Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2005
09/01/2005US20050189502 Alignment systems and methods for lithographic systems
09/01/2005US20050189501 Charged particle system and a method for measuring image magnification
09/01/2005US20050189499 Apparatus and method for repairing resist latent images
09/01/2005US20050189321 Method for removing organic material from a substrate and for oxidizing oxidizable material thereon
09/01/2005US20050188924 Method of controlling mover device, cooperative device of mover device, cooperative method of mover device, semiconductor manufacturing device, liquid crystal manufacturing device, and mechanical scan ion implantation device
09/01/2005DE4324654B4 Vorsensibilisierte Platte Presensitized plate
09/01/2005DE19755712B4 Verfahren zum Erzeugen von Stanzstempeln für gestanzte IC-Mikrostrukturen A method for producing punches for embossed IC microstructures
09/01/2005DE102005008296A1 Beam conversion system for micro-lithographic projection exposure equipment, has lenses arranged between beam conversion units to change distance between object and image planes, such that focal lengths of optical units are changed
09/01/2005DE102005001168A1 Erzeugen einer Mehrzahl von Dünnfilmvorrichtungen Generating a plurality of thin-film devices
09/01/2005DE102004053587A1 Flüssigkristalldisplay-Tafel und Verfahren zu deren Herstellung Liquid crystal display panel and process for their preparation
09/01/2005DE102004007600A1 Druckform mit mehreren flächigen Funktionszonen Printing plate having a plurality of two-dimensional functional zones
09/01/2005DE102004006262A1 Optical imaging device designing method, involves optimizing free parameter of mathematical model when value of basis function, that indicates wave front aberration of lens, exceeds its upper limit, where model is used for designing lens
09/01/2005DE102004005247A1 Imprint-lithographic process for manufacturing e.g. MOSFET, involves structuring polymerized gate dielectric layer by imprint stamp that is used to form hole on layer, and etching base of hole till preset thickness of layer is reached
09/01/2005CA2556684A1 Process for preparing a polymeric relief structure
09/01/2005CA2555544A1 Permanent resist composition, cured product thereof, and use thereof
08/2005
08/31/2005EP1569037A2 Scanner system
08/31/2005EP1569036A2 Optical system, exposure apparatus using the same and device manufacturing method
08/31/2005EP1569035A1 Lithographic apparatus and device manufacturing method
08/31/2005EP1569034A1 Lithographic apparatus and device manufacturing method
08/31/2005EP1569033A2 Exposure apparatus and method
08/31/2005EP1568976A1 Exposure apparatus mounted with measuring apparatus
08/31/2005EP1568723A1 Photo- and thermo-setting resin composition and printed wiring boards made by using the same
08/31/2005EP1568491A2 Planographic printing plate precursor
08/31/2005EP1567918A2 Developing mixture, and preparation of lithographic printing plates with this developer
08/31/2005EP1567917A2 Positive imageable thick film compositions
08/31/2005EP1567916A2 A polymer solution for nanoprint lithography to reduce imprint temperature and pressure
08/31/2005EP1567915A1 Pattern forming materials and pattern formation method using the materials
08/31/2005EP1567913A1 A chucking system and method for modulating shapes of substrates
08/31/2005EP1567518A2 Oxime ester photoinitiators with heteroaromatic groups
08/31/2005EP1567288A2 ANTI-REFLECTIVE COATING COMPOSITIONS FOR USE WITH LOW k DIELECTRIC MATERIALS
08/31/2005EP1448686A4 Stabilized imageable coating composition and printing plate precursor
08/31/2005EP1348150B1 Lithographic manufacturing process comprising a method of measuring overlay
08/31/2005EP1348149B1 Method of measuring alignment of a substrate with respect to a reference alignment mark
08/31/2005CN1663032A Composition for removing sidewall residues
08/31/2005CN1662854A Process for preventing development defect and composition for use in the same
08/31/2005CN1662853A Onium salts and the use therof as latent acids
08/31/2005CN1662852A Multi-tiered lithographic template
08/31/2005CN1662851A Photomask
08/31/2005CN1662788A Scatterometric measurement of undercut multi-layer diffracting structures
08/31/2005CN1662625A Adhesive for sealing organic electroluminescent element and use thereof
08/31/2005CN1662546A Silyl alkyl esters of anthracene- and phenanthrene carboxylic acids
08/31/2005CN1662383A Mold tool method of manufacturing a mold tool and storage medium formed by use of the mold tool
08/31/2005CN1661776A Barrier film material and pattern formation method using the same
08/31/2005CN1661775A Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and el television
08/31/2005CN1661773A Mask data correction method, photomask, optical image prediction method
08/31/2005CN1661771A Method for aligning wafer
08/31/2005CN1661770A Method to predict and identify defocus wafers and system thereof
08/31/2005CN1661481A Lithographic apparatus and device manufacturing method
08/31/2005CN1661479A Eigen decomposition based OPC model
