Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2005
12/06/2005US6972420 Atomic beam to protect a reticle
12/06/2005US6972419 Extreme ultraviolet radiation imaging
12/06/2005US6972417 Apparatus and methods for patterning a reticle blank by electron-beam inscription with reduced exposure of the reticle blank by backscattered electrons
12/06/2005US6972201 Using scatterometry to detect and control undercut for ARC with developable BARCs
12/06/2005US6972167 lithographic printing plates comprising supports having layers containing polymers insoluble in water and soluble in alkaline solution, and a second layer containing light or heat curable polymers; sensitivity; image quality
12/06/2005US6972165 Electron beam exposure mask and electron beam exposure method using the same
12/06/2005US6971429 Conveyorized vacuum applicator and method of applying a dry film resist to a printed circuit board
12/06/2005CA2239488C Process for the homogenisation of fillers in the stereolithographic preparation of three-dimensional objects
12/06/2005CA2213886C Molecular complex compounds comprising a mono-, bis- or trisacylphosphine oxide with an .alpha.-hydroxy ketone as photoinitiators
12/01/2005WO2005114711A1 Liquid for immersion exposure and immersion exposure method
12/01/2005WO2005114673A1 Scanning probe microscope probe with integrated capillary channel
12/01/2005WO2005114332A1 Electronic beam recording board
12/01/2005WO2005114331A1 Resist compound and resist composition
12/01/2005WO2005114330A2 Image device with belt type processing member
12/01/2005WO2005114329A2 Fabrication of polymeric structures
12/01/2005WO2005114328A2 Quartz glass blank and method for producing said blank
12/01/2005WO2005113634A1 Derivatized polyhydroxystyrenes with a novolak type structure and processes for preparing the same
12/01/2005WO2005113617A1 (meth)acrylate, polymer and resist composition
12/01/2005WO2005113422A1 Imprinting of supported and free-standing 3-d micro-or nano-structures
12/01/2005WO2005113142A1 Photocatalytically active thin film
12/01/2005WO2005083511A3 System for reducing the coherence of laser radiation
12/01/2005WO2005070989A3 Thermally stable cationic photocurable compositions
12/01/2005WO2005057671A3 Irradiation systems
12/01/2005WO2005057290A3 Sensor for lithographic apparatus and method of obtaining measurements
12/01/2005WO2005045530A3 Lithography apparatus with extreme ultraviolet light source
12/01/2005WO2005022257A3 Novel photosensitive bilayer composition
12/01/2005WO2005010617A3 Method of cleaning a surface of an optical device
12/01/2005WO2005001901A3 Wet developable hard mask in conjunction with thin photoresist for micro photolithography
12/01/2005WO2004092833A3 Environmental system including a transport region for an immersion lithography apparatus
12/01/2005US20050267609 Lithographic motion control system and method
12/01/2005US20050267277 Composition for forming anti-reflective coating film, anti-reflective coating film composed of the composition, and method of forming resist pattern using the composition
12/01/2005US20050267275 A fluorinated vinyl sulfonate-polyalkenamer-acrylic acid or ester terpolymer with excellent transparency, substrate adhesion, developer penetrability, and plasma etch resistance; lithographic microprocessing; photoresists
12/01/2005US20050266781 Holder for wafers
12/01/2005US20050266693 Method for manufacturing semiconductor device
12/01/2005US20050266683 Remover compositions for dual damascene system
12/01/2005US20050266587 Substrate support method
12/01/2005US20050266359 Developing method and developing unit
12/01/2005US20050266358 Photosensitivity; flexography
12/01/2005US20050266357 Method for enhancing wafer alignment marks
12/01/2005US20050266356 lower and upper photoresists; selectively implanting silicon ions in upper photoresist pattern to form a silylated layer only in upper portions of upper photoresist; simultaneously oxidizing silylated layer in an oxygen plasma and anisotropically ashing lower photoresist; etching lower; photolithography
12/01/2005US20050266355 Method of manufacturing semiconductor device
12/01/2005US20050266354 Top layer over the photoresist layer containing a copolymer of fluorosulfonamide monomer unit having a polymerzable unsaturated ester, ketone, vinyl ester goups; imaging, developing, patterning, transferring patterned layer to the material layer
12/01/2005US20050266353 Applying the resist layer to the base layer in the solid state, selectivly irradiating it, and developing; adhesive force of the adhesive in the resist decreases or increases during irradiation; residues of the resist layer may be stripped
12/01/2005US20050266352 Metallic pattern forming method and conductive pattern material
12/01/2005US20050266351 a copolymer of an adamantanecarbonyloxyalkyl acrylic acid ester and a 2-furanone ester of acrylc acid; acid generator is triphenylsulfonium 1-(3-hydroxymethyl-adamantane)methoxycarbonyldifluoromethanesulfonate or triphenylsulfonium 4-oxo-1-adamantyloxycarbonyldifluoromethanesulfonate;
12/01/2005US20050266350 Method of processing light sensitive planographic printing plate material
