Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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01/26/2006 | US20060018045 Mirror arrangement and method of manufacturing thereof, optical system and lithographic method of manufacturing a miniaturized device |
01/26/2006 | US20060017910 Composite printing |
01/26/2006 | US20060017905 Projection optical system, exposure apparatus, and device manufacturing method |
01/26/2006 | US20060017900 Optical arrangement of autofocus elements for use with immersion lithography |
01/26/2006 | US20060017898 Exposure apparatus and aberration correction method |
01/26/2006 | US20060017897 Exposure apparatus |
01/26/2006 | US20060017896 Cooling apparatus |
01/26/2006 | US20060017074 Raised-lines overlay semiconductor targets and method of making the same |
01/26/2006 | US20060017027 Debris mitigation device |
01/26/2006 | US20060017023 High flux, high energy photon source |
01/26/2006 | US20060017021 Multi-electron beam exposure method and apparatus |
01/26/2006 | US20060016785 Composition for removing photoresist and/or etching residue from a substrate and use thereof |
01/26/2006 | US20060016356 Image forming material |
01/26/2006 | US20060016355 Flexographic pringting plate, flexographic printing device, production method for flexographic printing plate and production method for printing matter |
01/26/2006 | DE102004031720A1 Method of determining optimal light distribution in imaging device for photolithographic structuring in a mask on a semiconductor wafer uses algorithmic pixel evaluation |
01/26/2006 | CA2574054A1 Oxime derivatives and the use therof as latent acids |
01/25/2006 | EP1619557A1 Composition for removing photoresist and/or etching residue from a substrate and use thereof |
01/25/2006 | EP1619556A1 Method and masks for reducing the impact of stray light during optical lithography |
01/25/2006 | EP1619555A1 Porous underlayer film and underlayer film forming composition used for forming the same |
01/25/2006 | EP1619554A1 Positive photoresist composition and method for forming resist pattern |
01/25/2006 | EP1619553A1 Positive resist composition and method of formation of resist patterns |
01/25/2006 | EP1619407A1 Exposure apparatus and semiconductor device manufacturing method |
01/25/2006 | EP1619226A1 Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device |
01/25/2006 | EP1619023A2 Image forming material |
01/25/2006 | EP1618601A2 Methods and apparatus for patterned deposition of nanostructure-containing materials by self-assembly and related articles |
01/25/2006 | EP1618438A2 Photolithographic process, stamper, use of said stamper and optical data storage medium |
01/25/2006 | EP1618437A2 Composition and method for printing a patterned resist layer |
01/25/2006 | EP1618436A2 Determination of center of focus by parameter variability analysis |
01/25/2006 | EP1618429A1 Illuminating and imaging system comprising a diffractive beam splitter |
01/25/2006 | EP1618426A1 Method and array for determining the focal position during imaging of a sample |
01/25/2006 | EP1378036A4 Injection seeded laser with precise timing control |
01/25/2006 | EP1303892A4 Injection seeded f 2? lithography laser |
01/25/2006 | EP1258059A4 Bandwidth control technique for a laser |
01/25/2006 | EP0902914B1 Continuous production of cross-linked resin relief images for printing plates |
01/25/2006 | CN2754121Y Optical mash liquid crystal projection colour enlarging device |
01/25/2006 | CN1726630A Apparatus for processing an object with high position accurancy |
01/25/2006 | CN1726435A Process for producing photoresist composition, filter, coater and photoresist composition |
01/25/2006 | CN1726434A Color filter black matrix resist composition |
01/25/2006 | CN1726433A Compositions and processes for nanoimprinting |
01/25/2006 | CN1726432A Laser exposure of photosensitive masks for DNA microarray fabrication |
01/25/2006 | CN1726431A Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrications |
01/25/2006 | CN1726429A Chucking system and method for modulating shapes of substrates |
01/25/2006 | CN1726427A Liquid crystal displays with post spacers, and their manufacture |
01/25/2006 | CN1725111A Exposure system, exposure method and method for fabricating semiconductor device |
01/25/2006 | CN1725110A Lithographic apparatus having a gas flushing device |
01/25/2006 | CN1725109A Lithographic apparatus and device manufacturing method |
01/25/2006 | CN1725108A Photoreaction apparatus |
01/25/2006 | CN1725107A Production technology of antiforged package |
01/25/2006 | CN1725089A Manufacturing method of two-wine structure film transistor array |
01/25/2006 | CN1725086A Photosensitive resin composite, spacer for display plate and display plate |
01/25/2006 | CN1725076A System and method for manufacturing a flat panel display |
