| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 11/24/2005 | WO2005110771A1 System for thermal development of flexographic printing plates |
| 11/24/2005 | WO2005110751A1 Method of making a photopolymer sleeve blank having an integral uv transparent cushion layer for flexographic printing |
| 11/24/2005 | WO2005110699A2 Method of patterning a conductive layer on a substrate |
| 11/24/2005 | WO2005110043A2 Method of making a photopolymer sleeve blank for flexographic printing |
| 11/24/2005 | WO2005085309A3 Method for hardening a photosensitive filler material and hardening device |
| 11/24/2005 | WO2005084092A3 Micrometric direct-write methods for patterning conductive material and applications to flat panel display repair |
| 11/24/2005 | WO2005079304A3 Method and system to measure characteristics of a film disposed on a substrate |
| 11/24/2005 | WO2005064406A3 Projection optical system |
| 11/24/2005 | WO2005062128A3 Immersion lithographic process using a conforming immersion medium |
| 11/24/2005 | WO2005054956A3 Projection optical system |
| 11/24/2005 | WO2005054954A3 Microlithography projection system and device manufacturing method |
| 11/24/2005 | WO2005040932A3 Apparatus and method for aligning surfaces |
| 11/24/2005 | WO2005015314A3 An illumination system for microlithography |
| 11/24/2005 | WO2004111725A3 An intergrated, in-line bumping and exposure system |
| 11/24/2005 | WO2004053594A3 High sensitivity resist compositions for electron-based lithography |
| 11/24/2005 | US20050261458 Polycarboxylic acid resin, polycarboxylic acid resin composition, and cured article obtained therefrom |
| 11/24/2005 | US20050260860 Method of pattering a photoresist film using a lithographic |
| 11/24/2005 | US20050260779 Lithographic apparatus and a device manufacturing method |
| 11/24/2005 | US20050260528 Liquid composition for immersion lithography and lithography method using the same |
| 11/24/2005 | US20050260527 Methods of patterning photoresist |
| 11/24/2005 | US20050260526 Radiation sensitive resin composition, cathode separator and EL display device |
| 11/24/2005 | US20050260525 Resin of an acrylic ester with pendant cyclic or heterocyclic groups and an acid generator; suitable for ArF excimer laser lithography, showing excellent resolution, sensitivity, pattern shape, excellent line edge roughness |
| 11/24/2005 | US20050260524 Planographic printing plate material and preparing process of planographic printing plate |
| 11/24/2005 | US20050260523 Photoresist composition for LCD light diffuse reflecting film |
| 11/24/2005 | US20050260522 Permanent resist composition, cured product thereof, and use thereof |
| 11/24/2005 | US20050260521 Polymer, resist composition and patterning process |
| 11/24/2005 | US20050260520 Heat stable photocurable resin composition for dry film resist |
| 11/24/2005 | US20050260519 Fluorinated (cyclo)paraffin alcohols or ethers with acid labile protecting groups; high ultraviolet transparency |
| 11/24/2005 | US20050260510 Method for determining the relative positional accuracy of two structure elements on a wafer |
| 11/24/2005 | US20050260508 manufacturing of micromechanical devices and micro-optical components such as diffractive, refractive and holographic optics; each aperture includes a plurality segments forming a serrated edge, resulting in mixed edge diffraction; resolution |
| 11/24/2005 | US20050260506 Phase shift mask including a substrate with recess |
| 11/24/2005 | US20050260295 Remote center compliant flexure device |
| 11/24/2005 | US20050259785 Dynamic mask projection stereo micro lithography |
| 11/24/2005 | US20050259701 Helical optical pulse stretcher |
| 11/24/2005 | US20050259327 Multi-axis projection imaging system |
| 11/24/2005 | US20050259324 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems |
| 11/24/2005 | US20050259318 Catadioptric imaging system exhibiting enhanced deep ultraviolet spectral bandwidth |
| 11/24/2005 | US20050259314 Ultraviolet light source, laser treatment apparatus comprising ultraviolet light source, and exposure apparatus comprising ultraviolet light source |
| 11/24/2005 | US20050259303 Long-term high temperature and humidity stable holographic optical data storage media compositions with exceptional high dynamic range |
| 11/24/2005 | US20050259269 Shearing interferometer with dynamic pupil fill |
| 11/24/2005 | US20050259268 Heterodyne laser interferometer for measuring wafer stage translation |
| 11/24/2005 | US20050259257 Position detecting device and position detecting method |
| 11/24/2005 | US20050259238 Image-forming device having a belt type processing member with micro-features |
| 11/24/2005 | US20050259236 Lithographic apparatus and device manufacturing method |
| 11/24/2005 | US20050259235 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory |
| 11/24/2005 | US20050259234 Exposure apparatus and device manufacturing method |
| 11/24/2005 | US20050259233 Lithographic apparatus and device manufacturing method |
| 11/24/2005 | US20050259232 Lithographic apparatus and device manufacturing method |
| 11/24/2005 | US20050258851 Adjusting device and arrangement for adjusting a wafer |
| 11/24/2005 | US20050258768 Method and arrangement for the plasma-based generation of intensive short-wavelength radiation |
| 11/24/2005 | US20050258571 Use of novel micro- and nano-imprinting techniques for making supported three-dimensional micro- and nano-structures for pixel segregation in OLED-based displays; enables assembly of polymers without a glass transition temperature and eliminates heating required to assemble thermoplastic polymers |
