| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/05/2006 | US20060003256 Photosensitive resin composition and coating film cured product thereof |
| 01/05/2006 | US20060003255 Methods for optimizing physical characteristics of selectively consolidatable materials |
| 01/05/2006 | US20060003254 Photosensitive composition and method for forming pattern using same |
| 01/05/2006 | US20060003252 Chemical amplification type silicone based positive photoresist composition |
| 01/05/2006 | US20060003236 Photomask and near-field exposure method |
| 01/05/2006 | US20060003235 Semiconductor manufacturing method and an exposure mask |
| 01/05/2006 | US20060003233 Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method |
| 01/05/2006 | US20060001981 Projection optical system, exposure apparatus, and exposure method |
| 01/05/2006 | US20060001889 Positioning apparatus and photolithography apparatus including the same |
| 01/05/2006 | US20060001861 Measuring method and measuring system for measuring the imaging quality of an optical imaging system |
| 01/05/2006 | US20060001854 Optical system having an optical element that can be brought into at least two positions |
| 01/05/2006 | US20060001853 Exposure apparatus and method of cleaning optical element of the same |
| 01/05/2006 | US20060001851 Immersion photolithography system |
| 01/05/2006 | US20060001194 System for varying dimensions of a substrate during nanoscale manufacturing |
| 01/05/2006 | US20060001139 Support structure for use in thinning semiconductor substrates and for supporting thinned semiconductor substrates |
| 01/05/2006 | US20060000985 Optics for extreme ultraviolet lithography |
| 01/05/2006 | US20060000929 Chemical application apparatus and chemical application method |
| 01/05/2006 | US20060000489 In-situ cleaning of light source collector optics |
| 01/05/2006 | US20060000381 Method and apparatus for immersion lithography |
| 01/05/2006 | DE102004038530B3 Verfahren und Vorrichtung zur Herstellung einer optischen Verbindung zwischen einem optoelektronischen Bauelement und einem Lichtwellenleiter Method and apparatus for making an optical connection between an optoelectronic component and an optical waveguide |
| 01/05/2006 | DE102004036969A1 Enhancement of visible contrast in imaged lithographic printing plate by using translucent or opaque polymer as substrate for the plate |
| 01/05/2006 | DE102004027622A1 Laser marking of polymer material surfaces involves clamping polymer object, marking with pulsed laser having specified characteristics and cutting off marked section |
| 01/05/2006 | DE10125487A9 Optisches Element, Projektionsobjektiv und Mikrolithographic-Projektionsbelichtungsanlage mit Fluoridkristall-Linsen Optical element, projection lens and Mikrolithographic projection exposure system with fluoride crystal lenses |
| 01/04/2006 | EP1612858A2 Composition for stripping and cleaning and use thereof |
| 01/04/2006 | EP1612850A1 Exposure apparatus and method for manufacturing device |
| 01/04/2006 | EP1612849A1 Exposure method and apparatus, and device manufacturing method |
| 01/04/2006 | EP1612848A1 Extreme ultraviolet light source and target for extreme ultraviolet light source |
| 01/04/2006 | EP1612623A1 Holographic recording medium and recording method using the same |
| 01/04/2006 | EP1612611A2 Composition for removing photoresist residue and polymer residue |
| 01/04/2006 | EP1612610A2 Developing method of photoresist and developing device |
| 01/04/2006 | EP1612609A2 Method and apparatus for immersion lithography |
| 01/04/2006 | EP1612608A2 Positioning apparatus and photolithography apparatus including the same |
| 01/04/2006 | EP1612607A2 Lithographic apparatus and device manufacturing method |
| 01/04/2006 | EP1612606A2 Illumination optimization for specific mask patterns |
| 01/04/2006 | EP1612605A1 Laser exposure |
| 01/04/2006 | EP1612604A2 Compositions and processes for immersion lithography |
| 01/04/2006 | EP1612603A2 Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device |
| 01/04/2006 | EP1612602A2 Photosensitive composition and method for forming pattern using the same |
| 01/04/2006 | EP1612586A2 Polarizing element, method of manufacturing polarizing element, method of evaluating exposure apparatus, method of manufacturing semiconductor device, and exposure apparatus |
| 01/04/2006 | EP1612556A1 Method of fixing low-molecular compound to solid-phase support |
| 01/04/2006 | EP1612247A2 Ink composition for inkjet recording and method of producing lithographic printing plate using the same |
| 01/04/2006 | EP1611486A2 Environmental system including a transport region for an immersion lithography apparatus |
| 01/04/2006 | EP1611485A2 Environmental system including vaccum scavange for an immersion lithography apparatus |
| 01/04/2006 | EP1611483A2 Novel photosensitive resin compositions |
| 01/04/2006 | EP1611482A2 Run-off path to collect liquid for an immersion lithography apparatus |
| 01/04/2006 | EP1278786B1 Copolymers for photoresists and processes therefor |
