Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2005
10/05/2005CN1678960A Lithographic method for small line printing
10/05/2005CN1678959A Method and device for producing exposed structures
10/05/2005CN1678958A Active energy ray sensitive resin composition, active energy ray sensitive resin film and method for forming pattern using said film
10/05/2005CN1678957A Photopolymerizable resin composition for sandblast resist
10/05/2005CN1678956A Device for transferring a pattern to an object
10/05/2005CN1678888A Backlighting system for displays
10/05/2005CN1678655A Polycarboxylic acid resin, polycarboxylic acid resin composition, and cured article obtained therefrom
10/05/2005CN1678646A Fluorinated polymers, photoresists and processes for microlithography
10/05/2005CN1678443A Methods and apparatus of field-induced pressure imprint lithography
10/05/2005CN1678170A Method of manufacturing substrate having resist film
10/05/2005CN1677641A Position measurement technique
10/05/2005CN1677616A Mask with two-way alignment pattern
10/05/2005CN1677606A Antistatic film forming composition, and producing method for conductive film pattern
10/05/2005CN1677248A Photoresist stripping agent composition
10/05/2005CN1677247A Method for stripping positive-phase anti-corrosion film, method for making exposure mask and anti-corrosion agent stripping device
10/05/2005CN1677246A Lithographic apparatus and device manufacturing method
10/05/2005CN1677245A Laser drawing device, method thereof and method for preparing optical mask
10/05/2005CN1677244A Exposure apparatus and exposure method and correction method
10/05/2005CN1677243A Lithographic apparatus and device manufacturing method
10/05/2005CN1677242A Exposure apparatus and device manufacturing method
10/05/2005CN1677241A Exposure apparatus and method
10/05/2005CN1677240A Exposing device
10/05/2005CN1677239A Lithographic apparatus and device manufacturing method
10/05/2005CN1677238A Focusing-levelling detection device
10/05/2005CN1677237A Pattern exposure method and apparatus
10/05/2005CN1677236A Method for cutting film workpiece
10/05/2005CN1677235A 正型抗蚀剂组合物 The positive resist composition
10/05/2005CN1677234A 正型抗蚀剂组合物 The positive resist composition
10/05/2005CN1677233A Resist material and pattern formation method using the same
10/05/2005CN1677232A Method for making metal picture
10/05/2005CN1677141A Patterned grid element polarizer
10/05/2005CN1677139A Radiation-ray sensitive composition for colour-filtering piece, colour filtering piece and colour liquid crystal display device
10/05/2005CN1677138A Radiation-ray sensitive composition for colour-filtering piece, colour filtering piece and colour liquid crystal display device
10/05/2005CN1222201C Method for producing wire with rough conducting structures and at least one area with fine conducting structures
10/05/2005CN1222020C Method for removing photoresistive layer in mfg. process of inserting metals
10/05/2005CN1222019C High-pressure treatment method
10/05/2005CN1221869C Photoresist stripper/cleaner compositions containing aromatic acid inhibitors
10/05/2005CN1221868C Aniline printing plate and original plate therefor
10/05/2005CN1221867C Exposure method for forming IC chip image in intermeidate mask using main mask
10/05/2005CN1221866C Scanning pattern generator system and scanning method
10/05/2005CN1221865C Printed circuit board imaging device and interlacing raster scanning line method
10/05/2005CN1221864C Process for producing acid sensitive liquid composition containing a carbonate
10/05/2005CN1221863C Thermal sensitive lithographic printing front body
10/05/2005CN1221862C Photo-sensitive or thermal-induction image forming material
10/05/2005CN1221861C 光致抗蚀剂组合物 The photoresist composition
10/05/2005CN1221860C Photosensitive resin composition, photosensitive element comprising the same, process for producing photo-resist pattern, and process for producing printed circuit board
10/05/2005CN1221859C Photosensitive lithographic printing plate
10/05/2005CN1221858C Methods for deciding gap between a transparent template and substrate
10/05/2005CN1221857C Self-contained imaging assembly having improved stripping strength
10/05/2005CN1221856C Polymer and forming method of micro pattern using the same
10/05/2005CN1221611C Light solidified and heat solidified resin composition and method for producing printed circuit board
10/05/2005CN1221582C Liquid curable resin composition
