Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2005
11/16/2005CN1227546C Method of making patterned passive delay and thus made delay
11/15/2005US6965624 Laser gas replenishment method
11/15/2005US6965484 Optical imaging systems and methods using polarized illumination and coordinated pupil filter
11/15/2005US6965436 System and method for calibrating a spatial light modulator array using shearing interferometry
11/15/2005US6965432 Non-invasive wafer transfer position diagnosis and calibration
11/15/2005US6965427 System to increase throughput in a dual substrate stage double exposure lithography system
11/15/2005US6965387 Real time data conversion for a digital display
11/15/2005US6965153 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
11/15/2005US6965119 Method and apparatus of calibrating multi-position SLM elements
11/15/2005US6965117 Extreme UV light source and semiconductor exposure device
11/15/2005US6965115 Airtight processing apparatus, airtight processing method, and electron beam processing apparatus
11/15/2005US6965114 Apparatus and methods for mask/substrate alignment in charged-particle-beam pattern-transfer
11/15/2005US6965045 Organic metal precursor for use in forming metal containing patterned films
11/15/2005US6964840 Mixture containing acid generator ; amplification og photoresist semiconductor
11/15/2005US6964839 Using acid generator
11/15/2005US6964838 Sensitivity and definition and is advantageously used for patterning a resist with less shrink
11/15/2005US6964837 Polymer mixture containing fluorescence chromogen
11/15/2005US6964836 Amino resin crosslinked carboxyvinyl polymer
11/15/2005US6964832 Semiconductor device and manufacturing method thereof
11/15/2005US6964813 Ultraviolet curable resin composition and photo solder resist including the same
11/15/2005US6964793 Photolithography process for creating high resolution patterns, using a template, applying a polymerizable composition, electrochemical polymerization, etching to form a pattern
11/15/2005US6964735 Supporting medium with an organic polymer substrate having a substantially uncharged surface
11/15/2005US6964485 Collector for an illumination system with a wavelength of less than or equal to 193 nm
11/15/2005US6964228 Conveying device
11/15/2005CA2400921C Dual-layer self-contained recording paper incorporating hollow microspheres
11/10/2005WO2005106932A1 Analysis method, exposing equipment and exposing equipment system
11/10/2005WO2005106931A1 Pattern transfer method
11/10/2005WO2005106930A1 Exposure method, exposure system, and method for fabricating device
11/10/2005WO2005106597A2 Photopolymer plate and method for imaging the surface of a photopolymer plate
11/10/2005WO2005106596A1 Exposure apparatus
11/10/2005WO2005106595A1 Exposure apparatus and pattern forming method
11/10/2005WO2005106594A2 Device and method for determining an illumination intensity profile of an illuminator for a lithography system
11/10/2005WO2005106593A2 Method and apparatus for measurement of exit pupil transmittance
11/10/2005WO2005106592A2 High resolution in-situ illumination source measurement in projection imaging systems
11/10/2005WO2005106591A1 Exposure pattern forming method
11/10/2005WO2005106590A1 Exposure apparatus
11/10/2005WO2005106589A1 Microlithographic projection exposure apparatus and immersion liquid therefore
11/10/2005WO2005106588A1 Method for enabling transmission of substantially equal amounts of energy
11/10/2005WO2005106587A1 Positive resist composition, method of forming resist pattern, and method of ion implantation
11/10/2005WO2005106585A1 Photosensitive original printing plate for relief printing, method for producing relief printing plate, and light-shielding ink for performing the method
11/10/2005WO2005106385A1 Detector and stage device
11/10/2005WO2005106383A2 Interferometry systems and methods of using interferometry systems
11/10/2005WO2005105873A1 Resin for resist composition, negative resist composition and method for forming resist pattern
11/10/2005WO2005105869A1 Copolymer for semiconductor lithography, method for producing same, and composition
11/10/2005WO2005105662A2 Method for producing two-dimensional periodic structures in a polymeric medium
11/10/2005WO2005105476A1 Security mark for a data carrier, corresponding data carrier and method for the production of a security mark
11/10/2005WO2005104756A2 Composite patterning devices for soft lithography
11/10/2005WO2005104682A2 Non-fluoride containing supercritical fluid composition for removal of ion-implant photoresist
11/10/2005WO2005087693A3 Highly purified liquid perfluoro-n-alkanes and method for preparing
11/10/2005WO2005085955A3 Transmission filter device
11/10/2005WO2005083524A3 Method for aligning the surface of a substrate
11/10/2005WO2005081068A3 Imaging system for a microlithographical projection light system
11/10/2005WO2005072120A3 Materials and methods for imprint lithography
11/10/2005WO2005069081A3 Polarization-modulating optical element
11/10/2005WO2005013008A3 Method for monitoring and controlling imaging in immersion lithography systems
11/10/2005WO2004097520A3 Fiber laser-based euv-lithography
11/10/2005US20050251350 Real time analysis of periodic structures on semiconductors
11/10/2005US20050250924 Radiation transparent at exposure wavelength of activated lasers; dry etching resistance; photoresists sensitive to high energy radiation; mixture with photoacid generator and solvent
