| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/08/2005 | US20050195461 Spatial light modulator, spatial light modulator array, and image formation apparatus |
| 09/08/2005 | US20050195413 Optical measurements of line edge roughness |
| 09/08/2005 | US20050195405 Position detecting system and exposure apparatus using the same |
| 09/08/2005 | US20050195404 Interferometers and systems using interferometers |
| 09/08/2005 | US20050195398 Continuously varying offset mark and methods of determining overlay |
| 09/08/2005 | US20050195382 Lithographic apparatus and device manufacturing method |
| 09/08/2005 | US20050195381 Moveable object carrier, lithographic apparatus comprising the moveable object carrier and device manufacturing method |
| 09/08/2005 | US20050195380 Lithographic apparatus and device manufacturing method |
| 09/08/2005 | US20050195379 Optimized optical lithography illumination source for use during the manufacture of a semiconductor device |
| 09/08/2005 | US20050195377 Correcting device, exposure apparatus, device production method, and device produced by the device production method |
| 09/08/2005 | US20050195376 System for purifying purge gases |
| 09/08/2005 | US20050194843 Aligning apparatus, exposure apparatus, and device manufacturing method |
| 09/08/2005 | US20050194661 Solvent prewet and method to dispense the solvent prewet |
| 09/08/2005 | US20050194427 X-ray alignment system for fabricating electronic chips |
| 09/08/2005 | US20050193944 Printing apparatus and device manufacturing method |
| 09/08/2005 | DE10356699A1 Lithographiemaske und Lithographiesystem für richtungsabhängige Belichtung Lithography mask lithography system for directional exposure |
| 09/08/2005 | DE102004022137B3 Radiation-sensitive composition useful for making lithographic printing plates includes a polyfunctional oxazole, thiazole or selenazole sensitizer and a coinitiator |
| 09/08/2005 | DE102004009536A1 Verfahren zur Herstellung und Strukturierung eines lichtempfindlichen, hochviskosen, chemisch verstärkten, wässrig-alkalisch entwickelbaren Positiv-Photoresists Process for the preparation and patterning of a light-sensitive, highly viscous, chemically amplified, aqueous-alkaline developable positive photoresists |
| 09/08/2005 | DE102004009530A1 Tenside cleaning agent for electronic chip substrate during manufacture is heated to beyond the power point |
| 09/08/2005 | DE102004008835A1 Process for photolithographically exposing a semiconductor wafer used in the production of semiconductor circuits comprises carrying out lithographic exposure using a lithographic mask and post-exposing the wafer in the substrate region |
| 09/08/2005 | DE102004008754A1 Herstellung von spannungsarmen, nicht (111)-orientierten, großvolumigen Einkristallen mit geringer Spannungsdoppelbrechung und homogener Brechzahl, sowie deren Verwendung Preparation of low stress not (111) oriented, large-volume single crystals of low birefringence and a homogeneous refractive index, and the use thereof |
| 09/08/2005 | DE102004008753A1 Process for preparation of a low stress large volume crystal of defined height and diameter having a small double refraction and homogeneous refractive index useful for production of optical elements, computer chips and integrated circuits |
| 09/08/2005 | DE102004008749A1 Verfahren zur Herstellung eines großvolumigen CaF2-Einkristalles mit geringer Streuung und verbesserter Laserstabilität, sowie ein solcher Kristall und dessen Verwendung A method for producing a large volume of CaF2 single crystal with low scattering and improved laser stability, as well as such a crystal and its use |
| 09/08/2005 | DE102004008500A1 Average radiation power determination method for a light source, especially a UV, deep UV or extreme UV light source used in semiconductor lithography, involves comparison of average radiation power with a test radiation source |
| 09/08/2005 | DE102004008474A1 Diffraction pattern suppression method for use in association with the optical inspection of semiconductor wafers, whereby a matched suppression pattern is temporarily created in an optical fashion using a light sensitive layer |
