Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2005
12/15/2005WO2005119369A1 Projection system with compensation of intensity variatons and compensation element therefor
12/15/2005WO2005119368A2 System for measuring the image quality of an optical imaging system
12/15/2005WO2005119367A1 Water-repellent composition, water-repellent thin film, and thin film with water-repellent/hydrophilic pattern
12/15/2005WO2005119366A2 Method for pre-exposing relief image printing plate
12/15/2005WO2005119365A2 A high-efficiency spectral purity filter for euv lithography
12/15/2005WO2005119364A2 Photoimageable coating composition and composite article thereof
12/15/2005WO2005119363A2 Assembly for supporting a workpiece or specimen in a charged particle beam system
12/15/2005WO2005119362A2 Laser interferometer mirror assembly
12/15/2005WO2005119361A2 Apparatus for blanking a charged particle beam
12/15/2005WO2005119360A1 Modified metal mold for use in imprinting processes
12/15/2005WO2005118914A2 Substrate support system and method
12/15/2005WO2005118656A2 Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers
12/15/2005WO2005118212A1 Solder mask enhancement and method of inspecting printed circuit board assemblies
12/15/2005WO2005091796A3 Method and system for treating a hard mask to improve etch characteristics
12/15/2005WO2005074499B1 Processless digitally imaged photopolymer elements using microspheres
12/15/2005WO2005059647A3 Real time image resizing for dynamic digital photolithography
12/15/2005WO2005040918A3 Low-activation energy silicon-containing resist system
12/15/2005WO2003031136A3 Methods for patterning using liquid embossing
12/15/2005US20050278685 Matrix optical process correction
12/15/2005US20050278056 Machine vision systems for use with programmable material consolidation system and associated methods and structures
12/15/2005US20050278049 Method of planning tasks in a machine, method of controlling a machine, supervisory machine control system, lithographic apparatus, lithographic processing cell and computer program
12/15/2005US20050277756 Porous film-forming composition, patterning process, and porous sacrificial film
12/15/2005US20050277755 Silicones; acid catalysts; photoresists; photomasks; heat treatment; lithography; improved storage stability, adhesion, and coating uniformity
12/15/2005US20050277747 Holographic storage medium
12/15/2005US20050277746 Cross-linked networks containing nanoscopic reinforcing domains
12/15/2005US20050277277 Dual damascene process
12/15/2005US20050277245 Method for forming bump on electrode pad with use of double-layered film
12/15/2005US20050277071 Method for controlling an intensity of an infrared source used to detect objects adjacent to an interactive display surface
12/15/2005US20050277069 forming a photoresist film on a substrate, then selectively irradiating the film with light through a mask with an immersion liquid, drying and developing the film; fabrication of semiconductors
12/15/2005US20050277068 Semiconductor manufacturing apparatus and pattern formation method
12/15/2005US20050277067 Semiconductor device with scattering bars adjacent conductive lines
12/15/2005US20050277066 Selective etch process for step and flash imprint lithography
12/15/2005US20050277065 Method of manufacturing a semiconductor device
12/15/2005US20050277064 Lithographic semiconductor manufacturing using a multi-layered process
12/15/2005US20050277062 Method of making a photopolymer sleeve blank having an integral UV transparent cushion layer for flexographic printing
12/15/2005US20050277060 Positive resist composition and pattern forming method using the same
12/15/2005US20050277059 Protective film-forming composition for immersion exposure and pattern-forming method using the same
12/15/2005US20050277058 Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same
12/15/2005US20050277057 Resist material and pattern formation method
12/15/2005US20050277056 For preventing exposing failures, profile, using photolithography on semiconductor device
12/15/2005US20050277055 Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device
12/15/2005US20050277054 Resist pattern thickening material and process for forming the same, and semiconductor device and process for manufacturing the same
12/15/2005US20050277053 Increased sensitivity, IR, and UV imageable photographic elements
12/15/2005US20050277052 Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography
12/15/2005US20050277051 Increased sensitivity, UV imageable photographic elements
12/15/2005US20050277035 Exposure measurement method and apparatus, and semiconductor device manufacturing method
12/15/2005US20050277033 Method of forming a semiconductor layer using a photomask reticle having multiple versions of the same mask pattern with different biases
12/15/2005US20050277029 Microstructured pattern inspection method
12/15/2005US20050276988 Protective coating system for reflective optical elements, reflective optical element and method for the production thereof
12/15/2005US20050276914 Method for manufacturing light guide plate mold cores
12/15/2005US20050276908 Thin film coating device, thin film coating method, immersion exposure device, and immersion exposure method
12/15/2005US20050276513 Method for characterizing a digital imaging system
