Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2005
11/03/2005WO2005103824A2 Method of forming a metal pattern on a substrate
11/03/2005WO2005103823A1 Photosensitive composition for black matrix
11/03/2005WO2005103822A2 Photosensitive resin composition, cured product thereof and production method of printed circuit board using the same
11/03/2005WO2005103821A1 Low-expansion glass substrate for a reflective mask and reflective mask
11/03/2005WO2005103820A1 Levenson type phase shift mask and production method therefor
11/03/2005WO2005103819A2 Method of emulation of lithographic projection tools
11/03/2005WO2005103788A1 Method for connection of an optical element to a mount structure
11/03/2005WO2005103167A1 Uv curable composition for forming dielectric coatings and related method
11/03/2005WO2005103098A1 Resist protecting film forming material for immersion exposure process and resist pattern forming method using the protecting film
11/03/2005WO2005102735A1 Method of forming a deep-featured template employed in imprint lithography
11/03/2005WO2005057670A3 Irradiation apparatuses
11/03/2005WO2005021156A3 Capillary imprinting technique
11/03/2005WO2004093130A3 Cleanup method for optics in immersion lithography
11/03/2005WO2004070471A3 Arc layer for semiconductor device
11/03/2005US20050245768 Multimer forms of mono-and bis-acylphosphine oxides
11/03/2005US20050245739 UV decomposable molecules and a photopatternable monomolecular film formed therefrom
11/03/2005US20050245717 Spin-on-glass anti-reflective coatings for photolithography
11/03/2005US20050245663 Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
11/03/2005US20050245643 combination of nonfluorinated aromatic epoxy resins (bisphenol a, bisphenol f type), an alicyclic epoxy resin having cyclohexene oxide or cyclopentene oxide structure in its molecule, a photoinitiator with iodinium or sulfonium cations and B(tetrafluorobenzene)4 or SbF6 anions, silica, Mg/OH/2 filler
11/03/2005US20050245094 Method to reduce photoresist pattern collapse by controlled surface microroughening
11/03/2005US20050245085 Method for forming pattern using printing method
11/03/2005US20050245082 Process for removing organic materials during formation of a metal interconnect
11/03/2005US20050245075 Semiconductor device and method of manufacturing same
11/03/2005US20050245005 Wafer edge ring structures and methods of formation
11/03/2005US20050244979 Evaluation method for chemical solution, qualification method for chemical solution and method for manufacturing semiconductor device
11/03/2005US20050244761 diluting waste photoresist with solvent, measuring the solids content and thicknessses of the photoresists; monitoring and comparing them to target values to determine recyclabilty
11/03/2005US20050244759 Bake apparatus for use in spin-coating equipment
11/03/2005US20050244758 Manufacturing method for molecular rulers
11/03/2005US20050244757 Dynamic mask module
11/03/2005US20050244750 Negative resist composition comprising hydroxy-substituted base polymer and si-containing crosslinker having epoxy ring and a method for patterning semiconductor devices using the same
11/03/2005US20050244749 imageable element; a hydrophilic substrate, a photothermal conversion material, an ink-receptive top layer, a copolymer of N-phenyl-maleimide, an acrylamide, an acrylic acid and a monomer having a cyclic urea group; lithographic printing plate resistant to press chemistry
11/03/2005US20050244748 Photoresist polymer and photoresist composition containing the same
11/03/2005US20050244747 Positive-tone radiation-sensitive resin composition
11/03/2005US20050244746 Lithographic printing plate precursor and lithographic printing method
11/03/2005US20050244745 Photoresist compositions with si-component
11/03/2005US20050244740 Slightly alkali-soluble or alkali-insoluble novolak or polyhydroxystyrenic resin ; bisvinyloxyalkylene or polyvinyl ether curing agent; photoacid generator; organic solvent; high sensitivity, heat resistance and resolution; undulation suppression
11/03/2005US20050244739 Highly heat-resistant, negative-type photosensitive resin composition
11/03/2005US20050244729 Method of measuring the overlay accuracy of a multi-exposure process
11/03/2005US20050244727 Dynamic mask module
11/03/2005US20050244726 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
11/03/2005US20050244725 Apparatus and method for structure exposure of a photoreactive layer
11/03/2005US20050244724 Evaluation of pattern formation process, photo masks for the evaluation, and fabrication method of a semiconductor device with the evaluation process
11/03/2005US20050244723 Lithography mask for the fabrication of semiconductor components
11/03/2005US20050244721 Composite layer method for minimizing PED effect
11/03/2005US20050244647 Simple, inexpensive and largely gentle method which involves nontoxic photoinitiator such as vitamin B3 and electromagnetic radiation to hydrogel such as polyvinylpyrrolidone, polyethylene glycol or polyethylenimine to coat polymer catheter or stent such as polyethylene
11/03/2005US20050244588 Method of observing monolayer ultraviolet decomposition process, method of controlling degree of surface decomposition, and patterning method
11/03/2005US20050244587 Heating elements deposited on a substrate and related method
11/03/2005US20050244572 Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system
11/03/2005US20050244535 Method for decorating surface of mold and mold
11/03/2005US20050244124 Waveguide compositions and waveguides formed therefrom
