| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 09/15/2005 | WO2005017983A3 Plasma ashing process |
| 09/15/2005 | WO2005010611A3 Wafer table for immersion lithography |
| 09/15/2005 | WO2004077493A3 Method for producing an exposed substrate |
| 09/15/2005 | WO2004051709A8 Process for obtaining spatially-organised nanostructures on thin films |
| 09/15/2005 | US20050204330 Exposure pattern forming method and exposure pattern |
| 09/15/2005 | US20050204327 Layout data verification method, mask pattern verification method and circuit operation verification method |
| 09/15/2005 | US20050203262 Fluorinated polymers, photoresists and processes for microlithography |
| 09/15/2005 | US20050202987 Stripping formulation for photoresists containing ammonium difluoride or ammonium fluoride, a sulfone or sulfoxide solvent and a basic amine |
| 09/15/2005 | US20050202668 Methods of patterning a surface using single and multilayer molecular films |
| 09/15/2005 | US20050202599 Method of forming metal pattern having low resistivity |
| 09/15/2005 | US20050202583 Antistatic film forming composition, and producing method for conductive film pattern, electron source and image display apparatus |
| 09/15/2005 | US20050202564 System and method for controlling composition for lithography process in real time using near infrared spectrometer |
| 09/15/2005 | US20050202352 Systems and methods for sub-wavelength imaging |
| 09/15/2005 | US20050202351 alkali soluble, water insoluble barrier against removal in immersion microlithography; alkyl alcohol solvent and a polynorbornene with an ionizable ring group (acidic fluoroalkylalcohol) to prevent amine contamination; pKa less than 9; poly(1,1,2,3,3-pentafluoro-4-fluoroalkyl-4-hydroxy-1,6-heptadiene) |
| 09/15/2005 | US20050202350 Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascene patterning |
| 09/15/2005 | US20050202348 Substrate, conductive substrate, fine structure substrate, organic field effect transistor and manufacturing method thereof |
| 09/15/2005 | US20050202347 Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof |
| 09/15/2005 | US20050202346 when the sealing rubber is pressed the thin negative resist layer bends because it is made from a flexible resin and capillary phenomenon occurs ao sealing rubber is elastically deformed when entering the plating pattern; thus plating solution does not leak; electrode on semiconductor wafer |
| 09/15/2005 | US20050202345 Resist composition |
| 09/15/2005 | US20050202343 infrared absorber is cyanine dye with an amide, urethane, urea, or a sulfonamide bond; radical generator, acid generator; radical polymerizable compound, acid crosslinker; recording layer of a negative lithographic printing plate precursor; direct infrared laser from digital signals; no dye deposit |
| 09/15/2005 | US20050202342 positive; directly from scanning exposure based on digital signals; offset printing master; reproducibility of highly fine images; printing durability and chemical resistance of small-area image areas like halftone dots and thin lines; cresol-formaldehyde-dimethylolurea resin in lower layer |
| 09/15/2005 | US20050202341 Unsaturaed monomer, photoinitiator (titanocene), benzotriazole sensitizer; exposure to laser light having a wavelength of 450 nm or shorter; scanning exposure adapted for computer-to-plate systems; storage stability; can reproduce halftone dot area with a high fidelity after accelerated aging |
| 09/15/2005 | US20050202340 alkali soluble, water insoluble barrier against removal in immersion microlithography; alkyl alcohol solvent and a polynorbornene with an ionizable ring group (acidic fluoroalkylalcohol) to prevent amine contamination; pKa less than 9; poly(1,1,2,3,3-pentafluoro-4-fluoroalkyl-4-hydroxy-1,6-heptadiene) |
| 09/15/2005 | US20050202337 Mix of polyamides with hydroxy groups and photosensitizer, used to form an insulating layer of organic polyimide electroluminescent displays and a surface protective coat and a dielectric film among layers of semiconductor elements; less likely to cause defects such as transcribed trace and line drawing |
| 09/15/2005 | US20050202328 Large feature-shift coma sensitivity is simulated for a range of illumination conditions, resulting source sensitivity data is modeled and a practical array of source shapes, each of which is optimized to eliminate the effects of transverse distortion due to third-order coma, is identified |
