Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2005
09/06/2005US6939662 Positive-working resist composition
09/06/2005US6939661 Blocked isocyanate compound-containing composition for forming a radiation absorbing coating and anti-reflective coating formed therefrom
09/06/2005US6939659 positive-working, aqueous base developable photosensitive polybenzoxazole (PBO) precursor compositions of capped and uncapped polyamides, a photosensitizer and a solvent; use in microelectronics
09/06/2005US6939650 making integrated circuits using absorbent transmission masks that can be repaired
09/06/2005US6939649 Preparing a mask having, on a first main surface of a mask sustrate; permitting inversion of the phase of a light transmitted through the second light transmitting region transferring predetermined patterns to a photoresist film
09/06/2005US6939648 Holography recording
09/06/2005US6938546 Printing press, layered formation and making method thereof, and printing plate and making method thereof
09/01/2005WO2005081372A2 Laser multiplexing
09/01/2005WO2005081307A1 Manufacturing method of semiconductor device, and ic card, ic tag, rfid, transponder, bill, securities, passport, electronic apparatus, bag, and garment
09/01/2005WO2005081306A1 Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof
09/01/2005WO2005081299A2 Device manufacturing method and substrate comprising radiation sensitive material
09/01/2005WO2005081295A1 Exposure method, exposure apparatus, exposure system and method for manufacturing device
09/01/2005WO2005081294A1 Exposure device, liquid treating method, exposure method, and device production method
09/01/2005WO2005081293A1 Exposure apparatus and exposure method, and device producing method
09/01/2005WO2005081292A1 Exposure apparatus, supply method and recovery method, exposure method, and device producing method
09/01/2005WO2005081291A1 Exposure apparatus and method of producing device
09/01/2005WO2005081290A1 Exposure apparatus and method of producing the device
09/01/2005WO2005081071A1 Process for preparing a polymeric relief structure
09/01/2005WO2005081070A1 Methods for exposing patterns and emulating masks in optical maskless lithography
09/01/2005WO2005081069A1 Method to determine the value of process parameters based on scatterometry data
09/01/2005WO2005081068A2 Imaging system for a microlithographical projection light system
09/01/2005WO2005081067A1 Projection objective for a microlithographic projection exposure apparatus
09/01/2005WO2005081066A1 Rectangular contact lithography for circuit performance improvement
09/01/2005WO2005081065A1 Light-sensitive substrate and method for patterning
09/01/2005WO2005081064A1 Bilayer laminated film for bump formation and method of bump formation
09/01/2005WO2005081063A1 Resist laminate used for immersion lithography
09/01/2005WO2005081062A1 Base material for pattern forming material, positive resist composition and method of resist pattern formation
09/01/2005WO2005081061A1 Photoresist composition and method of forming resist pattern
09/01/2005WO2005081060A2 Device consisting of at least one optical element
09/01/2005WO2005081059A1 Method for the production of masks used in photolithography, and use of such masks
09/01/2005WO2005081034A1 Two-dimensional light modulation device, exposure apparatus, and exposure method
09/01/2005WO2005081030A1 Catadioptric imaging system for high numerical aperture imaging with deep ultraviolet light
09/01/2005WO2005081029A2 Housing structure for mounting optical elements
09/01/2005WO2005081026A1 Photocurable resin composition for forming optical waveguide, photocurable dry film for forming optical waveguide, and optical waveguide
09/01/2005WO2005080474A1 Polymer, photoresist composition containing the polymer, and method of forming resist pattern
09/01/2005WO2005080473A1 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern
09/01/2005WO2005080472A1 Organosilicon compound and method for producing same
09/01/2005WO2005080458A1 Curable resin composition for light guide, curable dry film for light guide, light guide and method of forming core portion for light guide
09/01/2005WO2005080453A1 Adhesive film functionalizing color compensation and near infrared ray (nir) blocking and plasma display panel filter using the same
09/01/2005WO2005080337A1 Oxime ester compound, photopolymerizable composition and color filter utilizing the same
09/01/2005WO2005080306A1 Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern
09/01/2005WO2005080255A1 Enzyme-assisted nanolithography
09/01/2005WO2005079498A2 Continuously varying offset mark and methods of determining overlay
09/01/2005WO2005079470A2 Photomask and method for conveying information associated with a photomask substrate
09/01/2005WO2005079330A2 Permanent resist composition, cured product thereof, and use thereof
09/01/2005WO2005079304A2 Method and system to measure characteristics of a film disposed on a substrate
09/01/2005WO2005045528A3 Interference patterning
09/01/2005WO2005038528A3 Method of coating a multilayered element
09/01/2005WO2005022266A3 Immersion medium bubble elimination in immersion lithography
09/01/2005WO2005017625A3 Method and apparatus for monitoring and controlling imaging in immersion lithography systems
