Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
01/2006
01/26/2006US20060018045 Mirror arrangement and method of manufacturing thereof, optical system and lithographic method of manufacturing a miniaturized device
01/26/2006US20060017910 Composite printing
01/26/2006US20060017905 Projection optical system, exposure apparatus, and device manufacturing method
01/26/2006US20060017900 Optical arrangement of autofocus elements for use with immersion lithography
01/26/2006US20060017898 Exposure apparatus and aberration correction method
01/26/2006US20060017897 Exposure apparatus
01/26/2006US20060017896 Cooling apparatus
01/26/2006US20060017074 Raised-lines overlay semiconductor targets and method of making the same
01/26/2006US20060017027 Debris mitigation device
01/26/2006US20060017023 High flux, high energy photon source
01/26/2006US20060017021 Multi-electron beam exposure method and apparatus
01/26/2006US20060016785 Composition for removing photoresist and/or etching residue from a substrate and use thereof
01/26/2006US20060016356 Image forming material
01/26/2006US20060016355 Flexographic pringting plate, flexographic printing device, production method for flexographic printing plate and production method for printing matter
01/26/2006DE102004031720A1 Method of determining optimal light distribution in imaging device for photolithographic structuring in a mask on a semiconductor wafer uses algorithmic pixel evaluation
01/26/2006CA2574054A1 Oxime derivatives and the use therof as latent acids
01/25/2006EP1619557A1 Composition for removing photoresist and/or etching residue from a substrate and use thereof
01/25/2006EP1619556A1 Method and masks for reducing the impact of stray light during optical lithography
01/25/2006EP1619555A1 Porous underlayer film and underlayer film forming composition used for forming the same
01/25/2006EP1619554A1 Positive photoresist composition and method for forming resist pattern
01/25/2006EP1619553A1 Positive resist composition and method of formation of resist patterns
01/25/2006EP1619407A1 Exposure apparatus and semiconductor device manufacturing method
01/25/2006EP1619226A1 Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device
01/25/2006EP1619023A2 Image forming material
01/25/2006EP1618601A2 Methods and apparatus for patterned deposition of nanostructure-containing materials by self-assembly and related articles
01/25/2006EP1618438A2 Photolithographic process, stamper, use of said stamper and optical data storage medium
01/25/2006EP1618437A2 Composition and method for printing a patterned resist layer
01/25/2006EP1618436A2 Determination of center of focus by parameter variability analysis
01/25/2006EP1618429A1 Illuminating and imaging system comprising a diffractive beam splitter
01/25/2006EP1618426A1 Method and array for determining the focal position during imaging of a sample
01/25/2006EP1378036A4 Injection seeded laser with precise timing control
01/25/2006EP1303892A4 Injection seeded f 2? lithography laser
01/25/2006EP1258059A4 Bandwidth control technique for a laser
01/25/2006EP0902914B1 Continuous production of cross-linked resin relief images for printing plates
01/25/2006CN2754121Y Optical mash liquid crystal projection colour enlarging device
01/25/2006CN1726630A Apparatus for processing an object with high position accurancy
01/25/2006CN1726435A Process for producing photoresist composition, filter, coater and photoresist composition
01/25/2006CN1726434A Color filter black matrix resist composition
01/25/2006CN1726433A Compositions and processes for nanoimprinting
01/25/2006CN1726432A Laser exposure of photosensitive masks for DNA microarray fabrication
01/25/2006CN1726431A Nanometer-scale engineered structures, methods and apparatus for fabrication thereof, and applications to mask repair, enhancement, and fabrications
01/25/2006CN1726429A Chucking system and method for modulating shapes of substrates
01/25/2006CN1726427A Liquid crystal displays with post spacers, and their manufacture
01/25/2006CN1725111A Exposure system, exposure method and method for fabricating semiconductor device
01/25/2006CN1725110A Lithographic apparatus having a gas flushing device
01/25/2006CN1725109A Lithographic apparatus and device manufacturing method
01/25/2006CN1725108A Photoreaction apparatus
01/25/2006CN1725107A Production technology of antiforged package
01/25/2006CN1725089A Manufacturing method of two-wine structure film transistor array
01/25/2006CN1725086A Photosensitive resin composite, spacer for display plate and display plate
