Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2005
10/12/2005EP1584982A2 Method of optimizing imaging performance
10/12/2005EP1584981A2 Polymer composite
10/12/2005EP1584979A1 Mask blank having a protection layer
10/12/2005EP1584634A1 Polymeric compound for photoresist and resin composition for photoresist
10/12/2005EP1584485A2 Lithographic printing plate precursor and lithographic printing method
10/12/2005EP1584470A2 Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution
10/12/2005EP1584089A1 Method and device for irradiating spots on a layer
10/12/2005EP1583998A2 Method of forming resist pattern, positive resist composition, and layered product
10/12/2005EP1583997A2 Photoresist removal
10/12/2005EP1583994A1 Optical devices incorporating photo reactive polymers
10/12/2005EP1583946A1 A method to detect a defective pixel
10/12/2005EP1583934A1 In-process correction of stage mirror deformations during a photolithography exposure cycle
10/12/2005EP1583740A2 Fluoroarylsulfonium photoacid generators
10/12/2005EP1540393A4 Writing of photo-induced structures
10/12/2005EP1435012A4 Method for apodizing a planar waveguide grating
10/12/2005EP1368136A4 Methods for cleaning microelectronic structures
10/12/2005EP1150797B1 Laser processing power output stabilization
10/12/2005EP0858392B2 Processes for preparing and using moulds
10/12/2005EP0766820B1 The production of electrodes for electrochemical sensing
10/12/2005CN1682388A Material with pattern surface for use as template and process for producing the same
10/12/2005CN1682350A Method of heating a substrate in a variable temperature process using a fixed temperature chuck
10/12/2005CN1682156A Low silicon-outgassing resist for bilayer lithography
10/12/2005CN1682155A Photoresist remover composition
10/12/2005CN1681377A Method of manufacturing electronic component mounting body, electronic component mounting body, and electro-optical device
10/12/2005CN1681086A Resist pattern formation method, patterned substrate manufacturing method, and display device making method
10/12/2005CN1681084A Method for creating a pattern in a material and semiconductor structure processed therewith
10/12/2005CN1680878A Feature optimisation using interference mapping lithography
10/12/2005CN1680877A Lithographic apparatus and methods for use thereof
10/12/2005CN1680876A Smoothening method of rotary coating material layer and production of photoresist layer
10/12/2005CN1680875A Chemically amplified posative opto-corrosionproof agent composition
10/12/2005CN1680873A Screen-printing metal mask plate
10/12/2005CN1680863A Liquid crystal display and fabricating method thereof
10/12/2005CN1680470A Curable resin comosition and coating film thereof
10/12/2005CN1680045A Device and method for forming single coating membrane
10/12/2005CN1223248C Transmission belt type vacuum applicator and coating method of printing circuit board anti-corrosion drying film
10/12/2005CN1223247C Method for producing etched circuit
10/12/2005CN1223172C Multiple-beam diode-pumped imaging system
10/12/2005CN1222832C Electronic photoetching equipment with pattern emitter
10/12/2005CN1222831C Method of contact printing on gold coated films
10/12/2005CN1222829C Lithography device which uses source of radiation in the extreme ultraviolet range and multi-layered mirrors with broad spectral band in this range
10/12/2005CN1222554C Resin compound containing functional group derivated from quinone-cyclopentadiene affixture and light resistant agent composition
10/11/2005US6954911 Method and system for simulating resist and etch edges
10/11/2005US6954316 Projection objective
10/11/2005US6954275 Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
10/11/2005US6954259 Scanning exposure apparatus
10/11/2005US6954258 Positioning apparatus
10/11/2005US6954257 includes a silicon/molybdenum multilayer structure, an outer capping layer and an interlayer positioned between them; has acceptable reflectivity while exhibiting improved resistance to oxidation over the long term
10/11/2005US6954256 Gradient immersion lithography
10/11/2005US6954255 Exposure apparatus
10/11/2005US6954041 Supporting apparatus having a plurality of magnets that generate a floating force and method, stage apparatus, and exposure apparatus
10/11/2005US6953976 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern
10/11/2005US6953946 Emitter for electron-beam projection lithography system and manufacturing method thereof
10/11/2005US6953751 Micro device and process for producing it
10/11/2005US6953654 Using supercritical fluids; separation
