Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2005
10/27/2005US20050239971 New difunctional photoinitators
10/27/2005US20050239970 Poly(arylene ethers) with pendant crosslinkable groups, and devices incorporating same
10/27/2005US20050239953 Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide
10/27/2005US20050239932 Composition for antireflection coating and method for forming pattern
10/27/2005US20050239930 Photocurable compositions and flexographic printing plates comprising the same
10/27/2005US20050239673 Containing hydrogen peroxide, sulfolane, optionally tetramethylammonium hydroxide, and either trans-1,2-cyclohexanediamine tetraacetic acid or ethylenediaminetetrakis(methylene phosphonic acid); cleans copper residues, SiO2,and low- and high- kappa dielectrics
10/27/2005US20050239296 Top ARC polymers, method of preparation thereof and top ARC compositions comprising the same
10/27/2005US20050239291 Nonlithographic method of defining geometries for plasma and/or ion implantation treatments on a semiconductor wafer
10/27/2005US20050239002 Semiconductor multilevel interconnect structure
10/27/2005US20050239001 use of a high activation energy chemically amplified photoresist (CARS) that is contacted with a low pH high saturation magnetic moment plating solution to form a magnetic head component that is essentially free of plating defects
10/27/2005US20050239000 Method and substrate for the preparation of a printing plate
10/27/2005US20050238999 Process for the manufacture of flexographic printing plates
10/27/2005US20050238998 Photosensitive resin composition and photosensitive dry film containing the same
10/27/2005US20050238997 Curable undercoat of copolymers of acrylic esters, amides, and hydroxy substituted aromatic olefins, a phenolic crosslinker, a thermal acid generator and a solvent; bilayer relief image; integrated circuits
10/27/2005US20050238995 Precursor comprises switchable polymer, cyanine dye infrared radiation absorber, triazine compound and novolak resin; hydrophobic and then lipophilic after exposure to heat
10/27/2005US20050238993 Nitrogen-containing organic compound, chemically amplified resist composition and patterning process
10/27/2005US20050238992 Exposure latitude and line-edge roughness
10/27/2005US20050238991 Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
10/27/2005US20050238990 Photoresist resin and photoresist resin composition
10/27/2005US20050238970 Device manufacturing method
10/27/2005US20050238967 Composite patterning devices for soft lithography
10/27/2005US20050238965 Method and system of lithography using masks having gray-tone features
10/27/2005US20050238838 Method and apparatus for recycling ultraviolet curing resin, and method for manufacturing optical recording medium using that recycling method
10/27/2005US20050238351 Automatic developing apparatus and process for forming image using the same
10/27/2005US20050238350 Apparatus for removing developing solution
10/27/2005US20050238349 Method for replenishing development replenisher in automatic developing machine for photosensitive lithographic printing plate
10/27/2005US20050237623 Optical unit for an illumination system of a microlithographic projection exposure apparatus
10/27/2005US20050237618 Mirror unit, method of producing the same, and exposure apparatus and method using the mirror unit
10/27/2005US20050237542 Method for the formation of a structure size measured value
10/27/2005US20050237541 In-situ interferometer arrangement
10/27/2005US20050237540 Measuring apparatus and exposure apparatus having the same
10/27/2005US20050237536 Interferometry systems and methods of using interferometry systems
10/27/2005US20050237527 Illumination optical system, exposure apparatus and device fabrication method
10/27/2005US20050237512 Method and apparatus for measurement of exit pupil transmittance
10/27/2005US20050237510 Stage device, exposure apparatus, and method of manufacturing device
10/27/2005US20050237509 System and method for custom-polarized photolithography illumination
10/27/2005US20050237508 Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography
10/27/2005US20050237507 Exposure apparatus, focal point detecting method, exposure method and device manufacturing method
10/27/2005US20050237506 Method of optimizing imaging performance
10/27/2005US20050237505 Large field of view 2X magnification projection optical system for FPD manufacture
10/27/2005US20050237504 Exposure apparatus, exposure method, and method for producing device
10/27/2005US20050237503 Exposure apparatus having separately supported first and second shades and method for manufacturing semiconductor device
10/27/2005US20050237502 Exposure apparatus
10/27/2005US20050237501 Wafer cell for immersion lithography
10/27/2005US20050237375 Exposure apparatus, device manufacturing method, pattern generator and maintenance method
10/27/2005US20050236967 Resist composition for separator formation, separator of EL display device and EL display device
10/27/2005US20050236954 Microcavity discharge device
10/27/2005US20050236915 Electromagnetic force actuator
10/27/2005US20050236908 Stage positioning unit for photo lithography tool and for the like