12/15/2005US20050276465 Overlay vernier pattern for measuring multi-layer overlay alignment accuracy and method for measuring the same
12/15/2005US20050275998 Conveying method, conveyance apparatus, exposure apparatus, and device manufacturing method
12/15/2005US20050275840 Optical position assessment apparatus and method
12/15/2005US20050275835 Method and apparatus for protecting an EUV reticle from particles
12/15/2005US20050275823 Photosensitive media cassette for an imaging device
12/15/2005US20050275822 Positioning device and device manufacturing method
12/15/2005US20050275821 Exposure apparatus and device manufacturing method
12/15/2005US20050275819 Imaging system for thermal transfer
12/15/2005US20050275818 Attenuator for attenuating wavelengths unequal to a used wavelength
12/15/2005US20050275817 Light exposure apparatus and method of light exposure
12/15/2005US20050275816 Exposure apparatus
12/15/2005US20050275814 Maskless vortex phase shift optical direct write lithography
12/15/2005US20050275311 Compliant device for nano-scale manufacturing
12/15/2005US20050275251 Compliant device for nano-scale manufacturing
12/15/2005US20050275125 Processing apparatus and method
12/15/2005US20050274912 Apparatus for the temporally stable generation of EUV radiation by means of a laser-induced plasma
12/15/2005US20050274911 Raster frame beam system for electron beam lithography
12/15/2005US20050274909 Level sensor for lithographic apparatus
12/15/2005US20050274898 Pollutant removal method and apparatus, and exposure method and apparatus
12/15/2005US20050274897 Illumination system for a wavelength of less than or equal to 193 nm, with sensors for determining an illumination
12/15/2005US20050274694 Manufacturing method of semiconductor device
12/15/2005US20050274693 Device and method for lithography
12/15/2005US20050274692 Siloxane copolymer crosslinkable containing an aliphatic or cycloaliphatic organofunctional group such as a hydroxy, epoxy, acyloxy or acryloxy group; improved storage stability, filling properties, adhesion and coating uniformity; film is dissolvable in a stripping solution
12/15/2005US20050274400 Apparatus for processing substrates and method therefor
12/15/2005US20050274268 Apparatus for pulling a sleeve on and off
12/15/2005US20050274219 Method and system to control movement of a body for nano-scale manufacturing
12/15/2005DE102004026518A1 Projection lens for microlithography, has polarization manipulating device between physical beam splitter and deflection mirror
12/15/2005DE102004025203A1 Photolithographic photomask production involves coating the photolacquer with an acid at a stage between the solvent removal and the final development step
12/15/2005DE102004025202A1 Photolithographic photomask production is such that the temperature used in solvent removal and/or in heating immediately before development is at 50-90degreesC for 25-35 seconds
12/15/2005DE102004024886A1 Method for applying photoactive multilayer coatings to substrates comprises applying nitrogen-free, non-stoichiometric silicon oxide dielectric anti-reflection layer to substrate with surface to which photoactive resist can be applied
12/15/2005DE102004024808A1 Quarzglasrohling und Verfahren zur Herstellung desselben A quartz glass blank and process for producing same
12/15/2005DE102004023739A1 Messgerät und Verfahren zum Betreiben eines Messgeräts zur optischen Inspektion eines Objekts Meter and method for operating a measuring device for optical inspection of an object
12/15/2005DE102004022961A1 Verfahren zur Herstellung eines dreidimensionalen Objekts mit Auflösungsverbesserung mittels Pixel-Shift Method for producing a three-dimensional object with resolution enhancement using pixel shift
12/15/2005DE102004022606A1 Verfahren zur Herstellung eines dreidimensionalen Objekts mit verbesserter Trennung ausgehärteter Materialschichten von einer Bauebene A process for preparing a three dimensional object having an improved separation of cured material layers of a building plane
12/15/2005DE102004017131B4 Lithographiemaske für die Herstellung von Halbleiterbauelementen Lithography mask for the manufacture of semiconductor devices
12/15/2005CA2569097A1 High speed lithography machine and method
12/14/2005EP1605314A1 Method for replenishing development replenisher in automic developing machine for photosensitive lithographic printing plate precursor
12/14/2005EP1605313A2 Lithographic apparatus and device manufacturing method
12/14/2005EP1605312A1 Radiation system, lithographic apparatus and device manufacturing method
12/14/2005EP1605311A2 Illumination device with light mixer for homogenisation of radiation distributions
12/14/2005EP1605310A2 Exposure system and pattern formation method
12/14/2005EP1605309A1 Method and apparatus for the drying of the printing plates for flexography
12/14/2005EP1605308A2 Apparatus
12/14/2005EP1605021A1 Radiation curable composition, optical waveguide and method for formation thereof
12/14/2005EP1605005A1 Curable resin composition
12/14/2005EP1604246A2 Collectors in two hemispheres
12/14/2005EP1603749A2 Development enhancement of radiation-sensitive elements
12/14/2005EP1417525B1 Objective with pupil obscuration
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