Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2005
10/20/2005US20050231708 Plate exposing apparatus
10/20/2005US20050231707 Removable reticle window and support frame using magnetic force
10/20/2005US20050231706 Feedforward control with reduced learning time for lithographic system to improve throughput and accuracy
10/20/2005US20050231705 Apparatus and method for high resolution in-situ illumination source measurement in projection imaging systems
10/20/2005US20050231704 Device manufacturing method
10/20/2005US20050231703 Exposure apparatus, and device manufacturing method
10/20/2005US20050231702 Exposure apparatus and exposure method, and device manufacturing method using the same
10/20/2005US20050231701 Lithographic apparatus and device manufacturing method
10/20/2005US20050231699 Lithographic apparatus,control system and device manufacturing method
10/20/2005US20050231698 Method of measuring alignment of a substrate with respect to a reference alignment mark
10/20/2005US20050231697 Exposure apparatus and device manufacturing method including gas purging of a space containing optical components
10/20/2005US20050231696 Exposure device
10/20/2005US20050231695 Method and system for immersion lithography using high PH immersion fluid
10/20/2005US20050231694 Lithographic apparatus and device manufacturing method
10/20/2005US20050231668 Liquid crystal display and fabricating method thereof
10/20/2005US20050231141 Moving apparatus, exposure apparatus, and device manufacturing method
10/20/2005US20050231043 Lithographic apparatus, coil assembly, positioning device including a coil assembly, and device manufacturing method
10/20/2005US20050230882 Method of forming a deep-featured template employed in imprint lithography
10/20/2005US20050230876 Manufacturing method of a microchemical chip made of a resin and a microchemical chip made of a resin by the method
10/20/2005US20050230645 Extreme ultraviolet light source
10/20/2005US20050230599 Illumination optical system, exposure apparatus, and device manufacturing method using the same
10/20/2005US20050230369 System for and method of manufacturing gravure printing plates
10/20/2005US20050230368 System for and method of manufacturing gravure printing plates
10/20/2005US20050230367 System for and method of manufacturing gravure printing plates
10/20/2005US20050230366 System for and method of manufacturing gravure printing plates
10/20/2005US20050230352 Method and compositions for hardening photoresist in etching processes
10/20/2005US20050230351 Plasma processing method and apparatus
10/20/2005US20050230348 Method for forming organic mask and method for forming pattern using said organic mask
10/20/2005US20050230346 Processing apparatus
10/20/2005US20050229783 Method for purification of lens gases used in photolithography
10/20/2005DE10393651T5 Polymerisierbare Verbindungen mit Gruppen, die vier Wasserstoffbrückenbindungen ausbilden Polymerizable compounds with groups that form four hydrogen bonds
10/19/2005EP1587144A1 Test structure for an electronic device and corresponding test method
10/19/2005EP1586950A2 Illumination optical system, exposure apparatus, and device manufacturing method using the same
10/19/2005EP1586949A2 Exposure apparatus and exposure method using EUV light
10/19/2005EP1586948A1 Lithographic apparatus and device manufacturing method
10/19/2005EP1586947A1 Lithographic apparatus, control system and device manufacturing method
10/19/2005EP1586946A2 Optical system of a microlithographic projection exposure apparatus
10/19/2005EP1586945A1 Alkali-soluble gap filling material forming composition for lithography
10/19/2005EP1586944A1 Cyanoadamantyl compounds and polymers
10/19/2005EP1586923A2 Method of manufacturing an optical component and optical system using the same
10/19/2005EP1586603A1 Waveguide compositions and waveguides formed therefrom
10/19/2005EP1586594A1 Acrylic copolymer and radiation-sensitive resin composition
10/19/2005EP1586570A1 Sulfonium salts, radiation-sensitive acid generators, and positive radiation-sensitive resin compositions
10/19/2005EP1586544A1 Optical element made from silica glass, method of its manufacture and its use
10/19/2005EP1586460A1 Planographic printing plate material and preparing process of planographic printing plate
10/19/2005EP1586448A1 Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution
10/19/2005EP1586386A1 Contaminant removing method and device, and exposure method and apparatus
10/19/2005EP1586147A1 Electromagnetic radiation pulse timing control
10/19/2005EP1586112A2 Binder diffusion patterning of a thick film paste layer