| 01/04/2006 | CN2750352Y Control device for preventing chip break-up |
| 01/04/2006 | CN1717779A Stage device, exposure apparatus, and method of manufacturing devices |
| 01/04/2006 | CN1717778A Method and apparatus for multilayer photoresist dry development |
| 01/04/2006 | CN1717777A Illumination optical system, exposure system, and exposure method |
| 01/04/2006 | CN1717776A Optical device and projection exposure apparatus using such optical device |
| 01/04/2006 | CN1717763A Unbaked laminate for producing front plate of plasma display device, and method for producing front plate of plasma display device |
| 01/04/2006 | CN1717632A Rinse liquid for lithography and method for forming resist pattern using same |
| 01/04/2006 | CN1717631A 光刻系统 Lithography system |
| 01/04/2006 | CN1717630A Positive photosensitive composition |
| 01/04/2006 | CN1717629A Radiation-sensitive resin composition |
| 01/04/2006 | CN1717628A Curable composition, cured object, color filter, and liquid-crystal display |
| 01/04/2006 | CN1717627A Photosensitive resin composition comprising a halogen-free colorant |
| 01/04/2006 | CN1717626A Method of pattern formation using ultrahigh heat resistant positive photosensitive composition |
| 01/04/2006 | CN1717625A Template |
| 01/04/2006 | CN1717624A Method of forming a rim phase shifting mask and using the rim phase shifting mask to form a semiconductor device |
| 01/04/2006 | CN1717598A Colored photosensitive composition for color filters, color filters, and process for the production thereof |
| 01/04/2006 | CN1717428A Photocurable and thermosetting resin composition and printed circuit boards made by using the same |
| 01/04/2006 | CN1716627A Image sensor and method for manufacturing the same |
| 01/04/2006 | CN1716535A Semiconductor manufacturing method and an exposure mask |
| 01/04/2006 | CN1716407A Manufacturing method of stamper master disc to produce optical recording medium |
| 01/04/2006 | CN1716114A Image recorder and image recording method |
| 01/04/2006 | CN1716104A Composition for removing photoresist residue and polymer residue |
| 01/04/2006 | CN1716103A Developing method of photoresist and developing device |
| 01/04/2006 | CN1716102A Aligning system and aligning method |
| 01/04/2006 | CN1716101A Image drawing apparatus and image drawing method |
| 01/04/2006 | CN1716100A Photo development apparatus and method for fabricating a color filter substrate using the same |
| 01/04/2006 | CN1716099A Pattern writing apparatus and pattern writing method |
| 01/04/2006 | CN1716098A Emulating method and device for exposure system |
| 01/04/2006 | CN1716097A Fractionation of resins using a static mixer and a liquid-liquid centrifuge |
| 01/04/2006 | CN1716096A Infrared light-sensitive composition |
| 01/04/2006 | CN1716095A Radiation sensitive resin composition, cured resin and liquid crystal display device |
| 01/04/2006 | CN1716094A Radiation sensitive resin composition |
| 01/04/2006 | CN1716093A Photoresist composition and spin-less coating method thereof, fabrication method of organic layer pattern and liquid crystal display |
| 01/04/2006 | CN1716092A Manufacturing method of thick film member pattern |
| 01/04/2006 | CN1716091A Transfer printing device and method for microwave structure pattern |
| 01/04/2006 | CN1716062A Method for producing array board of liquid crystal display device |
| 01/04/2006 | CN1715967A Method for producing color filter |
| 01/04/2006 | CN1715958A Method and device for producing optical module |
| 01/04/2006 | CN1715389A Composition for stripping and cleaning and use thereof |
| 01/04/2006 | CN1715343A Ink composition for ink jet recording and method of producing lithographic printing plate using the same |
| 01/04/2006 | CN1715270A Uv decomposable molecules and a photopatternable monomolecular film formed therefrom |
| 01/04/2006 | CN1714945A Rotary coating device |
| 01/04/2006 | CN1714944A Rotary cup type coating device |
| 01/04/2006 | CN1235280C Manufacture of deep-channel capacitor |
| 01/04/2006 | CN1235268C Method for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidification |
| 01/04/2006 | CN1235267C Treating solution applying method |
| 01/04/2006 | CN1235093C Corrosion inhibitor stripper composition using conductive material with high equivalent electric conductivity in aqueous solution |
| 01/04/2006 | CN1235092C Electron beam exposure method and system therefor |
| 01/04/2006 | CN1235091C Inert gas displacement method and device, exposure device and graticule sheet device |
| 01/04/2006 | CN1235090C Positive photo resist composition and method for forming resist pattern |
| 01/04/2006 | CN1235089C Photosensitive lithographic printing plate |
| 01/04/2006 | CN1235088C Light exposure monitoring method and method for making semiconductor device |
| 01/04/2006 | CN1235087C Mask pattern correction device and mask pattern correction method, mask manufacturing method and semiconductor device manufacturing method |
| 01/04/2006 | CN1234526C Metal net fabric for screen printing |