Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2014
03/27/2014US20140087312 Method for manufacturing of organic light emitting display device
03/27/2014US20140087311 Developable bottom anti-reflective coating
03/27/2014US20140087310 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
03/27/2014US20140087309 Olefin-triggered acid amplifiers
03/27/2014US20140087308 Photosensitive resin composition and applications thereof
03/27/2014US20140087307 Photosensitive resin composition and applications thereof
03/27/2014US20140087306 Printing form precursor having indicia and a method for preparing a printing form from the precursor
03/27/2014US20140087294 Chemically amplified positive resist composition and pattern forming process
03/27/2014US20140087293 Maleimide containing cycloolefinic polymers and applications thereof
03/27/2014US20140087290 Manufacturing Method of Transparent Electrode and Mask Thereof
03/27/2014US20140085742 Color filter substrate and fabrication method thereof, transflective liquid crystal display device
03/27/2014US20140085620 3d printer with self-leveling platform
03/27/2014US20140085619 Lithographic Apparatus, Spectral Purity Filter and Device Manufacturing Method
03/27/2014US20140085618 Particle control near reticle and optics using showerhead
03/27/2014US20140083614 Substrate processing apparatus and gas supply apparatus
03/27/2014US20140083458 Photoresist stripping solution, stripping solution recycling system and operating method, and method for recycling stripping solution
03/27/2014DE102013205214A1 Micro-mechanical or micro-electromechanical device for projection exposure system such as extreme UV (EUV) projection exposure system, has temperature control device that is provided with gas supply unit and gas exhaust unit
03/27/2014DE102013204317A1 Component i.e. weight force compensation device, for use in microlithographic projection exposure system for manufacturing e.g. LCD, has magnetic circuit producing magnetic field that causes force on element of exposure system
03/27/2014DE102013204316A1 Projection arrangement for e.g. extreme UV lithography device used for manufacture of e.g. integrated electric circuit, has manipulator which receives signal used for converting transmitted energy into objective form of energy
03/27/2014DE102012109130A1 Method for manufacturing three-dimensional structure used for optic element, involves moving portion of pattern of high-energy region relative to photo-sensitive material, to write structure into photo-sensitive material
03/27/2014DE102012018635A1 Method for producing three dimensional structure of integrated circuit, involves introducing coarse structure of three dimensional structure by unit of two dimensional surface in lithography of lithography sensitive material
03/26/2014EP2711776A1 Lithography rinsing fluid and pattern formation method using same
03/26/2014EP2711775A2 Exposure apparatus, exposure method, and device manufacturing method
03/26/2014EP2711774A1 Photosensitive resin composition
03/26/2014EP2711746A1 Diffraction grating manufacturing method, spectrophotometer, and semiconductor device manufacturing method
03/26/2014EP2710427A1 High resolution high contrast edge projection
03/26/2014EP2710417A1 Radiation-sensitive composition, method for forming pattern, color filter and method of producing the same, and solid-state image sensor
03/26/2014EP2710415A1 Reflective optical element and optical system for euv lithography
03/26/2014CN203502736U Device for soft photomask exposure
03/26/2014CN203502735U Device for producing graphic substrate
03/26/2014CN203502701U Substrate and mask panel
03/26/2014CN103688222A Photoresist stripping solution, stripping solution recycling system and operating method, and method for recycling stripping solution
03/26/2014CN103688221A Photosensitive resin composition, cured product and spacer
03/26/2014CN103688220A Process for the production of a layered body and layered bodies without masking obtainable therefrom
03/26/2014CN103688198A Diffraction grating manufacturing method, spectrophotometer, and semiconductor device manufacturing method
03/26/2014CN103681782A Method for extreme ultraviolet electrostatic chuck with reduced clamping effect
03/26/2014CN103681624A Overlay mark and method of forming the same
03/26/2014CN103681511A Imprinted memory
03/26/2014CN103681489A Array substrate, manufacturing method and display device thereof
03/26/2014CN103681483A Method for alleviating line breakage of transparent conducting layer and structure thereof
03/26/2014CN103681479A Method for improving tolerance of multilayer wiring through hole photoetching technology
03/26/2014CN103681426A Large warp silicon wafer pre-alignment device and method
03/26/2014CN103681305A Photoresist removing method for use after high-energy ion implantation
03/26/2014CN103681255A Double patterning process
03/26/2014CN103681250A Method for controlling CD (Critical Dimension) of double etching formed graphs
03/26/2014CN103681249A Manufacture method for fine pattern on semiconductor device
03/26/2014CN103680078A Pre-warning system and optical device
