Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2005
10/18/2005US6956596 Method for correcting the beam intensity in an image recording apparatus using a multi-channel light modulator
10/18/2005US6956222 Lithographic apparatus and method of manufacturing a device
10/18/2005US6956097 Siloxane polymer and an organic absorbing compound that strongly absorbs light at given wavelength, such as 9-anthracene carboxy-methyl triethoxysilane; for deep ultraviolet photolithography
10/18/2005US6955915 Solid phase synthesis; photolithography
10/18/2005US6955868 Method to control the relative position between a body and a surface
10/18/2005US6955767 Scanning probe based lithographic alignment
10/18/2005US6955485 Developing method and developing unit
10/18/2005US6955178 Substrate treatment apparatus
10/18/2005US6955074 Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured thereby
10/13/2005WO2005096684A1 Circuit board, circuit board manufacturing method and display apparatus provided with circuit board
10/13/2005WO2005096682A2 Fully-integrated hybrid electrical optical circuit boards
10/13/2005WO2005096680A1 Light source unit, illumination optical device and exposing method
10/13/2005WO2005096354A1 Exposure apparatus, exposure method, device manufacturing method, and surface shape detecting device
10/13/2005WO2005096351A2 Fabrication and use of superlattice
10/13/2005WO2005096101A1 Exposure equipment
10/13/2005WO2005096100A1 Radiation-sensitive composition, laminate, process for producing the sane and electronic part
10/13/2005WO2005096099A2 Removal of particles generated by a radiation source
10/13/2005WO2005096098A2 Projection objective, projection exposure apparatus and reflective reticle for microlithography
10/13/2005WO2005095510A1 Thermoresponsive polymer composition and uses thereof
10/13/2005WO2005095115A1 Hollow cylindrical printing base material
10/13/2005WO2005094399A2 High performance water-based primer
10/13/2005WO2005094304A2 Catadioptric imaging system employing immersion liquid for use in broad band microscopy
10/13/2005WO2005081066A8 Rectangular contact lithography for circuit performance improvement
10/13/2005WO2005054119A3 Methods and devices for fabricating three-dimensional nanoscale structures
10/13/2005WO2005040924A3 Photoresist coating process for microlithography
10/13/2005WO2005026836A3 Laminated photosensitive relief printing original plate and method for producing the relief printing plate
10/13/2005WO2005022263A3 Control circuit and method for forming optical images
10/13/2005WO2004074928A3 Photoresist composition for deep ultraviolet lithography
10/13/2005WO2003032369A3 Correction of overlay offset between inspection layers
10/13/2005US20050229147 Test ket layout for precisely monitoring 3-foil lens aberration effects
10/13/2005US20050229125 System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques
10/13/2005US20050228162 Novel polyether compound containing acid group and unsaturated group, process for producing the same, and resin composition
10/13/2005US20050228147 Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance
10/13/2005US20050228064 Liquid radiation-curable composition, especially for stereolithography
10/13/2005US20050227497 Light transparent substrate imprint tool with light blocking distal end
10/13/2005US20050227492 Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device
10/13/2005US20050227482 Composition useful for removal of bottom anti-reflection coatings from patterned ion-implanted photoresist wafers
10/13/2005US20050227473 Etching composition and method for etching a substrate
10/13/2005US20050227395 Array substrate of liquid crystal display and fabrication method thereof
10/13/2005US20050227186 Three dimensional printing using photo-activated building materials
10/13/2005US20050227185 Photoresists; photomasks; dry etching, undercutting
10/13/2005US20050227183 Compositions and methods for image development of conventional chemically amplified photoresists
10/13/2005US20050227182 Method of producing a relief image for printing
10/13/2005US20050227180 Method for making a printing plate and a plate exposing apparatus
10/13/2005US20050227179 Exposure processing method of a planographic printing plate and apparatus for executing the same method
10/13/2005US20050227174 Positive resist compositions and patterning process
10/13/2005US20050227173 Positive resist compositions and patterning process
10/13/2005US20050227172 Process for producing photoresist composition, filtration device, application device, and photoresist composition
10/13/2005US20050227171 Silicone base resin {polysilsesquioxanes containing hydroxyphenylalkyltrioxy units and phenylsilanetrioxy units some of which are substituted with an acid dissociable dissolution inhibiting group connected by an ether oxygen to the phenyl ring (1-ethoxyethyl)}; acid generator
10/13/2005US20050227170 Positive resist composition
10/13/2005US20050227169 Mixture containing acid generator, crosslinking agent and dye; reproduction, photostability, heat resistance
10/13/2005US20050227168 Irradiating a protective layer containing a 2 hydroxylarylbenzotriazole or a 2-hydroxybenzophenone photostabilizer and a polymer of an acrylic acid ester of branched alkyl, 1-alkoxyalkyll or 1-alkoxyalkylphenyl(alkyl) alcohol through a photomask, heating, developing, irradiating, heating, applying paste
10/13/2005US20050227167 comprises a radiation sensitive acid generator, a first polymer containing an alkoxymethyl amido group and a hydroxy-containing second polymer
