| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 11/17/2005 | US20050255237 Additive and subtractive correction using direct write nanolithography; fine control over lateral dimensions and height; printing an ink from polymer-coated tip to substrate to form structure on substrate, wherein tip is scanned by position system which provides scanning feedback; biotechnology |
| 11/17/2005 | US20050254773 Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method |
| 11/17/2005 | US20050254541 Semiconductor laser and manufacturing process therefor |
| 11/17/2005 | US20050254404 Manufacturing method of stamper master disc to produce optical recording medium |
| 11/17/2005 | US20050254186 Combination current sensor and relay |
| 11/17/2005 | US20050254154 Method and apparatus for managing actinic intensity transients in a lithography mirror |
| 11/17/2005 | US20050254122 Apparatus for viewing and analyzing ultraviolet beams |
| 11/17/2005 | US20050254120 Optical imaging system, in particular catadioptric reduction objective |
| 11/17/2005 | US20050254068 Measuring instrument and method for operating a measuring instrument for optical inspection of an object |
| 11/17/2005 | US20050254042 Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements |
| 11/17/2005 | US20050254040 Apparatus and process for the determination of static lens field curvature |
| 11/17/2005 | US20050254036 Stage device, exposure apparatus, and device manufacturing method |
| 11/17/2005 | US20050254035 Multi-photon lithography |
| 11/17/2005 | US20050254033 Illuminating optical system, exposure method |
| 11/17/2005 | US20050254031 Immersion photolithography system and method using inverted wafer-projection optics interface |
| 11/17/2005 | US20050254030 Alignment system and method and device manufactured thereby |
| 11/17/2005 | US20050254029 Lithographic apparatus and device manufacturing method |
| 11/17/2005 | US20050254028 Lithographic apparatus and device manufacturing method |
| 11/17/2005 | US20050254026 Exposure apparatus and method |
| 11/17/2005 | US20050254025 Lithographic apparatus and device manufacturing method |
| 11/17/2005 | US20050254024 Lithographic apparatus and device manufacturing method |
| 11/17/2005 | US20050253922 Photolithography method and apparatus |
| 11/17/2005 | US20050253463 Stage apparatus, plane motor, and device manufacturing method |
| 11/17/2005 | US20050253308 Flash curing in selective deposition modeling |
| 11/17/2005 | US20050253307 Method of patterning a conductive layer on a substrate |
| 11/17/2005 | US20050253296 Mould for nano-printing, process for manufacturing such a mould and use of such a mould |
| 11/17/2005 | US20050253215 Method and apparatus for determining chip arrangement position on substrate |
| 11/17/2005 | US20050253119 Sensitivity, resolution, heat resistance, and a wide development latitude; free from elution of the dye; solvent resistance of the pattern; and with high productivity, containing aminopyrazolone skeleton together with a sulfonamide group |
| 11/17/2005 | US20050253092 Radiation source, lithographic apparatus, and device manufacturing method |
| 11/17/2005 | US20050253091 Lithographic apparatus, device manufacturing method and radiation system |
| 11/17/2005 | US20050253090 Apparatus and method for immersion lithography |
| 11/17/2005 | US20050253082 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method |
| 11/17/2005 | US20050252752 Systems and methods for measurement of a specimen with vacuum ultraviolet light |
| 11/17/2005 | US20050252402 Method for operating a developing machine and developing machine |
| 11/17/2005 | DE4344897B4 Verfahren zur Herstellung von Dünnfilmtransistoren Process for the preparation of thin film transistors |
| 11/17/2005 | DE19753276B4 Amid- oder Imid- enthaltendes Copolymer, Herstellungsverfahren für das Copolymer und dieses Copolymer enthaltendes Photoresist Amide or imide-containing copolymer manufacturing method of the copolymer and this copolymer containing photoresist |
| 11/17/2005 | DE10307523B4 Verfahren zur Herstellung einer Resistmaske für die Strukturierung von Halbleitersubstraten A method for preparing a resist mask for the patterning of semiconductor substrates |
| 11/17/2005 | DE102005002410A1 New top anti-reflective coating polymer for use in immersion lithography for fabrication of sub-nanomicron semiconductor device |
| 11/17/2005 | DE102004020983A1 Process for structuring a substrate uses multiple exposure processes of an adjustable optical system to generate a structured image on the substrate |
| 11/17/2005 | DE102004020657A1 Verfahren zum Bilden eines Strukturgrößen-Messwertes A method of forming a structure size measuring value |
| 11/17/2005 | CA2564945A1 Graphic-arts laser imaging with reduced-length laser cavities and improved performance |
| 11/16/2005 | EP1596571A2 Reduction of imaging artifacts in a platesetter having a diffractive modulator. |
| 11/16/2005 | EP1596431A1 Holder for wafers |
| 11/16/2005 | EP1596425A1 Transfer method, exposure method and exposure device, and device manufacturing method |
| 11/16/2005 | EP1596424A1 Exposure apparatus and optical member for exposure apparatus |
| 11/16/2005 | EP1596423A1 Stage device, exposure device, and device manufacturing method |
