Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2005
10/26/2005CN1688936A Planar inorganic device
10/26/2005CN1688935A Flexographic printing plate, flexographic printing device, production method for flexographic printing plate and production method for printing matter
10/26/2005CN1688934A Method for fabricating photomask and semiconductor device
10/26/2005CN1688933A Photomask and its production method, and pattern forming method
10/26/2005CN1688931A Nozzle assembly for applying a liquid to a substrate
10/26/2005CN1688930A Compositions substrate for removing etching residue and use thereof
10/26/2005CN1687847A Liquid delivering and airtight device in submersible photoetching system
10/26/2005CN1687846A Method for making micro-Chinese character by micro-photoetching technique
10/26/2005CN1225018C Method for monitoring overlaying alignment on wafer
10/26/2005CN1224864C Stripping liquid for photoresist and photoresist stripping method using said stripping liguid
10/26/2005CN1224849C Micro lens and producing method, micro-lens array plate, electrooptical apparatus and electronic instrument
10/26/2005CN1224610C Organic anti-reflection polymer and preparation method thereof
10/26/2005CN1224525C Manufacturing method of supporting body for use on offset printing plate and manufacturing device
10/25/2005US6959224 Probability constrained optimization for electrical fabrication control
10/25/2005US6958864 Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
10/25/2005US6958808 System and method for resetting a reaction mass assembly of a stage assembly
10/25/2005US6958806 Lithographic apparatus and device manufacturing method
10/25/2005US6958804 Lithography system
10/25/2005US6958803 Projection exposure apparatus and method with adjustment of rotationally asymmetric optical characteristics
10/25/2005US6958312 No corrosion of copper
10/25/2005US6958294 Method for photoresist strip, sidewall polymer removal and passivation for aluminum metallization
10/25/2005US6958292 Method of manufacturing integrated circuit
10/25/2005US6958281 Method for forming alignment pattern of semiconductor device
10/25/2005US6958250 Light-emitting diode encapsulation material and manufacturing process
10/25/2005US6958207 a photomask spatially modulates the intensity of UV-light onto a photosensitive material effective for visible light; polymeric films adhered onto optically transparent substrates; high quality surface profiles; uniformity, reproducibility
10/25/2005US6958205 Image forming material and ammonium compound
10/25/2005US6958201 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus
10/20/2005WO2005098920A2 Aqueous solution for removing post-etch residue
10/20/2005WO2005098911A1 Drive method for mobile body, stage device, and exposure device
10/20/2005WO2005098545A1 Water-soluble resin composition and method of forming pattern therewith
10/20/2005WO2005098544A2 Device and method for producing resist profiled elements
10/20/2005WO2005098543A1 Method for structuring a substrate using multiple exposure
10/20/2005WO2005098542A1 Antireflection film for semiconductor containing condensation type polymer
10/20/2005WO2005098541A1 Top coat composition
10/20/2005WO2005098540A1 Solid freeform compositions, methods of application thereof, and systems for use thereof
10/20/2005WO2005098539A1 Radiation-sensitive composition, multilayer body and method for producing same, and electronic component
10/20/2005WO2005098538A2 Chemical compositions
10/20/2005WO2005098537A2 Light source for photolithography
10/20/2005WO2005098506A1 Catadioptric projection objective
10/20/2005WO2005098505A1 Catadioptric projection objective with mirror group
10/20/2005WO2005098504A1 Imaging system with mirror group
10/20/2005WO2005098487A1 A broad-angle multilayer mirror design
10/20/2005WO2005098486A1 Method for manufacturing micro structure, method for manufacturing stamper using the micro structure and method for manufacturing resin micro structure using the stamper
10/20/2005WO2005098483A1 Aperture stop assembly for high power laser beams
10/20/2005WO2005098482A1 Optical imaging device
10/20/2005WO2005097883A2 Method of producing a crosslinked coating in the manufacture of integrated circuits
10/20/2005WO2005097876A1 Method of coloring a coating composition
10/20/2005WO2005097725A1 Calixresorcinarene compounds, photoresist base materials, and compositions thereof
10/20/2005WO2005097501A2 System for and method of manufacturing gravure printing plates
10/20/2005WO2005074499A3 Processless digitally imaged photopolymer elements using microspheres
10/20/2005WO2005059653A3 Polarization optically effective delay system for a microlithographic projection illumination device
10/20/2005WO2005059645A3 Microlithography projection objective with crystal elements
10/20/2005WO2005047981A3 Thermophoretic techniques for protecting reticles from contaminants
10/20/2005WO2005043250B1 Process for the use of bis-choline and tris-choline in the cleaning of quartz-coated polysilicon and other materials
10/20/2005WO2005019231A8 Phosphazene compound, photosensitive resin composition and use thereof
