| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/18/2006 | CN1721569A Coat base with curved surface and method for manufacturing such coat base |
| 01/18/2006 | CN1721516A Semiconductor process residue removal composition |
| 01/18/2006 | CN1721160A Stamper, imprinting method, and method of manufacturing an information recording medium |
| 01/18/2006 | CN1237574C Mfg. method for semiconductor device |
| 01/18/2006 | CN1237402C System and method for coating and developing |
| 01/18/2006 | CN1237401C Photosensitive resin composition and printing circuit board |
| 01/18/2006 | CN1237400C Photosensitive resin composition |
| 01/18/2006 | CN1237399C Organis antireflective coating composition and method for forming photoresist pattern with the same composition |
| 01/18/2006 | CN1237398C Developing liquid manufacturing device and method |
| 01/18/2006 | CN1237397C Device isolating process flow for ARS system |
| 01/18/2006 | CN1237396C Light mark, focusing monitoring method, light exposure monitoring method, and manufacturing method of semiconductor device |
| 01/18/2006 | CN1237394C Producing method for lithographic printing plate originals |
| 01/18/2006 | CN1237387C Synchronous photoetching and exposing process on chip supporting net for making roller-to-roller display |
| 01/18/2006 | CN1237355C Optical component and method of manufacturing same |
| 01/18/2006 | CN1237136C Water-based coating composition, coated metallic material, and production process thereof |
| 01/18/2006 | CN1237085C Carboxylated photosensitive resin, alkali-developable photocurable/heat-curable composition containing the same, and cured article obtained therefrom |
| 01/18/2006 | CN1236933C Resin relief plate for forming film |
| 01/17/2006 | US6988016 Method for evaluating lithography process margins |
| 01/17/2006 | US6987830 Radiation generating apparatus, radiation generating method, exposure apparatus, and exposure method |
| 01/17/2006 | US6987621 Aberration correction optical system |
| 01/17/2006 | US6987599 Pattern generator mirror configurations |
| 01/17/2006 | US6987572 Methods and systems for lithography process control |
| 01/17/2006 | US6987569 Dynamic interferometer controlling direction of input beam |
| 01/17/2006 | US6987558 Reaction mass for a stage device |
| 01/17/2006 | US6987557 Enhanced lithographic displacement measurement system |
| 01/17/2006 | US6987556 Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby |
| 01/17/2006 | US6987554 Temperature adjusting system and exposure apparatus incorporating the same |
| 01/17/2006 | US6987335 Alignment apparatus and exposure apparatus using the same |
| 01/17/2006 | US6987279 Light source device and exposure equipment using the same |
| 01/17/2006 | US6987278 Gas flushing system with recovery system for use in lithographic apparatus |
| 01/17/2006 | US6987276 Gas supply unit, gas supply method and exposure system |
| 01/17/2006 | US6987275 Lithographic apparatus and device manufacturing method |
| 01/17/2006 | US6987198 Acid generator and thin film composition containing the same |
| 01/17/2006 | US6987155 Polymers for photoresist and photoresist compositions using the same |
| 01/17/2006 | US6987060 Semiconductor device having improved contact hole structure and method for fabricating the same |
| 01/17/2006 | US6987053 Method of evaluating reticle pattern overlay registration |
| 01/17/2006 | US6986983 Method for forming a reflection-type light diffuser |
| 01/17/2006 | US6986982 Resist material and method of manufacturing inkjet recording head using the same |
| 01/17/2006 | US6986981 Amplified photoresist |
| 01/17/2006 | US6986980 Method of producing micro structure, method of producing liquid discharge head, and liquid discharge head by the same |
| 01/17/2006 | US6986979 a polymeric microcapsule suspended in an aqueous media, which contains a stabilizer of an anionic polymeric mixture containing a first sulfonated polystyrene polymer and a second sulfonated polystyrene polymer in a specific ratio |
| 01/17/2006 | US6986975 sensing the first and the second pattern, with the distance being established such that the first and the second pattern form a desired moire pattern when the template and the substrate are in a desired spatial relationship |
| 01/17/2006 | US6986973 Test photomask, flare evaluation method, and flare compensation method |
| 01/17/2006 | US6986851 Dry developing method |
| 01/12/2006 | WO2006004171A1 Photosensitive film, process for producing the same, process for forming permanent pattern |
| 01/12/2006 | WO2006004135A1 Exposure apparatus and device manufacturing method |
| 01/12/2006 | WO2006003757A1 Method of forming plated product using negative photoresist composition and photosensitive composition used therein |
| 01/12/2006 | WO2006003373A2 Immersion photolithography system |
| 01/12/2006 | WO2006002859A2 Illumination source, wavefront measuring device and microlithography projection illumination device |
| 01/12/2006 | WO2006002567A1 Laser irradiation |
| 01/12/2006 | WO2005118656A3 Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers |
| 01/12/2006 | WO2005098537A3 Light source for photolithography |
| 01/12/2006 | WO2005088399A3 Method for the electrostatic structuring of a substrate surface and raster probe lithography method |
| 01/12/2006 | WO2005078528A3 Source optimization for image fidelity and throughput |