11/03/2005US20050243452 Monolithic hard pellicle
11/03/2005US20050243440 Aperture plate for lithography systems
11/03/2005US20050243435 Catadioptric reduction objective having a polarization beamsplitter
11/03/2005US20050243398 System and method for calculating aerial image of a spatial light modulator
11/03/2005US20050243397 System and method for calculating aerial image of a spatial light modulator
11/03/2005US20050243390 Extreme ultraviolet radiation imaging
11/03/2005US20050243328 Device and method for the optical measurement of an optical system, a container therefor, and a microlithography projection exposure machine
11/03/2005US20050243309 Apparatus and process for determination of dynamic lens field curvature
11/03/2005US20050243299 Device and method for determining an illumination intensity profile of an illuminator for a lithography system
11/03/2005US20050243298 Lithographic apparatus and device manufacturing method
11/03/2005US20050243297 Lithographic apparatus and device manufacturing method
11/03/2005US20050243296 Position detecting method and apparatus, exposure apparatus and device manufacturing method
11/03/2005US20050243295 Lithographic apparatus and device manufacturing
11/03/2005US20050243294 Apparatus and process for determination of dynamic scan field curvature
11/03/2005US20050243293 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method
11/03/2005US20050243292 Lithographic apparatus and device manufacturing method
11/03/2005US20050243291 Apparatus for removing liquid in immersion lithography process and method of immersion lithography
11/03/2005US20050243266 Method of fabricating color filter substrate for liquid crystal display device having patterned spacers
11/03/2005US20050243247 Liquid crystal display device having patterned spacers and method of fabricating the same
11/03/2005US20050243233 Method for fabricating cliche and method for forming pattern using the same
11/03/2005US20050243222 Optical system of a microlithographic projection exposure apparatus
11/03/2005US20050243120 Method for calibrating a write head for producing a printing plate
11/03/2005US20050242764 Positioning apparatus, exposure apparatus, and semiconductor device manufacturing method
11/03/2005US20050242448 Overlay key, method of manufacturing the same and method of measuring an overlay degree using the same
11/03/2005US20050242303 Advanced pattern definition for particle-beam exposure
11/03/2005US20050242302 Advanced pattern definition for particle-beam processing
11/03/2005US20050242300 Atomic beam to protect a reticle
11/03/2005US20050241673 Resist removing apparatus and method of removing resist
11/03/2005US20050241572 Apparatus for coating photoresist
11/03/2005US20050241569 Crystallization method and crystallization apparatus
11/03/2005US20050241532 Azo dye: azopyrazolone metal complex intercalcated with melamine; colour filters in liquid crystal displays, screens, colour resolution instruments, sensors
11/03/2005US20050241512 Image recording apparatus, notch forming apparatus, and method for use therewith
11/03/2005US20050241509 System for thermal development of flexographic printing plates
11/03/2005US20050241338 Reduced striae extreme ultraviolet elements
11/03/2005DE10393581T5 Härtbare Schutzlackzusammensetzungen, daraus erhaltene gehärtete Produkte und Verfahren zu ihrer Herstellung The curable coating compositions, cured products obtained therefrom and processes for their preparation
11/03/2005DE10356668B4 Herstellungsverfahren für eine Hartmaske auf einer Halbleiterstruktur Production method of a hard mask on a semiconductor structure
11/03/2005DE10253162B4 Verfahren zum Spülen einer optischen Linse A method of rinsing an optical lens
11/03/2005DE102004035595A1 Verfahren zur Justage eines Projektionsobjektives Method for adjusting a projection objective
11/03/2005DE102004018817A1 Removing material substrate surface for manufacturing semiconductor integrated circuits and devices by introducing pressurized processing solution in vessel to expose surface to processing solution
11/03/2005DE102004018659A1 Abschlussmodul für eine optische Anordnung Termination module for an optical arrangement
11/03/2005DE102004018656A1 Optisches Element An optical element
11/03/2005DE102004018147A1 Einrichtung und Verfahren zur Erzeugung von Resistprofilen Apparatus and method for producing resist profiles
11/03/2005DE102004016749A1 Textured surface overlapping method for home entertainment, involves utilizing transmission and reflection abilities of film, arranged between upper surface of textured surface and projector, for computative manipulation of digital graphics
11/03/2005DE102004016480A1 Vollintegrierte hybride optisch-elektrische Leiterplatte Fully integrated hybrid optical-electrical circuit board
11/03/2005DE102004015930A1 Integrated circuit e.g. NROM, path pattern lithographic projection method, involves operating projection apparatus in two modes to project pattern onto resist layer, and controlling phase of exposure light by alternating phase shift mask
11/03/2005DE102004015194A1 Printing plate illustrating device, has transport path for printing plates which is diagonally oriented in section between printing plate input and printing plate output, such that transport path runs in Z-form
11/02/2005EP1591833A2 Exposure method and apparatus
11/02/2005EP1591832A2 Photosensitive composition, compound used in the same, and patterning method using the same
11/02/2005EP1591489A1 Pigment preparations
11/02/2005EP1591242A2 Lithographic printing plate precursor
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