Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2014
04/09/2014CN103718112A Laminated flexographic printing sleeves and methods of making the same
04/09/2014CN103718111A Thin film formation composition for lithography which contains titanium and silicon
04/09/2014CN103718110A Photosensitive composition and compound used therein
04/09/2014CN103718109A Photosensitive resin composition, material for forming relief pattern, photosensitive film, polyimide film, cured relief pattern and method for producing same, and semiconductor device
04/09/2014CN103718108A Photosensitive resin composition and cured product thereof
04/09/2014CN103718107A Negative-type photosensitive resin composition, resin film, and electronic component
04/09/2014CN103718106A Coloring composition, coloring radiation-sensitive composition, color filter and solid-state imaging device
04/09/2014CN103718066A Microlens array and scanning exposure device using same
04/09/2014CN103717626A Polymer and photosensitive resin composition containing same
04/09/2014CN103717625A Fluororesin and photosensitive resin composition including same
04/09/2014CN103717562A Cyclic compound, method for producing same, composition, and method for forming resist pattern
04/09/2014CN103713477A Alignment structure and alignment method for dual surface lithography machine
04/09/2014CN103713476A Stripping and cleaning compositions for removal of thick film resist
04/09/2014CN103713475A Rapid exchange device for lithography reticles
04/09/2014CN103713474A Illumination optics for microlithography
04/09/2014CN103713473A Method for modifying ITO (Indium Tin Oxide) by using restricted photocatalytic oxidation and application of method
04/09/2014CN103713472A System for automatically installing mask
04/09/2014CN103713471A Calibration unit and method for critical dimension testing
04/09/2014CN103713470A Active energy-ray curable resin composition for print resist, method for resist patterning using the same, print resist laminate, and printed circuit board
04/09/2014CN103713469A Photosensitive resin composition for color filters and uses thereof
04/09/2014CN103713467A Mask set and method for detecting alignment precision by utilizing mask set
04/09/2014CN103713392A Space image forming element, method of manufacturing the same, display device, and terminal
04/09/2014CN103712965A Resolution testing standard board manufacturing method for super-resolution fluorescence microscope system
04/09/2014CN103709731A Quantum dot/polyurethane nano crystal complex and preparation method thereof as well as colorful conversion film
04/09/2014CN103707669A Method for manufacturing color filter using receptive layer
04/09/2014CN103706189A Simple gas-liquid separation apparatus in rotating development vacuum line
04/09/2014CN102819187B Photoetching production technology of single glass and single-layer glass black matrix
04/09/2014CN102768474B Projection objective lens wave aberration detection method based on two-order aberration model
04/09/2014CN102758875B Magnetic levitation balance mass framework
04/09/2014CN102707564B Color filter and manufacturing method thereof
04/09/2014CN102654595B Phase difference plate and manufacturing method thereof
04/09/2014CN102575108B Colored curable composition, resist liquid, ink for inkjet printing, color filter, method of producing color filter, solid-state image sensor, liquid crystal display, organic el display, image display device and colorant compound
04/09/2014CN102540701B Self alignment type secondary imaging method
04/09/2014CN102508413B Method for acquiring thickness change of photoresist and monitoring influence of photoresist thickness on graphic dimension
04/09/2014CN102483572B Photopolymerizable composition, color filter, method for producing same, solid-state image pickup element, liquid crystal display device, lithographic printing original plate, and novel compound
04/09/2014CN102422226B Method of determining overlay error
04/09/2014CN102402137B Photoetching method of pores
04/09/2014CN102317868B Projection illumination method, projection illumination device, laser beam source and bandwidth narrowing module for laser beam source
04/09/2014CN102193328B Lithographic apparatus and method of manufacturing device using lithographic apparatus
04/09/2014CN102171287B Dispersed composition, polymerizable composition, light shielding color filter, solid-state imaging element, liquid crystal display device, wafer-level lens, and imaging unit
04/09/2014CN102163004B Exposure apparatus, exposure method and device producing method
04/09/2014CN102112926B Active spot array lithographic projector system with regulated spots
04/09/2014CN102067039B Lithographic apparatus and device manufacturing method
04/09/2014CN102057332B Method and system for thermally conditioning optical element
04/09/2014CN101952777B Method for producing cured resist using negative photosensitive resin laminate, negative photosensitive resin laminate, and use of negative photosensitive resin laminate
04/09/2014CN101755237B Method for patterning surface
04/09/2014CN101751502B Method and system for correcting window maximized optic proximity effect in photoetching process
04/09/2014CN101750896B Method for preparing fluorine-containing silicon low-surface-energy material for nano-imprinting
04/09/2014CN101434682B Polymer resin composition
04/09/2014CN101407641B Processing pigment, pigment dispersed composition and coloring photosensitive composition