| 01/12/2006 | WO2005059648A3 Deffect mitigation in spatial light modulator used for dynamic photolithography |
| 01/12/2006 | WO2005038527A3 Enhancing photoresist performance using electric fields |
| 01/12/2006 | WO2005036265A3 Photoresist compositions comprising diamondoid derivatives |
| 01/12/2006 | WO2005029138A3 Systems and methods for inducing crystallization of thin films using multiple optical paths |
| 01/12/2006 | US20060010417 Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems |
| 01/12/2006 | US20060009583 Method of producing (meth) acrylic acid derivative polymer for resist |
| 01/12/2006 | US20060008758 System for two-step resist soft bake to prevent ILD outgassing during semiconductor processing |
| 01/12/2006 | US20060008747 Device manufacturing method |
| 01/12/2006 | US20060008746 Method for manufacturing semiconductor device |
| 01/12/2006 | US20060008739 Materials for use in programmed material consolidation processes |
| 01/12/2006 | US20060008733 Photosensitive composition and image recording method using the same |
| 01/12/2006 | US20060008712 Exposure method, mask fabrication method, fabrication method of semiconductor device, and exposure apparatus |
| 01/12/2006 | US20060008711 Mirror for exposure system, reflection mask for exposure system, exposure system and pattern formation method |
| 01/12/2006 | US20060008135 Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method |
| 01/12/2006 | US20060007839 Optical recording medium and master disc for manufacturing optical recording medium |
| 01/12/2006 | US20060007836 Optical recording medium and master disc for manufacturing optical recording medium |
| 01/12/2006 | US20060007563 Holding and positioning apparatus for an optical element |
| 01/12/2006 | US20060007532 Catadioptric optical system and exposure apparatus having the same |
| 01/12/2006 | US20060007495 Image-forming method and device utilizing a shim member arrangement |
| 01/12/2006 | US20060007431 Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion |
| 01/12/2006 | US20060007418 Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system |
| 01/12/2006 | US20060007416 Exposure apparatus |
| 01/12/2006 | US20060007415 Exposure system and device production process |
| 01/12/2006 | US20060007413 Esposure apparatus, cooling method, and device manufacturing method |
| 01/12/2006 | US20060006580 acts as barrier to prevent differently colored resins from blending |
| 01/12/2006 | US20060006503 Insulative coatings for apertures of semiconductor device components and semiconductor device components including insulative coatings |
| 01/12/2006 | US20060006448 Localized masking for semiconductor structure development |
| 01/12/2006 | US20060006373 Method for manufacturing pattern formed structure |
| 01/12/2006 | US20060006350 Lithographic projection apparatus and reflector assembly for use therein |
| 01/12/2006 | US20060006349 Optical switching in lithography system |
| 01/12/2006 | US20060006345 Inductively-driven light source for lithography |
| 01/12/2006 | US20060006136 Processing system and method for chemically treating a tera layer |
| 01/12/2006 | US20060005420 Method and apparatus for heat processing of substrate |
| 01/12/2006 | DE112004000235T5 Fotomasken-Rohling, Fotomaske und Bild-Übertragungsverfahren unter Verwendung einer Fotomaske Photomask blank photo mask and image transmission method using a photomask |
| 01/12/2006 | DE10350114B4 Optisches Element sowie Excimerlaser mit optischem Element Optical element and excimer laser with optical element |
| 01/12/2006 | DE102005028240A1 Abdecklack zum Ausbilden eines Musters und Verfahren zum Ausbilden des Musters unter Verwendung desselben Of the same for forming a resist pattern and method for forming the pattern using |
| 01/12/2006 | DE102004063246A1 Flüssige Zusammensetzung für die Immersions-Lithographie und Lithographieverfahren unter Verwendung derselben A liquid composition for immersion lithography and lithographic method using the same |
| 01/12/2006 | DE102004029503A1 New polymer modified with infra red-absorber (obtained by reaction of a polymer with phenolic groups and/or sulfonamide groups, with a photo-thermal transformation material), useful for the production of radiation-sensitive elements |
| 01/12/2006 | DE102004029501A1 Modifizierte Polymere und ihre Verwendung bei der Herstellung von Lithographie-Druckplattenvorläufern Modified polymers and their use in the preparation of lithographic printing plate precursors |
| 01/12/2006 | DE102004027621A1 Laser beam marking device for lead marking, has laser beam source that is designed, such that marking beams are present in the form of transverse ring mode, and deflection device used for deflecting beams to carrier for object to be marked |
| 01/11/2006 | EP1615077A2 Alignment method and apparatus, lithographic apparatus, device manufacturing method, and alignment tool |
| 01/11/2006 | EP1615076A1 Projection system for EUV lithography |
| 01/11/2006 | EP1615075A1 Device for fabricating printing screens |
| 01/11/2006 | EP1615074A1 Photosensitive resin composition, photosensitive layer therefrom and photosensitive resin printing original plate |
| 01/11/2006 | EP1615073A1 Photosensitive composition and image recording method using the same |
| 01/11/2006 | EP1615072A2 Photosensitive resin composition |