08/31/2005CN1661478A Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems
08/31/2005CN1661477A Method for fabricating pressing mold
08/31/2005CN1661476A Method of passive alignment by using photo mask plate
08/31/2005CN1661475A Photocuring resinoid compsn. and printed circuit board using same
08/31/2005CN1661474A Planographic printing plate precursor
08/31/2005CN1661473A Maskless optical writer
08/31/2005CN1661472A Method for forming pattemized photoresistive layer and fab ricating device
08/31/2005CN1661412A Visual display element in micro electromechanical unit
08/31/2005CN1217236C Photoresist remover composition comprising ammonium fluoride
08/31/2005CN1217234C Substrate treatment device and method
08/31/2005CN1217233C Photocurable and thermosetting resin composition
08/31/2005CN1217232C Monomer for cross-linkage agent containing double bond and photoresist copolymer containing same
08/31/2005CN1216950C Photo-curing composition and its curing method
08/31/2005CN1216926C Organic anti-reflective paint polymer and its preparing method
08/30/2005US6938238 Method of manufacturing electronic device
08/30/2005US6937959 Method of determining the distance of projection points on the surface of a printing form
08/30/2005US6937911 Compensating for cable drag forces in high precision stages
08/30/2005US6937635 High rep-rate laser with improved electrodes
08/30/2005US6937394 Device and method for changing the stress-induced birefringence and/or the thickness of an optical component
08/30/2005US6937345 Measuring system for measuring performance of imaging optical system
08/30/2005US6937344 Method of measuring overlay
08/30/2005US6937337 Overlay target and measurement method using reference and sub-grids
08/30/2005US6937334 Method of measuring alignment of a substrate with respect to a reference alignment mark
08/30/2005US6937320 Reflective liquid crystal display lithography system
08/30/2005US6937319 Exposure method and apparatus with vibration-preventative control
08/30/2005US6937318 Lithographic apparatus, computer program, device manufacturing method, and device manufactured thereby
08/30/2005US6937317 Active damping apparatus, exposure apparatus and device manufacturing method
08/30/2005US6937316 Lithographic apparatus, device manufacturing method and device manufactured thereby
08/30/2005US6936931 For use in semiconductor device
08/30/2005US6936831 Divided reticles for charged-particle-beam microlithography apparatus, and methods for using same
08/30/2005US6936825 Process for the decontamination of microlithographic projection exposure devices
08/30/2005US6936819 semiconductor wafer chips; scanning electron microscope
08/30/2005US6936406 Method of manufacturing integrated circuit
08/30/2005US6936405 Organic polymeric antireflective coatings deposited by chemical vapor deposition
08/30/2005US6936404 For the production of offset printing plates
08/30/2005US6936402 Monomers containing an oxepan-2-one group, photoresist compositions comprising polymers prepared from the monomers, methods for preparing the compositions, and methods for forming photoresist patterns using the compositions
08/30/2005US6936401 Pattern formation material and pattern formation method
08/30/2005US6936400 Negative resist composition
08/30/2005US6936398 Inclusion of a sufficient amount of base counteracts the detrimental effects of photoacid generators, thus providing resists having submicron linewidth resolution.
08/30/2005US6936386 for application to semiconductor wafers; comprises charge coupled camera; lithography
08/30/2005US6936384 Infrared-absorbing compound that exhibits an electronic transition band in the near-infrared region, initiator, and metallocene; capable of producing radicals sufficient to initiate the photopolymerization of unsaturated compounds
08/30/2005US6936194 Forming an optical coupling device on a substrate by disposing a material onto the substrate that is polymerizable in response to actinic radiation. A stack of the material is formed by contacting the material with a template having a
08/30/2005US6936181 Methods for patterning using liquid embossing
08/30/2005US6936180 Thin-film patterning method, manufacturing method of thin-film device and manufacturing method of thin-film magnetic head
08/30/2005US6936107 Coating film forming apparatus and coating unit
08/30/2005US6935238 Image recording material conveying device and automatic image recording system
08/30/2005US6935237 Plate-making system of light-sensitive lithographic printing plate and plate-making method
08/30/2005US6935014 inhibits creation of polymer debris through etching process for intermediate layer and deterioration of photoresist frame at formation of intermediate layer; usable for fabricating a writing magnetic pole portion of a thin film magnetic head
08/25/2005WO2005078779A1 Imprinting apparatus with independently actuating separable modules
08/25/2005WO2005078778A1 Lighting optical device, polarization status detector,and exposure system and exposure method
08/25/2005WO2005078777A1 Drive method, exposure method, exposure device, and device manufacturing method