| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/14/2005 | EP1410416B1 Slit lens arrangement for particle beams |
| 12/14/2005 | EP1230276B1 Photoinitiator formulations |
| 12/14/2005 | EP1070345B1 Organic removal process |
| 12/14/2005 | CN2746425Y Infiltration photoetching system |
| 12/14/2005 | CN1708729A Electron beam exposure method and electron beam exposure system |
| 12/14/2005 | CN1708728A Radiation-sensitive resin composition |
| 12/14/2005 | CN1708727A Lithographic method for forming mold inserts and molds |
| 12/14/2005 | CN1708488A Improvement in the storage stability of photoinitiators |
| 12/14/2005 | CN1708362A Supercritical carbon dioxide/chemical formulation for removal of photoresists |
| 12/14/2005 | CN1707757A Semiconductor manufacturing apparatus and pattern formation method |
| 12/14/2005 | CN1707735A Plasma display device |
| 12/14/2005 | CN1707364A Lithographic apparatus and device manufacturing method |
| 12/14/2005 | CN1707363A Radiation system, lithographic apparatus, device manufacturing method and device manufactured thereby |
| 12/14/2005 | CN1707362A Method of manufacturing a semiconductor device |
| 12/14/2005 | CN1707361A Exposure system and pattern formation method |
| 12/14/2005 | CN1707360A Thin film coating device, thin film coating method, immersion exposure device, and immersion exposure method |
| 12/14/2005 | CN1707359A Photosensitive paste composition, PDP electrode prepared therefrom, and PDP comprising the PDP electrode |
| 12/14/2005 | CN1707358A Photosensitive resin composition |
| 12/14/2005 | CN1707156A Protective cover for a lamp, set including a lamp and a protective cover, method of installing a source in a lithographic apparatus |
| 12/14/2005 | CN1232010C High power gas discharge laser with helium purged line narrowing unit |
| 12/14/2005 | CN1231816C Photoresist compositions |
| 12/14/2005 | CN1231815C Ultraviolet-curing resin composition and photo solder resist ink containing the same |
| 12/14/2005 | CN1231797C Manufacture of light-conducting board mold |
| 12/14/2005 | CN1231503C Compound and preparing process thereof, anti-reflecting paint compsns. and its application |
| 12/14/2005 | CN1231362C Support for lithographic plate |
| 12/14/2005 | CN1231299C Coating apparatus and special spreading connecting elements used for the same coating apparatus |
| 12/13/2005 | US6975974 Overlay error model, sampling strategy and associated equipment for implementation |
| 12/13/2005 | US6975497 Method for reducing particles from an electrostatic chuck and an equipment for manufacturing a semiconductor |
| 12/13/2005 | US6975443 Multi-beam pattern generator |
| 12/13/2005 | US6975409 Illumination device; and coordinate measuring instrument having an illumination device |
| 12/13/2005 | US6975398 Method for determining semiconductor overlay on groundrule devices |
| 12/13/2005 | US6975387 Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparatus, and method for manufacturing micro device |
| 12/13/2005 | US6975385 Projection optical system and exposure apparatus |
| 12/13/2005 | US6975384 Exposure apparatus and method |
| 12/13/2005 | US6975383 Stage alignment apparatus and its control method, exposure apparatus, and semiconductor device manufacturing method |
| 12/13/2005 | US6975375 Semipermeable liquid crystal display device and manufacturing method thereof |
| 12/13/2005 | US6974963 Substrate inspecting device, coating/developing device and substrate inspecting method |
| 12/13/2005 | US6974960 Exposure system and exposure method |
| 12/13/2005 | US6974782 Reticle tracking and cleaning |
| 12/13/2005 | US6974766 In situ deposition of a low κ dielectric layer, barrier layer, etch stop, and anti-reflective coating for damascene application |
| 12/13/2005 | US6974658 Used in manufacturing a semiconductor device |
| 12/13/2005 | US6974657 Compositions for microlithography |
| 12/13/2005 | US6974656 Paste filled with metal powder and metal products obtained with same |
| 12/13/2005 | US6974655 A chemically amplified photo-resist includes a polymer containing acid-labile radicals attached to a polar group and also contains anchor groups that allow attachment of a consolidating agent. The polymer includes first repeating |
| 12/13/2005 | US6974653 Methods for critical dimension and focus mapping using critical dimension test marks |
| 12/13/2005 | US6974600 Changing fluid photosensitive material into a photosensitive material having a band form, having length longer than width, applying such material to the first surface to stabilize photosensitive material |
| 12/08/2005 | WO2005117075A1 Correcting method, predicting method, exposuring method, reflectance correcting method, reflectance measuring method, exposure apparatus, and device manufacturing method |
| 12/08/2005 | WO2005117074A1 Immersion liquid for immersion exposure process and method for forming resist pattern using such immersion liquid |
| 12/08/2005 | WO2005116776A1 Resin composition for forming fine pattern and method for forming fine pattern |
| 12/08/2005 | WO2005116775A1 Pattern forming method, color filter manufacturing method, color filter, and liquid crystal display |
| 12/08/2005 | WO2005116774A1 Pattern formation method |
| 12/08/2005 | WO2005116773A1 Optical module for a lens |
| 12/08/2005 | WO2005116772A1 Apparatus for providing a pattern of polarization |
| 12/08/2005 | WO2005116771A2 Wavelength selector for the soft x-ray range and the extreme ultraviolet range |
| 12/08/2005 | WO2005116770A1 Photosensitive polyimide precursor composition |
| 12/08/2005 | WO2005116769A1 Positive resist composition and method for forming resist pattern |
| 12/08/2005 | WO2005116768A1 Positive resist compositions and process for the formation of resist patterns with the same |
