| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/21/2005 | EP1577114A2 Device for positioning a curing radiation source on an engraving cylinder or an engraving plate holder |
| 09/21/2005 | EP1577113A2 Curable composition and image forming material containing the same |
| 09/21/2005 | EP1577089A2 Lithographic printing method |
| 09/21/2005 | EP1577088A2 Method of making a planographic printing plate |
| 09/21/2005 | EP1577087A2 Planographic printing plate precursor |
| 09/21/2005 | EP1577086A2 Lithographic printing process |
| 09/21/2005 | EP1576716A2 Apparatus for processing an object with high position accuracy |
| 09/21/2005 | EP1576423A2 Method for operating a developing machine and developing machine |
| 09/21/2005 | EP1576422A2 Method and system for overlay measurement |
| 09/21/2005 | EP1576421A2 Process for the production of negative working lithographic printing plate precursors with a coating comprising diazo resin |
| 09/21/2005 | EP1576420A1 Nano-imprint lithography method involving substrate pressing |
| 09/21/2005 | EP1576419A2 Programmable photolithographic mask and reversible photo-bleachable materials based on nano-sized semiconductor particles and their applications |
| 09/21/2005 | EP1576418A1 Color filter black matrix resist composition and carbon black dispersion composition used for the composition |
| 09/21/2005 | EP1576040A2 Patterned polymeric structures, particularly microstructures, and methods for making same |
| 09/21/2005 | EP1573785A3 Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties |
| 09/21/2005 | EP1444550B1 Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties |
| 09/21/2005 | EP1019992A4 Pulse energy control for excimer laser |
| 09/21/2005 | EP0983320B1 Curable sealant composition |
| 09/21/2005 | CN2727780Y Light shield for making inclined reflection bump |
| 09/21/2005 | CN1672242A Light conducting device |
| 09/21/2005 | CN1672100A Micro-contact printing method |
| 09/21/2005 | CN1672098A Lithographic template having a repaired gap defect |
| 09/21/2005 | CN1672097A Photosensitive bottom anti-reflective coatings |
| 09/21/2005 | CN1671821A Composition and process for wet stripping removal of sacrificial anti-reflective material |
| 09/21/2005 | CN1671772A Organosiloxanes |
| 09/21/2005 | CN1670922A Semiconductor device manufacturing method |
| 09/21/2005 | CN1670914A Method for improving the critical dimension uniformity of patterned features on wafers |
| 09/21/2005 | CN1670628A 抗蚀剂组合物 The resist composition |
| 09/21/2005 | CN1670627A Accurate adjustable positioning device |
| 09/21/2005 | CN1670626A Photosensitive resin composition and use of the same |
| 09/21/2005 | CN1670625A Formation of projections and spacers and radiation sensitive resin composition for the same |
| 09/21/2005 | CN1670624A 蚀刻组合物 Etching composition |
| 09/21/2005 | CN1670623A Coating compositions |
| 09/21/2005 | CN1670622A Light shield made through laser annealing and method for forming polycrystalline films by utilizing laser annealing |
| 09/21/2005 | CN1670598A Process for preparing active matrix LCD arrangement with pattern active layers |
| 09/21/2005 | CN1670261A Aluminium sheet embossing roll |
| 09/21/2005 | CN1670014A Cyanoadamantyl compounds and polymers |
| 09/21/2005 | CN1669665A Thin seam nozzle and substrate treating device |
| 09/21/2005 | CN1220249C Read-only code mask and use method thereof |
| 09/21/2005 | CN1220245C Figure forming method |
| 09/21/2005 | CN1220116C Device for measuring relative position error |
| 09/21/2005 | CN1220115C Light carving rubber stripper composition |
| 09/21/2005 | CN1220114C Light-sensitive resin composition for colour filter film |
| 09/21/2005 | CN1220100C Substrate for electrooptical screen and making method and electrooptical screen and relative electric appliance |
| 09/21/2005 | CN1219832C Low foaming N, N'-dialkyl malic imine wetting agent |
| 09/21/2005 | CN1219802C Copolymer resin, preparation thereof, and photo resist using the same |
| 09/20/2005 | USRE38798 Projection exposure apparatus |
| 09/20/2005 | US6948149 Method of determining the overlay accuracy of multiple patterns formed on a semiconductor wafer |
| 09/20/2005 | US6947850 Real time analysis of periodic structures on semiconductors |
| 09/20/2005 | US6947519 X-ray exposure apparatus and method, semiconductor manufacturing apparatus, and microstructure |
| 09/20/2005 | US6947518 X-ray exposure apparatus, X-ray exposure method, X-ray mask, X-ray mirror, synchrotron radiation apparatus, synchrotron radiation method and semiconductor device |
| 09/20/2005 | US6947210 Catoptric projection optical system, exposure apparatus and device fabrication method using same |
