| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/04/2006 | CN1234472C Method of removing organic materials from substrates |
| 01/03/2006 | US6982841 Mirror holding mechanism in exposure apparatus, and device manufacturing method |
| 01/03/2006 | US6982796 Wavefront splitting element for EUV light and phase measuring apparatus using the same |
| 01/03/2006 | US6982786 Reticle and optical characteristic measuring method |
| 01/03/2006 | US6982784 Substrate holding device, semiconductor manufacturing apparatus and device manufacturing method |
| 01/03/2006 | US6982783 Chucking system for modulating shapes of substrates |
| 01/03/2006 | US6982782 Processing apparatus for processing object in vessel |
| 01/03/2006 | US6982232 comprises pulsed ultraviolet radiation source; high purity fused silica optical members |
| 01/03/2006 | US6982141 Semiconductor device and manufacturing method thereof |
| 01/03/2006 | US6982140 Resolution |
| 01/03/2006 | US6982138 scanning electron microscope video signaling |
| 01/03/2006 | US6982135 Pattern compensation for stitching |
| 01/03/2006 | US6982117 Particle scattering; solid light transmissive matrix |
| 01/03/2006 | US6982102 When coating a photoresist on a semiconductor wafer using an apparatus having a second exhaust pipe for atmospheric gas separate from a first exhaust pipe so that the flow rate and maintainence of a constant pressure in the casing are controlled |
| 01/03/2006 | US6982058 Selectively applying and exposing layers of biocompatible photoimageable material to create layers forming a cross-linked latticework structure having the desired geometric properties |
| 01/03/2006 | US6982002 Apparatus and method for forming coating film |
| 01/03/2006 | US6981808 Substrate processing apparatus and substrate transferring method |
| 01/03/2006 | US6981445 Method and apparatus for micro-contact printing |
| 12/29/2005 | WO2005124835A1 Exposure equipment and device manufacturing method |
| 12/29/2005 | WO2005124833A1 Exposure device, exposure device member cleaning method, exposure device maintenance method, maintenance device, and device manufacturing method |
| 12/29/2005 | WO2005124832A1 Exposure system |
| 12/29/2005 | WO2005124831A1 Light detecting apparatus, illumination optical apparatus, exposure apparatus and exposure method |
| 12/29/2005 | WO2005124468A1 A photolitography apparatus and mask for nano meter scale patterning of some arbitrary shapes |
| 12/29/2005 | WO2005124467A1 Electron beam drawing device |
| 12/29/2005 | WO2005124466A1 Exposure equipment |
| 12/29/2005 | WO2005124465A1 Aqueous edge bead remover |
| 12/29/2005 | WO2005124464A2 Vacuum system for immersion photolithography |
| 12/29/2005 | WO2005124463A1 Positive resist composition and method for forming resist pattern |
| 12/29/2005 | WO2005124462A1 Photosensitive composition, method for forming pattern, and permanent pattern |
| 12/29/2005 | WO2005124461A1 Photosensitive composition for use in producing printing plate, and photosensitive printing original plate laminate and printing plate using the photosensitive composition |
| 12/29/2005 | WO2005124460A1 Binder-free photopolymerizable compositions |
| 12/29/2005 | WO2005124459A1 Organic film composition and method for forming resist pattern |
| 12/29/2005 | WO2005124458A1 Inorganic powder-containing resin composition, transfer film and method for producing member for plasma display panel |
| 12/29/2005 | WO2005124457A1 Photosensitive media cassette for an imaging device |
| 12/29/2005 | WO2005124456A2 Photopolymerisable composition |
| 12/29/2005 | WO2005124420A1 Optical system, exposing apparatus and exposing method |
| 12/29/2005 | WO2005124398A1 Optical material, optical lens and prism |
| 12/29/2005 | WO2005124293A1 Method of forming a semiconductor layer using a photomask reticle having multiple versions of the same mask pattern with different biases |