| 09/15/2005 | US20050202327 Method and arrangement for controlling focus parameters of an exposure tool |
| 09/15/2005 | US20050202324 Method for producing masks for photolithograpy and the use of such masks |
| 09/15/2005 | US20050202323 Phase shift mask and method of manufacturing phase shift mask |
| 09/15/2005 | US20050201246 Particle-optical projection system |
| 09/15/2005 | US20050200966 Objective with birefringent lenses |
| 09/15/2005 | US20050200940 Device and method for wavefront measurement of an optical imaging system, and a microlithography projection exposure machine |
| 09/15/2005 | US20050200839 Method and system for detecting defects |
| 09/15/2005 | US20050200830 Levitated and driven reticle-masking blade stage |
| 09/15/2005 | US20050200828 Driving apparatus and exposure apparatus |
| 09/15/2005 | US20050200827 Positioning apparatus and exposure apparatus using the same |
| 09/15/2005 | US20050200824 Methods and systems for controlling radiation beam characteristics for microlithographic processing |
| 09/15/2005 | US20050200823 Scanning exposure method, scanning exposure apparatus and its making method, and device and its manufacturing method |
| 09/15/2005 | US20050200822 Exposure apparatus and method |
| 09/15/2005 | US20050200821 Lithographic apparatus and device manufacturing method |
| 09/15/2005 | US20050200820 Lithographic apparatus and device manufacturing method |
| 09/15/2005 | US20050200819 comprises spaced patterning arrays, wherein combined, overlapped image of patterning arrays, which arrives from different angles and has high effective numerical aperture, is projected onto substrate; improved resolution |
| 09/15/2005 | US20050200818 Exposing systems providing post exposure baking and related methods |
| 09/15/2005 | US20050200815 Projection exposure apparatus, device manufacturing method, and sensor unit |
| 09/15/2005 | US20050200693 Exposure head |
| 09/15/2005 | US20050200678 Pressure development apparatus |
| 09/15/2005 | US20050200243 Method and device for vibration control |
| 09/15/2005 | US20050200208 Lithographic apparatus, lorentz actuator, and device manufacturing method |
| 09/15/2005 | US20050199830 EUV light source optical elements |
| 09/15/2005 | US20050199829 EUV light source |
| 09/15/2005 | US20050199827 Charged particle beam apparatus, charged particle beam control method, substrate inspection method and method of manufacturing semiconductor device |
| 09/15/2005 | US20050199598 Method and system for precisely positioning a waist of a material-processing laser beam to process microstructures within a laser-processing site |
| 09/15/2005 | US20050199584 Decal transfer microfabrication |
| 09/15/2005 | US20050199505 Manufacturing process of aluminum support for planographic printing plate, aluminum support for planographic printing plate, planographic printing plate material and image formation process |
| 09/15/2005 | DE19640811B4 Verfahren zum Untersuchen von Prozessdefekten bei Halbleitervorrichtungen A method of inspecting of process defects in semiconductor devices |
| 09/15/2005 | DE19510449B4 Retikel Reticle |
| 09/15/2005 | DE102004063848A1 Lighting for microlithography projection exposure system, includes two dimensional light distribution device with two raster devices for receiving light from primary and secondary sources |
| 09/15/2005 | DE102004059400A1 System und Verfahren zum Verwenden eines seitenbefestigten Interferometers, um Positionsinformationen zu erfassen System and method for using a side mounted interferometer to detect position information |
| 09/15/2005 | DE102004027213A1 Twin-mask lithography for a substrate surface coated with a photo varnish, to form an electronic integrated circuit, has light shrouding main and auxiliary structures which are used with illumination |
| 09/15/2005 | DE102004010569A1 Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage Illumination system for a microlithography projection exposure apparatus |
| 09/15/2005 | DE102004009173A1 Verfahren zur Kompensation der Verkürzung von Linienenden bei der Bildung von Linien auf einem Wafer A method for compensating for the shortening of line ends in the formation of lines on a wafer |
