| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/19/2006 | WO2006006730A1 Planar motor equipment, stage equipment, exposure equipment and device manufacturing method |
| 01/19/2006 | WO2006006565A1 Exposure equipment and device manufacturing method |
| 01/19/2006 | WO2006006562A1 Method of determining exposure conditions, exposure method, exposure apparatus, and method of producing device |
| 01/19/2006 | WO2006005547A1 Catadioptric projection objective |
| 01/19/2006 | WO2006005149A2 Method of producing polymer layer with latent polarized image |
| 01/19/2006 | WO2005109585A3 Graphic-arts laser imaging with reduced-length laser cavities and improved performance |
| 01/19/2006 | WO2005101122A3 Cleaning of multi-layer mirrors |
| 01/19/2006 | WO2005059618A3 Microlithography projection objective with crystal lens |
| 01/19/2006 | WO2004013693A3 Scatterometry alignment for imprint lithography |
| 01/19/2006 | US20060014381 Method for forming interconnection line in semiconductor device using a phase-shift photo mask |
| 01/19/2006 | US20060014110 Photoresist stripping solution and a method of stripping photoresists using the same |
| 01/19/2006 | US20060014108 Resist pattern forming method based on near-field exposure, and substrate processing method and device manufacturing method using the resist pattern forming method |
| 01/19/2006 | US20060014104 Method for making a lithographic printing plate |
| 01/19/2006 | US20060014103 Exposing heat-sensitive, negative-working printing plate precursor which is not sensitive to visible and UV light comprising a support with a hydrophilic layer and a coating; developing the precursor by applying an aqueous alkaline solution |
| 01/19/2006 | US20060014102 Lining board for lithographic plate and its manufacturing method. and protected lithographic plate and its stack |
| 01/19/2006 | US20060014100 high resolution, favorable shape, wide depth of focus; acrylic ester copolymer |
| 01/19/2006 | US20060014098 Process for producing photoresist composition, filter, coater and photoresist composition |
| 01/19/2006 | US20060013960 Apparatus and method for processing a substrate |
| 01/19/2006 | US20060012893 Objective, in particular a projection objective in microlithography |
| 01/19/2006 | US20060012880 Optical device with refractive and diffractive properties |
| 01/19/2006 | US20060012799 Method and apparatus for determining telecentricity and microlithography projection exposure apparatus |
| 01/19/2006 | US20060012769 Illumination optical system and exposure apparatus using the same |
| 01/19/2006 | US20060012768 Exposure apparatus and optical component for the same |
| 01/19/2006 | US20060012765 Exposure apparatus and device fabrication method |
| 01/19/2006 | US20060012764 Exposure apparatus and method |
| 01/19/2006 | US20060012762 Method for cleaning semiconductor device |
| 01/19/2006 | US20060012051 Production process and production apparatus of three-dimensionally structured material |
| 01/19/2006 | US20060011912 Method of forming a metal pattern and a method of fabricating tft array panel by using the same |
| 01/19/2006 | US20060011895 Pb free Ag paste composition for PDP address electrode |
| 01/19/2006 | US20060011864 Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby |
| 01/19/2006 | US20060011855 Movable carriage for a lithographic apparatus and device manufacturing method |
| 01/19/2006 | DE4238404B4 Verfahren zur Herstellung einer Halbleiterspeichervorrichtung A method of manufacturing a semiconductor memory device |
| 01/19/2006 | DE10239956B4 Katadioptrisches Mikroskopobjektiv A catadioptric microscope objective |
| 01/19/2006 | DE102004059252A1 Optically active structure application method for Fresnel lens manufacture, involves photographic structuring photosensitive resist layer, coating substrate with optically active layer and lifting-off resist layer |
| 01/19/2006 | DE102004031111A1 Sub lithographic structure production, involves removing etch resistant layer and hard mask layer, and providing eventually isotopic etching in such manner that sub lithographic conducting layer is obtained |
| 01/19/2006 | DE102004030861A1 Structuring a semiconductor substrate in a lithographic manner comprises preparing a semiconductor substrate, applying a first layer containing a photoresist and further processing |
| 01/19/2006 | DE102004030803A1 Hochreflektiv beschichteter mikromechanischer Spiegel, Verfahren zu dessen Herstellung sowie dessen Verwendung Highly reflective coated micro-mechanical mirror, process for its preparation and its use |
| 01/19/2006 | DE102004030019A1 Photopolymerisierbare Zusammensetzung A photopolymerizable composition |
| 01/19/2006 | DE102004020744A1 Test layout used in the production of deep trench capacitive memory elements comprises a first test pattern arranged in the middle position of a test region, a second test pattern close to the first test pattern and a third test pattern |
| 01/19/2006 | DE102004016480B4 Vollintegrierte hybride optisch-elektrische Leiterplatte Fully integrated hybrid optical-electrical circuit board |
| 01/19/2006 | DE10131488B4 Verfahren zur chemischen Nachverstärkung von Photoresists im UV-Bereich A method for chemical amplification of photoresists in the UV range |
| 01/19/2006 | DE10131144B4 Verstärkung von Resiststrukturen aus fluorierten Resistpolymeren durch strukturelles Aufwachsen der Strukturen mittels gezieltem chemischem Anbinden von fluorierten Oligomeren Amplification of resist structures of fluorinated polymer resist by structural growth of the structures by means of targeted chemical binding of fluorinated oligomers |