10/27/2005US20050236739 Step and flash imprint lithography
10/27/2005US20050236721 Method of reducing film stress on overlay mark
10/27/2005US20050236585 Exposure apparatus and exposure method using EUV light
10/27/2005US20050236584 Exposure method and apparatus
10/27/2005US20050236566 Scanning probe microscope probe with integrated capillary channel
10/27/2005US20050236362 Cleaning solution and manufacturing method for semiconductor device
10/27/2005US20050236095 Roller chain for applying pressure
10/27/2005US20050235910 Coating apparatus with substrate cleaner
10/27/2005US20050235903 Single scan irradiation for crystallization of thin films
10/27/2005US20050235696 Positioning a nonrigid implant in a lower half of the uterine cavity and allowing it to remain to promote tissue growth that results in adhesion formation; reduces or eliminates abnormal intrauterine bleeding causing amenorrhea
10/27/2005DE202004019052U1 Aufbau diffraktiver Optiken durch strukturierte Glasbeschichtung Structure of diffractive optics structured glass coating
10/27/2005DE19915704B4 Resistzusammensetzung und Musterbildungsprozess Resist composition and patterning process
10/27/2005DE10393820T5 Positiv arbeitende Photoresistzusammensetzung auf Siliconbasis vom chemischen Amplifizierungstyp The positive-working photoresist composition of silicone-based chemical Amplifizierungstyp
10/27/2005DE102005013532A1 EUV-Lithographiesystem und Chuck zum Lösen von Retikeln in einer vakuumisolierten Umgebung EUV lithography system and Chuck for solving reticles in a vacuum-insulated environment
10/27/2005DE102004021491B3 Vorrichtung zur Herstellung eines Druckbildes mittels eines Lasers An apparatus for producing a print image using a laser
10/27/2005DE102004017131A1 Lithographiemaske für die Herstellung von Halbleiterbauelementen Lithography mask for the manufacture of semiconductor devices
10/27/2005DE102004015923A1 Inspection method for resist structures on wafer surfaces uses test structures with test elements set out as a measuring scale and exposed to asymmetrical unbalanced capillary forces
10/27/2005DE10104577B4 Verfahren zum Belacken eines Photomaskenrohlings für die Chipherstellung A method for lacquering a photomask blank for chip production
10/27/2005CA2847260A1 Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography
10/27/2005CA2549341A1 Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography
10/26/2005EP1589792A2 Light source apparatus and exposure apparatus having the same
10/26/2005EP1589573A2 Method for patterning cavities and enhanced cavity shapes for semiconductor devices
10/26/2005EP1589379A2 Optical illumination system, exposure apparatus and device fabrication method
10/26/2005EP1589378A2 Exposure apparatus and exposure method and device manufacturing method using the same
10/26/2005EP1589377A2 Patterning process and resist overcoat material
10/26/2005EP1589376A1 Conductive pattern forming method, and conductive pattern material
10/26/2005EP1589375A1 Resist composition
10/26/2005EP1589374A2 Polymerizable composition, photopolymerizing method and process for producing lithographic printing plate using the polymerizable composition
10/26/2005EP1589373A1 Exposing mask and production method therefor and exposing method
10/26/2005EP1589084A1 Pressure-sensitive adhesive sheet for removal of fluorescent substances
10/26/2005EP1589082A1 Coating composition, antireflective film, photoresist and pattern forming method using same
10/26/2005EP1589020A1 Novel compounds capable of forming photoconvertible organic thin films and articles having organic thin films
10/26/2005EP1588860A1 Printing plate material and printing process
10/26/2005EP1588859A1 Printing plate material and printing process employing the same
10/26/2005EP1588858A2 Lithographic printing plate precursor and lithographic printing method
10/26/2005EP1588847A1 Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic plate material
10/26/2005EP1588362A1 Method of manufacturing an optical data storage medium, optical data storage medium and apparatus for performing said method
10/26/2005EP1588221A2 A method of patterning photoresist on a wafer using a transmission mask with a carbon layer
10/26/2005EP1588220A1 Apparatus and method for treating imaging materials
10/26/2005EP1588219A2 Semiconductor fabrication method for making small features
10/26/2005EP1587847A2 Process for refining crude resin for electronic material
10/26/2005EP1532193A4 Organosiloxanes
10/26/2005EP1393133B1 Projection system for euv lithography
10/26/2005EP1275036B1 Abbe error correction system and method
10/26/2005EP1084457B1 Method for producing small and micro-sized ceramic parts
10/26/2005EP0975437B1 Black matrix with conductive coating
10/26/2005EP0882072B2 Anionic photocatalyst
10/26/2005CN1689142A Method and compositions for hardening photoresist in etching processes
10/26/2005CN1688939A Photoresist base material, method for purification thereof, and photoresist compositions
10/26/2005CN1688938A Multiphoton photosensitization system
10/26/2005CN1688937A Multi-photon reactive compositions with inorganic particles and method for fabricating structures
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