| 09/20/2005 | US6947199 Loosely-packed two-dimensional modulator arrangement |
| 09/20/2005 | US6947192 Correction of birefringence in cubic crystalline optical systems |
| 09/20/2005 | US6947148 Interferometric apparatus and method with phase shift compensation |
| 09/20/2005 | US6947141 Overlay measurements using zero-order cross polarization measurements |
| 09/20/2005 | US6947140 Birefringence measurement apparatus and method |
| 09/20/2005 | US6947125 Bearing arrangement for reaction mass in a controlled environment |
| 09/20/2005 | US6947124 Illumination system particularly for microlithography |
| 09/20/2005 | US6947123 Exposure device with laser device |
| 09/20/2005 | US6947122 Scanning exposure apparatus and method |
| 09/20/2005 | US6947121 Projection optical system, a projection exposure apparatus provided with the same, as well as a device manufacturing method |
| 09/20/2005 | US6947120 Illumination system particularly for microlithography |
| 09/20/2005 | US6947119 Distortion measurement method and exposure apparatus |
| 09/20/2005 | US6947118 Lithographic apparatus and method of manufacturing a device |
| 09/20/2005 | US6946757 Stage apparatus and method of controlling the same |
| 09/20/2005 | US6946736 Electrical device including dielectric layer formed by direct patterning process |
| 09/20/2005 | US6946666 Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same |
| 09/20/2005 | US6946665 Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus |
| 09/20/2005 | US6946628 Heating elements deposited on a substrate and related method |
| 09/20/2005 | US6946396 Maleic acid and ethylene urea containing formulation for removing residue from semiconductor substrate and method for cleaning wafer |
| 09/20/2005 | US6946394 Methods and systems for determining a characteristic of a layer formed on a specimen by a deposition process |
| 09/20/2005 | US6946390 Photolithographic production of trenches in a substrate |
| 09/20/2005 | US6946360 Fluid pressure bonding |
| 09/20/2005 | US6946332 Forming nanoscale patterned thin film metal layers |
| 09/20/2005 | US6946239 Method of developing photosensitive planographic printing plate |
| 09/20/2005 | US6946236 Applying the chemically amplified resist to a substrate; removing the solvent to provide a photosensitive resist film; sectionally exposing the photosensitive resist; contrasting the exposed resist film; developing; removing excess developer |
| 09/20/2005 | US6946235 Radiation transparent; bonding strength; lithography |
| 09/20/2005 | US6946234 Terpolymer of p-isopropenylphenol, (meth)acrylic acid and alkyl or hydroxyalkyl (meth)acrylate; vinyl ether such as the bis(2-vinyloxyethyl) ether of Bisphenol A; acid generator |
| 09/20/2005 | US6946233 High resolution; etching chemical resistance |
| 09/20/2005 | US6946231 Presensitized lithographic plate comprising microcapsules |
| 09/15/2005 | WO2005086223A2 Multi-layer overlay measurement and correction technique for ic manufacturing |
| 09/15/2005 | WO2005086209A1 Optical element, projection optical system, and exposure device |
| 09/15/2005 | WO2005085957A1 Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate |
| 09/15/2005 | WO2005085956A2 Pellicle for a lithographic lens |
| 09/15/2005 | WO2005085955A2 Transmission filter device |
| 09/15/2005 | WO2005085954A1 Positive resist composition for immersion exposure and method for forming resist pattern |
| 09/15/2005 | WO2005085953A1 Photosensitive structure for flexographic printing and process for producing the same |
| 09/15/2005 | WO2005085952A1 Photomask substrate made of synthetic quartz glass and photomask |
| 09/15/2005 | WO2005085947A1 Laser light source device, exposure apparatus using this laser light source device, and mask examining device |
| 09/15/2005 | WO2005085367A1 Violet colorant for colour filters, inks for ink-jet, electrophotographic toners and developers and e-inks |
| 09/15/2005 | WO2005085309A2 Method for hardening a photosensitive filler material and hardening device |
| 09/15/2005 | WO2005085301A1 Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer |
| 09/15/2005 | WO2005084873A1 Laser beam application device and pattern drawing method |
| 09/15/2005 | WO2005084788A1 Mechanism and method for supplying liquid, and apparatus and method for developing treatment |
| 09/15/2005 | WO2005067634A3 Advanced multi-pressure worpiece processing |
| 09/15/2005 | WO2005060668A3 Methods of modifying surfaces |
| 09/15/2005 | WO2005047564A3 Method of improving post-develop photoresist profile on a deposited dielectric film |
| 09/15/2005 | WO2005043249A3 Composite optical lithography method for patterning lines of unequal width |
| 09/15/2005 | WO2005038522A3 Transparent invisible conductive grid |