| 09/08/2005 | DE102004008080A1 System zur Reinigung von Spülgasen System for purifying flushing gases |
| 09/08/2005 | DE102004007414A1 Process to produce microelectronic components by extreme ultraviolet lithography |
| 09/08/2005 | DE102004006372A1 Transformation of positional information relating to structural elements in a pattern representing one or more levels of an integrated circuit between two different coordinate systems by use of a transformation step library |
| 09/08/2005 | DE102004005981A1 Ausrichtungselemente einer Vorrichtung zur Handhabung von Druckplatten Alignment elements of a device for handling printing plates |
| 09/07/2005 | EP1571741A1 Ultraviolet light source, phototherapy apparatus using ultraviolet light source, and exposure system using ultraviolet light source |
| 09/07/2005 | EP1571701A1 Exposure apparatus and method for manufacturing device |
| 09/07/2005 | EP1571700A1 Optical device and projection exposure apparatus using such optical device |
| 09/07/2005 | EP1571699A1 Exposure apparatus and method for manufacturing device |
| 09/07/2005 | EP1571698A1 Exposure apparatus, exposure method and method for manufacturing device |
| 09/07/2005 | EP1571697A1 Exposure system and device producing method |
| 09/07/2005 | EP1571696A1 Exposure apparatus and method for manufacturing device |
| 09/07/2005 | EP1571695A1 Exposure apparatus and method for manufacturing device |
| 09/07/2005 | EP1571694A1 Exposure apparatus and method for manufacturing device |
| 09/07/2005 | EP1571494A1 Lithographic apparatus and device manufacturing method |
| 09/07/2005 | EP1571493A1 Polymerizable composition and lithographic printing plate precursor |
| 09/07/2005 | EP1571492A1 Process of preparing planographic printing plate |
| 09/07/2005 | EP1571469A1 Colored photosensitive composition for color filters, color filters, and process for the production thereof |
| 09/07/2005 | EP1571465A2 Method of and apparatus for producing micro lens and micro lens |
| 09/07/2005 | EP1570422A1 Layer arrangement provided with a structure producing a diffractive optical effect and a lens-type effect |
| 09/07/2005 | EP1570316A1 Device and method for producing flexographic plates using digital imaging, for newspaper printing |
| 09/07/2005 | EP1570315A2 Method for adjusting a desired optical property of a positioning lens and microlithographic projection exposure system |
| 09/07/2005 | EP1570249A2 Method and system for determining characteristics of substrates employing fluid geometries |
| 09/07/2005 | EP1570232A1 Apparatus and methods for detecting overlay errors using scatterometry |
| 09/07/2005 | EP1569866A2 Process for obtaining spatially-organised nanostructures on thin films |
| 09/07/2005 | EP1171801A4 Novel photosensitive polybenzoxazole precursor compositions |
| 09/07/2005 | EP1015136B1 Method and apparatus for spin-coating chemicals |
| 09/07/2005 | EP0990147A4 Acrylic microchannels and their use in electrophoretic applications |
| 09/07/2005 | CN1666294A Holographic data storage media comprising an aluminum salt compound and an asymetric acrylate compound |
| 09/07/2005 | CN1666155A Coating forming agent for increasing fineness of pattern and fine pattern forming method using the same |
| 09/07/2005 | CN1666154A Composition for antireflection coating and method for forming pattern |
| 09/07/2005 | CN1666153A Optical device comprising an light source |
| 09/07/2005 | CN1666152A Very high-aperture projection objective |
| 09/07/2005 | CN1666151A Composition sensitive to visible light |
| 09/07/2005 | CN1666150A Photosensitive compositions based on polycyclic polymers |
| 09/07/2005 | CN1666149A Heat stable photocurable resin composition for dry film resist |
| 09/07/2005 | CN1666146A Developer-soluble metal alkoxide coatings for microelectronic applications |
| 09/07/2005 | CN1666144A Reticle carrier |
| 09/07/2005 | CN1666138A A device having a light-absorbing mask and a method for fabricating same |
| 09/07/2005 | CN1666129A Holding device, exposing device and device manufacturing method |
