Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2005
12/28/2005EP1610184A1 Resist pattern thickening material and process for forming the same, and semiconductor device and process for manufacturing the same
12/28/2005EP1610183A2 Lithographic apparatus and device manufacturing method
12/28/2005EP1610182A2 Lithographic apparatus and device manufacturing method
12/28/2005EP1610181A2 Illumination optical system, exposure apparatus, and device manufacturing method
12/28/2005EP1610180A2 Semiconductor manufacturing apparatus and pattern formation method
12/28/2005EP1610179A1 Protective film-forming composition for immersion exposure and pattern-forming method using the same
12/28/2005EP1610178A1 Resist composition for liquid immersion exposure process and method of forming resist pattern therewith
12/28/2005EP1610177A1 Photosensitive resin film and cured film made therefrom
12/28/2005EP1610176A2 UV decomposable molecules and a photopatternable monomolecular film formed therefrom
12/28/2005EP1609618A1 Lithographic printing plate original form and plate making method
12/28/2005EP1609617A1 Printing plate material and image formation process
12/28/2005EP1609026A2 Process for producing a heat resistant relief structure
12/28/2005EP1609025A2 Photoresist composition for the formation of thick films
12/28/2005EP1609024A2 Novel photosensitive resin compositions
12/28/2005EP1608934A2 Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry
12/28/2005EP1608933A2 Apparatus and method for measurement of fields of backscattered and forward scattered/reflected beams by an object in interferometry
12/28/2005EP1301818B1 Apparatus for active compensation of aberrations in an optical system
12/28/2005CN1714426A Spin-coating methods and apparatus for spin-coating, including pressure sensor
12/28/2005CN1714370A Layer arrangement provided with a structure producing a diffractive optical effect and a lens-type effect
12/28/2005CN1714316A Antireflective compositions for photoresists
12/28/2005CN1714315A Applicability improver for photosensitive resin composition and photosensitive resin composition containing the same
12/28/2005CN1714314A Aqueous developable photoimageable thick film compositions for making photoimageable black electrodes
12/28/2005CN1714130A Uv-cure adhesive composition for optical disk, cured material and goods
12/28/2005CN1713355A Manufacturing method of semiconductor device
12/28/2005CN1713078A Bare aluminum baffles for resist stripping chambers
12/28/2005CN1713077A Composition for removing photoresist
12/28/2005CN1713076A High-temperature stripping agent of curing membrane for printed nickel net, its preparation and use
12/28/2005CN1713075A Lithographic apparatus and device manufacturing method
12/28/2005CN1713074A Resist pattern thickening material and process for forming the same, and semiconductor device and process for manufacturing the same
12/28/2005CN1234049C Resin composition for photofabrication of three dimensional objects
12/28/2005CN1234047C Chemical amplification light resistance agent compsn.
12/28/2005CN1233679C Ultraviolet-curable resin composition and photosolder resist ink containing the composition
12/28/2005CN1233525C Method for forming fine patterns on surfaces of glass and glass products
12/27/2005US6980917 Optimization of die yield in a silicon wafer “sweet spot”
12/27/2005US6980872 Information providing method and system
12/27/2005US6980366 Projecting exposure apparatus
12/27/2005US6980304 Method for measuring a characteristic dimension of at least one pattern on a disc-shaped object in a measuring instrument
12/27/2005US6980282 Method for modulating shapes of substrates
12/27/2005US6980281 Lithographic apparatus and device manufacturing method
12/27/2005US6980279 Interferometer system for measuring a height of wafer stage
12/27/2005US6980278 Self-cleaning method for semiconductor exposure apparatus
12/27/2005US6980277 Immersion photolithography system and method using inverted wafer-projection optics interface
12/27/2005US6979838 Ultra-high density storage device using phase change diode memory cells and methods of fabrication thereof
12/27/2005US6979655 Substrate processing method and substrate processing apparatus
12/27/2005US6979653 Semiconductor fabrication methods and apparatus
12/27/2005US6979604 Method for forming pattern on substrate and method for fabricating liquid crystal display using the same
12/27/2005US6979577 Method and apparatus for manufacturing semiconductor device
12/27/2005US6979528 Method and apparatus for uniformly baking substrates such as photomasks
12/27/2005US6979527 forming a multiple of photoresist layers and the influence of a upper sublayer on a lower sublayer is suppressed in the step to reduce the difference in thickness of the amount of the photoresist layers
