| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 11/10/2005 | US20050248650 Image recording apparatus |
| 11/10/2005 | US20050248220 Linear motor apparatus |
| 11/10/2005 | US20050248219 Alignment apparatus and exposure apparatus using the same |
| 11/10/2005 | US20050248062 Process for the production of a three-dimensional object with resolution improvement by "pixel-shift" |
| 11/10/2005 | US20050248061 Process for the production of a three-dimensional object with an improved separation of hardened material layers from a construction plane |
| 11/10/2005 | US20050247225 Method and apparatus for producing printing forms |
| 11/10/2005 | US20050247222 Method of making a photopolymer sleeve blank having an integral cushion layer for flexographic printing |
| 11/10/2005 | DE19650722B4 Belichtungsverfahren zum Bilden von Mikromustern An exposure method of forming micropatterns |
| 11/10/2005 | DE10337286B4 Verfahren zur Projektion eines auf einer Maske angeordneten Schaltungsmusters auf einen Halbleiterwafer A method for projecting a mask arranged on a circuit pattern on a semiconductor wafer |
| 11/10/2005 | DE102004019731A1 Vorrichtung zum Drehbelacken von Substraten Apparatus for Drehbelacken of substrates |
| 11/10/2005 | DE102004019595A1 Projection optic system especially for photolithography for semiconductor processing has a filter with opaque and transmitting regions to provide an optimum intensity distribution for the projection |
| 11/10/2005 | DE102004019346A1 Screen for an irradiating device for projecting a pattern into a photo-sensitive layer comprises a substrate having a surface containing a reflecting element and a control unit for adjusting the reflection properties of the element |
| 11/10/2005 | DE102004019020A1 Organische Pigmentpräparationen Organic Pigment Preparations |
| 11/10/2005 | DE102004017082A1 Optische Abbildungsvorrichtung Optical imaging device |
| 11/10/2005 | DE10140174B4 Koordinaten-Messtisch und Koordinaten-Messgerät Coordinate measuring table and coordinate measuring instrument |
| 11/09/2005 | EP1594178A2 A method of fabricating a desired pattern of electronically functional material |
| 11/09/2005 | EP1594008A2 Method and apparatus for submicron ic design using edge fragment tagging |
| 11/09/2005 | EP1594007A2 Assembly and adjusting method of optical system, exposure apparatus having the optical system |
| 11/09/2005 | EP1594006A2 Method for making a printing plate and a plate exposing apparatus |
| 11/09/2005 | EP1594005A2 Process for preparing a flexographic printing plate |
| 11/09/2005 | EP1594004A2 Barrier film material and pattern formation method using the same |
| 11/09/2005 | EP1594003A1 Lithographic printing plate precursor and lithographic printing method |
| 11/09/2005 | EP1594002A2 Method for manufacturing large area stamp for nanoimprint lithography |
| 11/09/2005 | EP1594001A1 Device and method for imprint lithography |
| 11/09/2005 | EP1593650A2 A method of creating a patterned monolayer on a surface |
| 11/09/2005 | EP1593520A1 Thermal transfer dye-donors sheet for recording by laser. |
| 11/09/2005 | EP1593496A2 Method and means for realising printing surfaces |
| 11/09/2005 | EP1593002A2 Method for generating a circular periodic structure on a basic support material |
| 11/09/2005 | EP1592771A2 Selective and alignment-free molecular patterning of surfaces |
| 11/09/2005 | EP1592752A1 Radiation curable aqueous compositions |
| 11/09/2005 | EP1592520A2 Supercritical carbon dioxide/chemical formulation for removal of photoresists |
| 11/09/2005 | EP1292852B1 Microfabrication of organic optical elements |
| 11/09/2005 | EP1287592A4 Gas discharge laser with blade-dielectric electrode |
| 11/09/2005 | EP1155481A4 Durable etalon based output coupler |
| 11/09/2005 | EP1147581A4 Line narrowed f2 laser with etalon based output coupler |
| 11/09/2005 | EP1118144A4 Line narrowing apparatus with high transparency prism beam expander |
| 11/09/2005 | EP1060439B1 Improved pattern generator for avoiding stitching errors |
| 11/09/2005 | EP1035147B1 Composition for light absorption film formation containing blocked isocyanate compound and antireflection film formed therefrom |
| 11/09/2005 | EP0855049B1 A method of forming a monolayer of particles, and products formed thereby |
| 11/09/2005 | EP0795199B1 Structure and method for exposing photoresist |
| 11/09/2005 | CN1695096A Position detecting method, surface shape estimating method, and exposure apparatus and device manufacturing method using the same |
| 11/09/2005 | CN1695094A Device for sealing a projection exposure apparatus |
| 11/09/2005 | CN1695076A Continuous direct-write optical lithography |
| 11/09/2005 | CN1695073A Projection lens for a microlithographic projection exposure apparatus |
| 11/09/2005 | CN1695040A Assessment and optimization for metrology instrument |
| 11/09/2005 | CN1693994A Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent |
| 11/09/2005 | CN1693993A A method of fabricating a desired pattern of electronically functional material |