03/26/2014CN103677389A Touch screen panel and method of preparing the same
03/26/2014CN103676505A Photoresist stripper for chip and preparation method and photoresist removing process thereof
03/26/2014CN103676504A Waterborne photoresist stripping liquid
03/26/2014CN103676503A Photoresist stripping agent composition
03/26/2014CN103676502A Constituents of thick film negative photoresist stripping agent
03/26/2014CN103676501A Method for treating substrate
03/26/2014CN103676500A Full-automatic exposure machine
03/26/2014CN103676499A Rotary Dammann grating based multichannel parallel laser direct writing device and method
03/26/2014CN103676498A Pupil shaping unit structure of lithography machine and design method for diffraction optical element of pupil shaping unit structure
03/26/2014CN103676497A On-product focus offset metrology method and structure for use in semiconductor chip manufacturing
03/26/2014CN103676496A Apparatus for creating extreme ultraviolet light and exposing apparatus including the same,
03/26/2014CN103676495A Photomask, photomask set, exposure apparatus and exposure method
03/26/2014CN103676494A Field-by-field focusing and leveling method for scanning lithography machine
03/26/2014CN103676493A Mixed photolithography method capable of reducing line roughness
03/26/2014CN103676492A Electron beam photo-etching method
03/26/2014CN103676491A Method for reducing roughness of photoresist during electron beam lithography
03/26/2014CN103676490A Method for monitoring weak point forming reasons
03/26/2014CN103676489A Reflection type objective lens structure and manufacturing method thereof
03/26/2014CN103676488A Mask connecting mechanism and mask stage with same
03/26/2014CN103676487A Workpiece height measuring device and correcting method thereof
03/26/2014CN103676486A Special high-precision high-efficiency exposure machine for grating ruler and optical coded disc
03/26/2014CN103676485A Photoetching alignment marking structure for thick epitaxy process
03/26/2014CN103676484A Method for exposing graphics of mask pate
03/26/2014CN103676483A Light-intensity adjusting device for photoetching exposure and light-intensity adjusting method
03/26/2014CN103676482A Positive photosensitive resin composition and method for forming patterns by using the same
03/26/2014CN103676481A Polymer material and application thereof
03/26/2014CN103676480A Photosensitive resin composition
03/26/2014CN103676479A Radiation-sensitive linear composition, method of forming cured film for display element, cured film for display element and display element
03/26/2014CN103676478A Photoresists comprising multiple acid generator compounds
03/26/2014CN103676477A Acid generator compounds and photoresists comprising same
03/26/2014CN103676476A Black solidification resin composition and printed wiring substrate obtained through utilizing the black solidification resin composition
03/26/2014CN103676475A Black curable resin composition
03/26/2014CN103676474A Split type manufacturing method of micro-imprinting mould
03/26/2014CN103676473A Method for preparing metal pattern on curved surface by combining nano-imprinting with wet etching
03/26/2014CN103676472A Pattern transfer substrate device and pattern transfer substrate thereof
03/26/2014CN103676471A Method for manufacturing patterned resin layer and resin composition applied thereto
03/26/2014CN103676470A Method and device for forming photoresist pattern
03/26/2014CN103676465A Mask board and method for forming via hole in organic insulating film
03/26/2014CN103676463A Design and OPC (optical proximity correction) optimization method of test patterns
03/26/2014CN103676344A Method for manufacturing IPS (In-panel Switching) screen electrode
03/26/2014CN103676096A Projection-objective optical system
03/26/2014CN103675975A Flexible colour light filter and manufacturing method thereof
03/26/2014CN103675968A Annular radial line aluminum metal polarization transmission grating
03/26/2014CN103666061A Liquid photosensitive corrosion-resistant printing ink and preparation method thereof
03/26/2014CN103666006A Surfactant, coating composite and resist composition
03/26/2014CN103665377A Polymide precursor and photosensitive resin component
03/26/2014CN103665254A Polymer comprising end groups containing photoacid generator, photoresist comprising the polymer, and method of making a device
03/26/2014CN103664870A Onium compounds and methods of synthesis thereof
03/26/2014CN103664722A Photoinduced acid compound, polymer and preparing method thereof
03/26/2014CN103663363A Disordered alloy micro-spring, and preparation method and lighthouse thereof
03/26/2014CN103663361A Flexible mechanical photoetching stripping process method of silicon substrate or ceramic substrate
03/26/2014CN103663358A Method for preparing super-hydrophobic surface on silicon wafer based on laser interference nanometer lithography
03/26/2014CN102799064B Device for separating mask plate from substrate by electrostatic field force for metal pattern direct impression transfer
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