Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2005
12/01/2005US20050263021 Platemaking method for lithographic printing plate precursor and planographic printing method
12/01/2005US20050262685 Method of processing vertical cross-section using atomic force microscope
12/01/2005DE19818840B4 Ladungsteilchenstrahlbelichtungsverfahren und Ladungsteilchenstrahlbelichtungsvorrichtung A charged and charged particle
12/01/2005DE10346124B4 Werkzeug und Verfahren zum Erzeugen einer mikrostrukturierten Oberfläche und Verwendung eines Werkzeuges sowie damit erzeugter Gegenstand Tool and method for generating a microstructured surface, and using a tool and thus generated object
12/01/2005DE102004022596A1 Process to detect positional errors in photolithographic projections in semiconductor wafers with circuit patterns uses overlay measuring apparatus and projection simulation
12/01/2005DE102004022087A1 Verfahren und Vorrichtung zur Herstellung von Druckformen Method and apparatus for production of printing plates
12/01/2005DE10121178B4 Experimentelles Verfahren zur Verifikation von Abbildungsfehlern bei Fotomasken Experimental procedure for the verification of aberrations in photomasks
11/2005
11/30/2005EP1601008A1 Immersion liquid for immersion exposure process and resist pattern forming method using such immersion liquid
11/30/2005EP1601007A1 Inline connection setting method and device and substrate processing device and substrate processing system
11/30/2005EP1600820A1 Method for processing light sensitive planographic printing plate material
11/30/2005EP1600819A1 Lithographic apparatus having a gas flushing device
11/30/2005EP1600818A1 Lithographic apparatus and device manufacturing method
11/30/2005EP1600817A1 Pattern generator mirror configurations
11/30/2005EP1600816A2 Apparatus for providing a pattern of polarization
11/30/2005EP1600815A2 Semiconductor manufacturing apparatus and pattern formation method
11/30/2005EP1600814A2 Coating compositions for use with an overcoated photoresist
11/30/2005EP1600813A1 Resist material for liquid immersion exposure process and method of forming resist pattern with the resist material
11/30/2005EP1600812A1 Photosensitive resin composition and curing product thereof
11/30/2005EP1600811A1 Modified metal molds for use in imprinting processes
11/30/2005EP1600473A2 Modified pigment products and black matrixes comprising same
11/30/2005EP1600437A1 Acid generators, sulfonic acids, sulfonyl halides, and radiation-sensitive resin compositions
11/30/2005EP1599764A2 Method for producing resist substrates
11/30/2005EP1599763A2 Method for producing an exposed substrate
11/30/2005EP1599762A2 Optical lithography using both photomask surfaces
11/30/2005EP1373982B1 Method for adjusting the overlay of two masking levels in a photolithographic process
11/30/2005EP1350141B1 Illumination system with vacuum chamber wall having a transparent structure
11/30/2005EP1166180B1 Semiconductor wafer processing system with vertically-stacked process chambers and single-axis dual-wafer transfer system
11/30/2005EP1060500B1 An apparatus and method for controlling a beam shape in lithographiy systems
11/30/2005CN1703656A Exposure method and apparatus
11/30/2005CN1703609A Laser interferometer for repeatable mounting on the wall of a vacuum chamber
11/30/2005CN1703474A Liquid-repellent, alkali-resistant coating composition and coating suitable for pattern forming
11/30/2005CN1703286A Nanostructured and nanoporous film compositions, structures, and methods for making the same
11/30/2005CN1703137A Exposure unit
11/30/2005CN1702837A Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus
11/30/2005CN1702835A Imprinting method, information recording medium-manufacturing method, and imprinting apparatus
11/30/2005CN1702562A Image recording apparatus, notch forming apparatus, and method for use therewith
11/30/2005CN1702561A Apparatus for processing substrate and method of processing the same
11/30/2005CN1702560A Diluent composition for removing light sensitive resin
11/30/2005CN1702559A Lithographic apparatus and device manufacturing method
11/30/2005CN1702558A Lithographic apparatus and device manufacturing method
11/30/2005CN1702557A Exposure device, exposure method, and exposure treating programme
11/30/2005CN1702556A Exposure device
11/30/2005CN1702555A Lithographic apparatus and device manufacturing method
11/30/2005CN1702554A Light sensitive resin composition
11/30/2005CN1702553A Light sensitive composition
11/30/2005CN1702552A Resist material and pattern formation method
11/30/2005CN1702551A Resist material and pattern formation method
11/30/2005CN1702550A Resist material and pattern formation method
11/30/2005CN1702549A Pattern data manufacturing method, pattern checking method and application thereof
11/30/2005CN1702492A Apparatus for providing a pattern of polarization
11/30/2005CN1701956A Recording head checking method for platemaking
11/30/2005CN1229839C Composite material used for mfg. isolation sheet of thin layer display panel
11/30/2005CN1229694C Exposure system