10/05/2005CN1221331C Multi-functional cleaning module and cleaning apparatus using the module
10/05/2005CN1221300C Chemical Supply device and method thereof
10/04/2005US6952254 Supporting system in exposure apparatus
10/04/2005US6952253 Immersion; a non-contact gas seal forms so that liquid is contained in the space between the projection system and the substrate
10/04/2005US6951823 Plasma ashing process
10/04/2005US6951766 Correcting device, exposure apparatus, device production method, and device produced by the device production method
10/04/2005US6951710 Mixtures of amines and/or ammonium compounds, hydroxylamine, corrosion inhibitors, diluents and optionally water used for cleaning substrates
10/04/2005US6951709 Method of fabricating a semiconductor multilevel interconnect structure
10/04/2005US6951708 Method of forming photosensitive film pattern
10/04/2005US6951706 Sulfonate and resist composition
10/04/2005US6951705 Polymers for photoresist compositions for microlithography
10/04/2005US6951701 Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM
10/04/2005US6951700 Use of a composition in stereolithography
10/04/2005US6951682 Porous coatings bearing ligand arrays and use thereof
10/04/2005US6951380 methacrylic copolymer composite is formed by radical polymerization, thermally crosslinked; head is inexpensive, accurate, and highly reliable
10/04/2005US6951173 method of transferring includes dispensing a selected volume of imprinting fluid onto the template transfer substrate, placing template upon the selected volume and converting the imprinting fluid to solid imprint material
10/04/2005CA2343630C Lithographic imaging with non-ablative wet printing members
09/2005
09/29/2005WO2005091375A1 Method for forming pattern, thin film transistor, display device and method for manufacturing the same, and television device
09/29/2005WO2005091343A1 Mirror, position aligning method, optical unit producing method, optical unit, and exposure device
09/29/2005WO2005091079A1 Electron beam lithography system
09/29/2005WO2005091078A1 Pattern forming process and pattern
09/29/2005WO2005091077A2 Projection lens of a microlithographic projection exposure system
09/29/2005WO2005091076A2 Methods for manufacturing reflective optical elements
09/29/2005WO2005091075A2 Method for producing a base material for screen printing, and base material of this type
09/29/2005WO2005091074A1 Positively radiation-sensitive resin composition
09/29/2005WO2005091073A1 Negative resist composition
09/29/2005WO2005091072A1 Negative radiation-sensitive resin composition
09/29/2005WO2005091071A1 Photosensitive insulative paste composition and photosensitive film using the same
09/29/2005WO2005091070A1 Surface treating agent for substrate for use in lithography
09/29/2005WO2005091069A2 Pressure development apparatus
09/29/2005WO2005091068A1 Image-forming process, lithographic printing plate, and lithography process
09/29/2005WO2005090975A1 Patterning method for biosensor applications and devices comprising such patterns
09/29/2005WO2005090931A1 Embedded attenuated phase shift mask with tunable transmission
09/29/2005WO2005090902A1 Stage device
09/29/2005WO2005090447A2 Use of n-ethyl-2-pyrrolidone
09/29/2005WO2005089957A1 Process for the production of strongly adherent coatings
09/29/2005WO2005089944A2 Microfluidic chip
09/29/2005WO2005089369A2 Apparatus for imaging using an array of lenses
09/29/2005WO2005089355A2 Environmentally friendly photoacid generators (pags) with no perfluorooctyl sulfonates (pfos)
09/29/2005WO2005089150A2 Thermally cured undercoat for lithographic application
09/29/2005WO2005089131A2 Lpp euv light source
09/29/2005WO2005089130A2 A high repetition rate laser produced plasma euv light source
09/29/2005WO2005073808A3 Process of producing microcapsules and product thereof
09/29/2005WO2005064401A3 Lithographic apparatus having a debris-mitigation system, a source for producing euv radiation having a debris mitigation system and a method for mitigating debris
09/29/2005WO2005052688A3 Chemically amplified positive photosensitive thermosetting resin composition method of forming cured article and method of producing functional device
09/29/2005WO2005045522A3 Photocurable compositions for articles having stable tensile properties
09/29/2005WO2005029192A3 Surface triangulation and profiling through a thin film coating
09/29/2005WO2005024517A3 Apparatus and method for providing fluid for immersion lithography
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