10/13/2005US20050227166 Active energy ray sensitive resin composition, active energy ray sensitive resin film and method for forming pattern using said film
10/13/2005US20050227153 Mask for proximity field optical exposure, exposure apparatus and method therefor
10/13/2005US20050227151 Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device
10/13/2005US20050227082 Adhesive for sealing organic electroluminescent element and use thereof
10/13/2005US20050227014 Use of "CAP coater" in which liquid level height, capillary gap distance, and relative scanning speed between coating nozzle and surface to be coated are adjusted by setting the thickness of the resist film at a predetermined value; the larger the coating gap, the smaller the thickness distribution rate
10/13/2005US20050226999 Method of producing optical disk-use original and method of producing optical disk
10/13/2005US20050226742 Microfabricated elastomeric valve and pump systems
10/13/2005US20050226000 Optical apparatus for illuminating an object
10/13/2005US20050225859 System and method for calibrating a spatial light modulator array using shearing interferometry
10/13/2005US20050225836 Pattern generator mirror configurations
10/13/2005US20050225829 Polarization modulator
10/13/2005US20050225788 Exposure apparatus and exposure method
10/13/2005US20050225772 Interferometric servo control system for stage metrology
10/13/2005US20050225770 Laser interferometer for repeatable mounting on the wall of a vacuum chamber
10/13/2005US20050225741 Exposure apparatus
10/13/2005US20050225740 Light source for photolithography
10/13/2005US20050225739 Exposure apparatus and device fabrication method using the same
10/13/2005US20050225738 Optical element and projection exposure apparatus based on use of the optical element
10/13/2005US20050225737 Projection objective for immersion lithography
10/13/2005US20050225736 Local flare correction
10/13/2005US20050225735 Exposure apparatus and method for producing device
10/13/2005US20050225734 Lithographic apparatus and device manufacturing method
10/13/2005US20050224983 Semiconductor structures and methods for forming patterns using nitrogen-free SiCOH anti-reflective layers
10/13/2005US20050224923 Methods of eliminating pattern collapse on photoresist patterns
10/13/2005US20050224726 Direct write lithography system
10/13/2005US20050224725 System and method for proximity effect correction in imaging systems
10/13/2005US20050224724 Lithographic apparatus, device manufacturing method and device manufactured thereby
10/13/2005US20050224561 Method of manufacturing electronic component mounting body, electronic component mounting body, and electro-optical device
10/13/2005US20050224452 For microstructuring electronic components, which yields high resolutions ( <== 200 nm) at a good aspect ratio while being significantly less expensive than photolithographic methods, semiconductors
10/13/2005US20050224222 System and method for cooling motors of a lithographic tool
10/13/2005US20050224132 Apparatus and method of dispensing photosensitive solution in semiconductor device fabrication equipment
10/13/2005US20050223980 Substrate processing device, substrate processing method, and developing device
10/13/2005US20050223973 EUV lithography system and chuck for releasing reticle in a vacuum isolated environment
10/13/2005US20050223718 Thermophoretic wand to protect front and back surfaces of an object
10/13/2005US20050223539 Method of manufacturing an optical component and optical system using the same
10/13/2005DE10393808T5 Zusammensetzung zur Bildung einer Antireflexionsbeschichtung A composition for forming an anti-reflection coating
10/13/2005DE102004054358A1 Verfahren zum Korrigieren eines Lithographieprozesses und Verfahren zur Herstellung einer Überlagerungsmarkierung A method for correcting a lithography process and a superposition process for producing marking
10/13/2005DE102004036391A1 Diaphragm plate for optical lithography systems comprises an opaque plate with a central pole opening, and a set of four sector openings with the same opening angle that spread radially outward from a mid-point of the central pole opening
10/13/2005DE102004034718A1 Adhesive cement part used in a projective lens for microlithography in the manufacture of semiconductor elements comprises a liquid film which connects an optical element to a fastening element and a further optical element
10/13/2005DE102004014482A1 Verfahren zum Erweitern von Limitierungen für Strukturweiten beim Herstellungsprozess von Fotomasken Method for upgrading of limitations for feature sizes in the manufacturing process of photomasks
10/13/2005DE102004013161A1 Mikrofluidik-Chip Microfluidic chip
10/13/2005DE102004012191A1 Strongly basic developer solution, useful for developing printing, especially lithographic, plates, includes base and, as stabilizer, a (hydrogen)carbonate to prevent drop in pH caused by carbon dioxide absorption
10/13/2005CA2504080A1 A manufacturing method of a microchemical chip made of a resin and a microchemical chip made of a resin by the method
10/12/2005EP1585169A1 Exposure system and exposure method
10/12/2005EP1585101A2 Spatial light modulator and method of performing photolithography using the same
10/12/2005EP1584984A1 Method for replenishing developer in an automatic developing machine for photosensitive lithographic printing plate
10/12/2005EP1584983A2 Exposure apparatus, and device manufacturing method
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