| 09/15/2005 | DE102004008782A1 Smoothing the surfaces of a structure, e.g. to make smooth-edged photo-resists in micro-electronics, involves coating with another material, heating to above the glass transition point of the first material and then cooling |
| 09/15/2005 | DE102004008074A1 Verfahren und Testform zum Abgleichen der Belichtungsköpfe in einem Belichter für Druckvorlagen Procedures and test form for adjusting the exposure heads in an imagesetter for printing templates |
| 09/15/2005 | DE102004007678B3 Mask manufacturing method for semiconductor component, involves enlarging slivers after breaking up of semiconductor layout data, and transmitting enlarged slivers to generator in form of control data after photographic exposure of mask |
| 09/15/2005 | CA2599727A1 Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate |
| 09/15/2005 | CA2558505A1 Violet colorant for colour filters, inks for ink-jet, electrophotographic toners and developers and e-inks |
| 09/14/2005 | EP1574907A1 Developing agent for positive-type photosensitive composition |
| 09/14/2005 | EP1574906A2 Aligning apparatus, exposure apparatus, and device manufacturing method |
| 09/14/2005 | EP1574905A1 Lithographic apparatus and device manufacturing method |
| 09/14/2005 | EP1574904A1 Radial and tangential polarizer for high numerical aperture systems |
| 09/14/2005 | EP1574903A1 Photoresists comprising cyanoadamantyl moiety-containing polymers |
| 09/14/2005 | EP1574902A1 Method of pattern formation using ultrahigh heat resistant positive photosensitive composition |
| 09/14/2005 | EP1574901A1 Process for producing photoresist composition, filter, coater and photoresist composition |
| 09/14/2005 | EP1574528A1 Novel photosensitive resin based on saponified polyvinyl acetate, photosensitive resin composition, method of forming aqueous gel from the same, and compound |
| 09/14/2005 | EP1574331A2 Planographic printing plate precursor |
| 09/14/2005 | EP1573785A2 Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties |
| 09/14/2005 | EP1573772A2 Field emission device, and method of manufacturing such a device |
| 09/14/2005 | EP1573771A2 System and method for removal of materials from an article |
| 09/14/2005 | EP1573730A1 Liquid removal in a method and device for irradiating spots on a layer |
| 09/14/2005 | EP1573403A1 Resistor structures to electrically measure unidirectional misalignment of stitched masks |
| 09/14/2005 | EP1573402A2 Illumination system having a more efficient collector optic |
| 09/14/2005 | EP1573401A1 Method and system for measuring the reproduction quality of an optical reproduction system |
| 09/14/2005 | EP1573400A2 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and a resist layer |
| 09/14/2005 | EP1573399A1 Microstructure comprising an adhesive coating and method for making same |
| 09/14/2005 | EP1573398A2 Apparatus and method for making a forming structure |
| 09/14/2005 | EP1573397A1 Color filter black matrix resist composition |
| 09/14/2005 | EP1573396A2 Laser exposure of photosensitive masks for dna microarray fabrication |
| 09/14/2005 | EP1573395A2 Scatterometry alignment for imprint lithography |
| 09/14/2005 | EP1573385A1 Manufacture of shaped structures in lcd cells, and masks therefor |
| 09/14/2005 | EP1573366A2 Continuous direct-write optical lithography |
| 09/14/2005 | EP1573268A1 Assessment and optimization for metrology instrument |
| 09/14/2005 | EP1572860A2 Gradient structures interfacing microfluidics and nanofluidics, methods for fabrication and uses thereof |
| 09/14/2005 | EP1572758A1 Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerization |
| 09/14/2005 | EP1501916A4 Non-corrosive cleaning compositions for removing etch residues |
| 09/14/2005 | EP1305673A4 Prioritizing the application of resolution enhancement techniques |
| 09/14/2005 | EP1010040A4 Laser-illuminated stepper or scanner with energy sensor feedback |
| 09/14/2005 | CN1669121A Transfer mask for exposure and pattern exchanging method of the same |
| 09/14/2005 | CN1669081A Spin-coating device and method of producing disk-like recording medium |
| 09/14/2005 | CN1668984A Projection optical system and method for photolithography and exposure apparatus and method using same |
| 09/14/2005 | CN1668983A Machine for exposing printed circuit boards |
| 09/14/2005 | CN1668982A Composition for antireflection film formation |