatic development device thereof |
| 08/25/2005 | US20050185683 Exposure apparatus with laser device |
| 08/25/2005 | US20050185359 Wafer Stage |
| 08/25/2005 | US20050185307 Optical component, comprising a material with a predetermined homogneity of thermal expansion |
| 08/25/2005 | US20050185269 Catadioptric projection objective with geometric beam splitting |
| 08/25/2005 | US20050185193 System and method of using a side-mounted interferometer to acquire position information |
| 08/25/2005 | US20050185183 Method for aligning wafer |
| 08/25/2005 | US20050185174 Method to determine the value of process parameters based on scatterometry data |
| 08/25/2005 | US20050185170 Method to predict and identify defocus wafers |
| 08/25/2005 | US20050185169 Method and system to measure characteristics of a film disposed on a substrate |
| 08/25/2005 | US20050185167 Positioning system, exposure apparatus using the same, and device manufacturing method |
| 08/25/2005 | US20050185166 Exposure apparatus and device manufacturing method |
| 08/25/2005 | US20050185165 Illumination apparatus and exposure apparatus |
| 08/25/2005 | US20050185164 Exposure apparatus and a device manufacturing method using the same |
| 08/25/2005 | US20050185163 Method, system, and apparatus for management of reaction loads in a lithography system |
| 08/25/2005 | US20050185162 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
| 08/25/2005 | US20050185161 Method and test form for equalizing the exposure heads in an exposer for printing originals |
| 08/25/2005 | US20050185160 Transport system for a lithographic apparatus and device manufacturing method |
| 08/25/2005 | US20050185159 Fast model-based optical proximity correction |
| 08/25/2005 | US20050185157 Projecting exposure method |
| 08/25/2005 | US20050185156 Exposure apparatus and air-conditioning apparatus for use with exposure apparatus |
| 08/25/2005 | US20050185155 Exposure apparatus and method |
| 08/25/2005 | US20050185044 Method and system for recording images |
| 08/25/2005 | US20050184990 Drawing apparatus and drawing-data-generation apparatus therefor as well as drawing method and drawing-data-generation method therefor to efficiently perform stable drawing operations |
| 08/25/2005 | US20050184436 UV nanoimprint lithography process and apparatus |
| 08/25/2005 | US20050184423 Method for fabricating a stamper |
| 08/25/2005 | US20050184248 EUV light spectrum measuring apparatus and calculating method of EUV light intensity |
| 08/25/2005 | US20050184247 Device for measuring angular distribution of EUV light intensity, and method for measuring angular distribution of EUV light intensity |
| 08/25/2005 | US20050184043 Wafer processing apparatus and method of use |
| 08/25/2005 | US20050184036 Method and system for precisely positioning a waist of a material-processing laser beam to process microstructures within a laser-processing site |
| 08/25/2005 | US20050183823 Exposure apparatus and device manufacturing method |
| 08/25/2005 | US20050183597 Combined ablation and exposure system and method |
| 08/25/2005 | DE4119686B4 Vorsensibilisierte Platte Presensitized plate |
| 08/25/2005 | DE102004005242A1 Process for the generation of intensive short wavelength plasma emissions for EUV lithography |
| 08/25/2005 | DE102004004865A1 Polymere auf der Basis von Zimtsäure als Antireflexschicht für die 157 nm Photolithographie Polymers on the basis of cinnamic acid as an anti-reflective coating for 157 nm photolithography |
| 08/25/2005 | DE102004004597A1 Method for measuring a structure formed on semiconductor wafer e.g. for manufacture of integrated circuits, involves use of raster electron microscope with electron beam source and detector |
| 08/24/2005 | EP1566700A2 Automatic development method of photosensitive lithographic printing plate and automatic development device thereof |
| 08/24/2005 | EP1566699A2 Automatic development method of photosensitive lithographic printing plate and automatic development device thereof |
| 08/24/2005 | EP1566698A1 Lithographic apparatus and device manufacturing method |
| 08/24/2005 | EP1566697A2 Lithographic apparatus and device manufacturing method |
| 08/24/2005 | EP1566696A1 Lithographic apparatus and device manufacturing method with feed-forward focus control. |
| 08/24/2005 | EP1566695A1 Lithographic apparatus |
| 08/24/2005 | EP1566694A1 Positive resist composition and pattern forming method using the same |
| 08/24/2005 | EP1566693A2 Resist composition for immersion exposure and pattern forming method using the same |