| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/29/2005 | WO2004027810A3 System and method for removal of materials from an article |
| 09/29/2005 | US20050216117 System and method providing control of reticle stocking and sorting |
| 09/29/2005 | US20050215749 Low hydrolytic chlorine; curable, for a material in an electronics. |
| 09/29/2005 | US20050215735 Catalyst complexes for polymerization and co-polymerization of cyclic olefins |
| 09/29/2005 | US20050215721 Pattern forming method, arranged fine particle pattern forming method, conductive pattern forming method, and conductive pattern material |
| 09/29/2005 | US20050215713 Method of producing a crosslinked coating in the manufacture of integrated circuits |
| 09/29/2005 | US20050215656 Photocurable and thermosetting resin composition and printed circuit boards made by using the same |
| 09/29/2005 | US20050215446 Mixture of fluorine compound, amine compound and chelate compound in aqueous solution; semiconductor wafer cleaning compound |
| 09/29/2005 | US20050215162 Plasma display panel producing method, and plasma display panel |
| 09/29/2005 | US20050215161 Plasma display panel manufacturing method |
| 09/29/2005 | US20050215050 Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materials |
| 09/29/2005 | US20050214828 Using ultrviolet laser excitation and fluorescence to identify regions of hybridization along microarray comprised of immobilized polynucleotides; gene expression analysis; genomics |
| 09/29/2005 | US20050214695 Pattern forming method and method for manufacturing semiconductor device |
| 09/29/2005 | US20050214694 Pattern formation method |
| 09/29/2005 | US20050214693 Pattern forming method, graft pattern material, conductive pattern forming method and conductive pattern material |
| 09/29/2005 | US20050214692 Method for producing microhole structures |
| 09/29/2005 | US20050214690 Method for creating a pattern in a material and semiconductor structure processed therewith |
| 09/29/2005 | US20050214689 Fabrication of nanoelectronic circuits |
| 09/29/2005 | US20050214688 Forming film pattern over a substrate, forming a second film pattern which is curved on the surface of first film pattern or substrate, and forming film pattern by irradiating the first film pattern with light with second film pattern and modifying part of the second film pattern; cost efficiency |
| 09/29/2005 | US20050214687 Imagewise exposure to ultraviolet radiation using a digital mirror device, removing an image formation layer having an arene-iron or tribromoacetyl polymerization initiator, an acrylic monomer and diazo resin at non-exposed portions with an basic solution; high chemical resistance and printing durability |
| 09/29/2005 | US20050214686 Imagewise exposure to ultraviolet radiation using a digital mirror device, removing an image formation layer having an arene-iron or tribromoacetyl polymerization initiator, an acrylic monomer and diazo resin at non-exposed portions with an basic solution; high chemical resistance and printing durability |
| 09/29/2005 | US20050214685 Process of preparing planographic printing plate |
| 09/29/2005 | US20050214683 Method and apparatus for reforming film and controlling slimming amount thereof |
| 09/29/2005 | US20050214680 Radiation-sensitive resin composition |
| 09/29/2005 | US20050214679 Negative dye-containing curable composition, color filter and method of producing the same |
| 09/29/2005 | US20050214678 Light-sensitive lithographic printing plate |
| 09/29/2005 | US20050214677 Light-sensitive lithographic printing plate |
| 09/29/2005 | US20050214676 Chemically amplified positive resist composition |
| 09/29/2005 | US20050214674 Positive-working photoimageable bottom antireflective coating |
| 09/29/2005 | US20050214661 Structure formed with template having nanoscale features |
| 09/29/2005 | US20050214660 Negative dye-containing curable composition, color filter and method of producing the same |
| 09/29/2005 | US20050214659 Radiation filter element and manufacturing processes therefore |
| 09/29/2005 | US20050214658 Method for alleviating tolerance restrictions for feature sizes during fabrication of photomasks |
| 09/29/2005 | US20050214657 Method of generating writing pattern data of mask and method of writing mask |
| 09/29/2005 | US20050214656 Process for producing a mask |
| 09/29/2005 | US20050214651 Aperture plate for optical lithography systems |
| 09/29/2005 | US20050214650 Hologram recording material, hologram recording method, optical recording medium, three-dimensional display hologram and holographic optical element |
| 09/29/2005 | US20050214550 Method of forming a pattern, conductive patterned material, and method of forming a conductive pattern |
| 09/29/2005 | US20050214467 Method for smoothing areas in structures by utilizing the surface tension |
| 09/29/2005 | US20050214448 Compositions containing heterocyclic nitrogen compounds and glycols for texturing resinous material and desmearing and removing resinous meterial |
| 09/29/2005 | US20050214398 Assembly and method for transferring imprint lithography templates |
| 09/29/2005 | US20050214195 Method for manufacturing a carbon nanotube multilayer pattern using photolithography and dry etching |
| 09/29/2005 | US20050213806 System and method for manufacturing printed circuit boards employing non-uniformly modified images |
| 09/29/2005 | US20050213198 Broad-angle multilayer mirror design |
| 09/29/2005 | US20050213189 Buffers for light modulation elements in spatial light modulators |
| 09/29/2005 | US20050213179 Angled strobe lines for high aspect ratio spatial light modulator |
| 09/29/2005 | US20050213098 Scan exposure apparatus and method, and device manufacturing method |
| 09/29/2005 | US20050213097 Method of determining aberration of a projection system of a lithographic apparatus |
