| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/11/2006 | EP1615071A1 Mask blank, mask blank manufacturing method, transfer mask manufacturing method, and semiconductor device manufacturing method |
| 01/11/2006 | EP1615067A1 Optical element, optical system, laser device, exposure device, mask testing device, and high polymer crystal processing device |
| 01/11/2006 | EP1615063A1 Imaging system for emulating high aperture scanner systems |
| 01/11/2006 | EP1615062A2 Microscopic imaging system and procedure for the emulation of a high aperture imaging system, in particular for mask inspection |
| 01/11/2006 | EP1614704A1 Crosslinked polyimide, composition comprising the same and method for producing the same |
| 01/11/2006 | EP1614537A1 Lithographic printing plate precursor and lithographic printing method |
| 01/11/2006 | EP1614153A2 Overlay metrology mark |
| 01/11/2006 | EP1614151A2 Organosilicate resin formulation for use in microelectronic devices |
| 01/11/2006 | EP1614009A2 Masking arrangement and method for producing integrated circuit arrangements |
| 01/11/2006 | EP1614008A2 Optical element for a lighting system |
| 01/11/2006 | EP1614007A1 Optical system, method of altering retardances therein and photolithography tool |
| 01/11/2006 | EP1614006A2 Method for the production of photopolymerizable, cylindrical, continuous seamless flexographic printing elements, and use thereof for the production of cylindrical flexographic printing forms |
| 01/11/2006 | EP1614005A2 Photoresist compositions |
| 01/11/2006 | EP1614004A2 Positive tone bi-layer imprint lithography method and compositions therefor |
| 01/11/2006 | EP1614002A2 Lithium salt of polyacetylene as radiation sensitive filaments and preparation and use thereof |
| 01/11/2006 | EP1614001A2 Cleanup method for optics in immersion lithography |
| 01/11/2006 | EP1614000A2 Optical arrangement of autofocus elements for use with immersion lithography |
| 01/11/2006 | EP1613707A1 Radiation-cured substances |
| 01/11/2006 | CN1720485A Composition for forming antireflection coating |
| 01/11/2006 | CN1720484A Positive type photoresist composition for LCD production and method of forming resist pattern |
| 01/11/2006 | CN1720483A Local flare correction |
| 01/11/2006 | CN1720482A Card printing system and method |
| 01/11/2006 | CN1720245A Oxime ester photoinitiators with heteroaromatic groups |
| 01/11/2006 | CN1720148A Combination mask |
| 01/11/2006 | CN1720139A Thermally sensitive multilayer imageable element |
| 01/11/2006 | CN1720110A Pollutant removal method and apparatus, and exposure method and apparatus |
| 01/11/2006 | CN1719580A Device manufacturing method |
| 01/11/2006 | CN1719340A Environmental protection plate cleaning liquid for plate making |
| 01/11/2006 | CN1719339A Exposure device and exposure method |
| 01/11/2006 | CN1719338A Ultraviolet ray solidification cation type etching glue for nano embessing |
| 01/11/2006 | CN1719337A Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same |
| 01/11/2006 | CN1718521A Base plate treater |
| 01/11/2006 | CN1236454C Process for recovering onium hydroxides from solutions containing onium compounds |
| 01/11/2006 | CN1236362C Material removing method, substance reproducing method and method for making display device |
| 01/11/2006 | CN1236361C Ultraviolet exposing machine and its exposure automatic control method and its device |
| 01/11/2006 | CN1236360C Method for forming micro-pattern on substrate |
| 01/11/2006 | CN1236359C Method in connection with the production of template and the template thus produced |
| 01/11/2006 | CN1236358C Positive photoresist composition |
| 01/11/2006 | CN1236353C Method for producing liquid crystal display device |
| 01/10/2006 | US6985847 System and method for process matching |
| 01/10/2006 | US6985655 Compositions and methods involving direct write optical lithography |
| 01/10/2006 | US6985618 Overlay marks, methods of overlay mark design and methods of overlay measurements |
| 01/10/2006 | US6985508 Very narrow band, two chamber, high reprate gas discharge laser system |
| 01/10/2006 | US6985286 Catadioptric optical system and exposure apparatus having the same |
| 01/10/2006 | US6985280 Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography |
| 01/10/2006 | US6985261 Method and apparatus for seamless imaging of sleeves as used in flexography |
| 01/10/2006 | US6985229 Overlay metrology using scatterometry profiling |
| 01/10/2006 | US6985227 Birefringence measurement at deep-ultraviolet wavelengths |
| 01/10/2006 | US6985218 Method of determining at least one parameter that is characteristic of the angular distribution of light illuminating an object in a projection exposure apparatus |
| 01/10/2006 | US6985211 photolithography apparatus comprising reflection multilayer stacks of molybdenum, rhodium, palladium, platinum, ruthenium, silicon and/or yttrium, and light sources, used for focussing patterned radiation beams on target substrates |
| 01/10/2006 | US6985210 Projection system for EUV lithography |
| 01/10/2006 | US6985208 Apparatus and method for retaining mirror, and mirror exchange method |
| 01/10/2006 | US6985196 Mask for manufacturing a substrate with light reflecting film having random light transmitting parts and non-light transmitting parts |
| 01/10/2006 | US6985193 Liquid crystal display device and method for manufacturing the same |
| 01/10/2006 | US6984945 Linear motor apparatus |
| 01/10/2006 | US6984941 Extreme UV radiation source and semiconductor exposure device |