11/10/2005US20050250898 solution can be used in immersion lithography; suppressed in swelling and dissolution in water, that is dissolved rapidly in developing solution, and that has been made high in adhesion and glass transition point
11/10/2005US20050250660 Tertiary amine with a cycloalkyl group in the molecule, an alkaline compound, a fluoro compound and an anionic surfactant with two or more anionic functional groups; inhibits corrosion or damage on the copper wiring or the Low-k film, can remove ashed photoresist residues
11/10/2005US20050250276 Superlattice nanopatterning of wires and complex patterns
11/10/2005US20050250244 Method of fabricating a desired pattern of electronically functional material
11/10/2005US20050250227 Method to detect photoresist residue on a semiconductor device
11/10/2005US20050250225 Method and apparatus for forming patterned photoresist layer
11/10/2005US20050250058 Process of exposing the printing plate, processing with a developer solution using an automatic processor with a developing section and a washing section, andwashing the plate with water; the washing water forms the developer solution
11/10/2005US20050250056 Substrate treatment method, substrate treatment apparatus, and method of manufacturing semiconductor device
11/10/2005US20050250055 integrated circuit semiconductors; reflow stabilizing solution comprises a polymer, is applied after the photoresist material has been developed and patterned; provides structural and mechanical support, stable dimensions in the submicron range
11/10/2005US20050250054 Development of photolithographic masks for semiconductors
11/10/2005US20050250053 Selective provision of a diblock copolymer material
11/10/2005US20050250052 Maskless lithography using UV absorbing nano particle
11/10/2005US20050250051 Organometallic composition for forming a metal alloy pattern and a method of forming such a pattern using the composition
11/10/2005US20050250050 Photolithography; thick and thin photoresist layer; using optics
11/10/2005US20050250049 Bi-wavelength optical intensity modulators using materials with saturable absorptions
11/10/2005US20050250045 having alpha-beta unsaturated ester groups and a photoinitiator joined to the polymer by a urethane, amide or urea bond; generates a free radical when exposed to actinic radiation; more water soluble or water dispersible; reduces contamination of articles
11/10/2005US20050250044 liquid photoresist of diluent and polymer having alpha , beta -unsaturation and a group that generates a free radical upon exposure of the photoresist to actinic radiation e.g. urethane acrylates modified with hexaaarylbiimidazole; improved water solubility to reduce contamination
11/10/2005US20050250043 Method of making a photopolymer sleeve blank for flexographic printing
11/10/2005US20050250042 Etherification of 4-hydroxyphenylmethylcarbinol with methanol using an ion exchange resin; and polymerizing the ether in the presence of an acid catalyst
11/10/2005US20050250041 Composition which forms an electrically conductive resist layer and a method for patterning a photoresist using the resist layer
11/10/2005US20050250026 Overlay box structure for measuring process induced line shortening effect
11/10/2005US20050250025 Method and lithographic structure for measuring lengths of lines and spaces
11/10/2005US20050250024 Negative dye-containing curable composition, color filter and method of producing the same
11/10/2005US20050250023 Apparatus used in reshaping a surface of a photoresist
11/10/2005US20050250016 Holographic recording medium, holographic recording method and holographic information medium
11/10/2005US20050248860 High positioning reproducible low torque mirror - actuator interface
11/10/2005US20050248858 Device for holding a beam splitter element
11/10/2005US20050248856 Projection optical system and method for photolithography and exposure apparatus and method using same
11/10/2005US20050248853 Optical projection lens system
11/10/2005US20050248835 Reflective projection lens for EUV-photolithography
11/10/2005US20050248772 Interferometry systems and methods of using interferometry systems
11/10/2005US20050248771 Lithographic interferometer system
11/10/2005US20050248747 System to increase throughput in a dual substrate stage double exposure lithography system
11/10/2005US20050248746 Lithographic apparatus, article support member, and method
11/10/2005US20050248745 Scanning exposure apparatus
11/10/2005US20050248744 Stage device, exposure apparatus, and method of manufacturing devices
11/10/2005US20050248743 Diffuser plate and method of making same
11/10/2005US20050248742 Bearing arrangement for reaction mass in a controlled environment
11/10/2005US20050248741 Method of generating writing pattern, method of forming resist pattern, method of controlling exposure tool, and method of manufacturing semiconductor device
11/10/2005US20050248740 Lithographic apparatus for imaging a front side or a back side of a substrate, method of substrate identification, device manufacturing method, substrate, and computer program
11/10/2005US20050248739 Lithographic apparatus, thermal conditioning system, and method for manufacturing a device
11/10/2005US20050248659 Exposure apparatus, and method, device manufacturing method, pattern generator and maintenance method
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