| 09/29/2005 | US20050213073 Machine for exposing printed circuit boards |
| 09/29/2005 | US20050213072 Lithography using controlled polarization |
| 09/29/2005 | US20050213071 Multi beam exposing device and exposing method using the same |
| 09/29/2005 | US20050213070 Method for a multiple exposure, microlithography projection exposure installation and a projection system |
| 09/29/2005 | US20050213069 Extreme ultraviolet exposure apparatus and vacuum chamber |
| 09/29/2005 | US20050213068 Image exposure device |
| 09/29/2005 | US20050213067 Lithographic apparatus and device manufacturing method |
| 09/29/2005 | US20050213066 Exposure apparatus |
| 09/29/2005 | US20050213065 Exposure apparatus and method |
| 09/29/2005 | US20050213063 Exposure apparatus and device manufacturing method |
| 09/29/2005 | US20050213062 Exposure apparatus |
| 09/29/2005 | US20050213061 System and apparatus for photolithography |
| 09/29/2005 | US20050213060 Lithographic optical system |
| 09/29/2005 | US20050212997 Light-sensitive composition, light-sensitive transfer material, light shielding layer for display device, color filter, liquid crystal display element, and substrate having light shielding layer for display device and producing method thereof |
| 09/29/2005 | US20050212900 Multibeam exposure method and device |
| 09/29/2005 | US20050212722 Spatial light modulator and method for interleaving data |
| 09/29/2005 | US20050212427 Pressure-sensitive adhesive sheet for removal of fluorescent substances |
| 09/29/2005 | US20050212361 Stage device and exposure apparatus |
| 09/29/2005 | US20050212178 Capacitive measurement method and system for nanoimprint process monitoring |
| 09/29/2005 | US20050212156 Processing apparatus |
| 09/29/2005 | US20050212096 Manufacturing methods of semiconductor device and solid state image pickup device |
| 09/29/2005 | US20050211929 Charged particle beam photolithography machine, standard substrate for correcting misalignment factor of charged particle beam photolithography machine, correcting method for charged particle beam photolithography machine, and method of manufacturing electronic device |
| 09/29/2005 | US20050211928 Charged-particle-beam lithographic system |
| 09/29/2005 | US20050211920 Positioning device and method of initializing a positioning device |
| 09/29/2005 | US20050211919 System and method for patterning a flexible substrate in a lithography tool |
| 09/29/2005 | US20050211918 Alignment apparatus, exposure apparatus using same, and method of manufacturing devices |
| 09/29/2005 | US20050211681 Charged-particle beam system |
| 09/29/2005 | US20050211515 Anti-vibration mount apparatus, exposure apparatus, and device manufacturing method |
| 09/29/2005 | US20050211375 Method of manufacturing a semiconductor device |
| 09/29/2005 | US20050211161 Printing apparatus and device manufacturing method |
| 09/29/2005 | US20050211160 Method for making large-volume CaF2 single cystals with reduced scattering and improved laser stability, the crystals made by the method and uses thereof |
| 09/29/2005 | US20050211121 Flexo processor |
| 09/29/2005 | US20050211120 Apparatus and method for thermally developing flexographic printing elements |
| 09/29/2005 | US20050211119 Apparatus and method for thermally developing flexographic printing sleeves |
| 09/29/2005 | DE102004063610A1 Color photoresist removing method for use during color filter fabrication, involves performing sequentially plasma ashing, wet etching, and plasma ashing processes on substrate to remove residue of color photoresist on substrate |
| 09/29/2005 | DE102004032401A1 Device for exposing a photosensitive resist layer on a semiconductor wafer during manufacture of a semiconductor memory comprises a light source, an illuminator geometry, a hybrid mask, and a projection lens |
| 09/29/2005 | DE102004012179A1 Verfahren zur elektrostatischen Strukturierung einer Substratoberfläche und Rastersonden-Lithographieverfahren damit A method for electrostatic structuring of a substrate surface and scanning probe lithography process so |
| 09/29/2005 | DE102004010002A1 Lithographic mask holder for e.g. mask recorder, has electrodes that are electrically biased to reduce distances between mask and electrodes by electrical attraction of mask, where mask is attached on holder via electrodes |
| 09/29/2005 | DE102004009095A1 Mask layer structure superimposition accuracy determination, for semiconductor manufacture, involves scanning rear side of substrate and mask layer using radiation, and evaluating images to find positions of alignment marks |
| 09/29/2005 | CA2558768A1 Method for producing a base material for screen printing, and base material of this type |
| 09/29/2005 | CA2502070A1 Polymer composite comprising hydrophilic, photo-cured membrane |
| 09/28/2005 | EP1581034A1 Method of forming solder mask |
| 09/28/2005 | EP1581031A1 Method of forming a pattern, conductive patterned material, and method of forming a conductive pattern |
| 09/28/2005 | EP1580980A2 Method and sample sheet for adjusting exposure heads in an exposure unit for print data |
| 09/28/2005 | EP1580607A2 Process solutions containing surfactants |
| 09/28/2005 | EP1580606A1 Rinse liquid for lithography and method for forming resist pattern using same |
| 09/28/2005 | EP1580605A2 Method of determining aberration of a projection system of a lithographic apparatus |
| 09/28/2005 | EP1580604A2 Stage device and exposure apparatus |
| 09/28/2005 | EP1580603A2 Lithographic Apparatus, Device Manufacturing Method and Variable Attenuator |
| 09/28/2005 | EP1580602A1 Lithographic apparatus, Lorentz actuator and device manufacturing method |
| 09/28/2005 | EP1580601A1 Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same |
| 09/28/2005 | EP1580600A1 Resist composition |