01/25/2006 | CN1724626A Composition for removing photoresist and/or etching residue from a substrate and use thereof |
01/25/2006 | CN1238771C Resist removing agent |
01/25/2006 | CN1238770C Resist remover composition |
01/25/2006 | CN1238769C Mask forming and removing method, and semiconductor device, electric circuit, display module, color filter and emissive device manufactured by the same method |
01/25/2006 | CN1238768C Developer solution composition and use method thereof |
01/25/2006 | CN1238767C Optical recorder and recording method thereof |
01/25/2006 | CN1238766C Positive type radiosensitive composition and method for forming pattern |
01/25/2006 | CN1238765C Sensitive paste-like material, plasma display and Manufacturing method thereof |
01/25/2006 | CN1238764C Method for producing photomask, photomark , image transfer method |
01/25/2006 | CN1238763C Image recorder |
01/25/2006 | CN1238762C Method for preparing optical film for stretching visual angle of display screen |
01/25/2006 | CN1238752C Substrate processing devices |
01/25/2006 | CN1238232C Image recorder |
01/25/2006 | CN1238203C 平版印刷版 Lithographic printing plate |
01/24/2006 | US6990430 System and method for on-the-fly eccentricity recognition |
01/24/2006 | US6990386 Moving mechanism and stage system in exposure apparatus |
01/24/2006 | US6990225 Inspection method of photo mask for use in manufacturing semiconductor device |
01/24/2006 | US6990173 Positioning apparatus, atmosphere substituting method, exposure apparatus, and device manufacturing method |
01/24/2006 | US6989922 Deformable mirror actuation system |
01/24/2006 | US6989920 System and method for dose control in a lithographic system |
01/24/2006 | US6989904 Method of determining local structures in optical crystals |
01/24/2006 | US6989889 Method, system, and apparatus for management of reaction loads in a lithography system |
01/24/2006 | US6989888 Stage system, exposure apparatus, and device manufacturing method |
01/24/2006 | US6989887 Dual force mode fine stage apparatus |
01/24/2006 | US6989886 Series of lens components are dimensioned to collect at least third order diffraction components of the patterned beam, which reduce ghosting effects; microlens array (MLA) imaging systems |
01/24/2006 | US6989885 Scanning exposure apparatus and method |
01/24/2006 | US6989647 Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device |
01/24/2006 | US6989629 Method and apparatus for debris mitigation for an electrical discharge source |
01/24/2006 | US6989603 nF-Opening Aiv Structures |
01/24/2006 | US6989595 contact lithography; low-k dielectrics; reverse images |
01/24/2006 | US6989544 Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program |
01/24/2006 | US6989515 Imaging stabilization apparatus and method for high-performance optical systems |
01/24/2006 | US6989358 Including alcohol; solubilizing inorganic salts and polar organic compounds; damage-free, residue-free cleaning |
01/24/2006 | US6989333 Process for forming a pattern |
01/24/2006 | US6989231 Method of forming fine patterns using silicon oxide layer |
01/24/2006 | US6989230 Producing low k inter-layer dielectric films using Si-containing resists |
01/24/2006 | US6989229 radiating photoresists/photomasks, transferring patterns without transferring tile, absorption; semiconductors; integrated circuits; improved uniformity |
01/24/2006 | US6989227 E-beam curable resist and process for e-beam curing the resist |
01/24/2006 | US6989226 A hydrophilic copolymer is used as dispersants for improving compatibility and dispersibility of photosensitive resin in water, monomers of copolymer comprising methacrylic acid, butadiene, styrene, butyl acrylate, modified by acrylic acid |
01/24/2006 | US6989225 Liquid phase; photopolymerization; heat resistance; impact strength; mixture of polyepoxide and addition polymer |
01/24/2006 | US6989224 Acrylated resins; exposure, development |
01/24/2006 | US6989220 Processless digitally imaged photopolymer elements using microspheres |
01/24/2006 | US6989177 molding optical filters from photosensitive epoxy resins, in radiation transparent substrates having interiors patterned with grooves, then curing and separating from substrates; liquid crystals displays; color photography |
01/24/2006 | US6989068 Roller chain for applying pressure |
01/24/2006 | CA2452564C Test slide for microscopes and method for the production of such a slide |
01/24/2006 | CA2244780C Covered microchannels and the microfabrication thereof |
01/19/2006 | WO2006007536A1 Area based optical proximity correction in raster scan printing |
01/19/2006 | WO2006007270A1 Imageable element with solvent-resistant polymeric binder |
01/19/2006 | WO2006006854A2 Microstructuring of mesogens using contact printing |