Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2005
11/02/2005EP1591241A2 Image recording apparatus
11/02/2005EP1591240A2 Device for bilding a printing image by using a laser
11/02/2005EP1591223A2 A manufacturing method of a microchemical chip made of a resin and a microchemical chip made of a resin by the method
11/02/2005EP1591218A1 Mould for nanoimprinting, method of manufacture of such a mould and use of such a mold
11/02/2005EP1591217A1 Method and apparatus for recycling ultraviolet curing resin
11/02/2005EP1590709A2 Process for refining crude resin for resist
11/02/2005EP1590101A1 Methods and device for removing cross-linked polymers from metal structures
11/02/2005EP1170343B1 Infrared sensitive coating liquid
11/02/2005EP1101145B1 Method and apparatus for providing rectangular shaped array of light beams
11/02/2005CN1692417A Method for producing stamper used for producing optical disc and optical disc producing method
11/02/2005CN1692314A Chemical-amplification positive-working photoresist composition
11/02/2005CN1692313A Multiphoton photosensitization method
11/02/2005CN1692312A Photomask blank, and photomask
11/02/2005CN1692142A Radiation curable composition, optical waveguide and method for formation thereof
11/02/2005CN1692130A Unsaturated monomers, polymers, chemically amplified resist composition, and process of pattern formation
11/02/2005CN1690866A Device and method for treating panel
11/02/2005CN1690865A Photoresist stripper
11/02/2005CN1690864A Automatic developing apparatus and process for forming image using the same
11/02/2005CN1690863A Device manufacturing method
11/02/2005CN1690862A Method of generating writing pattern, method of forming resist pattern, method of controlling exposure tool
11/02/2005CN1690861A Optical illumination system, exposure apparatus and device fabrication method
11/02/2005CN1690860A Apparatus for removing developer
11/02/2005CN1690859A Scribing groove structure for registration photo etching
11/02/2005CN1690858A Imaging interference photo etching method and system by rotating a mask and a resist silicon slice
11/02/2005CN1690857A Laser interference photo etching method adopting holographic optical elements and photo etching system
11/02/2005CN1690856A Chemical amplification positive photoresist compositions
11/02/2005CN1690855A Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures
11/02/2005CN1690854A Photosensitive composition
11/02/2005CN1690853A Photosensitive resin composition and photosensitive dry film containing the same
11/02/2005CN1690852A Glass composition for silver paste, photosensitive silver paste using same, electrode pattern and plasma display panel
11/02/2005CN1690851A Chemical amplification positive photoresist compositions, (methyl) acrylate derivatives and method for preparing same
11/02/2005CN1690850A Negative thermosensitive offset matrix
11/02/2005CN1690849A Optics film and its manufacturing method
11/02/2005CN1690848A Image recording apparatus
11/02/2005CN1690735A Dyed layer forming radiation linear combination, colour filter and liquid crystal display screen
11/02/2005CN1690183A Cleaning solution and manufacturing method for semiconductor device
11/02/2005CN1690125A Waveguide compositions and waveguides formed therefrom
11/02/2005CN1690099A Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
11/02/2005CN1690098A Top arc polymers, method of preparation thereof and top arc compositions
11/02/2005CN1689834A Printing plate material and printing process
11/02/2005CN1689809A Cylindrical outer surface scanning apparatus and method for use therewith
11/02/2005CN1689802A Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic plate material
11/02/2005CN1225678C Optical approaching correcting method
11/02/2005CN1225509C Radiation-sensitive composition capable of having refractive index distribution
11/02/2005CN1225489C Photoionizable solidified compsns., solidified body and its mfg. process
11/02/2005CN1225486C Fluoropolymer having acid-reactive group and chemical amplification type photoresist compsn. contg. same
11/02/2005CN1225401C Production method of millimetric wave voltage-controlled phase shifter for microelectronic machine
11/02/2005CN1225371C Design producing technology for metal etching maps
11/01/2005US6961186 Contact printing using a magnified mask image
11/01/2005US6961160 Recording material for holograms, manufacturing method thereof, recording medium for holograms, hologram recording method and hologram reproduction method
11/01/2005US6961132 Interference system and semiconductor exposure apparatus having the same
11/01/2005US6961119 Method and apparatus to facilitate separation of a mask and a mask platform
11/01/2005US6961115 Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system
11/01/2005US6961114 Optical apparatus and exposure apparatus incorporating the apparatus
11/01/2005US6961113 Exposure method and apparatus