| 12/29/2005 | WO2005123795A1 Polymer compound, positive resist composition and method for forming resist pattern |
| 12/29/2005 | WO2005123655A1 Compound, polymer compound, positive resist composition and method for forming resist pattern |
| 12/29/2005 | WO2005103825A3 Device for covering substrates in a rotating manner |
| 12/29/2005 | WO2005091887A3 Euv light source optical elements |
| 12/29/2005 | WO2005076081A3 Reticle fabrication using a removable hard mask |
| 12/29/2005 | WO2005076076A3 Directly photodefinable polymer compositions and methods thereof |
| 12/29/2005 | WO2005041291A3 Mask and method for using the mask in lithographic processing |
| 12/29/2005 | WO2005040920A3 Multistep process for creating irregularities in a repating array of pattern elements |
| 12/29/2005 | US20050288535 Liquid perfluoropentane and perfluorohexane transparent to ultraviolet radiation; minimized oxygen and water content; optical couplers, cements, elements, or inspection media for semiconductor wafers and immersion photolithography |
| 12/29/2005 | US20050288199 ammonium fluroride, an acid selected from oxalic acid, tartaric acid, citric acid, malonic acid, and malic acid, an organic amine such as morpholine, piperidine, piperizine, N-methylmonoethanolamine, etc., glyoxyl acid and water; copper corrosion inhibitor |
| 12/29/2005 | US20050287821 Wafer processing system, coating/developing apparatus, and wafer, processing apparatus |
| 12/29/2005 | US20050287820 Mold for nano imprinting |
| 12/29/2005 | US20050287816 Methods of forming patterned photoresist layers over semiconductor substrates |
| 12/29/2005 | US20050287814 H2O plasma for simultaneous resist removal and charge releasing |
| 12/29/2005 | US20050287811 Semiconductor device fabrication method |
| 12/29/2005 | US20050287717 Methods and devices for forming nanostructure monolayers and devices including such monolayers |
| 12/29/2005 | US20050287483 Contact hole printing method and apparatus with single mask, multiple exposures, and optimized pupil filtering |
| 12/29/2005 | US20050287480 Photoresist stripper composition |
| 12/29/2005 | US20050287479 improved efficiency by heat treating a silicon oxynitride antireflective layer; for contemporary imaging devices, such as charge-coupled devices (CCDs) and CMOS image sensors (CISs). |
| 12/29/2005 | US20050287478 Wash composition with polymeric surfactant |
| 12/29/2005 | US20050287477 Method of making a lithographic printing plate precursor |
| 12/29/2005 | US20050287474 Resist polymer and method for producing the polymer |
| 12/29/2005 | US20050287473 Photosensitive composition and method for forming pattern using the same |
| 12/29/2005 | US20050287472 Plasma display panels (PDP); improved electrical resistance, anti-sanding property of terminal portions, and withstanding voltage characteristics |
| 12/29/2005 | US20050287471 Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same |
| 12/29/2005 | US20050287469 Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric |
| 12/29/2005 | US20050287466 Negative-working photosensitive composition and negative-working photosensitive planographic printing plate |
| 12/29/2005 | US20050287292 Optical element fabrication method, optical element, exposure apparatus, device fabrication method |
| 12/29/2005 | US20050286599 Method and apparatus for gas discharge laser output light coherency reduction |
| 12/29/2005 | US20050286598 Laser output beam wavefront splitter for bandwidth spectrum control |
| 12/29/2005 | US20050286146 Closing module for an optical arrangement |
| 12/29/2005 | US20050286121 Objective, especially a projection objective for microlithography |
| 12/29/2005 | US20050286051 Overlay targets with isolated, critical-dimension features and apparatus to measure overlay |
| 12/29/2005 | US20050286050 Real-time through lens image measurement system and method |
| 12/29/2005 | US20050286040 Lithographic apparatus, a device manufacturing method, and a fastener for use in a lithographic apparatus |