| 01/10/2006 | US6984838 Surface position detection apparatus and method, and exposure apparatus and device manufacturing method using the exposure apparatus |
| 01/10/2006 | US6984583 Stereolithographic method for forming insulative coatings for via holes in semiconductor devices |
| 01/10/2006 | US6984531 Electrical field alignment vernier |
| 01/10/2006 | US6984483 obtainable by condensation of organically modified silanediols with organically modified silanes in presence of photoinitiator; use as negative resists; storage stability |
| 01/10/2006 | US6984482 Top-coating composition for photoresist and process for forming fine pattern using the same |
| 01/10/2006 | US6984478 Print control for flexographic printing |
| 01/10/2006 | US6984477 Resist pattern forming apparatus and method thereof |
| 01/10/2006 | US6984476 Radiation-sensitive resin composition, forming process for forming patterned insulation film, active matrix board and flat-panel display device equipped with the same, and process for producing flat-panel display device |
| 01/10/2006 | US6984473 Method of patterning a mask blank |
| 01/10/2006 | US6984472 Exposure method and apparatus |
| 01/10/2006 | US6984362 Processing apparatus, measuring apparatus, and device manufacturing method |
| 01/10/2006 | US6984334 Method of manufacturing optical element |
| 01/10/2006 | US6984051 Multifaceted reflecting mirror, illumination optical system based on use of the same, and semiconductor exposure apparatus |
| 01/10/2006 | US6983693 comprises forming an oleophilic image on a substrate for a printing plate comprising a support having a hydrophilic layer on its surface, the oleophilic image being formed by inkjet printing an aqueous solution or aqueous colloidal dispersion |
| 01/10/2006 | CA2116805C Mask and method for manufacturing the same |
| 01/05/2006 | WO2006002197A2 Image forming device and an exposure member |
| 01/05/2006 | WO2006001989A1 Holographic storage medium |
| 01/05/2006 | WO2006001892A1 Imaging system for thermal transfer |
| 01/05/2006 | WO2006001785A1 Lithographic systems and methods with extended depth of focus |
| 01/05/2006 | WO2006001520A1 Exposure apparatus, exposure method, and exposure mask |
| 01/05/2006 | WO2006001518A2 Cationic photopolymerizable epoxy resin composition, minute structural member using the same and method for manufacturing minute structural member |
| 01/05/2006 | WO2006001516A1 Photosensitive resin composition, method of forming level difference pattern using the photosensitive resin composition, and method of producing ink jet head |
| 01/05/2006 | WO2006001416A1 Management method, management system, and program |
| 01/05/2006 | WO2006001291A1 Projection optical system, exposure device, and exposure method |
| 01/05/2006 | WO2006000718A1 Device for generating extreme ultraviolet light and application to an extreme ultraviolet radiation lithography source |
| 01/05/2006 | WO2006000352A1 Positioning unit and alignment device for an optical element |
| 01/05/2006 | WO2005064411A3 Lithographic apparatus and with a debris-mitigation system |
| 01/05/2006 | WO2005062127A3 Method for joining at least two members |
| 01/05/2006 | WO2005054955A3 Lithographic apparatus and device manufacturing method |
| 01/05/2006 | WO2005054953A3 Holding device for an optical element in an objective |
| 01/05/2006 | WO2005045529A3 Characterization and compensation of errors in multi-axis interferometry system |
| 01/05/2006 | US20060004161 Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same |
| 01/05/2006 | US20060004129 Perfluoro-1,2-propylene oxide adduct carboxylate or sulfonate; phosphonic acid, amino acid or an aminosulfonic acid in aqueous medium; photolithography, storage stability; blends with polyvinylpyrrolidone, polyacrylic acid and/or polyvinyl alcohol |
| 01/05/2006 | US20060004118 Ink composition for inkjet recording and method of producing lithographic printing plate using the same |
| 01/05/2006 | US20060003910 Composition and method comprising same for removing residue from a substrate |
| 01/05/2006 | US20060003601 Method of forming fine patterns |
| 01/05/2006 | US20060003549 Assemblies including semiconductor substrates of reduced thickness and support structures therefor |
| 01/05/2006 | US20060003271 Basic supercritical solutions for quenching and developing photoresists |
| 01/05/2006 | US20060003269 Resist pattern forming method, substrate processing method, and device manufacturing method |
| 01/05/2006 | US20060003268 Method of forming semiconductor patterns |
| 01/05/2006 | US20060003267 Nano-structure and method of fabricating nano-structures |
| 01/05/2006 | US20060003264 Higher pattern accuracy with a small number of processes; improved forward tapered edge shape and surface flatness; shrinkage ratio before and after baking of second precursor layer is larger than that of first precursor layer; plasma display |
| 01/05/2006 | US20060003260 Alkali soluble copolymer have optionally alkylated styrene and hydroxystyrene units; bisvinyloxyalkylene or polyvinyl ether curing agent; photoacid generator; organic solvent; high sensitivity, heat resistance and resolution; undulation suppression |
| 01/05/2006 | US20060003259 Polymer comprising a 1-alkoxy- or 1-aryloxy-alkyl alkacrylate repeating unit, e.g., 1-n-propoxy-2-methylpropyl methacrylate, a compound that generates an acid by visible light irradiation, and a sensitizing dye; useful as an electronic circuit forming material, a lithographic printing material, etc. |