| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/14/2005 | CN1668981A Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric |
| 09/14/2005 | CN1668980A Highly heat-resistant, negative-type photosensitive resin composition |
| 09/14/2005 | CN1668767A Antireflective coatings for high-resolution photolithographic synthesis of DNA array |
| 09/14/2005 | CN1668709A Polymerisable diketopyrrolopyrroles, use of such compounds in colour filters and polymers prepared from these compounds |
| 09/14/2005 | CN1668648A New difunctional photoinitiators |
| 09/14/2005 | CN1668437A Imprint lithography processes and systems |
| 09/14/2005 | CN1667802A Plating method |
| 09/14/2005 | CN1667727A Exposure apparatus of an optical disk master, method of exposing an optical disk master and pinhole mechanism |
| 09/14/2005 | CN1667726A Exposure apparatus of an optical disk master, method of exposing an optical disk master and pinhole mechanism |
| 09/14/2005 | CN1667516A Lithographic apparatus and device manufacturing method |
| 09/14/2005 | CN1667515A Lithographic apparatus, lorentz actuator and device manufacturing method |
| 09/14/2005 | CN1667514A System and method for controlling composition for lithography process in real-time using near-infrared spectrometer |
| 09/14/2005 | CN1667513A Exposure apparatus and method |
| 09/14/2005 | CN1667512A Method for forming light reflecting pattern and products thereof |
| 09/14/2005 | CN1667511A Positive photoresist composition for non-spincoating type and anti-corrosive pattern forming method |
| 09/14/2005 | CN1667510A Photoresist composition |
| 09/14/2005 | CN1667509A Planographic printing plate precursor |
| 09/14/2005 | CN1667508A Aqueous emulsion type cylinder photoresist |
| 09/14/2005 | CN1667507A Environmental friendly aqueous emulsion type round screen sensitization glue |
| 09/14/2005 | CN1667506A Acid and alkali resistant cylinder photoresist for printmaking |
| 09/14/2005 | CN1667505A Layout data verification method, mask pattern verification method and circuit operation verification method |
| 09/14/2005 | CN1667449A Micro electromechanical actuator having a plurality of face comb electrodes and method for manufacturing the same |
| 09/14/2005 | CN1219241C Photoresist remover composition |
| 09/14/2005 | CN1219240C Magnetic suspension precise work bench of integrated circuit photolithography equipment |
| 09/14/2005 | CN1219239C Silver halide emulsion with high image contrast, and preparing method and use thereof |
| 09/14/2005 | CN1219238C Positive photoresist composition |
| 09/14/2005 | CN1218840C Support device for lithographic printing plate, its making method and lithographic printing original plate |
| 09/13/2005 | US6944578 Measuring 3 dimensional profile changes in a photosensitive film and feeding back compensatory exposure tool focus corrections to maintain a stable lithographic process; measuring the relationship between line edge width and barometric pressure |
| 09/13/2005 | US6943941 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems |
| 09/13/2005 | US6943888 Pattern reading apparatus |
| 09/13/2005 | US6943882 Method to diagnose imperfections in illuminator of a lithographic tool |
| 09/13/2005 | US6943865 Device manufacturing apparatus |
| 09/13/2005 | US6943464 Lithographic apparatus and motor for use in the apparatus |
| 09/13/2005 | US6943458 Semiconductor device and manufacturing method thereof, and registration accuracy measurement enhancement method |
| 09/13/2005 | US6943432 Semiconductor constructions |
| 09/13/2005 | US6943359 Structured organic materials and devices using low-energy particle beams |
| 09/13/2005 | US6943142 Etching aftertreatment; removal photoresists; aqueous mixture of water soluble solvent and sulfonate |
| 09/13/2005 | US6943117 UV nanoimprint lithography process using elementwise embossed stamp and selectively additive pressurization |
| 09/13/2005 | US6943068 Method for fabricating nanometer gate in semiconductor device using thermally reflowed resist technology |
| 09/13/2005 | US6942959 comprises angle redistributing prescreen, which minimizes/eliminates sensitivity to projector location, with conventional diffusion screen; high resolution; photoresists; photolithography; silver halide emulsions |
| 09/09/2005 | WO2005084092A2 Micrometric direct-write methods for patterning conductive material and applications to flat panel display repair |
| 09/09/2005 | WO2005083759A1 Exposure system, and production method for device having fine pattern |
| 09/09/2005 | WO2005083758A1 Stage apparatus and projection exposure apparatus |
| 09/09/2005 | WO2005083757A1 Method for separating resist film and rework process |
| 09/09/2005 | WO2005083755A1 Photoresist film removing device and method |
| 09/09/2005 | WO2005083525A2 Determining image blur in an imaging system |
| 09/09/2005 | WO2005083524A2 Method for aligning the surface of a substrate |
| 09/09/2005 | WO2005083523A1 Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof |
| 09/09/2005 | WO2005083522A1 Pattern forming process |
| 09/09/2005 | WO2005083521A1 Negative colored photosensitive composition |
| 09/09/2005 | WO2005083520A1 Inorganic paste composition, method for preparing inorganic paste composition, and sheet-shaped unbaked body for producing display panel |
| 09/09/2005 | WO2005083519A2 Methods of patterning a surface using single and multilayer molecular films |
| 09/09/2005 | WO2005083518A1 Photosensitive material for immersion photolithography |
| 09/09/2005 | WO2005083517A2 Illumination system for a microlithography projection exposure installation |
| 09/09/2005 | WO2005083515A1 Process for fabricating semiconductor device and method for generating mask pattern data |
| 09/09/2005 | WO2005083514A2 Method of extending the stability of a photoresist during direct writing of an image |