| 12/29/2005 | US20050286035 Lithographic apparatus and device manufacturing method |
| 12/29/2005 | US20050286034 Lithographic apparatus and device manufacturing method |
| 12/29/2005 | US20050286033 Immersion lithography system with wafer sealing mechanisms |
| 12/29/2005 | US20050286032 Lithographic apparatus and device manufacturing method |
| 12/29/2005 | US20050286031 Use of highly purified hydrocarbons in vacuum ultraviolet applications |
| 12/29/2005 | US20050286030 Immersion optical projection system |
| 12/29/2005 | US20050285927 Image forming device and an exposure member for the device |
| 12/29/2005 | US20050285550 Planar motor initialization method, planar motro, lithographic apparatus and device manufacturing method |
| 12/29/2005 | US20050285451 Linear motor, stage apparatus, exposure apparatus, and device manufacturing apparatus |
| 12/29/2005 | US20050285308 Stamper, imprinting method, and method of manufacturing an information recording medium |
| 12/29/2005 | US20050285056 Process for manufacture of semiconductor chips utilizing a posteriori corrections to machine control system and settings |
| 12/29/2005 | US20050284573 Bare aluminum baffles for resist stripping chambers |
| 12/29/2005 | US20050284502 Rinse and resist patterning process using the same |
| 12/29/2005 | US20050284320 Imprint apparatus and method for imprinting |
| 12/29/2005 | DE112004000236T5 Maskenbearbeitungsvorrichtung, Maskenbearbeitungs-Verfahren, Programm und Maske Mask processing apparatus, mask processing method, program and mask |
| 12/29/2005 | DE10351972B4 Verfahren zum Bestimmen des optischen Einflusses einer Maskenschicht einer lithographischen Maske A method for determining the optical influence of a mask layer of a lithographic mask |
| 12/29/2005 | DE10328811B4 Verbindung zur Bildung einer selbstorganisierenden Monolage, Schichtstruktur, Halbleiterbauelement mit einer Schichtstruktur und Verfahren zur Herstellung einer Schichtstruktur Compound to form a self-assembled monolayer layer structure semiconductor device having a layer structure and process for producing a layer structure |
| 12/29/2005 | DE10259322B4 Verfahren zum Bilden einer Justiermarke in einer lichtundurchlässigen Schicht auf einem Substrat A method of forming an alignment mark in an opaque layer on a substrate |
| 12/29/2005 | DE102005026628A1 Telecenter determination device for microlithography-projection illumination system, has processor unit for determining telecenter error value from wave front tip measuring value that is attained by wave front measuring device |
| 12/29/2005 | DE102004044765A1 Device for lithographic exposure of photosensitive layer has system provided with pressure modulator which changes gas pressure in path of rays resulting in change of gas density so that position of focal plane is varied |
| 12/29/2005 | DE102004028943A1 Vorrichtung zur zeitlich stabilen Erzeugung von EUV-Strahlung mittels eines laserinduzierten Plasmas Apparatus for time-stable generation of EUV radiation by means of a laser-induced plasma |
| 12/29/2005 | DE102004027277A1 Excess film emending method for e.g. dynamic RAM, involves providing simulation model with regulation algorithm, determining offset values for samples, and determining parameter of algorithm for illumination device on basis of offset values |
| 12/29/2005 | DE102004022329B3 Dynamic dosage adaptation method in lithography projector, involves setting exposure amount for each light exposure area, based on difference between time set for exposing each exposure area and time set for stabilizing resist layer |
| 12/28/2005 | EP1610362A1 Stage device, exposure deice, and method of producing device |
| 12/28/2005 | EP1610361A1 Exposure system and device production method |
| 12/28/2005 | EP1610191A1 Holographic recording medium and recording method therefor |
| 12/28/2005 | EP1610185A2 Composition and method using same for removing residue from a substrate |