| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/28/2005 | EP1580599A1 Process of preparing planographic printing plate |
| 09/28/2005 | EP1580598A2 Positive resist composition for immersion exposure and pattern-forming method using the same |
| 09/28/2005 | EP1580597A2 Hologram recording material, hologram recording method and optical recording medium |
| 09/28/2005 | EP1580596A2 Structure formed with template having nanoscale features |
| 09/28/2005 | EP1580595A2 Pattern forming method, graft pattern material, conductive pattern forming method and conductive pattern material |
| 09/28/2005 | EP1579944A2 Laser radiation source |
| 09/28/2005 | EP1579435A1 Method and device for irradiating spots on a layer |
| 09/28/2005 | EP1579275A2 Method for manufacturing and controlling structures and patterns of soluble and colloidal substances by printing on the micrometer and nanometer scale and with reduction of the dimensions of the stamp's features |
| 09/28/2005 | EP1579273A2 System and method for aerial image sensing |
| 09/28/2005 | EP1579272A2 Stable non-photosensitive polyimide precursor compositions for use in bilayer imaging systems |
| 09/28/2005 | EP1578870A2 Sensitizer dyes for photoacid generating systems |
| 09/28/2005 | EP1578855A1 Organic bottom anti-reflective composition and patterning method using the same |
| 09/28/2005 | EP1578849A1 Method for modifying the surface of a polymeric substrate |
| 09/28/2005 | EP1578605A1 Method for producing flexoprinting forms by means of laser engraving using photopolymer flexoprinting elements and photopolymerisable flexoprinting element |
| 09/28/2005 | EP1488286A4 Ph buffered compositions for cleaning semiconductor substrates |
| 09/28/2005 | EP1360552B1 Fabrication of structures of metal/semiconductor compound by x-ray/euv projection lithography |
| 09/28/2005 | EP1303789A4 T-butyl cinnamate polymers and their use in photoresist compositions |
| 09/28/2005 | EP1169613B1 Characterizing and correcting cyclic errors in distance measuring and dispersion interferometry |
| 09/28/2005 | EP1060543A4 RELIABLE, MODULAR, PRODUCTION QUALITY NARROW-BAND KrF EXCIMER LASER |
| 09/28/2005 | CN1675968A Method for forming bump on electrode pad with use of double-layered film |
| 09/28/2005 | CN1675779A Method of manufacturing fine T-shaped electrode |
| 09/28/2005 | CN1675590A Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric |
| 09/28/2005 | CN1675589A Polymerizable composition, polymer, resist, and lithography methods |
| 09/28/2005 | CN1675588A Image forming material having bluish-violet laser-photosensitive resist material layer and resist image forming method therefor |
| 09/28/2005 | CN1675303A Optical material containing photocurable fluoropolymer and photocurable fluororesin composition |
| 09/28/2005 | CN1675264A Photoresists, fluorinated polymers and processes for 157 nm microlithography |
| 09/28/2005 | CN1675263A Photoresists, fluoropolymers and processes for 157 nm microlithography |
| 09/28/2005 | CN1675262A Fluorinated polymers useful as photoresists, and processes for microlithography |
| 09/28/2005 | CN1675179A Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography |
| 09/28/2005 | CN1675064A High speed negative-working thermal printing plates |
| 09/28/2005 | CN1675044A Polymer derived ceramic materials |
| 09/28/2005 | CN1674947A Method for immobilizing hydrogel-bonding polymers on polymer substrate surfaces |
| 09/28/2005 | CN1674767A Pattern forming method, circuit substrate and electronic apparatus |
| 09/28/2005 | CN1674228A Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof |
| 09/28/2005 | CN1674227A Method for forming pattern, thin film transistor, display device and method for manufacturing the same and application |
| 09/28/2005 | CN1674226A A method for performing transmission tuning of a mask pattern to improve process latitude |
| 09/28/2005 | CN1674205A Plasma focus light source with impoved pulse power system |
| 09/28/2005 | CN1673875A Lithographic apparatus, device manufacturing method and variable attenuator |
| 09/28/2005 | CN1673874A Method of determining aberration of a projection system of a lithographic apparatus |
| 09/28/2005 | CN1673873A Pattern forming method and method for manufacturing semiconductor device |
| 09/28/2005 | CN1673872A Stage device and exposure apparatus |
| 09/28/2005 | CN1673871A Method for detecting imaging quality of photoetching machine |
| 09/28/2005 | CN1673870A Method for manufacturing a carbon nanotube multilayer pattern using photolithography and dry etching |
| 09/28/2005 | CN1673869A Photomask micronic dust scavenger and photomask micronic dust clearing program |
| 09/28/2005 | CN1673868A Exposure machine with variable shutter and exposure method thereof |
| 09/28/2005 | CN1673867A Method for raising standard image logarithmic slope of exposure straight line |
| 09/28/2005 | CN1673866A Aperture disc applied for optical photoetching system |
| 09/28/2005 | CN1673865A Method for producing metal product with permanent pattern and character at spherical surface and metal globe |
