Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2014
03/26/2014CN102692831B Counterpoint mark and method for using same to manufacture workpieces in exposure process
03/26/2014CN102621820B Manufacturing method of efficient super-resolution focusing devices for photo-etching
03/26/2014CN102566335B Template image acquisition method
03/26/2014CN102466967B Manufacture method of diffractive optical element with large aspect ratio
03/26/2014CN102445846B Photosensitive conductive paste
03/26/2014CN102443281B Method for transferring photochemical relief miniature image onto pigment surface
03/26/2014CN102365589B Exposure method and exposure apparatus
03/26/2014CN102213779B Lens and method for producing lens
03/26/2014CN102073226B Thick film photoresist cleaning solution and cleaning method thereof
03/26/2014CN102012643B Decompression drier and decompression dry method
03/26/2014CN101993537B Alkali-soluble polymer, photosensitive resin composition comprising the same, and uses of the same
03/26/2014CN101296952B Anti-reflective coatings
03/25/2014US8681314 Stage device and coordinate correction method for the same, exposure apparatus, and device manufacturing method
03/25/2014US8681309 Lithographic apparatus and device manufacturing method
03/25/2014US8680721 Coil, positioning device, actuator, and lithographic apparatus
03/25/2014US8680427 Uniform large-grained and gain boundary location manipulated polycrystalline thin film semiconductors formed using sequential lateral solidification and devices formed thereon
03/25/2014US8679734 Photoresist removal
03/25/2014US8679733 Patterning process for small devices
03/25/2014US8679732 Method for removing resist and for producing a magnetic recording medium, and systems thereof
03/25/2014US8679731 Semiconductor device manufacturing method
03/25/2014US8679729 Method for forming patterns of semiconductor device by using mixed assist feature system
03/25/2014US8679728 Method for fabricating patterned layer
03/25/2014US8679727 Developing method for immersion lithography, solvent used for the developing method and electronic device using the developing method
03/25/2014US8679726 Negative-working lithographic printing plate precursors
03/25/2014US8679724 Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
03/25/2014US8679708 Polarization monitoring reticle design for high numerical aperture lithography systems
03/20/2014WO2014043267A1 Methods of fabricating photoactive substrates suitable for electromagnetic transmission and filtering applications
03/20/2014WO2014042443A1 Compound and composition for forming lower film of resist pattern, and method for forming lower film using same
03/20/2014WO2014042288A1 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, manufacturing method of electronic device using the same, and electronic device
03/20/2014WO2014042003A1 Method for generating extreme ultraviolet light and device for generating extreme ultraviolet light
03/20/2014WO2014041941A1 Substrate processing device and device manufacturing method
03/20/2014WO2014041824A1 Pattern drawing device and pattern drawing method
03/20/2014WO2014012641A3 Projection exposure apparatus for microlithography comprising an optical distance measurement system
03/20/2014WO2013178404A3 A method to determine the usefulness of alignment marks to correct overlay, and a combination of a lithographic apparatus and an overlay measurement system
03/20/2014WO2013174646A9 Lithographic apparatus and device manufacturing method
03/20/2014WO2013167576A3 Method for the manufacture of coated articles and coated articles
03/20/2014WO2013134390A3 Method and processor for developing a violet imaged lithographic printing plate
03/20/2014US20140080069 Double patterning by ptd and ntd process
03/20/2014US20140080067 Method of semiconductor integrated circuit fabrication
03/20/2014US20140080066 Double patterning method
03/20/2014US20140080065 Method of lithography
03/20/2014US20140080064 Resist protective film-forming composition and patterning process
03/20/2014US20140080063 Pigment dispersion, ink composition including pigment dispersion, and color filter yellow resist composition including pigment dispersion
03/20/2014US20140080062 Photoresists comprising multiple acid generator compounds
03/20/2014US20140080061 Photoresists containing polymer-tethered nanoparticles
03/20/2014US20140080060 Acid generator compounds and photoresists comprising same
03/20/2014US20140080059 Acid generator compounds and photoresists comprising same
03/20/2014US20140080058 Acid generators and photoresists comprising same
03/20/2014US20140080057 Composition, process of preparation and method of application and exposure for light imaging paper
