| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/22/2005 | US20050281954 Method for producing a pellicle for lithography |
| 12/22/2005 | US20050281639 Transport apparatus |
| 12/22/2005 | US20050281638 Insertion device, lithographic apparatus with said insertion device and device manufacturing method |
| 12/22/2005 | US20050280946 Wiring board, magnetic disc apparatus, and method of manufacturing wiring board |
| 12/22/2005 | US20050280910 Method for the targeted deformation of an optical element |
| 12/22/2005 | US20050280821 Illumination system having a light mixer for the homogenization of radiation distributions |
| 12/22/2005 | US20050280799 Moving mechanism and stage system in exposure apparatus |
| 12/22/2005 | US20050280798 Lithographic apparatus and device manufacturing method |
| 12/22/2005 | US20050280797 Lithographic apparatus and device manufacturing method |
| 12/22/2005 | US20050280796 Illumination optical system and method, and exposure apparatus |
| 12/22/2005 | US20050280795 Lithographic apparatus and device manufacturing method |
| 12/22/2005 | US20050280794 Illumination optical system, exposure apparatus, and device manufacturing method |
| 12/22/2005 | US20050280792 Defining a pattern on a substrate |
| 12/22/2005 | US20050280791 Exposure apparatus, exposure method, and method for producing device |
| 12/22/2005 | US20050280790 Processing apparatus for processing object in vessel |
| 12/22/2005 | US20050280789 Lithographic apparatus, device manufacturing method, and mask having a pellicle attached hereto |
| 12/22/2005 | US20050280788 Lithographic apparatus and device manufacturing method |
| 12/22/2005 | US20050280390 Electromagnetic alignment and scanning apparatus |
| 12/22/2005 | US20050280314 Positioning mechanism for specimen inspection and processing |
| 12/22/2005 | US20050280171 Mold for diffractive aspheric lenses and method for making the mold |
| 12/22/2005 | US20050280150 Photolithographic techniques for producing angled lines |
| 12/22/2005 | US20050280147 Imprinting lithography using the liquid/solid transition of metals and their alloys |
| 12/22/2005 | US20050279951 Grazing incidence mirror, lithographic apparatus including a grazing incidence mirror, method for providing a grazing incidence mirror, method for enhancing EUV reflection of a grazing incidence mirror, device manufacturing method and device manufactured thereby |
| 12/22/2005 | US20050279946 Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source |
| 12/22/2005 | US20050279458 Plasma processing method and apparatus |
| 12/22/2005 | US20050279453 System and methods for surface cleaning |
| 12/22/2005 | US20050279380 Method for surface cleaning |
| 12/22/2005 | US20050279234 Image recording material and lithographic printing plate precursor |
| 12/22/2005 | DE4240747B4 Verfahren zum Herstellen einer Originalvorlage für eine Streuscheibe A method of manufacturing an original master for a diffuser |
| 12/22/2005 | DE10356966A1 Verfahren zum Erstellen einer Steueranweisung für ein Maskenschreibgerät Procedure to create a control statement for a mask writing tool |
| 12/22/2005 | DE10351607B4 Anordnung zur Projektion eines auf einer Photomaske gebildeten Musters auf einen Halbleiterwafer Arrangement for projecting a pattern formed on a photo mask onto a semiconductor wafer |
| 12/22/2005 | DE10339786B4 Halbtonphasenmaske, Verfahren zur Herstellung derselben und Verfahren zur Projektion einer auf ihr gebildeten Struktur auf ein Substrat Halbtonphasenmaske, method for producing the same and method for projecting a film formed on their structure on a substrate |
| 12/22/2005 | DE10254499B4 Schichtanordnung mit einer einen linsenartigen Effekt erzeugenden beugungsoptisch wirksamen Struktur Layer arrangement with a lens-like effect generating optically diffractive structure |
| 12/22/2005 | DE102005009062A1 Heterodynlaserinterferometer zum Messen einer Waferstufentranslation Heterodynlaserinterferometer for measuring a wafer stage translation |
| 12/22/2005 | DE102004027347A1 Wellenlängenselektor für den weichen Röntgen- und den extremen Ultraviolettbereich Wavelength for the soft X-ray and extreme ultraviolet region |
| 12/22/2005 | DE102004026019A1 Programmable reflection mask, to structure micro-electronic and similar systems, has a matrix of micro-mirror pixel cells where photo elements convert optical signals into electrical signals for the control electrodes |
| 12/22/2005 | DE102004025997A1 Einrichtung zur Erzeugung und Emission von XUV-Strahlung Means for generating and emission of XUV radiation |
| 12/22/2005 | DE102004025837A1 Lithographic method for manufacture of resist pattern having line roughness involves unstructured exposure of resist to light e.g. floodlight of mercury vapor lamp and heating it so that its line roughness is reduced |
| 12/22/2005 | DE102004025832A1 Optikmodul für ein Objektiv Optical module for a lens |
| 12/22/2005 | DE102004015194B4 Printing plate illustrating device, has transport path for printing plates which is diagonally oriented in section between printing plate input and printing plate output, such that transport path runs in Z-form |
| 12/22/2005 | DE10121179B4 Experimentelles Verfahren zur Verifikation von Abbildungsfehlern bei optischen Belichtungsgeräten Experimental procedure for the verification of aberrations in the optical exposure devices |
| 12/22/2005 | CA2569777A1 Method and apparatus for the drying of the printing plates for flexography |
| 12/22/2005 | CA2569749A1 Photosensitive resin for flexographic printing plate |
| 12/22/2005 | CA2568795A1 Building up diffractive optics by structured glass coating |