01/25/2006CN1725076A System and method for manufacturing a flat panel display
01/25/2006CN1724626A Composition for removing photoresist and/or etching residue from a substrate and use thereof
01/25/2006CN1238771C Resist removing agent
01/25/2006CN1238770C Resist remover composition
01/25/2006CN1238769C Mask forming and removing method, and semiconductor device, electric circuit, display module, color filter and emissive device manufactured by the same method
01/25/2006CN1238768C Developer solution composition and use method thereof
01/25/2006CN1238767C Optical recorder and recording method thereof
01/25/2006CN1238766C Positive type radiosensitive composition and method for forming pattern
01/25/2006CN1238765C Sensitive paste-like material, plasma display and Manufacturing method thereof
01/25/2006CN1238764C Method for producing photomask, photomark , image transfer method
01/25/2006CN1238763C Image recorder
01/25/2006CN1238762C Method for preparing optical film for stretching visual angle of display screen
01/25/2006CN1238752C Substrate processing devices
01/25/2006CN1238232C Image recorder
01/25/2006CN1238203C 平版印刷版 Lithographic printing plate
01/24/2006US6990430 System and method for on-the-fly eccentricity recognition
01/24/2006US6990386 Moving mechanism and stage system in exposure apparatus
01/24/2006US6990225 Inspection method of photo mask for use in manufacturing semiconductor device
01/24/2006US6990173 Positioning apparatus, atmosphere substituting method, exposure apparatus, and device manufacturing method
01/24/2006US6989922 Deformable mirror actuation system
01/24/2006US6989920 System and method for dose control in a lithographic system
01/24/2006US6989904 Method of determining local structures in optical crystals
01/24/2006US6989889 Method, system, and apparatus for management of reaction loads in a lithography system
01/24/2006US6989888 Stage system, exposure apparatus, and device manufacturing method
01/24/2006US6989887 Dual force mode fine stage apparatus
01/24/2006US6989886 Series of lens components are dimensioned to collect at least third order diffraction components of the patterned beam, which reduce ghosting effects; microlens array (MLA) imaging systems
01/24/2006US6989885 Scanning exposure apparatus and method
01/24/2006US6989647 Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
01/24/2006US6989629 Method and apparatus for debris mitigation for an electrical discharge source
01/24/2006US6989603 nF-Opening Aiv Structures
01/24/2006US6989595 contact lithography; low-k dielectrics; reverse images
01/24/2006US6989544 Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program
01/24/2006US6989515 Imaging stabilization apparatus and method for high-performance optical systems
01/24/2006US6989358 Including alcohol; solubilizing inorganic salts and polar organic compounds; damage-free, residue-free cleaning
01/24/2006US6989333 Process for forming a pattern
01/24/2006US6989231 Method of forming fine patterns using silicon oxide layer
01/24/2006US6989230 Producing low k inter-layer dielectric films using Si-containing resists
01/24/2006US6989229 radiating photoresists/photomasks, transferring patterns without transferring tile, absorption; semiconductors; integrated circuits; improved uniformity
01/24/2006US6989227 E-beam curable resist and process for e-beam curing the resist
01/24/2006US6989226 A hydrophilic copolymer is used as dispersants for improving compatibility and dispersibility of photosensitive resin in water, monomers of copolymer comprising methacrylic acid, butadiene, styrene, butyl acrylate, modified by acrylic acid
01/24/2006US6989225 Liquid phase; photopolymerization; heat resistance; impact strength; mixture of polyepoxide and addition polymer
01/24/2006US6989224 Acrylated resins; exposure, development
01/24/2006US6989220 Processless digitally imaged photopolymer elements using microspheres
01/24/2006US6989177 molding optical filters from photosensitive epoxy resins, in radiation transparent substrates having interiors patterned with grooves, then curing and separating from substrates; liquid crystals displays; color photography
01/24/2006US6989068 Roller chain for applying pressure
01/24/2006CA2452564C Test slide for microscopes and method for the production of such a slide
01/24/2006CA2244780C Covered microchannels and the microfabrication thereof
01/19/2006WO2006007536A1 Area based optical proximity correction in raster scan printing
01/19/2006WO2006007270A1 Imageable element with solvent-resistant polymeric binder
01/19/2006WO2006006854A2 Microstructuring of mesogens using contact printing