| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/22/2005 | WO2005087655A1 Manufacturing method for molecular rulers |
| 09/22/2005 | WO2005087505A1 Lightweight offset plates, preparation and use thereof |
| 09/22/2005 | WO2005086901A2 Cynoadamantyl compound and polymers and photoresists compresing same |
| 09/22/2005 | WO2005054951A3 Thick film photoresist composition and method of forming resist pattern |
| 09/22/2005 | WO2005050324A3 A method and apparatus for producing microchips |
| 09/22/2005 | WO2005050317A3 Polarized reticle, photolithography system, and method of forming a pattern using a polarized reticle in conjunction with polarized light |
| 09/22/2005 | WO2005036273A3 Composite optical lithography method for patterning lines of significantly different widths |
| 09/22/2005 | WO2003058344A3 System and method for aerial image sensing |
| 09/22/2005 | US20050210438 Modification of an image of a pattern during an imaging process |
| 09/22/2005 | US20050210437 Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model |
| 09/22/2005 | US20050209369 High performance water-based primer |
| 09/22/2005 | US20050209357 Flame retardant radiation curable compositions |
| 09/22/2005 | US20050209118 Photoresist residue remover composition and semiconductor circuit element production process employing the same |
| 09/22/2005 | US20050208779 Imprint lithography process |
| 09/22/2005 | US20050208777 Film forming method, and substrate-processing apparatus |
| 09/22/2005 | US20050208772 Method of producing electron beam writing data, program of producing electron beam writing data, and electron beam writing apparatus |
| 09/22/2005 | US20050208756 Method of removing resist, semiconductor device thereby and method of manufacturing a semiconductor device |
| 09/22/2005 | US20050208755 Nitrogen-free ARC layer and a method of manufacturing the same |
| 09/22/2005 | US20050208685 Periodic patterns and technique to control misalignment |
| 09/22/2005 | US20050208683 [method of correcting lithographic process and method of forming overlay mark] |
| 09/22/2005 | US20050208537 Very large scale immobilized polymer synthesis |
| 09/22/2005 | US20050208435 Exposing and developing using a film having a pattern for a mask to pattern photoresist layer; forming metal layer on seed layer by LIGA process (lithographic electroforming molding) |
| 09/22/2005 | US20050208434 Method and system for treating a hard mask to improve etch characteristics |
| 09/22/2005 | US20050208433 Pattern forming method, circuit substrate and electronic apparatus |
| 09/22/2005 | US20050208431 such as waveguides; using multiphoton, multi-step photocuring to fabricate encapsulated optical element(s) within a body of a photopolymerizable composition; good hardness, durability, dimensional stability, resilience, and toughness |
| 09/22/2005 | US20050208430 Forming self-aligned patterned layer on pre-patterned film formed by solution of masking material in carrier; removing portion of carrier to form coating; exposing to radiation in conjunction with blocking mask to transmit and reflect back; exposed and unexposed regions of spacial intensity distribution |
| 09/22/2005 | US20050208429 Exposing the polymer resist layer to radiant energy to form at least one light field region in the polymer resist layer, and then contacting the polymer resist layer with CO2 solvent system to remove light field region |
| 09/22/2005 | US20050208428 Surface graft material, conductive pattern material, and production method thereof |
| 09/22/2005 | US20050208427 Semiconductor device manufacturing method |
| 09/22/2005 | US20050208426 Exposing to light a planographic printing plate precursor having a photosensitive layer comprising an infrared absorbent, a polymerization initiator, a polymerizable compound, a binder polymer, and a protective layer in that order; development with monoketone or monoalcohol compound antigelation agent |
| 09/22/2005 | US20050208424 (Meth)acrylate polymer comprising (co)monomers having adamantane group such as 2-ethyl-2-adamantyl-methacrylate, 10.0 g of hydroxyadamantyl methacrylate, 15.2 g of 4,8-dioxatricyclo[4.2.1.03,7]nonan-5-on-2-yl methacrylate; sensitive to high energy radiation; resolution; micropatterning |
| 09/22/2005 | US20050208422 Scumming resistance and long press life |