| 12/08/2005 | WO2005116767A1 Positive photosensitive composition |
| 12/08/2005 | WO2005116766A1 Negative photosensitive composition and negative photosensitive lithography plate |
| 12/08/2005 | WO2005116765A1 Photosensitive resin composition and lcd using the same |
| 12/08/2005 | WO2005116764A1 Positive photosensitive resin composition, and interlayer dielectrics and micro lenses made therefrom |
| 12/08/2005 | WO2005116763A1 Method of forming graft pattern, graft pattern material, method of lithography, method of forming conductive pattern, conductive pattern, process for producing color filter, color filter and process for producing microlens |
| 12/08/2005 | WO2005116762A1 Resist composition and method for forming resist pattern |
| 12/08/2005 | WO2005116761A2 Uv radiation blocking protective layers compatible with thick film pastes |
| 12/08/2005 | WO2005116760A2 Photosensitive resin composition, and cured product and use thereof |
| 12/08/2005 | WO2005116751A1 Wavelength converting optical system, laser light source, exposure apparatus, mask examining apparatus, and macromolecular crystal lens machining device |
| 12/08/2005 | WO2005116577A1 Method of adjusting imaging optical system, imaging device, positional deviation detecting device, mark identifying device and edge position detectinc device |
| 12/08/2005 | WO2005116103A1 Radiation curable liquid resin composition for optical three-dimensional molding and optical molded article obtained by photocuring same |
| 12/08/2005 | WO2005097501A3 System for and method of manufacturing gravure printing plates |
| 12/08/2005 | WO2005089944A3 Microfluidic chip |
| 12/08/2005 | WO2005089369A3 Apparatus for imaging using an array of lenses |
| 12/08/2005 | WO2005081372A3 Laser multiplexing |
| 12/08/2005 | WO2005069080A3 Device and method for the optical measurement of an optical system, measurement structure support, and microlithographic projection exposure apparatus |
| 12/08/2005 | WO2005067008A3 Method and system for coating polymer solution on a substrate in a solvent saturated chamber |
| 12/08/2005 | WO2005040927A3 Device and method for illumination dose adjustments in microlithography |
| 12/08/2005 | WO2005038822A3 Plasma source of directed beams and application thereof to microlithography |
| 12/08/2005 | WO2005022204A3 Catadioptric imaging system for broad band microscopy |
| 12/08/2005 | WO2005001578A3 Developer composition for resists and method for formation of resist pattern |
| 12/08/2005 | US20050273754 Pattern data correction method, pattern checking method, pattern check program, photo mask producing method, and semiconductor device manufacturing method |
| 12/08/2005 | US20050273753 Method and system for designing manufacturable patterns that account for the pattern- and position-dependent nature of patterning processes |
| 12/08/2005 | US20050272907 Solvent-soluble block copolymide composition and process for producing the same |
| 12/08/2005 | US20050272885 Surface and site-specific polymerization by direct-write lithography |
| 12/08/2005 | US20050272621 Composition and method for removing copper-compatible resist |
| 12/08/2005 | US20050272599 Mold release layer |
| 12/08/2005 | US20050271984 Textured chamber surface |
| 12/08/2005 | US20050271982 Unbaked laminate for producing front plate of plasma display device, and method for producing front plate of plasma display device |
| 12/08/2005 | US20050271981 Exposing to an infrared laser a lithographic printing precursor having a photosensitive-thermosensitive layer containing an infrared absorbent and a discoloring material that undergoes color change upon exposure; developable on a printing press; good visibility |
| 12/08/2005 | US20050271980 positive-working, aqueous base developable photosensitive polybenzoxazole (PBO) precursors which are a mixture of polyamides where on one, the hydroxyl groups of the dihydroxydiamine monomer unit are sulfonated with a quinonediazide, a photosensitive agent, and solvent; electronics, relief images |
| 12/08/2005 | US20050271979 Photosensitive paste composition, PDP electrode prepared therefrom, and PDP comprising the PDP electrode |
| 12/08/2005 | US20050271978 Resist polymer, making method, and chemically amplified positive resist composition |
| 12/08/2005 | US20050271977 Photosensitive polymer and chemically amplified photoresist composition including the same |
| 12/08/2005 | US20050271976 Lithographic printing plate precursor and lithographic printing method |
| 12/08/2005 | US20050271974 Photoactive compounds |
| 12/08/2005 | US20050271973 Negative acting photoresist with improved blocking resistance |
| 12/08/2005 | US20050271972 Alkali soluble novolak resin; alkali soluble acrylic resin have units from a hydroxyalkyl methacrylate, an alkyl methacrylate and optionally styrene; an acetal compound; and an acid generator; suitable for forming a thick film for a magnetic pole on a magnetic head and a bump |
| 12/08/2005 | US20050271971 Photoresist base material, method for purification thereof, and photoresist compositions |
| 12/08/2005 | US20050271957 Evaluation method and fabrication method of optical element having multilayer film, exposure apparatus having the multilayer film, and device fabrication method |
| 12/08/2005 | US20050271956 Administering drug aerosol in fluid propellant carrier using a pressurized metered dose inhaler, taking into consideration inspiratory flow rate and volume; diabetes, immune deficiency, asthma, and/or pain treatment |
| 12/08/2005 | US20050271955 System and method for improvement of alignment and overlay for microlithography |
| 12/08/2005 | US20050271954 Alignment mark, alignment apparatus and method, exposure apparatus, and device manufacturing method |