| 11/16/2005 | EP1596421A2 Lithographic apparatus and device manufacturing method |
| 11/16/2005 | EP1596259A1 Method of manufacture of thin metallic bodies, particularly watch parts |
| 11/16/2005 | EP1596253A1 Process for producing water development printing plate for relief printing |
| 11/16/2005 | EP1596252A1 Lithographic apparatus and device manufacturing method |
| 11/16/2005 | EP1596251A1 Immersion exposure process-use resist protection film forming material, composite film, and resist pattern forming method |
| 11/16/2005 | EP1596250A1 Method of producing photopolymerizable lithographic plate |
| 11/16/2005 | EP1596239A2 Measuring device and method for operating the same for optical inspection of a sample |
| 11/16/2005 | EP1596235A1 Optical device and a microlithography projection exposure system with passive thermal compensation |
| 11/16/2005 | EP1595703A2 Direct imaging polymer fluid jet orifice |
| 11/16/2005 | EP1595697A2 Process using a laser source for generating depressions on printing formes |
| 11/16/2005 | EP1595250A2 System and method for cutting using a variable astigmatic focal beam spot |
| 11/16/2005 | EP1595184A1 Pattern generation method |
| 11/16/2005 | EP1595183A2 Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon |
| 11/16/2005 | EP1595182A2 Halogenated oxime derivatives and the use thereof as latent acids |
| 11/16/2005 | EP1594904A1 Photocurable compositions |
| 11/16/2005 | EP1594683A2 Method for manufacturing of polymer micro needle array with liga process |
| 11/16/2005 | EP1504307A4 Imaging process and products providing durable assemblages |
| 11/16/2005 | EP1502156B1 Method for producing a unit comprising three-dimensional surface structuring and use of said method |
| 11/16/2005 | EP1428245A4 Monolithic three-dimensional structures |
| 11/16/2005 | EP1317337B1 Printing plate |
| 11/16/2005 | EP1285312A4 Method of controlling photoresist stripping process and regenerating photoresist stripper composition based on near infrared spectrometer |
| 11/16/2005 | EP1149328B1 Method and assembly for producing printing plates |
| 11/16/2005 | EP1060498B1 A method and apparatus that determines charged particle beam shape codes in lithography systems |
| 11/16/2005 | EP0990286A4 Very narrow band laser |
| 11/16/2005 | EP0960074B1 Method for determining laser-induced compaction in fused silica |
| 11/16/2005 | EP0954890B1 Excimer laser with greater spectral bandwidth and beam stability |
| 11/16/2005 | CN1698196A In-print method and in-print device |
| 11/16/2005 | CN1698182A Method for manufacturing semiconductor device |
| 11/16/2005 | CN1698181A Method for forming pattern and method for manufacturing semiconductor device |
| 11/16/2005 | CN1698155A Plasma display panel producing method, and plasma display panel |
| 11/16/2005 | CN1698018A Radiation-curing composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide |
| 11/16/2005 | CN1698017A Radiation-curing composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide |
| 11/16/2005 | CN1698016A Chemically amplified positive photo resist composition and method for forming resist pattern |
| 11/16/2005 | CN1698015A Photopolymerizable compositions and flexographic printing plates derived therefrom |
| 11/16/2005 | CN1698011A Lithographic printing with polarized light |
| 11/16/2005 | CN1697858A Photo-curable and thermosetting resin composition |
| 11/16/2005 | CN1697726A Method of decorating surface of mold and mold |
| 11/16/2005 | CN1697271A Semiconductor laser and manufacturing process therefor |
| 11/16/2005 | CN1697151A Method to detect photoresist residue on a semiconductor device |
| 11/16/2005 | CN1697051A Method and apparatus for recycling ultraviolet curing resin, and method for manufacturing optical recording medium using that recycling method |
| 11/16/2005 | CN1696834A Development of photolithographic masks for semiconductors |
| 11/16/2005 | CN1696833A Lithographic apparatus and device manufacturing method |
| 11/16/2005 | CN1696832A Method for monitoring regeneration of photoresist, technique, and sysem for regenerating photoesist |
| 11/16/2005 | CN1696831A Positive resist composition and resist fig. forming method |
| 11/16/2005 | CN1696830A Colored photosensitive resin composition |
| 11/16/2005 | CN1696829A Constituents of photoresistive agent of chemistry increased amplitude |
| 11/16/2005 | CN1696828A Chemically amplified positive resist composition, a haloester derivative and a process for producing the same |
| 11/16/2005 | CN1696827A Radiation sensitive resin composition, gap, its forming method and LCD element |
| 11/16/2005 | CN1696826A Method for forming pattern on substrate by mould board transparent to exciting light and semiconductor apparatus therefor |
| 11/16/2005 | CN1695959A Method of producing photopolymerizable lithographic plate |
| 11/16/2005 | CN1227737C Method and apparatus for personalization of semiconductor |
| 11/16/2005 | CN1227717C Optical device, exposure device and device manufacturing method |
| 11/16/2005 | CN1227716C Photo etch process with multiple dosages and regional exposure |
| 11/16/2005 | CN1227569C Fluorinated polymers, photoresists and processes for microlithography |