12/27/2005US6979526 Lithography alignment and overlay measurement marks formed by resist mask blocking for MRAMs
12/27/2005US6979522 Adjustment physical properties; using exposure tool; calibration pattern; accuracy
12/27/2005US6979519 an opaque-field phase shift mask and the second mask is a single phase structure mask, a phase shift window is aligned with the opaque field using a phase shift overlap area on the opaque field
12/22/2005WO2005122242A1 Stage apparatus, exposure apparatus, and exposure method
12/22/2005WO2005122235A2 Methods and devices for forming nanostructure monolayers and devices including such monolayers
12/22/2005WO2005122226A1 Method for plasma stripping using periodic modulation of gas chemistry and hydrocarbon addition
12/22/2005WO2005122221A1 Exposure equipment, exposure method and device manufacturing method
12/22/2005WO2005122220A1 Exposure apparatus, exposure method, and device producing method
12/22/2005WO2005122219A1 Substrate holding device, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate
12/22/2005WO2005122218A1 Exposure system and device production method
12/22/2005WO2005121903A2 System and method for improvement of alignment and overlay for microlithography
12/22/2005WO2005121902A1 Electron beam position fluctuation measurement method, electron beam position fluctuation measurement device, and electron beam recording device
12/22/2005WO2005121901A1 System and method for damping structural modes using active vibration control
12/22/2005WO2005121900A1 Lighting unit of a microlithographic projection exposure system
12/22/2005WO2005121899A1 Projection objective for a microlithographic projection exposure apparatus
12/22/2005WO2005121898A1 Method and apparatus for the drying of the printing plates for flexography
12/22/2005WO2005121897A1 Negative acting photoresist with improved blocking resistance
12/22/2005WO2005121896A1 Photosensitive resin for flexographic printing plate
12/22/2005WO2005121895A1 Positive photosensitive resin composition
12/22/2005WO2005121894A2 Photoactive compounds
12/22/2005WO2005121892A2 Apparatus, system and method to vary dimensions of a substrate during nano-scale manufacturing
12/22/2005WO2005121843A1 Transmissive element
12/22/2005WO2005121842A1 Building up diffractive optics by structured glass coating
12/22/2005WO2005121193A1 Polymer, positive resist composition and method for forming resist pattern
12/22/2005WO2005121019A1 Method for manufacturing nanostructure and nanostructure
12/22/2005WO2005120834A2 Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing
12/22/2005WO2005120793A1 Mold release layer
12/22/2005WO2005091879A3 Euv light source
12/22/2005WO2005046011A3 Relax gas discharge laser lithography light source
12/22/2005WO2005038884A3 Reducing photoresist line edge roughness using chemically-assisted reflow
12/22/2005WO2005026782A3 Inspection system using small catadioptric objective
12/22/2005US20050283747 OPC simulation model using SOCS decomposition of edge fragments
12/22/2005US20050282923 Photosensitive resin compositon comprising a halogen-free colorant
12/22/2005US20050282405 Vacuum system for immersion photolithography
12/22/2005US20050282402 Resist for forming pattern and method for forming pattern using the same
12/22/2005US20050282397 Semiconductor constructions
12/22/2005US20050282388 Imprinting lithography using the liquid/solid transition of metals and their alloys
12/22/2005US20050282383 Systems for forming insulative coatings for via holes in semiconductor devices
12/22/2005US20050282094 Developer for a photopolymer protective layer
12/22/2005US20050282093 Aqueous edge bead remover
12/22/2005US20050282092 Etching photomasks, photoresists; photolithography; depth of focus
12/22/2005US20050282091 Patterning process and undercoat-forming material
12/22/2005US20050282090 Composition for forming antireflection coating
12/22/2005US20050282087 Method and device for producing exposed structures
12/22/2005US20050282083 Polymer, resist composition and patterning process
12/22/2005US20050282082 Polymer, resist composition and patterning process
12/22/2005US20050282081 Printing plate material and image formation process
12/22/2005US20050282080 Water-soluble negative photoresist polymer and composition containing the same
12/22/2005US20050282079 copolymer comprising diacrylic acid monomer is reacted with an amine or ammonium hydroxide, which is a basic compound to form an amine oxide unit; useful in photolithography process using light source in a far ultraviolet region when high-integrated fine circuits of semiconductor device are manufactured
12/22/2005US20050282074 Method of manufacturing a semiconductor device
12/22/2005US20050281982 Template
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