| 09/07/2005 | CN1665881A Photo-induced cation curable epoxy resin composition |
| 09/07/2005 | CN1665684A Method and device for transferring a pattern from a stamp to a substrate |
| 09/07/2005 | CN1664995A Plasma processing method and plasma processing device |
| 09/07/2005 | CN1664707A Scouring agent and flushing fluid for the planography |
| 09/07/2005 | CN1664706A The management method and device of working solution level |
| 09/07/2005 | CN1664705A Method and apparatus for SU-8 glue exposure photo-etching by employing laser |
| 09/07/2005 | CN1664704A Lithographic apparatus and device manufacturing method |
| 09/07/2005 | CN1664703A A polarizing pupil device and use in projection photo-etching system |
| 09/07/2005 | CN1664701A Photosensitive glue for high resolution factor cylinder platemaking |
| 09/07/2005 | CN1664700A High performance emulsion type cylinder photosensitizing glue |
| 09/07/2005 | CN1664699A Developing agent for positive type photosensitive composition |
| 09/07/2005 | CN1664698A Polymerizable composition and lithographic printing plate precursor |
| 09/07/2005 | CN1664697A Manufacturing method for exposure mask, generating method for mask substrate information |
| 09/07/2005 | CN1664685A Method of manufacturing array substrate and thin film transistor array panel |
| 09/07/2005 | CN1664676A Liquid crystal display device and method for making same |
| 09/07/2005 | CN1218373C Inhibition of titanium corrosion |
| 09/07/2005 | CN1218366C Film semiconductor device |
| 09/07/2005 | CN1218222C Compsns. for cleaning organic and plasma etched residues for semiconductor devices |
| 09/07/2005 | CN1218221C Method for coating and developing and system |
| 09/07/2005 | CN1218220C Production of photoresist coatings |
| 09/07/2005 | CN1218219C Photosensitive resin composition |
| 09/07/2005 | CN1218218C Manufacture of ture 3D microelectronic mechanical system based on composite imprinting photoetched material |
| 09/06/2005 | WO2005052691A1 Method for forming thick film pattern, method for manufacturing electronic component, and photosensitive paste for photolithography |
| 09/06/2005 | US6941186 Semiconductor manufacturing apparatus |
| 09/06/2005 | US6941008 for fine small pattern, with high accuracy and throughput; semiconductor integrated circuits; combined light and electronic beam exposure |
| 09/06/2005 | US6940587 Lithographic apparatus and a measurement system |
| 09/06/2005 | US6940586 Exposure apparatus and method |
| 09/06/2005 | US6940585 Evaluation mask, focus measuring method and aberration measuring method |
| 09/06/2005 | US6940584 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory |
| 09/06/2005 | US6940582 Parallel link mechanism, exposure system and method of manufacturing the same, and method of manufacturing devices |
| 09/06/2005 | US6940578 filling a cylindrical substrate having varying depth and width grooves with resist material, which is then transferred onto a printing roll, and applying the resist portions onto a surface of an etching layer |
| 09/06/2005 | US6940080 Charged particle beam lithography system, lithography method using charged particle beam, method of controlling charged particle beam, and method of manufacturing semiconductor device |
| 09/06/2005 | US6939926 Condensation polymerization in the presence of an acid catalyst, dehydration, decomposing to control molecular weight of phenolic resins; dense pattern, isolation pattern, good shapes, photosensitivity, focal depth range |
| 09/06/2005 | US6939899 Eyeglass lens forming composition containing light absorbing compounds which may undergo light initiated polymerization |
| 09/06/2005 | US6939665 Forming a molecular film by using a photolytic organic silicon compound that contains an aromatic hydrocarbon group, as a starting material; irradiating the molecular film with a light |
| 09/06/2005 | US6939664 improved silsesquioxane polymers structures useful in resist compositions, resist compositions that have improved transparency at wavelengths at or below 193 nm with minimized image blurring, and photolithographic processes using such resists |