| 09/22/2005 | US20050208421 Photosensitive resin composition and use of the same |
| 09/22/2005 | US20050208420 Sulfonium or halogenium salts for amplification photoresists; heat treating coating and exposing coating to high energy or electron beam through photomask; developing |
| 09/22/2005 | US20050208419 Fluoropolymer containing unsaturated monomer with a adamantyl, decalin, norbornyl, cedrol , cyclohexyl, cycloheptyl, cyclooctyl , a cyclodecanyl, cyclododecanyl and/or tricyclodecanyl group; sulfonium type compound generates acid upon exposure to actinic radiation; semiconductor, integrated circuits |
| 09/22/2005 | US20050208418 Cyanoadamantyl compounds and polymers |
| 09/22/2005 | US20050208417 Cyanoadamantyl compounds and polymers and photoresists comprising same |
| 09/22/2005 | US20050208395 In a middle portion of a wafer the mask is die-by-die aligned based on marks provided at the chips, while in the second region outside of the first the coordinates of the respective chip are decided by a global alignment method based on detection of alignment marks of the first step |
| 09/22/2005 | US20050208394 Alkali-soluble resin, a phthalocyanine dye, and a photosensitive compound; heat resistance and light fastness |
| 09/22/2005 | US20050208392 An approximated curve to the curve of the actual pattern, mask pattern can be formed based on an individual and specific polygonal approximation in accordance with the shapes |
| 09/22/2005 | US20050208391 Focus masking structures, focus patterns and measurements thereof |
| 09/22/2005 | US20050208390 Exposed regions of a substrate are etched to a predetermined depth; Additional regions are exposed and trimmed to a predetermined thickness to provide desired attenuation amount; final etched depth compensating for the change of relative phase shift caused by trimming |
| 09/22/2005 | US20050208171 Mold and molding apparatus using the same |
| 09/22/2005 | US20050207751 Replenishing method of development replenisher in automatic developing equipment of photosensitive lithographic printing plate |
| 09/22/2005 | US20050207637 Polarization analyzing system, exposure method, and method for manufacturing semiconductor device |
| 09/22/2005 | US20050207536 X-ray-generating devices and exposure apparatus comprising same |
| 09/22/2005 | US20050207527 Radiation generating apparatus, radiation generating method, exposure apparatus, and exposure method |
| 09/22/2005 | US20050207089 Substrate holder and exposure apparatus using same |
| 09/22/2005 | US20050207029 Catadioptric projection objective |
| 09/22/2005 | US20050207018 Out-of-plane pre-aligned refractive micro lens |
| 09/22/2005 | US20050207012 Diffractive optical element |
| 09/22/2005 | US20050207001 Optical component that includes a material having a thermal longitudinal expansion with a zero crossing |
| 09/22/2005 | US20050206888 Method and apparatus for inspecting a pattern formed on a substrate |
| 09/22/2005 | US20050206881 Reticle and optical characteristic measuring method |
| 09/22/2005 | US20050206880 Optical apparatus, method of determining position of optical element in optical system, and device manufacturing method |
| 09/22/2005 | US20050206879 Lithographic apparatus and methods for use thereof |
| 09/22/2005 | US20050206871 Illumination apparatus, exposure apparatus and device manufacturing method |
| 09/22/2005 | US20050206870 Reticle stage based linear dosimeter |
| 09/22/2005 | US20050206869 Lithographic apparatus, device manufacturing method and variable attenuator |
| 09/22/2005 | US20050206868 Lithographic processing cell, lithographic apparatus, track and device manufacturing method |
| 09/22/2005 | US20050206867 Scanning exposure apparatus and method |
| 09/22/2005 | US20050206866 Exposure method and exposure system |
| 09/22/2005 | US20050206865 Balanced positioning system for use in lithographic apparatus |
| 09/22/2005 | US20050206863 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 09/22/2005 | US20050206862 Correcting device, exposure apparatus, device production method, and device produced by the device production method |
| 09/22/2005 | US20050206861 Correcting device, exposure apparatus, device production method, and device produced by the device production method |
