Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2005
10/06/2005US20050221226 Lithographic printing plate precursor and lithographic printing method using the same
10/06/2005US20050221225 Positive resist composition
10/06/2005US20050221224 having high sensitivity and high resolution and being excellent in the pattern profile, line edge roughness, dissolution contrast, surface roughness and prevention of negative conversion
10/06/2005US20050221223 Printing plate material, roll of a printing plate material and printing method
10/06/2005US20050221222 Photosensitive resin composition, resist pattern forming method, substrate processing method, and device manufacturing method
10/06/2005US20050221221 Sensitive to high-energy radiation, resolution, and etching resistance
10/06/2005US20050221220 flexibility in acid strength and polarity through changes in chemical structure; strong and large superacid
10/06/2005US20050221219 Polyhydroxystyrene modified by alicyclic dissolution inhibitors; defect inhibition, increased yields; microelectromechanical systems
10/06/2005US20050221218 bottom anti-reflective coatings (BARC's) and sacrificial light absorbing materials (SLAM) may be made more effective at preventing coherent light or electron beam reflection from a substrate by including in the anti-reflective material an additive to alter the radiation beam path of the reflected light
10/06/2005US20050221217 Hydroxy- or mercaptoalicyclic (meth)acrylate homopolymers with attached dissolution inhibitors; defect inhibition, increased yields; microelectromechanical systems
10/06/2005US20050221208 Resist pattern formation method, patterned substrate manufacturing method, and resist pattern formation apparatus
10/06/2005US20050221207 Method and apparatus for monitoring exposure process
10/06/2005US20050221205 Method for fabricating color filter substrate
10/06/2005US20050221204 control the writing dimension of a pattern; correction of foggy effect; manufacturing a semiconductor device and a liquid crystal display with fine and complicated patterns
10/06/2005US20050221203 irradiating TiO2 photocatalyst and a silicone coupler having fluorocarbon chain with light through the light-transmitting substrate to modify a part of a surface of the material containing the fluorocarbon chain which is to be a 2nd region; patterning a conductive material to form pattern to 2nd region
10/06/2005US20050221202 Wavelength filtering in nanolithography
10/06/2005US20050221199 Mask blank and a method for producing the same
10/06/2005US20050221198 Hologram recording material, hologram recording method and optical recording medium
10/06/2005US20050221019 Method of improving the uniformity of a patterned resist on a photomask
10/06/2005US20050220985 Substrate processing apparatus and substrate processing method
10/06/2005US20050220931 Nozzle assembly for applying a liquid to a substrate
10/06/2005US20050219713 Aperture stop assembly for high power laser beams
10/06/2005US20050219707 Projection objective of a microlithographic exposure apparatus
10/06/2005US20050219696 Patterned grid element polarizer
10/06/2005US20050219687 System microscope
10/06/2005US20050219550 Apparatus for optical system coherence testing
10/06/2005US20050219549 Measuring apparatus and method
10/06/2005US20050219532 System and method for verifying and controlling the performance of a maskless lithography tool
10/06/2005US20050219516 Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion
10/06/2005US20050219515 Aberration measuring method
10/06/2005US20050219502 RET for optical maskless lithography
10/06/2005US20050219501 Stage apparatus and exprosure apparatus
10/06/2005US20050219499 Lithographic apparatus and device manufacturing method
10/06/2005US20050219498 Illumination optical system and exposure apparatus having the same
10/06/2005US20050219497 Lithographic apparatus and device manufacturing method
10/06/2005US20050219496 Pattern exposure method and pattern exposure apparatus
10/06/2005US20050219495 Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus
10/06/2005US20050219494 Lithographic apparatus, illumination system, and optical element for rotating an intensity distribution
10/06/2005US20050219493 Illuminating method, exposing method, and device for therefor
10/06/2005US20050219491 Position measurement technique
10/06/2005US20050219490 Exposure apparatus and method for producing device
10/06/2005US20050219489 Exposure apparatus and method for producing device
10/06/2005US20050219488 Exposure apparatus and method for producing device
10/06/2005US20050219487 Scanning exposure apparatus and method
10/06/2005US20050219486 Exposure apparatus and device manufacturing method
10/06/2005US20050219485 Exposure apparatus and device manufacturing method
10/06/2005US20050219484 Novel method to simplify twin stage scanner OVL machine matching