04/09/2014CN101393393B Slurry combination for forming electrode of plasma display screen
04/09/2014CN101334587B Photosensitive resin composition for organic film transistor
04/08/2014US8693115 Apparatus for method for immersion lithography
04/08/2014US8693074 MOEMS apparatus and a method for manufacturing same
04/08/2014US8693061 Method of embedding data in printed halftone features on a receiver
04/08/2014US8692976 Exposure apparatus, and device manufacturing method
04/08/2014US8691925 Compositions of neutral layer for directed self assembly block copolymers and processes thereof
04/08/2014US8691497 Developing treatment method
04/08/2014US8691496 Method for forming resist under layer film, pattern forming method and composition for resist under layer film
04/08/2014US8691495 Photoresist pattern forming method, and microlens array forming method
04/08/2014US8691494 Patterning process
04/08/2014US8691493 Method for the production of a multilayer element, and multilayer element
04/08/2014US8691492 Silane-based compounds and photosensitive resin composition comprising the same
04/08/2014US8691491 Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions
04/08/2014US8691490 Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process
04/08/2014US8691481 Local exposure method and local exposure apparatus
04/03/2014WO2014052592A1 Imageable article comprising a substrate having an imageable crosslinkable fluoropolymer film disposed thereupon, and the imaged article prepared therefrom
04/03/2014WO2014052256A1 Maleimide containing cycloolefinic polymers and applications thereof
04/03/2014WO2014051431A1 Multi-axis differential interferometer
04/03/2014WO2014051063A1 Substrate processing method, computer storage medium, and substrate processing system
04/03/2014WO2014051035A1 Photocurable resin composition, printed wiring board, and method for producing photocurable resin composition
04/03/2014WO2014051034A1 Photocurable resin composition, printed wiring board, and method for producing photocurable resin composition
04/03/2014WO2014051027A1 Relief form film and method for manufacturing same, relief printing plate original and method for manufacturing same, and relief printing plate and plate-forming method for same
04/03/2014WO2014051018A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
04/03/2014WO2014050998A1 Coloring composition, photosensitive coloring composition, color filter, method for producing color filter, solid-state imaging element, and image display device
04/03/2014WO2014050905A1 Self-organizing composition for forming pattern, method for forming pattern by self-organization of block copolymer using same, and pattern
04/03/2014WO2014050738A1 Fluorene-type compound, photopolymerization initiator comprising said fluorene-type compound, and photosensitive composition containing said photopolymerization initiator
04/03/2014WO2014050730A1 Photosensitive resin composition, method for producing cured film, cured film, organic el display device, and liquid crystal display device
04/03/2014WO2014050633A1 Resin composition, photosensitive resin composition, and color filter
04/03/2014WO2014050627A1 Photosensitive resin composition, method for forming cured film using same, cured film, liquid crystal display device, and organic el display device
04/03/2014WO2014050626A1 Photosensitive resin composition, method for producing cured film using same, cured film, liquid crystal display device, and organic el display device
04/03/2014WO2014050567A1 Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing touch panel
04/03/2014WO2014050558A1 Positive photosensitive resin composition, and method for producing semiconductor device containing a cured film using said composition
04/03/2014WO2014050435A1 Lithographic printing original plate and plate making method
04/03/2014WO2014050421A1 Method for forming wiring pattern, and wiring pattern formation
04/03/2014WO2014050405A1 Exposure/rendering device, exposure/rendering system, program, and exposure/rendering method
04/03/2014WO2014050384A1 Exposure/rendering device, exposure/rendering system, program, and exposure/rendering method
04/03/2014WO2014050359A1 Lithographic presensitized plate and method for making lithographic printing plate
04/03/2014WO2014050324A1 Photosensitive resin composition and production method for pattern using same
04/03/2014WO2014050308A1 Diffraction optical element and method and device for producing diffraction optical element
04/03/2014WO2014049882A1 Photosensitive resin composition for screen printing, photosensitive film, and screen plate
04/03/2014WO2014049020A2 Device and method for coating substrates
04/03/2014WO2014049001A1 Photolithographic illuminator device enabling controlled diffraction
04/03/2014WO2014048999A1 Photolithographic illuminator that is telecentric in two directions
04/03/2014WO2014048828A1 Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
04/03/2014WO2014048654A1 Quantitative reticle distortion measurement system
04/03/2014WO2014048651A1 Reticle heater to keep reticle heating uniform
04/03/2014WO2014048211A1 Position matching structure and position matching method for two-sided stepper
04/03/2014WO2014047982A1 Colour filter substrate and related manufacturing method therefor
04/03/2014WO2014047961A1 Transparent electrode fabricating method and mask plate
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