| 09/22/2005 | US20050206860 Device for sealing a projection exposure apparatus |
| 09/22/2005 | US20050206850 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium |
| 09/22/2005 | US20050205811 LPP EUV light source |
| 09/22/2005 | US20050205810 High repetition rate laser produced plasma EUV light source |
| 09/22/2005 | US20050205809 Electron beam exposure apparatus |
| 09/22/2005 | US20050205803 Light source device and exposure equipment using the same |
| 09/22/2005 | US20050205781 Defect inspection apparatus |
| 09/22/2005 | US20050205776 AFM-based lithography metrology tool |
| 09/22/2005 | US20050205769 Light beam scanning apparatus and image forming apparatus |
| 09/22/2005 | US20050205210 Advanced multi-pressure workpiece processing |
| 09/22/2005 | US20050205115 After a resist stripping solution of sulfuric acid and a hydrogen peroxide is supplied to the surface of the substrate which is being rotated at a first rotational speed, the rotational speed of the substrate is reduced to form a liquid film on the surface; paddling to maintain the liquid film |
| 09/22/2005 | US20050205113 Processing solution supply nozzle is moved relatively from one end to the opposite end of a semiconductor wafer having undergone a developing operation while discharging an antistatic cleaning solution in a discharge width equal to or greater than the width of the wafer; defect prevention |
| 09/22/2005 | US20050205108 Method and system for immersion lithography lens cleaning |
| 09/22/2005 | US20050205007 Apparatus for uniformly baking substrates such as photomasks |
| 09/22/2005 | US20050204999 Method for making low-stress large-volume crystals with reduced stress birefringence and more uniform refractive index and crystals made thereby |
| 09/22/2005 | US20050204998 Method for making low-stress large-volume not-(111)-oriented crystals with reduced stress birefringence and more uniform refractive index and crystals made thereby |
| 09/22/2005 | US20050204959 Pigment produced by treating an organic pigment or carbon black each having a functional group reactive with a carbodiimide group; and a polyester side chains, polyether side chain, or a polyacrylic side chain |
| 09/22/2005 | US20050204945 Lithographic printing method |
| 09/22/2005 | US20050204943 Lithographic printing process |
| 09/22/2005 | DE102005003218A1 Three-dimensional component is formed using a stereolithography unit, which comprises a container for material to be solidified and an irradiation unit |
| 09/22/2005 | DE102005002537A1 System für geladene Teilchen und Verfahren zum Messen der Abbildungsvergrösserung System for charged particles and methods for measuring the imaging magnification |
| 09/22/2005 | DE102004011746A1 Lighting system for a microlithography projection illuminating device comprises a lens, an optical aperture plate forming element in the region of the lens surface, and an optical field forming element |
| 09/22/2005 | DE102004011733A1 Transmissionsfiltervorrichtung Transmission filter apparatus |
| 09/22/2005 | DE102004010902A1 Verfahren zur Übertragung eines kritischen Layouts einer Ebene einer integrierten Schaltung auf ein Halbleitersubstrat A method for transferring a layout of a critical level of an integrated circuit on a semiconductor substrate |
| 09/22/2005 | DE102004010282A1 Violettes Farbmittel für Color Filter, Ink Jet Tinten, elektrophotographische Toner und Entwickler und e-inks Violet colorant for color filters, ink jet inks, electrophotographic toners and developers and e-inks |
| 09/22/2005 | CA2558444A1 Lightweight offset plates, preparation and use thereof |
| 09/21/2005 | EP1577930A1 Coating device and coating film forming method |
| 09/21/2005 | EP1577929A2 Electron beam exposure apparatus |
| 09/21/2005 | EP1577709A2 Illumination apparatus exposure apparatus and device manufacturing method |
| 09/21/2005 | EP1577708A2 Photosensitive resin composition and use of the same |
| 09/21/2005 | EP1577670A2 Latent reactive polymers with biologically active moieties |
| 09/21/2005 | EP1577662A2 System and method for controlling composition for lithography process in real-time using near-infrared spectrometer |
| 09/21/2005 | EP1577285A1 Adamantane derivative and process for producing the same |
| 09/21/2005 | EP1577115A2 Support for lithographic printing plate and presensitized plate |