10/19/2005EP1586008A2 Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same
10/19/2005EP1586006A1 Radiation-sensitive elements
10/19/2005EP1586005A2 High sensitivity resist compositions for electron-based lithography
10/19/2005EP1216146B1 Filmable material with characteristics selectively modifiable by administration of particular types of energy
10/19/2005EP1080170B1 Cleaning composition and method for removing residues
10/19/2005EP1050070B1 Exposure apparatus with holding device for a substrate
10/19/2005EP0914623B1 Variable focus lens by small changes of the equatorial lens diameter
10/19/2005CN1685492A Comprehensive integrated lithographic process control system based on product design and yield feedback system
10/19/2005CN1685286A Lithographic method for wiring a side surface of a substrate
10/19/2005CN1685285A 193nm resist
10/19/2005CN1685284A Multi-image reticles
10/19/2005CN1684902A Decal transfer microfabrication
10/19/2005CN1684229A Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device
10/19/2005CN1684228A Optic micro distance correcting method
10/19/2005CN1684227A Evaluation method for chemical solution, qualification method for chemical solution and method for manufacturing semiconductor device
10/19/2005CN1684002A Flat plate printing apparatus and device manufacturing method
10/19/2005CN1684001A Lithographic apparatus and device manufacturing method
10/19/2005CN1684000A Lithograpic apparatus, illumination system, and optical element for rotating an intensity distribution
10/19/2005CN1683999A Lithographic apparatus and device manufacturing method
10/19/2005CN1683998A Method and device for producing analogue exposure tool imaging performance model and program product
10/19/2005CN1683997A Cyanoadamantyl compounds and polymers and photoresists comprising same
10/19/2005CN1683996A Method and system for immersion lithography using high ph immersion fluid
10/19/2005CN1683979A Array substrate of liquid crystal display and fabrication method thereof
10/19/2005CN1683943A Radioactive ray sensitive composition for forming coloring layer, color filter and color liquid crystal display plate
10/19/2005CN1683487A Cleaning solution, method for cleaning semiconductor substrate using the same, and method for forming metal wiring
10/19/2005CN1224078C Miniaturization process for multi-layer thin photo resist
10/19/2005CN1223958C Machine for exposing plate to laser radiation
10/19/2005CN1223908C Method for forming pattern and treating agent for use therein
10/19/2005CN1223907C Semiconductor developing agent
10/19/2005CN1223906C Method for making three-dimension microstructure and
10/19/2005CN1223905C Exposure process
10/19/2005CN1223904C Method for eliminating wire end shortening effection in photolithography and used mask set
10/19/2005CN1223903C Explosure device for double side printed circuit board
10/19/2005CN1223902C Chemically reinforced light etching rubber and a light etching rubber composition
10/19/2005CN1223901C Positive photosensitive polyimide resin composition
10/19/2005CN1223900C Photo-sensitive conducting resin, conductor pattern forming method and manufacturing method of ceramic laminated structural parts
10/19/2005CN1223899C A few light shield installable light shield support and micro-image exposure system
10/19/2005CN1223898C Method for producing photo mask and method for producing semiconductor device using said photo mask
10/19/2005CN1223885C Method for forming light polarization membrane
10/19/2005CN1223615C Polycyclic resist composition with increased etch resistance
10/19/2005CN1223495C Laser exposure type flat bed printing slip sheet, protective part and its packaging structure
10/19/2005CN1223339C Implanted degradable high molecular material medicine control-release carrier and its preparing process
10/18/2005US6957119 Method for monitoring matched machine overlay
10/18/2005US6956963 Imaging for a machine-vision system
10/18/2005US6956885 Electromagnetic radiation generation using a laser produced plasma
10/18/2005US6956694 Broad spectrum ultraviolet inspection systems employing catadioptric imaging
10/18/2005US6956659 Measurement of critical dimensions of etched features
10/18/2005US6956656 Interferometric servo control system for stage metrology
10/18/2005US6956655 Characterization and compensation of non-cyclic errors in interferometry systems
10/18/2005US6956641 Method of forming resist pattern, and exposure device
10/18/2005US6956640 Light energy detecting apparatus for exposure condition control in semiconductor manufacturing apparatus