10/06/2005US20050219483 Lithographic apparatus and device manufacturing method
10/06/2005US20050219482 Lithographic apparatus, device manufacturing method and device manufactured thereby
10/06/2005US20050219481 Lithographic apparatus and device manufacturing method
10/06/2005US20050218549 Solid freeform compositions, methods of application thereof, and systems for use thereof
10/06/2005US20050218342 Lithographic apparatus and device manufacturing method
10/06/2005US20050218335 Alignment apparatus, exposure apparatus, and device manufacturing method
10/06/2005US20050218112 Method of creating a patterned monolayer on a surface
10/06/2005US20050217956 Active damping apparatus, exposure apparatus and device manufacturing method
10/06/2005US20050217697 Aqueous stripping and cleaning composition
10/06/2005US20050217521 System for and method of manufacturing gravure printing plates
10/06/2005US20050217318 Optical component of quartz glass, method for producing the optical component, and use thereof
10/06/2005EP1583998A3 Method of forming resist pattern, positive resist composition, and layered product
10/06/2005DE4112598B4 Photopolymerisierbare Zusammensetzung A photopolymerizable composition
10/06/2005DE19748503B4 Projektionsbelichtungsgerät und Projektionsbelichtungsverfahren A projection exposure apparatus and the projection exposure method
10/06/2005DE10356847B4 Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente Radiation-sensitive compositions and imageable elements based thereon
10/06/2005DE102004013886A1 Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem Method for Multiple Exposure, microlithography projection exposure apparatus and projection system
10/06/2005DE102004012798A1 Stickstofffreie antireflektierende Beschichtung und Verfahren zur Herstellung derselben Nitrogen-free anti-reflective coating and methods for making the same
10/06/2005DE102004012751A1 Verwendung von N-Ethyl-2-pyrrolidon Use of N-ethyl-2-pyrrolidone
10/06/2005CA2561169A1 Composition curable by radical photo curing and cationic photo curing in combination
10/06/2005CA2558069A1 Nanoelectronic and microelectronic cleaning compositions
10/06/2005CA2557226A1 Photocurable compositions
10/05/2005EP1583069A2 Spatial light modulator and method of performing photolithography using the same
10/05/2005EP1583068A2 Spatial light modulator and method of performing photolithography using the same
10/05/2005EP1582935A1 Lithographic apparatus and device manufacturing method
10/05/2005EP1582934A2 Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems
10/05/2005EP1582933A2 Exposure apparatus and device manufacturing method
10/05/2005EP1582932A2 Alignment apparatus, exposure apparatus, and device manufacturing method
10/05/2005EP1582931A1 Lithograpic apparatus, illumination system, and optical element for rotating an intensity distribution
10/05/2005EP1582930A1 Lithographic apparatus and device manufacturing method
10/05/2005EP1582929A1 Lithographic apparatus and device manufacturing method
10/05/2005EP1582928A1 Lithographic apparatus and device manufacturing method
10/05/2005EP1582927A1 Lithographic apparatus and device manufacturing method
10/05/2005EP1582926A2 Positive resist composition
10/05/2005EP1582925A2 Positive resist composition
10/05/2005EP1582924A2 Processing apparatus
10/05/2005EP1582923A2 Processing apparatus
10/05/2005EP1582922A1 Nonlithographic method of defining geometries for plasma and/or ion implantation treatments on a semiconductor wafer
10/05/2005EP1582908A2 Measuring apparatus and method
10/05/2005EP1582904A1 System microscope
10/05/2005EP1582894A1 Patterned grid element polarizer
10/05/2005EP1582535A2 Catalyst complexes for polymerization and co-polymerization of cyclic olefins and polymerisation process
10/05/2005EP1582375A1 Printing plate material, roll of a printing plate material and printing method
10/05/2005EP1582347A2 Lithographic printing plate precursor and lithographic printing method using the same
10/05/2005EP1581837A2 A method of determining best process setting for optimum process window optimizing process performance determining optimum process window for a lithographic process
10/05/2005EP1581836A2 Method of measuring the performance of an illumination system
10/05/2005EP1581835A1 Liquid crystal displays with post spacers, and their manufacture
10/05/2005EP1554322A4 Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers
10/05/2005EP1303729A4 Reticle storage and retrieval system
10/05/2005EP1080522A4 Reliable modular production quality narrow-band high rep rate f 2? laser
10/05/2005CN2731706Y 半导体装置 Semiconductor device
10/05/2005CN1679173A Gate electrode and manufacturing method thereof
10/05/2005CN1679141A Maintenance system, substrate processing device, remote operation device, and communication method
10/05/2005CN1678961A Removing solution
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