| 12/22/2005 | CA2567930A1 Methods and devices for forming nanostructure monolayers and devices including such monolayers |
| 12/21/2005 | EP1608210A1 Wiring Board, Magnetic Disc Apparatus, and Method of Manufacturing Wiring Board |
| 12/21/2005 | EP1608004A1 Projection optical system, exposure system, and exposure method |
| 12/21/2005 | EP1608003A1 Mask repeater and mask manufacturing method |
| 12/21/2005 | EP1606834A1 Uv nanoimprint lithography process using elementwise embossed stamp and selectively additive pressurization |
| 12/21/2005 | EP1606671A2 Method and device for wetting a substrate with a liquid |
| 12/21/2005 | EP1606670A2 Applications of semiconductor nano-sized particles for photolithography |
| 12/21/2005 | EP1606657A1 Maskless optical interferometric lithography |
| 12/21/2005 | EP1606326A2 Novel photosensitive resin compositions |
| 12/21/2005 | EP1307777B1 Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems |
| 12/21/2005 | EP1154325B1 Flexographic printing plate and original plate therefor |
| 12/21/2005 | EP0870188B1 Variable spot-size scanning apparatus |
| 12/21/2005 | CN1711505A Protective layers compatible with thick film pastes |
| 12/21/2005 | CN1711504A 抗蚀组合物 The resist composition |
| 12/21/2005 | CN1711503A 负型感光性树脂组合物 The negative photosensitive resin composition |
| 12/21/2005 | CN1711295A Photosensitive resin composition and process for the formation of hydrogel |
| 12/21/2005 | CN1711290A Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerization |
| 12/21/2005 | CN1710490A Nano photoetching optical apparatus based on plasma ion wave |
| 12/21/2005 | CN1710489A Chemical application apparatus and chemical application method |
| 12/21/2005 | CN1710488A Resist for forming pattern and method for forming pattern using the same |
| 12/21/2005 | CN1710447A Mould core of non-spherical diffraction lens and mfg. method thereof |
| 12/21/2005 | CN1233022C Pattern formation material, water-soluble material and pattern formation method |
| 12/21/2005 | CN1233021C Method for forming pattern of semiconductor device |
| 12/21/2005 | CN1232885C Positive type photosensitive epoxy resin composition and printed circuit board using same |
| 12/21/2005 | CN1232884C Photoresisting agent composition |
| 12/21/2005 | CN1232875C Color light filter substrate and its mfg. method, liquid crystal device and mfg. method thereof and electronic machine |
| 12/20/2005 | US6978436 Design data format and hierarchy management for phase processing |
| 12/20/2005 | US6978191 Overlay registration control system and method employing multiple pilot lot in-line overlay registration measurement |
| 12/20/2005 | US6978041 Review work supporting system |
| 12/20/2005 | US6977728 Projection exposure apparatus and aberration measurement method |
| 12/20/2005 | US6977718 Lithography method and system with adjustable reflector |
| 12/20/2005 | US6977717 Method and device for determining projection lens pupil transmission distribution and illumination intensity distribution in photolithographic imaging system |
| 12/20/2005 | US6977716 Catadioptric lithography system and method with reticle stage orthogonal to wafer stage |
| 12/20/2005 | US6977714 Lithographic manufacturing process, lithographic projection apparatus, and device manufactured thereby |
| 12/20/2005 | US6977713 Lithographic apparatus and device manufacturing method |
| 12/20/2005 | US6977461 System and method for moving an object employing piezo actuators |
| 12/20/2005 | US6977422 Method of deforming a pattern and semiconductor device formed by utilizing deformed pattern |
| 12/20/2005 | US6977387 an opaque plate having an aperture with a central opening and a peripheral opening of an on-axis component and one off-axis component of illumination light to compensate for aberrations in optics of the imaging tool. |
| 12/20/2005 | US6977364 System and method for compensating for dark current in photosensitive devices |
| 12/20/2005 | US6977219 Solvent vapor-assisted plasticization of photoresist films to achieve critical dimension reduction during temperature reflow |
| 12/20/2005 | US6977135 Photosensitive material for immersion photolithography |
| 12/20/2005 | US6977133 Photomask and pattern forming method |
| 12/20/2005 | US6977131 Selected polymeric sulfonate acid generators and their use in processes for imaging radiation-sensitive elements |
| 12/20/2005 | US6977128 Multi-layered semiconductor structure |
| 12/20/2005 | US6977025 Method of forming a monolayer of particles having at least two different sizes, and products formed thereby |
| 12/20/2005 | US6976428 Wet offset printing form |
| 12/20/2005 | US6976424 substrate having a two-sided rigid carrier layer providing on its first side a rigid patterned layer and the second softer layer; soft layer absorbs the deformation by distributing the load and leaves the pattern structure unchanged |
| 12/15/2005 | WO2005119802A2 Adaptive shape substrate support system and method |
| 12/15/2005 | WO2005119801A2 Compliant device for nano-scale manufacturing |
| 12/15/2005 | WO2005119742A1 Exposure apparatus, exposure method, and device producing method |
| 12/15/2005 | WO2005119729A2 Apparatus for generating and emitting xuv radiation |
| 12/15/2005 | WO2005119592A1 Method for characterizing a digital imaging system |
| 12/15/2005 | WO2005119395A2 Method and system to control movement of a body for nano-scale manufacturing |
| 12/15/2005 | WO2005119372A1 Developer for a photopolymer protective layer |
| 12/15/2005 | WO2005119371A1 Ultraviolet-transparent alkanes and processes using same in vacuum and deep ultraviolet applications |
| 12/15/2005 | WO2005119370A2 High speed lithography machine and method |