| 09/28/2005 | CN1673864A Method for producing positive-working photoresist |
| 09/28/2005 | CN1673863A Pattern forming material, pattern forming apparatus and pattern forming method |
| 09/28/2005 | CN1673862A Etching composition and method for etching a substrate |
| 09/28/2005 | CN1673861A Chemically amplified positive resist composition |
| 09/28/2005 | CN1673860A Exposure device and positioning method |
| 09/28/2005 | CN1673859A Assembly of a reticle holder and a reticle |
| 09/28/2005 | CN1673829A Method for producing light conducting plate compression moulding plate utilizing grey step technique |
| 09/28/2005 | CN1673781A Light-sensitive composition, light-sensitive transfer material, light shielding layer for display device |
| 09/28/2005 | CN1673780A Radiation sensitive composition for repairing a color filter defect and method of repairing a color filter defect |
| 09/28/2005 | CN1673242A Catalyst complexes for polymerization and co-polymerization of cyclic olefins |
| 09/28/2005 | CN1220915C Negative-acting chemically amplified photoresist composition |
| 09/28/2005 | CN1220914C Chemical reinforcing positive photoresist composition and sulfonium salt |
| 09/28/2005 | CN1220913C Composition used for forming inorganic envelope and method to form inorganic envelope |
| 09/28/2005 | CN1220895C Methods of photosensitizing glasses with hydrogen or deuterium and waveguides resulting therefrom |
| 09/28/2005 | CN1220888C Method for making color filter and coloring photosensitive resin composition |
| 09/27/2005 | US6950292 Combination current sensor and relay |
| 09/27/2005 | US6950196 Methods and systems for determining a thickness of a structure on a specimen and at least one additional property of the specimen |
| 09/27/2005 | US6950192 Cyclic error compensation in interferometry systems |
| 09/27/2005 | US6950190 Scatterometry for junction metrology |
| 09/27/2005 | US6950188 Wafer alignment system using parallel imaging detection |
| 09/27/2005 | US6950187 Method for determining rotational error portion of total misalignment error in a stepper |
| 09/27/2005 | US6950176 Method and system for monitoring EUV lithography mask flatness |
| 09/27/2005 | US6950175 System, method, and apparatus for a magnetically levitated and driven reticle-masking blade stage mechanism |
| 09/27/2005 | US6950174 Projection exposure system for microlithography and method for generating microlithographic images |
| 09/27/2005 | US6949766 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 09/27/2005 | US6949751 Slit lens arrangement for particle beams |
| 09/27/2005 | US6949678 For resist applications; thermostability, storage stability |
| 09/27/2005 | US6949615 Monomer having electron-withdrawing group and process for preparing the same |
| 09/27/2005 | US6949609 Polymeric compositions and uses therefor |
| 09/27/2005 | US6949495 Cleaning solution for removing residue |
| 09/27/2005 | US6949330 Multiple level photolithography |
| 09/27/2005 | US6949329 Photoresist film formed on semiconductor substrate from positive chemically amplified resist material including polyvinylphenol whose soubility in alkaline developer is changed via acid generator such as pentafluorobenzenesulfonate |
| 09/27/2005 | US6949326 Lithographic printing plate for infrared laser |
| 09/27/2005 | US6949325 reactive ion etching; improved etch resistance; for production of semiconductor chips |
| 09/27/2005 | US6949324 Photosensitive fine pattern; mixture of polysiloxane and photosensitive pattern |
| 09/27/2005 | US6949323 Using tert-amyloxystyrene polymer; exposure to ultraviolet radiation |
| 09/27/2005 | US6949319 Method for determining depth of focus |
| 09/27/2005 | US6949199 Heat-transfer-stamp process for thermal imprint lithography |
| 09/27/2005 | US6948619 Reticle pod and reticle with cut areas |
| 09/27/2005 | US6948254 Method for calibration of a metrology stage |
| 09/22/2005 | WO2005088686A1 Step measuring method and apparatus, and exposure method and apparatus |
| 09/22/2005 | WO2005088685A1 Treatment liquid feeding system and filter device |
| 09/22/2005 | WO2005088684A1 Filter device |
| 09/22/2005 | WO2005088399A2 Method for the electrostatic structuring of a substrate surface and raster probe lithography method |
| 09/22/2005 | WO2005088398A1 Antireflective film containing sulfur atom |
| 09/22/2005 | WO2005088397A2 A process of imaging a deep ultraviolet photoresist with a top coating and materials thereof |
| 09/22/2005 | WO2005088396A1 Positive light-sensitive resin composition, relief pattern using the same, and solid imaging element |
| 09/22/2005 | WO2005088395A2 Systems and methods for sub-wavelength imaging |
| 09/22/2005 | WO2005088393A1 Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates |
| 09/22/2005 | WO2005088382A1 Method for establishing a light beam with substantially constant luminous intensity |
| 09/22/2005 | WO2005087841A1 Radiation-sensitive resin composition |
| 09/22/2005 | WO2005087693A2 Highly purified liquid perfluoro-n-alkanes and method for preparing |