10/20/2005US20050235231 System and method for charge-balanced, continuous-write mask and wafer process for improved colinearity
10/20/2005US20050234346 Image exposing apparatus and image exposing method
10/20/2005US20050234206 Fluoropolymer and resist composition
10/20/2005US20050233922 Cleaning solution and method of cleaning semiconductor devices using the same
10/20/2005US20050233921 Cleaning solution for photoresist, method for forming a photoresist pattern using the same, and semiconductor device
10/20/2005US20050233597 Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same
10/20/2005US20050233588 Semiconductor constructions
10/20/2005US20050233264 Systems and methods for filling voids and improving properties of porous thin films
10/20/2005US20050233263 Growth of carbon nanotubes at low temperature
10/20/2005US20050233262 surface plasmon resonance as a result of coupling surface plasmon with light; a pattern having a dimension smaller than a half or less of a wavelength of light can be transferred to a resist without requiring closely contact of the resist with the mask
10/20/2005US20050233261 Method and apparatus for monitoring saturation levels of solvents used during rapid prototyping processes
10/20/2005US20050233260 Radiation transparent; opacity
10/20/2005US20050233259 Resist material and pattern formation method using the same
10/20/2005US20050233258 Ozone-assisted bi-layer lift-off stencil for narrow track CPP-GMR heads
10/20/2005US20050233257 Forming amorphous carbon layer on semiconductor stack; etching; elimination of intermediate layer
10/20/2005US20050233256 Compositions and methods involving direct write optical lithography
10/20/2005US20050233255 Method for forming pattern
10/20/2005US20050233254 Patterning process and resist overcoat material
10/20/2005US20050233253 Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether
10/20/2005US20050233252 Stereoflexography
10/20/2005US20050233251 Lithographic printing plate precursor and lithographic printing method
10/20/2005US20050233250 Aluminum support for planographic printing plate, its manufacturing process, and planographic printing plate material
10/20/2005US20050233249 Photopolymerizable compositions and flexographic printing plates derived therefrom
10/20/2005US20050233248 Planographic printing plate material and planographic printing plate preparing process
10/20/2005US20050233245 2,4,6-Triisopropylbenzenesulfonate compound capable of generating an acid upon exposure to radiation or electron beams, polymer which changes solubility in alkaline developer under action of acid, and basic compound having high sensitivity, contrast, resolution, storage stability
10/20/2005US20050233244 Printing plate material and printing process employing the same
10/20/2005US20050233243 Hydrophilic layer and a thermosensitive image formation layer containing a blocked isocyanate, which is a reaction product of an isocyanate, a polyol, and an isocyanate group-blocking material such as methyl ethyl ketoxime; high printing durability and excellent storage stability at high temperatures
10/20/2005US20050233242 Photosensitive composition and pattern forming method using the same
10/20/2005US20050233228 Grayscale lithography methods and devices
10/20/2005US20050233227 Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system
10/20/2005US20050233226 Apparatus and method for correcting pattern dimension and photo mask and test photo mask
10/20/2005US20050233223 Method for using asymmetric OPC structures on line ends of semiconductor pattern layers
10/20/2005US20050233172 Alumina insulation for coating implantable components and other microminiature devices
10/20/2005US20050233081 Liquid immersion type exposure apparatus
10/20/2005US20050232557 Method of preparing a planar optical waveguide assembly
10/20/2005US20050232130 Production method for photoresist master, production method for optical recording medium-producing stamper, stamper, phtoresist master, stamper intermediate element and optical recroding medium
10/20/2005US20050232116 3-D holographic recording method and 3-D holographic recording system
10/20/2005US20050232000 Method of making information storage devices by molecular photolithography
10/20/2005US20050231814 Refractive projection objective for immersion lithography
10/20/2005US20050231813 Refractive projection objective
10/20/2005US20050231776 Non-resonant two-photon absorption induction method and process for emitting light thereby, optical data recording medium and process for recording data thereon
10/20/2005US20050231773 Optical image recording material, hologram base body, method of optical image recording and process for producing optical image recording material and hologram base body
10/20/2005US20050231737 CD metrology analysis using a finite difference method
10/20/2005US20050231732 Method of measuring overlay
10/20/2005US20050231722 Overlay target and measurement method using reference and sub-grids
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