| 11/09/2005 | CN1693992A Manufacturing method of aluminous plate for PS plate substrate for printing |
| 11/09/2005 | CN1693991A 光致抗蚀剂树脂组合物 The photoresist resin composition |
| 11/09/2005 | CN1693975A Liquid crystal display device having patterned spacers and method of fabricating the same |
| 11/09/2005 | CN1693955A Method for forming pattern using printing method |
| 11/09/2005 | CN1693953A Method for fabricating cliche and method for forming pattern using the same |
| 11/09/2005 | CN1693946A Method of fabricating color filter substrate for liquid crystal display device having patterned spacers |
| 11/09/2005 | CN1693086A Device for building a printing image by using a laser |
| 11/09/2005 | CN1693069A Method and apparatus for producing printing forms |
| 11/09/2005 | CN1226671C Optical amplification regulating system |
| 11/09/2005 | CN1226670C Photosensitive resin composition and method for improving dry etching resistance of photosensitive resin composition |
| 11/09/2005 | CN1226669C Radiation-sensitive resin composition |
| 11/09/2005 | CN1226346C Resin composition for insulation and laminated body using said composition |
| 11/09/2005 | CN1226212C Quartz glass member and projection aligner |
| 11/08/2005 | US6963821 Stage counter mass system |
| 11/08/2005 | US6963786 Remote maintenance system |
| 11/08/2005 | US6963595 Automatic gas control system for a gas discharge laser |
| 11/08/2005 | US6963452 Compact imaging head and high speed multi-head laser imaging assembly and method |
| 11/08/2005 | US6963449 Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method |
| 11/08/2005 | US6963434 System and method for calculating aerial image of a spatial light modulator |
| 11/08/2005 | US6963392 Image-forming device having a belt type processing member with micro-features |
| 11/08/2005 | US6963391 Lithographic apparatus and device manufacturing method |
| 11/08/2005 | US6963390 In-situ interferometer arrangement |
| 11/08/2005 | US6963075 Scanning exposure apparatus and device manufacturing method |
| 11/08/2005 | US6963072 Integral lens for high energy particle flow, method for producing such lenses and use thereof in analysis devices and devices for radiation therapy and lithography |
| 11/08/2005 | US6963071 Debris mitigation device |
| 11/08/2005 | US6962878 Method to reduce photoresist mask line dimensions |
| 11/08/2005 | US6962825 Exposure apparatus |
| 11/08/2005 | US6962771 formation of self-aligned dual damascene interconnects and vias, which incorporates two positive photoresist systems, which have different wavelength sensitivities, to form trench/via openings with only a two-step etching process |
| 11/08/2005 | US6962769 For use during microlithography |
| 11/08/2005 | US6962768 Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same |
| 11/08/2005 | US6962767 Acetal compound, polymer, resist composition and patterning process |
| 11/08/2005 | US6962766 Positive photoresist composition |
| 11/08/2005 | US6962762 Exposure positioning in photolithography |
| 11/08/2005 | US6962727 Organosiloxanes |
| 11/08/2005 | US6962627 Device for providing a pressurized solution to an applying device |
| 11/08/2005 | US6962161 Contacting workpiece with supercritical carbon dioxide and additives in a high-pressure chamber, removing the unnecessary substance on the workpiece, rinsing |
| 11/07/2005 | WO2006051745A1 Temperature regulation method and system for low flow rate liquid |
| 11/03/2005 | WO2005104637A1 Method and apparatus for accurately applying structures to a substrate |
| 11/03/2005 | WO2005104311A2 Duv light source optical element improvements |
| 11/03/2005 | WO2005104222A1 Process for forming a solder mask, apparatus thereof and process for forming electric-circuit patterned internal dielectric layer |
| 11/03/2005 | WO2005104214A2 Composition useful for removal of bottom anti-reflection coatings from patterned ion-implanted photoresist wafers |
| 11/03/2005 | WO2005104195A1 Exposure apparatus and device producing method |
| 11/03/2005 | WO2005104194A1 Substrate processing method and substrate processing apparatus |
| 11/03/2005 | WO2005104193A1 Method for correcting electron beam exposure data |
| 11/03/2005 | WO2005104189A2 System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques |
| 11/03/2005 | WO2005103832A1 Resist pattern forming method and composite rinse agent |
| 11/03/2005 | WO2005103831A1 Rinsing fluid for lithography |
| 11/03/2005 | WO2005103830A1 Rinse solution for lithography |
| 11/03/2005 | WO2005103829A1 Apparatus and method for thermally developing flexographic printing sleeves |
| 11/03/2005 | WO2005103828A2 System and method for fabricating contact holes |
| 11/03/2005 | WO2005103827A1 A method for error reduction in lithography |
| 11/03/2005 | WO2005103826A1 Illumination system for a microlithographic projection exposure apparatus |
| 11/03/2005 | WO2005103825A2 Device for covering substrates in a rotating manner |