09/01/2005WO2005008339A3 Lithographic projection apparatus, purge gas supply system and gas purging method
09/01/2005WO2004102278B1 Computer-implemented method and carrier medium configured to generate a set of process parameters and/or a list of potential causes of deviations for a lithography process
09/01/2005WO2004059699A3 System and method for on-the-fly eccentricity recognition
09/01/2005US20050193364 Pattern forming method and semiconductor device manufactured by using said pattern forming method
09/01/2005US20050193362 Multi-layer overlay measurement and correction technique for IC manufacturing
09/01/2005US20050192409 Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof
09/01/2005US20050192384 Additive composition for increasing the storage stability of ethylenically unsaturated resins
09/01/2005US20050192372 Supports and three dimensional printing with release agents
09/01/2005US20050191784 Method of and apparatus for producing micro lens and micro lens
09/01/2005US20050191585 for gravure printing, water, a tetraalkylammonium hydroxide and/or benzyltrialkylammonium hydroxide and/or ammonium hydroxide, sodium hydroxide or potassium hydroxide, and hexametaphosphoric soda, triphosphate soda and/or monophosphate soda for preventing a reduction in pH
09/01/2005US20050191584 Rinsing with aqueous ammonium hydroxide and hydrogen peroxide; removing residual resist prior to patterning; preventing contamination; simple, low cost, standard equipment
09/01/2005US20050191583 Exposure apparatus and method
09/01/2005US20050191581 Imagewise exposing, with an infrared laser, a planographic printing plate precursor including a substrate and an image recording layer provided thereon, removing unexposed areas , feeding an oil based ink and an aqueous component onto the planographic printing plate precursor in the printer
09/01/2005US20050191580 Negative photosensitive resin composition
09/01/2005US20050191579 Protecting groups in polymers, photoresists and processes for microlithography
09/01/2005US20050191578 Solution polymerization of such as tetrafluoroethylene and norbornene derivative having hexafluoro-2-propanol ring attachment; vacuum ultraviolet transparency, ultrafine patterns
09/01/2005US20050191577 Planographic printing plate precursor
09/01/2005US20050191576 Water-soluble material, chemically amplified resist and pattern formation method using the same
09/01/2005US20050191572 Aperture masks for circuit fabrication
09/01/2005US20050191567 Oxime ester photoinitiators
09/01/2005US20050191565 In-tool and out-of-tool protection of extreme ultraviolet (EUV) reticles
09/01/2005US20050191563 Method and system for reducing and monitoring precipitated defects on masking reticles
09/01/2005US20050191562 Method of increasing the shelf life of a photomask substrate
09/01/2005US20050191434 controlling deposition from scanning probe microscope tips to substrates, using electrical, magnetic, chemical or analogous forces
09/01/2005US20050191419 Fabrication of nanostructures
09/01/2005US20050191418 System, method, and apparatus for multilevel UV molding lithography for air bearing surface patterning
09/01/2005US20050191051 Method and device for processing substrate
09/01/2005US20050191016 Exposure head, exposure apparatus, and application thereof
09/01/2005US20050190957 System and method of providing mask defect printability analysis
09/01/2005US20050190801 Laser unit, exposure apparatus and method
09/01/2005US20050190684 Nanometer scale data storage device and associated positioning system
09/01/2005US20050190455 Refractive projection objective for immersion lithography
09/01/2005US20050190451 Apparatus for optical beam shaping and diffusing and associated methods
09/01/2005US20050190446 Catadioptric reduction objective
09/01/2005US20050190435 Catadioptric projection objective
09/01/2005US20050190378 Exposure apparatus mounted with measuring apparatus
09/01/2005US20050190377 Point diffraction interferometer and exposure apparatus and method using the same
09/01/2005US20050190376 Device and method for the determination of imaging errors and microlithography projection exposure system
09/01/2005US20050190375 Stage apparatus and control method therefor
09/01/2005US20050190355 Apparatus and system for improving phase shift mask imaging performance and associated methods
09/01/2005US20050190354 Lithographic apparatus and device manufacturing method
09/01/2005US20050190353 Lithographic apparatus and device manufacturing method
09/01/2005US20050190352 Method and apparatus for forming pattern on thin substrate or the like
09/01/2005US20050190351 Lithographic apparatus and device manufacturing method
09/01/2005US20050190350 Exposure apparatus and method
09/01/2005US20050190349 Method for determining rotational error portion of total misalignment error in a stepper
09/01/2005US20050190348 Device and method for testing an exposure apparatus
09/01/2005US20050190347 Optical system, exposure apparatus using the same and device manufacturing method
09/01/2005US20050189901 Stage devices and exposure systems comprising same
09/01/2005US20050189676 Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
1 ... 639 640 641 642 643 644 645 646 647 648 649 650 651 652 653 654 655 656 657 658 659 ... 1272