| 09/09/2005 | WO2005083513A2 Composite patterning with trenches |
| 09/09/2005 | WO2005083512A2 Illumination system for a microlithography projection exposure installation |
| 09/09/2005 | WO2005083511A2 System for reducing the coherence of laser radiation |
| 09/09/2005 | WO2005083487A1 Housing structure |
| 09/09/2005 | WO2005083294A1 Pneumatic spring apparatus, vibration-proof apparatus, stage apparatus and exposure apparatus |
| 09/09/2005 | WO2005083019A1 Coating resin composition |
| 09/09/2005 | WO2005082956A1 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern |
| 09/09/2005 | WO2005082592A1 Method for manufacturing fine component |
| 09/09/2005 | WO2005082097A2 Combined ablation and exposure system and method |
| 09/09/2005 | WO2005071486A3 Lithographic apparatus and device manufacturing method |
| 09/09/2005 | WO2005047979A3 Optical system |
| 09/09/2005 | WO2005040926A3 Optical subassembly and projection objective for semiconductor lithography |
| 09/09/2005 | WO2005024520A3 Phototool coating |
| 09/09/2005 | WO2005019935A3 Refractive index system monitor and control for immersion lithography |
| 09/09/2005 | WO2005015315A3 Microlithographic projection exposure system, and method for introducing an immersion liquid into an immersion chamber |
| 09/09/2005 | WO2005010926A3 Procede de fabrication de film conducteur anisotrope |
| 09/09/2005 | WO2004102274A3 Use of spin-on, photopatternable, interplayer dielectric materials and intermediate semiconductor device structure utilizing the same |
| 09/09/2005 | CA2556749A1 Combined ablation and exposure system and method |
| 09/08/2005 | US20050197772 Assessment and optimization for metrology instrument including uncertainty of total measurement uncertainty |
| 09/08/2005 | US20050197728 Feature targeted inspection |
| 09/08/2005 | US20050197727 Remote maintenance system |
| 09/08/2005 | US20050197482 for production of polyimides; for complexing with epoxy resin/silicone resin; photosensitivity |
| 09/08/2005 | US20050197265 Composition including an active cleaning combination selected from a quaternary ammonium base in combination with at least one of alkali and alkaline earth base and a strong base in combination with an oxidant; semiconductors |
| 09/08/2005 | US20050197254 Imprint lithography for superconductor devices |
| 09/08/2005 | US20050196713 Adding fluorinated polyether additive to a dispersion of electrophoretic pigment-containing microparticles dispersed in a dielectric solvent prepared by microencapsulation; improved colloidal stability, switching performance and temperature latitude |
| 09/08/2005 | US20050196711 Forming a light absorption layer over a substrate; forming a first region over the light absorption layer; generating a heat by irradiating the light absorption layer with a laser light; andforming a first film pattern by heating the first region with the heat |
| 09/08/2005 | US20050196710 Forming a first region including a light-absorbing material; forming a second region by modifying a surface of the substrate by irradiating a with laser having a wavelength which is absorbed by the light-absorbing material; forming a pattern by discharging a compound including a pattern forming material |
| 09/08/2005 | US20050196707 Patterned conductive coatings |
| 09/08/2005 | US20050196706 Semiconductor device manufacturing method and semiconductor device manufacturing system |
| 09/08/2005 | US20050196705 Forming image with high resolving power; producing extremely fine circuit pattern; utilizing excimer laser light emitted from annular shaped source; improving contrast with reduction projection lens; eliminates phase shifting |
| 09/08/2005 | US20050196704 Resin coating method and apparatus |
| 09/08/2005 | US20050196703 Imaging droplet extrusion appearance and automatically adjusting nozzle tip position before droplet impacts printed wiring board |
| 09/08/2005 | US20050196701 Process for preparing a flexographic printing plate |
| 09/08/2005 | US20050196700 Imagewise exposure to ultraviolet radiation using a digital mirror device, and removing an image formation layer having an acrylic ester-diazo resin copolymer, at non-exposed portions with an basic solution; high chemical resistance and printing durability |
| 09/08/2005 | US20050196698 Polyurethane resin from a dihydroxy monomer having alkylene groups and a pendant carboxylic acid group and a photopolymerization or thermal polymerization initiator; polymerization of the alkylene groups; excellent in press life, suitable for scanning exposure with laser beams, enables high-speed writing |
| 09/08/2005 | US20050196689 Method for transferring a layout of an integrated circuit level to a semiconductor substrate |
| 09/08/2005 | US20050196687 Mask layout and exposing method for reducing diffraction effects by using a single mask in the process of semiconductor production |
| 09/08/2005 | US20050196686 Carrying out a rule-based correction of proximity effects for insertion or supplementation of one or more serifs in the circuit design onto the line end of a wafer |
| 09/08/2005 | US20050196685 Rectangular contact lithography for circuit performance improvement and manufacture cost reduction |
| 09/08/2005 | US20050196682 Generating a mask for use in a photolithography process; tuning the transmittance of features in a target mask pattern |
| 09/08/2005 | US20050196680 Multi-image reticles |
| 09/08/2005 | US20050196529 Resin coating method and apparatus |
| 09/08/2005 | US20050196522 System capable of determining applied and anodized coating thickness of a coated-anodized product |
| 09/08/2005 | US20050196164 Automatic development method of photosensitive lithographic printing plate and automatic development device thereof |