| 11/24/2005 | US20050258570 Imprinting of supported and free-standing 3-D micro- or nano-structures |
| 11/24/2005 | US20050258420 Semiconductor device having a gap between a gate electrode and a dummy gate electrode |
| 11/24/2005 | US20050258406 Black resist composition for color filter |
| 11/24/2005 | US20050257709 Systems and methods for three-dimensional lithography and nano-indentation |
| 11/24/2005 | US20050257708 Graphic-arts laser imaging with reduced-length laser cavities and improved performance |
| 11/24/2005 | DE4340725B4 UV-Absorber UV absorber |
| 11/24/2005 | DE102005016785A1 Production of images on recording material, e.g. for production of printing forms, involves selective irradiation of a heat-sensitive layer with laser beams according to the periodicity of the required image spots |
| 11/24/2005 | DE102005015097A1 Production of printing forms for multi-color printing, involves scanning a rotating blank with laser beams from several moving arrays, using a special control system to prevent overlaps and gaps in the pattern |
| 11/24/2005 | DE102004037022A1 Manufacture of liquid crystal display device comprises attaching transfer film onto surface of substrate, transferring portion of transfer material layer to surface, and removing transfer film |
| 11/24/2005 | DE102004037008A1 Flüssigkristalldisplay-Vorrichtung und Verfahren zu deren Herstellung A liquid crystal display device and process for their preparation |
| 11/24/2005 | DE102004021415A1 Verfahren zur Strukturbelichtung einer photoreaktiven Schicht und zugehörige Belichtungsvorrichtung A method for structure exposure of a photoreactive layer and associated exposure apparatus |
| 11/24/2005 | DE102004008241A1 Enzymgestützte Nanolithografie Enzyme-assisted nanolithography |
| 11/24/2005 | DE10131487B4 Negativer Resistprozess mit simultaner Entwicklung und Aromatisierung von Resiststrukturen Negative resist process with simultaneous development and aromatization of resist structures |
| 11/24/2005 | CA2563429A1 Method of making a photopolymer sleeve blank having an integral uv transparent cushion layer for flexographic printing |
| 11/24/2005 | CA2562896A1 Method of making a photopolymer sleeve blank for flexographic printing |
| 11/23/2005 | EP1598858A1 Etching resistant film, process for producing the same, surface cured resist pattern, process for producing the same, semiconductor device and process for producing the same |
| 11/23/2005 | EP1598855A1 Exposure apparatus and method, and method of producing apparatus |
| 11/23/2005 | EP1598853A1 Adjustment apparatus for wafers |
| 11/23/2005 | EP1598706A1 Lithographic appartus and device manufacturing method |
| 11/23/2005 | EP1598705A1 Lithographic apparatus and device manufacturing method |
| 11/23/2005 | EP1598704A2 Pattern forming method |
| 11/23/2005 | EP1598703A1 Acrylic polymer-containing gap filler forming composition for lithography |
| 11/23/2005 | EP1598702A1 Coating compositions for use with an overcoated photoresist |
| 11/23/2005 | EP1598701A1 Photoresist composition and method of forming resist pattern |
| 11/23/2005 | EP1598700A1 Applicability improver for photosensitive resin composition and photosensitive resin composition containing the same |
| 11/23/2005 | EP1598699A2 Data storage medium comprising colloidal metal and preparation process thereof |
| 11/23/2005 | EP1598648A2 Shearing interferometer with dynamic pupil fill |
| 11/23/2005 | EP1598398A1 Curable composition |
| 11/23/2005 | EP1597631A1 Multiple exposure method for circuit performance improvement |
| 11/23/2005 | EP1597630A1 Slm direct writer |
| 11/23/2005 | EP1597629A2 Method of controlling the differential dissolution rate of photoresist compositions |
| 11/23/2005 | EP1597628A1 Colored stereolithographic resins |
| 11/23/2005 | EP1597627A2 Dissolution rate modifiers for photoresist compositions |
| 11/23/2005 | EP1597410A1 Fabrication method and apparatus |
| 11/23/2005 | EP1597287A2 Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof |
| 11/23/2005 | EP1597069A2 Nanometer-controlled polymeric thin films that resist adsorption of biological molecules and cells |
| 11/23/2005 | EP1407521A4 Line narrowing unit with flexural grating mount |
| 11/23/2005 | EP1330860A4 Anode with porous insulating layer for discharge lasers |
| 11/23/2005 | EP1315996A4 A method of illuminating a photomask using chevron illumination |
| 11/23/2005 | EP1222233B1 A method for synthesizing polymeric azo dyes |
| 11/23/2005 | EP1166182B1 Method for producing a pattern suitable for forming sub-micron width metal lines |
| 11/23/2005 | EP1141779B1 Method for depositing photoresist onto a substrate |
| 11/23/2005 | EP1023635A4 Multi-level conductive matrix formation method |
| 11/23/2005 | CN2742470Y Submerged light etching system |
| 11/23/2005 | CN2742469Y Liquid state photosensitive resin bag for non-precoated printing plate making |
| 11/23/2005 | CN1701419A Etching resistant film, process for producing the same, surface cured resist pattern, process for producing the same, semiconductor device and process for producing the same |
| 11/23/2005 | CN1701414A Method for removing photoresist in semiconductor manufacturing process |
| 11/23/2005 | CN1701280A Chemically amplified positive photo resist composition and method for forming resist pattern |
| 11/23/2005 | CN1701279A Method of enhancing clear field phase shift masks by adding parallel line to phase 0 region |