10/11/2005US6953651 Chemical amplifying type positive resist composition
10/11/2005US6953649 Block polymers such as polymethyl methacrylate/poly(t-butyl methacrylate), having end groups and acid generators, used to form films on silicon substrates; microelectronics having high resolution and contrast
10/11/2005US6953644 Method for compensating for scatter/reflection effects in particle beam lithography
10/11/2005US6953643 Mask shaping using temporal and spatial coherence in ultra high resolution lithography
10/11/2005US6953268 Light modulating device and exposure apparatus using the same
10/11/2005US6952886 Overlay vernier
10/06/2005WO2005093939A1 Motor controller
10/06/2005WO2005093793A1 Process for forming permanent pattern
10/06/2005WO2005093792A1 Exposure equipment, exposure method and device manufacturing method
10/06/2005WO2005093791A1 Exposure apparatus and method for manufacturing device
10/06/2005WO2005093721A1 Transfer mold and exposure mask for manufacturing magnetic disc board
10/06/2005WO2005093517A2 Information management and tracking system (imts)
10/06/2005WO2005093516A1 Resist composition
10/06/2005WO2005093515A1 Photosensitive composition, photosensitive film, and permanent pattern and process for forming the same
10/06/2005WO2005093514A1 Photosensitive resin composition and method of forming pattern with the composition
10/06/2005WO2005093513A2 Positive-working photoimageable bottom antireflective coating
10/06/2005WO2005093131A1 Method for manufacturing fine pattern reproducing die
10/06/2005WO2005093032A1 Nanoelectronic and microelectronic cleaning compositions
10/06/2005WO2005092981A1 Composition curable by both free-radical photocuring and cationic photocuring
10/06/2005WO2005092977A1 Photofunctional optical material comprising fluorinated acrylate polymer
10/06/2005WO2005092598A1 Photocurable compositions
10/06/2005WO2005092490A1 Photoreactive thin film processing method and photoreactive thin film processing apparatus
10/06/2005WO2005091887A2 Euv light source optical elements
10/06/2005WO2005091879A2 Euv light source
10/06/2005WO2005091796A2 Method and system for treating a hard mask to improve etch characteristics
10/06/2005WO2005075446A9 Unsaturated carboxylic acid hemiacetal ester, polymer, and resin composition for photoresist
10/06/2005WO2005073805A3 Composition comprising microcapsules
10/06/2005WO2005064410A8 Lithographic apparatus and method of calibration
10/06/2005WO2005033797A3 Single phase fluid imprint lithography method
10/06/2005WO2005029193A3 Interferometric analysis of surfaces.
10/06/2005WO2005022259A3 Attaching a pellicle frame to a reticle
10/06/2005WO2005017623A3 $m(c)method for producing inclined flank patterns by photolithography
10/06/2005WO2004081503A3 Discharge produced plasma euv light source
10/06/2005WO2004051372A3 Method of forming resist pattern, positive resist composition, and layered product
10/06/2005US20050222804 Assessment and optimization for metrology instrument
10/06/2005US20050222699 Exposure apparatus and device manufacturing method
10/06/2005US20050222354 Basic component, acidic component (carboxymethyl cellulose, ligninsulphonic acid, acid-modified starch, polystyrenesulfonic acid), acrylate component, oxidizing agent, reducing agent, fibers (polymer, ceramic, carbon, or glass) and binder including viscosity modifier and surface tension modifier
10/06/2005US20050222294 Photoinitiators; phosphine oxide structure with hydroxylamino, alkoxylamino, or hydrazido groups on the central phosphorus atom; simple synthesis; high tolerance to functional groups, very low tendency to migrate; photographic materials, radiation curing of photopolymerizable coatings, inks, dispersions
10/06/2005US20050221238 Use of a reticle absorber material in reducing aberrations
10/06/2005US20050221236 photoresist patterning; reduced thickness after development
10/06/2005US20050221235 Applying alternating material layers on a ridge and then removing some of the alternating layers to expose edges; exposed edges can be of nearly arbitrary length and curvature; edges can be used to fabricate an array of nano-scale-width curved wires
10/06/2005US20050221234 Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof
10/06/2005US20050221233 System and method for fabricating contact holes
10/06/2005US20050221232 Method of forming a metal pattern on a substrate
10/06/2005US20050221230 Plate for digitally-imaged offset printing
10/06/2005US20050221227 Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same
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