11/01/2005US6960846 Linear pulse motor, stage apparatus, and exposure apparatus
11/01/2005US6960845 Moving apparatus, exposure apparatus, and device manufacturing method
11/01/2005US6960775 first illumination system for beam of ultraviolet radiation, support structure for patterning device, projection system and second illumination system for a compensating beam; critical dimension profile correction; integrated circuit maufacture
11/01/2005US6960773 System and method for maskless lithography using an array of improved diffractive focusing elements
11/01/2005US6960540 Film formation method, semiconductor element and method thereof, and method of manufacturing a disk-shaped storage medium
11/01/2005US6960532 Suppressing lithography at a wafer edge
11/01/2005US6960484 Method of manufacturing liquid crystal display device
11/01/2005US6960481 Evaluation method
11/01/2005US6960425 Method for laminating and patterning carbon nanotubes using chemical self-assembly process
11/01/2005US6960422 Characterized in having a specified sensitivity ratio; infrared absorbing agent, a radical generator and a radical polymerizable compound on a support
11/01/2005US6960420 Photosensitive resin composition, process for forming relief pattern, and electronic component
11/01/2005US6960419 Antihalation dye for negative-working printing plates
11/01/2005US6960416 Method and apparatus for controlling etch processes during fabrication of semiconductor devices
11/01/2005US6960415 Aberration measuring method and projection exposure apparatus
11/01/2005US6960414 Determining overlay parameters for a plurality of sub-layouts; inputting the overlay parameters into an exposure system; exposing each sub-layout to photoresist on a wafer by using the exposure system; correction; development
11/01/2005US6960372 Drying the coating film after forming the coating film in a state of the posture of the substrate is kept and with inhibiting the down flow from turning into a side of the surface to be coated
11/01/2005US6959484 System for vibration control
11/01/2005CA2354080C Integral lens for high energy particle flow, method for producing such lenses and use thereof in analysis devices and devices for radiation therapy and lithography
10/2005
10/30/2005CA2505170A1 Method for calibrating a write head for producing a printing plate
10/27/2005WO2005101468A1 Rinse treatment method and development process method
10/27/2005WO2005101467A1 Coater/developer and coating/developing method
10/27/2005WO2005101466A2 Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography
10/27/2005WO2005101131A1 Support device for positioning an optical element
10/27/2005WO2005101130A1 Method of producing a relief image
10/27/2005WO2005101129A1 Radiation-sensitive resin composition
10/27/2005WO2005101128A1 Positive resist composition and process for the formation of resist patterns
10/27/2005WO2005101127A1 Resist composition
10/27/2005WO2005101126A1 Negative photosensitive composition and negative photosensitive lithographic printing plate
10/27/2005WO2005101125A1 Heat-resistant photosensitive resin composition, process for producing pattern from the composition, and electronic part
10/27/2005WO2005101124A1 Radiation-sensitive resin composition, interlayer insulation film, microlens and process for producing them
10/27/2005WO2005101123A1 Photosensitive resin composition and photoresist film
10/27/2005WO2005101122A2 Cleaning of multi-layer mirrors
10/27/2005WO2005101121A2 Optical element unit for exposure processes
10/27/2005WO2005101082A2 Optical element and fixture for an optical element
10/27/2005WO2005100472A1 Photo-radical-curable resin composition containing epoxy resin
10/27/2005WO2005100448A1 Resin curable with actinic energy ray, photocurable/thermosetting resin composition containing the same, and cured article obtained therefrom
10/27/2005WO2005100412A1 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern
10/27/2005WO2005100304A1 Adamantane derivative and process for producing the same
10/27/2005WO2005078525A3 Immersion lithography technique and product using a protection layer covering the resist
10/27/2005WO2005059649A3 Liquid crystal cell that resists degradation from exposure to radiation
10/27/2005WO2005033801A3 Adaptive thermal control of lithographic chemical processes
10/27/2005WO2005022264A3 Optical image formation using a light valve array and a light converging array
10/27/2005WO2001086353A9 Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same
10/27/2005US20050240895 Method of emulation of lithographic projection tools
10/27/2005US20050239984 Copolymers derived from fluorinated olefin, polycyclic ethylenically unsaturated polycyclic monomer with a fused 4-membered ring, useful for photoimaging, coated substrates, for imaging in the production of semiconductor devices, plasma etch resistance and adhesive properties
1 ... 624 625 626 627 628 629 630 631 632 633 634 635 636 637 638 639 640 641 642 643 644 ... 1272