| 01/19/2006 | CA2573328A1 Microstructuring of mesogens using contact printing |
| 01/18/2006 | EP1617292A2 Light source unit and exposure apparatus having the same |
| 01/18/2006 | EP1617291A2 Immersion exposure liquid and pattern formation method |
| 01/18/2006 | EP1617290A1 Apparatus and method for maskless lithography |
| 01/18/2006 | EP1617289A1 Composition for formation of underlayer film for lithography containing epoxy compound and carboxylic acid compound |
| 01/18/2006 | EP1617288A1 Photosensitive composition and lithographic printing plate precursor |
| 01/18/2006 | EP1617287A1 Method of manufacturing mask blank |
| 01/18/2006 | EP1616888A1 Resin for under-layer material, under-layer material, laminate and method for forming resist pattern |
| 01/18/2006 | EP1616854A1 Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process |
| 01/18/2006 | EP1616344A2 Creation of a permanent structure with high three-dimensional resolution |
| 01/18/2006 | EP1616225A2 Precision motion control using feed forward of acceleration |
| 01/18/2006 | EP1616224A2 Micromachining process, system and product |
| 01/18/2006 | EP1616220A2 Maintaining immersion fluid under a lithographic projection lens |
| 01/18/2006 | EP1616211A1 Exposure control |
| 01/18/2006 | EP1615695A2 Collector for euv light source |
| 01/18/2006 | EP1540287A4 Backlighting system for displays |
| 01/18/2006 | EP1258060A4 Fast wavelength correction technique for a laser |
| 01/18/2006 | CN1723594A Ultraviolet light source, laser treatment apparatus comprising ultraviolet light source, and exposure apparatus comprising ultraviolet light source |
| 01/18/2006 | CN1723542A Exposure apparatus and device manufacturing method |
| 01/18/2006 | CN1723541A Exposure apparatus and method for producing device |
| 01/18/2006 | CN1723540A Exposure apparatus and method for producing device |
| 01/18/2006 | CN1723539A Exposure apparatus, exposure method, and method for producing device |
| 01/18/2006 | CN1723538A Exposure apparatus and method for producing device |
| 01/18/2006 | CN1723537A Exposure apparatus and method for producing device |
| 01/18/2006 | CN1723536A Exposure apparatus and method for producing device |
| 01/18/2006 | CN1723519A Field emission device, and method of manufacturing such a device |
| 01/18/2006 | CN1723499A Liquid removal in a method and device for irradiating spots on a layer |
| 01/18/2006 | CN1723419A Resistor structures to electrically measure unidirectional misalignment of stitched masks |
| 01/18/2006 | CN1723418A Composition for forming antireflection film for lithography |
| 01/18/2006 | CN1723417A Apparatus and method for making a forming structure |
| 01/18/2006 | CN1723416A Picture dimension correcting unit and method, photomask and test used photomask |
| 01/18/2006 | CN1723384A Method to detect a defective element |
| 01/18/2006 | CN1723222A Novel photosensitive resin based on saponified polyvinyl acetate, photosensitive resin composition, method of forming aqueous gel from the same, and compound |
| 01/18/2006 | CN1722426A Semiconductor unit |
| 01/18/2006 | CN1722380A Manufacture method of semiconductor device for improving photo resist remainder after etch |
| 01/18/2006 | CN1722366A Method for manufacturing semiconductor device |
| 01/18/2006 | CN1722361A Substrate processing device and method, and pattern forming method |
| 01/18/2006 | CN1722002A Photoresistive desquamation process and apparatus thereof |
| 01/18/2006 | CN1722001A Lithographic projection apparatus and device manufacturing method |
| 01/18/2006 | CN1722000A Exposure apparatus and aberration correction method |
| 01/18/2006 | CN1721999A Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby |
| 01/18/2006 | CN1721998A Lithographic apparatus and device manufacturing method |
| 01/18/2006 | CN1721997A Multi-focus scanning with a tilted mask or wafer |
| 01/18/2006 | CN1721996A Image drawing apparatus and image drawing method |
| 01/18/2006 | CN1721995A Optical magnification adjustment system and projection exposure device |
| 01/18/2006 | CN1721994A Lithographic apparatus, control system and device manufacturing method |
| 01/18/2006 | CN1721993A System and method for moving an object employing piezo actuators |
| 01/18/2006 | CN1721992A Star polymer |
| 01/18/2006 | CN1721991A Production method for photosensitive resin composition and element and related members |
| 01/18/2006 | CN1721990A Composition for forming sheet materials, production method thereof, and sheet-shape unsintered materials for producing display screen |
| 01/18/2006 | CN1721989A Photoresist composition |
| 01/18/2006 | CN1721986A Mask pattern for manufacturing semiconductor device and its forming method, method for manufacturing coating composition for forming micropattern, and method for manufacturing semiconductor device |
| 01/18/2006 | CN1721962A Gray mask and manufacturing method thereof |
| 01/18/2006 | CN1721960A Gray mask and method for manufacturing gray mask |
| 01/18/2006 | CN1721959A Liquid crystal display picture element structure and manufacturing method thereof and liquid crystal display panel |
| 01/18/2006 | CN1721925A Liquid crystal display apparatus and method of manufacturing the same |
| 01/18/2006 | CN1721888A Colored photosensistive resin composition, coating film of colored photosensitive resin composition, photosensitive resin transfer material |
| 01/18/2006 | CN1721880A Optical devices made from radiation curable fluorinated compositions |