11/30/2005CN1229693C Chemical enhancement right photoetching rubber composite and sulfonium salt
11/30/2005CN1229692C Photo-corrosion-resisting agent composition
11/30/2005CN1229691C Photopolymer holographic memory materials comprising high refractive index epoxy and low refractive index olefine monomer and manufacturing method thereof
11/30/2005CN1229690C Positive photo slushing compound compsn. for mfg. LCD, and forming method of slushing pattern
11/30/2005CN1229674C Declining lug structure on surface of reflector and its mfg. method
11/30/2005CN1229237C Thermal transfer of crosslinked materials
11/29/2005USRE38900 Automating photolithography in the fabrication of integrated circuits
11/29/2005US6970292 Beam shaping element for use in a lithographic system
11/29/2005US6970291 Projection aligner, aberration estimating mask pattern, aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing method
11/29/2005US6970244 Scan exposure apparatus and method, and device manufacturing method
11/29/2005US6970233 System and method for custom-polarized photolithography illumination
11/29/2005US6970232 Structures and methods for reducing aberration in integrated circuit fabrication systems
11/29/2005US6970231 Exposure apparatus and exposure method
11/29/2005US6970230 Lithographic apparatus and device manufacturing method
11/29/2005US6970228 Exposure method and system
11/29/2005US6969966 Electromagnetic alignment and scanning apparatus
11/29/2005US6969864 System and method for lithography process monitoring and control
11/29/2005US6969863 Arrangement for feeding or dissipating heat to/from a semiconductor substrate for the purpose of preparing or post-processing a lithographic projection step
11/29/2005US6969862 Charged-particle-beam exposure apparatus and method of controlling same
11/29/2005US6969853 Pattern width measuring apparatus, pattern width measuring method, and electron beam exposure apparatus
11/29/2005US6969837 System and method for lithography process monitoring and control
11/29/2005US6969753 Siloxane polymer and an incorporatable organic absorbing compound that strongly absorbs light over > a 10 nm wide wavelength range at < 375 nm; photolithography
11/29/2005US6969733 Photoinitiators
11/29/2005US6969690 Methods and apparatus for patterned deposition of nanostructure-containing materials by self-assembly and related articles
11/29/2005US6969579 top layer containing a co-polymer of an unsaturated compound containing an imide group and a comonomer selected from an acryl imides, acrylonitriles, acryalmides and acrylic acids; chemical resistance printing plate
11/29/2005US6969578 Optical recording material
11/29/2005US6969577 Adaptable for exposure to far ultraviolet radiation using ArF and KrF as light sources in the of manufacturing semiconductor devices and has various performance, resolution, mask linearity of CD, scum free, reduced thinning of resist film
11/29/2005US6969576 Photosensitive dissolution inhibitors and resists based on onium salt carboxylates
11/29/2005US6969572 Developing method and apparatus
11/29/2005US6969571 Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same
11/29/2005US6969570 top layer containing a co-polymer of norbornene or a norbornene derivative and a monomer selected from maleic anhydride, maleimide, N-phenyl maleimide, N-benzyl maleimide, N-cyclohexyl maleimide, and mixtures; chemical resistant printing plate
11/29/2005US6969569 Method of extending the stability of a photoresist during direct writing of an image
11/29/2005US6969538 controlling the substrate temperature after coating the resist film,in baking steps, to maintain the substrate temperature uniform when the temperature of the substrate reaches the reaction temperature, leads to uniform coating
11/29/2005US6969502 Method and device for growing large-volume oriented monocrystals
11/29/2005US6968850 Introducing a first etchant into a light source chamber, ionizing the etchant and removing debris by reacting the ionized etchant with the debris
11/29/2005CA2413726C Absorbing compounds for spin-on glass anti-reflective coatings for photolithography
11/24/2005WO2005112077A1 Development apparatus and development method
11/24/2005WO2005111727A1 Method of making a photopolymer printing plate
11/24/2005WO2005111726A2 A vibration damper or isolator
11/24/2005WO2005111725A1 Method of making a photopolymer sleeve blank having an integral cushion layer for flexographic printing
11/24/2005WO2005111724A1 Antireflective film-forming composition containing vinyl ether compound
11/24/2005WO2005111723A1 Method for preparing photosensitive aqueous developable coating compositions
11/24/2005WO2005111722A2 Apparatus and method for providing fluid for immersion lithography
11/24/2005WO2005111719A2 Anti-reflective coatings using vinyl ether crosslinkers
11/24/2005WO2005111717A2 Image recording method
11/24/2005WO2005111689A2 Catadioptric projection objective with intermediate images
11/24/2005WO2005111674A1 Black resist composition for color filter
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