12/01/2005US20050266349 Method of making a photopolymer printing plate
12/01/2005US20050266346 Method for forming photoresist pattern and photoresist laminate
12/01/2005US20050266344 comprising: a siloxane resin, photoacid generator or photobase generator, and a solvent capable of dissolving component and curing acceleration catalyst
12/01/2005US20050266343 Photoresist composition and method of forming same
12/01/2005US20050266342 Photoresist composition and method of forming a pattern using same
12/01/2005US20050266341 Photosensitive resin composition and LCD using the same
12/01/2005US20050266340 Positive resist composition and compound used therein
12/01/2005US20050266339 Photoresist composition for organic layer of liquid crystal display, spin-less coating method thereof, fabrication method of organic layer pattern and liquid crystal display fabricated using the same
12/01/2005US20050266338 Resist material and pattern formation method
12/01/2005US20050266337 Resist material and pattern formation method
12/01/2005US20050266336 Photosensitive composition and pattern-forming method using the photosensitive composition
12/01/2005US20050266335 Negative photoresist mixture of epoxidized polyfunctional bisphenol A formaldehyde novolak resin, polycaprolactone polyol reactive diluent, photoacid generator, and 2-pentanone that may be mixed with 1,3-dioxolane; components for microelectromechanical systems, micromachines, and microfluidics
12/01/2005US20050266334 Mixture of alkali soluble resin, quinonediazide compound and alcohol
12/01/2005US20050266323 Conveying the substrate to an exposing position of a lithographic apparatus, exposing the substrate at the exposing position to a beam of radiation, conveying the exposed substrate from the exposing position toward a processing position
12/01/2005US20050266321 Mask for proximity field optical exposure, exposure apparatus and method therefor
12/01/2005US20050266318 Reticle manufacturing method
12/01/2005US20050265685 Optical material containing photocurable fluoropolymer and photocurable fluororesin composition
12/01/2005US20050264885 Apparatus for providing a pattern of polarization
12/01/2005US20050264884 Projection objective for microlithography
12/01/2005US20050264856 Cylindrical outer surface scanning apparatus and method for use therewith
12/01/2005US20050264827 Interferometric measuring device and projection exposure installation comprising such measuring device
12/01/2005US20050264819 Device for the range-resolved determination of scattered light, operating method, illumination mask and image-field mask
12/01/2005US20050264791 Wafer handling method for use in lithography patterning
12/01/2005US20050264790 Lithographic apparatus and device manufacturing method
12/01/2005US20050264789 Exposure system and exposure method
12/01/2005US20050264788 Lithography apparatus and pattern forming method using the same
12/01/2005US20050264787 Projection lens for a microlithographic projection exposure apparatus
12/01/2005US20050264786 Projection lens and microlithographic projection exposure apparatus
12/01/2005US20050264785 Compact pulse stretcher
12/01/2005US20050264784 Lithographic apparatus and device manufacturing method
12/01/2005US20050264783 In-situ interferometer arrangement
12/01/2005US20050264782 System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions
12/01/2005US20050264781 Position detection method and apparatus
12/01/2005US20050264780 Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus
12/01/2005US20050264779 Assembly and adjusting method of optical system, exposure apparatus having the optical system
12/01/2005US20050264778 Lithographic apparatus and device manufacturing method
12/01/2005US20050264777 High speed lithography machine and method
12/01/2005US20050264775 Lithographic apparatus, device manufacturing method and radiation system
12/01/2005US20050264774 Exposure apparatus and method for producing device
12/01/2005US20050264773 Lithographic apparatus having a gas flushing device
12/01/2005US20050264710 Method and apparatus for fabricating flat panel display
12/01/2005US20050264134 Adaptive shape substrate support system
12/01/2005US20050264132 Apparatus to control displacement of a body spaced-apart from a surface
12/01/2005US20050263915 Imprinting method, information recording medium-manufacturing method, and imprinting apparatus
12/01/2005US20050263743 Etching with organic ammonium compound and/or oxoammonium compound, water, and solvent
12/01/2005US20050263725 Source multiplexing in lithography
12/01/2005US20050263724 Source multiplexing in lithography
12/01/2005US20050263723 Source multiplexing in lithography
12/01/2005US20050263722 Method for reducing proximity effects in electron beam lithography
12/01/2005US20050263720 Method and apparatus for recycling gases used in a lithography tool
12/01/2005US20050263249 Substrate support system
12/01/2005US20050263077 Adaptive shape substrate support method
12/01/2005US20050263068 Lithographic apparatus
12/01/2005US20050263025 Micro-contact printing method
1 ... 616 617 618 619 620 621 622 623 624 625 626 627 628 629 630 631 632 633 634 635 636 ... 1272