| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 11/23/2005 | CN1701067A Thioxanthone derivatives, and their use as cationic photoinitiators |
| 11/23/2005 | CN1700417A Semiconductor device and method for manufacturing the same, liquid crystal television, and EL television |
| 11/23/2005 | CN1700416A Semiconductor manufacturing apparatus and pattern formation method |
| 11/23/2005 | CN1700102A Method for multiple exposure |
| 11/23/2005 | CN1700101A Focusing and leveling sensor for projection photo-etching machine |
| 11/23/2005 | CN1700100A Lithography member and method thereof |
| 11/23/2005 | CN1700099A Shearing interferometer with dynamic pupil fill |
| 11/23/2005 | CN1700098A Lithographic apparatus and device manufacturing method |
| 11/23/2005 | CN1700097A System and method for calculating aerial image of a spatial light modulator |
| 11/23/2005 | CN1700096A Liquid composition for immersion lithography and lithography method using the same |
| 11/23/2005 | CN1700095A Coating composition of positive type photosensitive polyimide |
| 11/23/2005 | CN1700094A Liquid crystal display element random layer optical resistance composition |
| 11/23/2005 | CN1699914A Heterodyne laser interferometer for measuring wafer stage translation |
| 11/23/2005 | CN1699530A Process solutions containing surfactants |
| 11/23/2005 | CN1228815C Liquid film forming method and solid film forming method |
| 11/23/2005 | CN1228809C Charged beam apparatus, pattern testing method and pattern display method |
| 11/23/2005 | CN1228690C Graphic writer |
| 11/23/2005 | CN1228689C Negative light-sensitive lithographic printing plate |
| 11/23/2005 | CN1228688C Photosensitive resin compsn., photosensitive element, prodn. method for resist pattern and prodn. method for printed circuit board |
| 11/23/2005 | CN1228687C Chemical amplification photo resist composition |
| 11/23/2005 | CN1228675C Liquid crystal display equipment array substrate and its making method |
| 11/23/2005 | CN1228657C Film wave-filter for optical multiplying device/demultiplying device and manufacturing method thereof |
| 11/23/2005 | CN1228359C High molecular polymer of chemical amplification type light resistance agent compsn. |
| 11/23/2005 | CN1228189C Original plate of lithographic plate and production method thereof |
| 11/22/2005 | US6968532 Multiple exposure technique to pattern tight contact geometries |
| 11/22/2005 | US6968531 Exposure method utilizing optical proximity corrected exposure patterns, an apparatus for generating optical proximity corrected exposure data, and an exposure apparatus for optical proximity corrected exposure data |
| 11/22/2005 | US6968529 Phase shift mask, and exposure method and device manufacturing method using the same |
| 11/22/2005 | US6968527 Reticle for transferring an integrated circuit layout to a wafer; efficiency |
| 11/22/2005 | US6968288 Method for detection of photolithographic defocus |
| 11/22/2005 | US6968253 Computer-implemented method and carrier medium configured to generate a set of process parameters for a lithography process |
| 11/22/2005 | US6967792 Apparatus for positioning an optical element in a structure |
| 11/22/2005 | US6967756 Lithographic apparatus device manufacturing method and device manufactured thereby |
| 11/22/2005 | US6967719 Illuminating a mask, in which a mask-pattern including mask-patterns of different in shape is formed, from a direction in which a point located off an optical axis of an exposure apparatus is a center of illumination, and exposing and projecting |
| 11/22/2005 | US6967713 Simultaneously coupling a patterning device and a calibration device to a stage; projecting an image; projecting an image formed using the calibration device onto a detector; detecting image and calibrating |
| 11/22/2005 | US6967712 Apparatus and system for improving phase shift mask imaging performance and associated methods |
| 11/22/2005 | US6967711 Lithographic apparatus and device manufacturing method |
| 11/22/2005 | US6967710 Projection exposure apparatus and method |
| 11/22/2005 | US6967709 Exposing a portion of a single wafer to a pattern of a reticle, stepping reticle across one or more remaining portions of single wafer, where each step exposes an other region of wafer to reticle pattern features producing test structures; testing |
| 11/22/2005 | US6967708 Pattern transfer device using PC projector |
| 11/22/2005 | US6967707 Device and method of correcting exposure defects in photolithography |
| 11/22/2005 | US6967706 Exposure apparatus and device manufacturing method including gas purging of a space containing optical components |
| 11/22/2005 | US6967670 Device, method and computer program for transmitting data |
| 11/22/2005 | US6967349 Method for fabricating a multi-level integrated circuit having scatterometry test structures stacked over same footprint area |
| 11/22/2005 | US6967341 Method and device for the generation of far ultraviolet or soft x-ray radiation |
| 11/22/2005 | US6967224 Photocurable using photoinitiator |
| 11/22/2005 | US6967173 Hydrogen plasma photoresist strip and polymeric residue cleanup processs for low dielectric constant materials |
| 11/22/2005 | US6967169 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 11/22/2005 | US6967072 Forming amorphous carbon layer on semiconductor stack; etching |
| 11/22/2005 | US6967068 determining an index of refraction and/or an extinction coefficient of a antireflecting coating, and based on that determining at least one parameter of a stepper exposure process |
| 11/22/2005 | US6967067 coherent radiation is reflected off the reflector surface including information that corresponds to an inverse of the holographic projection of the desired image, to provide a holographic projection of a desired image |
| 11/22/2005 | US6967054 Coating thickness control using surface features |