03/20/2014US20140080056 Onium compounds and methods of synthesis thereof
03/20/2014US20140080055 Chemically amplified resist composition and patterning process
03/20/2014US20140080054 Lithographic printing plate precursor and plate making method thereof
03/20/2014US20140080043 Siloxane-based compound, photosensitive composition comprising the same and photosensitive material
03/20/2014US20140080042 Printable Laminates for Flexo Plates, Methods of Making, and Methods of Using
03/20/2014US20140078487 Method for moving an optical element of a projection exposure apparatus for microlithography
03/20/2014US20140078486 Grazing Incidence Reflectors, Lithographic Apparatus, Methods for Manufacturing a Grazing Incidence Reflector and Methods for Manufacturing a Device
03/20/2014US20140078485 Mirror assembly for an exposure apparatus
03/20/2014US20140078484 Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
03/20/2014US20140078483 Catadioptric Projection Objective With Intermediate Images
03/20/2014US20140078482 Lithographic projection objective
03/20/2014US20140078481 Method for correcting the surface form of a mirror
03/20/2014US20140078480 Apparatus for creating an extreme ultraviolet light, an exposing apparatus including the same, and electronic devices manufactured using the exposing apparatus
03/20/2014US20140078478 Method of optimizing lithography tools utilization
03/20/2014US20140078154 Display apparatus with multi-height spacers
03/20/2014US20140076847 Photoresist composition and method of forming a metal pattern using the same
03/20/2014US20140076356 Composition of solutions and conditions for use enabling the stripping and complete dissolution of photoresists
03/20/2014DE102012216502A1 Spiegel Mirror
03/19/2014EP2708950A2 Aberration estimating method, program, and image-pickup apparatus
03/19/2014EP2708921A1 Fuorite having excellent laser durability
03/19/2014EP2708843A1 Shape measuring apparatus
03/19/2014EP2707776A1 Positive resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition
03/19/2014CN203490456U Surface plasmon imaging photo-etching structure
03/19/2014CN103649838A Composition for forming fine pattern and method for forming fined pattern using same
03/19/2014CN103649837A Method of processing a substrate in a lithography system
03/19/2014CN103649836A Network architecture and protocol for cluster of lithography machines
03/19/2014CN103649835A Resist underlayer film-forming composition for EUV lithography containing condensation polymer
03/19/2014CN103649834A Method for improving print performance of flexographic printing elements
03/19/2014CN103649833A Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device
03/19/2014CN103649832A Process for the production of a layered body and layered bodies obtainable therefrom
03/19/2014CN103649831A Photosensitive resin composition, and photosensitive film, photosensitive laminate, method for forming permanent pattern, and printed substrate using same
03/19/2014CN103649830A Lithographic patterning process and resists to use therein
03/19/2014CN103649815A Exposure device for the structured exposure of a surface
03/19/2014CN103649271A Etching solution and etching process using same
03/19/2014CN103646873A A method for removing photoresist
03/19/2014CN103646872A Photoresist removing apparatus
03/19/2014CN103645615A Maskless lithography system with improved reliability
03/19/2014CN103645614A Method for improving photoetching process used on Al2O3 medium
03/19/2014CN103645613A Method for polishing connection edge of angle mirror of photoetching machine
03/19/2014CN103645612A Defect detection method for photolithographic process graph
03/19/2014CN103645611A Layout design photolithographic technology friendliness detection method
03/19/2014CN103645610A System and method for preventing misuse of working conditions of lithography equipment
03/19/2014CN103645609A Method for improving photoresist profile
03/19/2014CN103645608A Movable body drive system and movable body drive method, pattern formation apparatus and method, exposure apparatus and method, device manufacturing method, and decision-making method
03/19/2014CN103645607A Gluing system
03/19/2014CN103645606A Photoresist supplying device
03/19/2014CN103645605A Curable resin composition and reflective sheet
03/19/2014CN103645604A Preparation method of chromium-free rotary screen photosensitive adhesive
03/19/2014CN103645601A Mask
03/19/2014CN103645532A Base material structure used for manufacturing concave blazed grating and manufacturing method of concave blazed grating
03/19/2014CN103645034A An integrated projection optics tester pin hole and an integrated projection optics tester
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