| 11/22/2005 | US6966997 Methods for patterning polymer films, and use of the methods |
| 11/22/2005 | US6966710 Pattern forming method and apparatus for fabricating semiconductor device |
| 11/22/2005 | US6966560 Device for fixing thin and flexible substrates |
| 11/17/2005 | WO2005109971A2 Atomic beam to protect a reticle |
| 11/17/2005 | WO2005109585A2 Graphic-arts laser imaging with reduced-length laser cavities and improved performance |
| 11/17/2005 | WO2005109476A1 Method for processing substrate and apparatus for processing substrate |
| 11/17/2005 | WO2005109116A1 Hologram recording material and hologram recording medium |
| 11/17/2005 | WO2005109115A1 Hologram recording material and hologram recording medium |
| 11/17/2005 | WO2005109114A1 Holographic recording medium, holographic recording method, and holographic information medium |
| 11/17/2005 | WO2005109108A1 Composition for removing a (photo) resist |
| 11/17/2005 | WO2005109107A1 Composition for removing a (photo)resist |
| 11/17/2005 | WO2005109106A1 Apparatus and process for determination of dynamic lens field curvature |
| 11/17/2005 | WO2005109105A2 Apparatus and process for determination of dynamic scan field curvature |
| 11/17/2005 | WO2005109104A2 Optical component having an improved thermal behavior |
| 11/17/2005 | WO2005109103A1 Photopolymer printing plate precursor. |
| 11/17/2005 | WO2005109102A1 Photoactive monomer, photosensitive polymer and chemically amplified photoresist composition including the same |
| 11/17/2005 | WO2005109101A1 Photocurable compositions and flexographic printing plates comprising the same |
| 11/17/2005 | WO2005109100A1 Radiation-sensitive resin composition, spacer, and method of forming the same |
| 11/17/2005 | WO2005109099A1 Positive photosensitive resin composition, method for forming pattern, and electronic component |
| 11/17/2005 | WO2005109098A1 Pattern forming material, pattern forming apparatus, and pattern forming process |
| 11/17/2005 | WO2005109097A1 Lithographic method products obtained and use of said method |
| 11/17/2005 | WO2005109096A2 Roller chain for applying pressure |
| 11/17/2005 | WO2005109095A2 Method for imprint lithography at constant temperature |
| 11/17/2005 | WO2005108458A1 Curable resin composition, overcoats, and process for formation thereof |
| 11/17/2005 | WO2005108446A1 Fluorine-containing copolymer, method for producing same and resist composition containing same |
| 11/17/2005 | WO2005108444A1 Lactone copolymer and radiation-sensitive resin composition |
| 11/17/2005 | WO2005108343A1 Adamantane derivative, method for producing same and photosensitive material for photoresist |
| 11/17/2005 | WO2005094304A9 Catadioptric imaging system employing immersion liquid for use in broad band microscopy |
| 11/17/2005 | WO2005082097A3 Combined ablation and exposure system and method |
| 11/17/2005 | WO2005066715A3 A low outgassing and non-crosslinking series of polymers for euv negative tone photoresists |
| 11/17/2005 | WO2005065066A3 Method and device for data integrity checking in a spatial light modulator |
| 11/17/2005 | WO2005054950A3 Method for creating a control command for a mask writing device |
| 11/17/2005 | US20050257188 Pattern correcting method, mask making method, method of manufacturing semiconductor device, pattern correction system, and computer-readable recording medium having pattern correction program recorded therein |
| 11/17/2005 | US20050256218 Containing a beta-diketone or a beta -ketoester; for example 3-{4-Acetyl-4-[2-(ethoxycarbonyl)ethyl]-5-oxohexanoyloxy}-2,2-dimethylpropyl ethyl 4,4-diacetylheptane-1,7-dioate; use in photocuring of UV curable ethylenically unsaturated compounds; yields colorless products; nonyellowing |
| 11/17/2005 | US20050255696 Method of processing resist, semiconductor device, and method of producing the same |
| 11/17/2005 | US20050255640 Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidification |
| 11/17/2005 | US20050255624 Positioning apparatus, exposure apparatus, and device manufacturing method |
| 11/17/2005 | US20050255581 Self-organized nanopore arrays with controlled symmetry and order |
| 11/17/2005 | US20050255414 Pattern forming method |
| 11/17/2005 | US20050255413 Forming resist film on substrate, irradiating selectively the resist film with exposure to light with a liquid on resist film, and forming resist pattern by developing film, wherein step of performing pattern exposure includes sub-step of removing a gas included in film; prevents diffraction abnormality |
| 11/17/2005 | US20050255412 applying a photomasking layer on the surfaces of substrates, then illuminating using electromagnetic radiation from a light source a layer of photoresists, aligning a pattern on a reticle and exposing a portion of the layer of photomask to form a second alignment mark on the substrate |
| 11/17/2005 | US20050255411 Multiple exposure and shrink to achieve reduced dimensions |
| 11/17/2005 | US20050255410 Anti-reflective coatings using vinyl ether crosslinkers |
| 11/17/2005 | US20050255409 Photo-curable resin composition, method of patterning the same, and ink jet head and method of fabricating the same |
| 11/17/2005 | US20050255407 Method of producing photopolymerizable lithographic plate |
| 11/17/2005 | US20050255405 Photoresist resin composition |
| 11/17/2005 | US20050255404 Lithographic printing plate precursor |
| 11/17/2005 | US20050255391 Polymerisable diketopyrrolopyrroles, use of such compounds in colour filters and polymers prepared from these compounds |
| 11/17/2005 | US20050255386 Mask for semiconductor (integrated circuits) manufacture composed of a layer with a chemical reaction interface that provides enhanced etch selectivity, especially a tunable, etch-resistant anti-reflective coating material. |