| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/01/2006 | EP1621932A1 Photo mask and focus measuring method using the mask |
| 02/01/2006 | EP1621931A1 Protective film-forming composition for immersion exposure and pattern-forming method using the same |
| 02/01/2006 | EP1621930A2 Illumination system for a microlithographic projection exposure apparatus |
| 02/01/2006 | EP1621929A2 Photosensitive composition comprising a sensitising dye |
| 02/01/2006 | EP1621928A1 Photopolymerizable composition. |
| 02/01/2006 | EP1621927A2 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same |
| 02/01/2006 | EP1621517A1 Method of bonding molecule and molecule bonding apparatus |
| 02/01/2006 | EP1621339A1 Plate-making method of lithographic printing plate |
| 02/01/2006 | EP1621337A1 Image recording material and lithographic printing plate precursor |
| 02/01/2006 | EP1620475A1 Novel trifunctional photoinitiators |
| 02/01/2006 | EP1574902A9 Method of pattern formation using ultrahigh heat resistant positive photosensitive composition |
| 02/01/2006 | CN1729522A Method and device for irradiating spots on a layer |
| 02/01/2006 | CN1729521A Method and device for irradiating spots on a layer |
| 02/01/2006 | CN1729431A Dual hemispherical collectors |
| 02/01/2006 | CN1729430A Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer |
| 02/01/2006 | CN1729429A Color filter black matrix resist composition and carbon black dispersion composition used for the composition |
| 02/01/2006 | CN1729428A Method and system for fabricating nanoscale patterns in light curable compositions using an electric field |
| 02/01/2006 | CN1729234A Polymers, methods of use thereof, and methods of decomposition thereof |
| 02/01/2006 | CN1729225A Capsule type hardener and composition |
| 02/01/2006 | CN1728356A Substrate processor |
| 02/01/2006 | CN1728335A Method for reducing the fogging effect |
| 02/01/2006 | CN1728002A Lithographic apparatus and method for calibrating the same |
| 02/01/2006 | CN1728001A Shutter of self-control liquid crystal light valve group for photo etching |
| 02/01/2006 | CN1728000A Lithographic apparatus and device manufacturing method |
| 02/01/2006 | CN1727999A New type hexa aryl and di-imidazole photoinitiator, and photosensitive combination of polyimide |
| 02/01/2006 | CN1727998A Photosensitive agent for producing acid containing fluorin-aether structured multi functional groups |
| 02/01/2006 | CN1727997A New type compound of sulfur onium salt in use for photosensitive agent for producing acid, and preparation method |
| 02/01/2006 | CN1727996A Improved image forming composition and method |
| 02/01/2006 | CN1727995A Composition for photoresist protective film, photoresist protective film and photoresist pattern formation process |
| 02/01/2006 | CN1727994A Method for reducing surface roughness on Nano stamping reproduction based on technique of backflow |
| 02/01/2006 | CN1727993A Pressing die in use for Nano stamping and preparation method |
| 02/01/2006 | CN1727976A Array substrate for LCD and fabrication method thereof |
| 02/01/2006 | CN1727970A Gantry-type XY stage |
| 02/01/2006 | CN1727951A Semi permeable type liquid crystal display, and producing method |
| 02/01/2006 | CN1727920A Method for preparing polymer of electric field tuning/2D optical grating in liquid crystal |
| 02/01/2006 | CN1240120C Desk rack positioning and its control and exposure device and method for producing semiconductor device |
| 02/01/2006 | CN1240109C Method for forming open-top pattern and application thereof |
| 02/01/2006 | CN1239961C Method and system for preparing high polymer group biochip micro flow path structure adopting quasi molecule laser |
| 02/01/2006 | CN1239958C Image recorder |
| 01/31/2006 | US6993742 correction tool predicts film edge placement for photoresist/photomask film/pattern; integrated circuits |
| 01/31/2006 | US6993411 System and method for discrete time trajectory planning for lithography |
| 01/31/2006 | US6992834 Objective with birefringent lenses |
| 01/31/2006 | US6992780 Position detecting method and apparatus, exposure apparatus and device manufacturing method |
| 01/31/2006 | US6992767 Management system, apparatus, and method, exposure apparatus, and control method therefor |
| 01/31/2006 | US6992763 Beam splitting apparatus, transmittance measurement apparatus, and exposure apparatus |
| 01/31/2006 | US6992754 Lithographic apparatus and device manufacturing method |
| 01/31/2006 | US6992753 for reducing radiation-induced damage to lenses; photolithography |
| 01/31/2006 | US6992752 Lithographic projection apparatus, computer program for control thereof, and device manufacturing method |
| 01/31/2006 | US6992751 Scanning exposure apparatus |
| 01/31/2006 | US6992750 Exposure apparatus and method |
| 01/31/2006 | US6992688 imaging via fresh developer; useful as lithographic printing plate precursors; for stochastic screening; photothermography |
| 01/31/2006 | US6992474 Movement actuator/sensor systems |
| 01/31/2006 | US6992371 Device including an amorphous carbon layer for improved adhesion of organic layers and method of fabrication |
| 01/31/2006 | US6992306 Temperature adjustment apparatus, exposure apparatus having the same, and device fabricating method |
| 01/31/2006 | US6992050 Stripping agent composition and method of stripping |
| 01/31/2006 | US6992015 Pattern formation method |
| 01/31/2006 | US6992013 Method of forming a fine pattern using a silicon-oxide-based film, semiconductor device with a silicon-oxide-based film and method of manufacture thereof |
| 01/31/2006 | US6991896 comprises photomasks/optical filters for patterning contact-holes; improved resolution |
| 01/31/2006 | US6991895 Defocus-invariant exposure for regular patterns |
| 01/31/2006 | US6991893 Providing a structure to prevent the alteration, upon exposure to radiation, of a portion of an overlying photoresist layer; and forming photoresist over structure |
| 01/31/2006 | US6991892 Methods of making an integrated waveguide photodetector |
| 01/31/2006 | US6991890 acid generator, additive, and unsaturated hydroxyl-containing monomer; not subject to swelling and/or microbridging when exposed photoresist is dissolved in developer solution, avoiding limited spatial resolution in photolithography |
| 01/31/2006 | US6991888 Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds |
| 01/31/2006 | US6991887 hydrosilation; platinum-bis-beta-diketonates as photopolymerization catalysts; polysiloxanes; polycarbosiloxanes; sensors |
| 01/31/2006 | US6991877 Projection lens exposes pattern to illumination; for fabrication of semiconductor chips, integrated circuits |
| 01/31/2006 | US6991739 Method of photoresist removal in the presence of a dielectric layer having a low k-value |
| 01/31/2006 | US6991416 System and method for reticle protection and transport |
| 01/31/2006 | US6991386 Image forming apparatus and image forming method |
| 01/31/2006 | US6991385 Method for developing processing and apparatus for supplying developing solution |
| 01/31/2006 | US6990870 System for determining characteristics of substrates employing fluid geometries |
| 01/26/2006 | WO2006009905A1 Laser output beam wavefront splitter for bandwidth spectrum control |
| 01/26/2006 | WO2006009852A2 Optical elements with protective undercoating |
| 01/26/2006 | WO2006009626A2 Imprinting lithography using the liquid/solid transition of metals and their alloys |
| 01/26/2006 | WO2006009295A1 Electron beam applying apparatus and drawing apparatus |
| 01/26/2006 | WO2006009188A1 Image surface measurement method, exposure method, device manufacturing method, and exposure device |
| 01/26/2006 | WO2006009169A1 Exposure method and method for producing device |
| 01/26/2006 | WO2006009064A1 Support method and support structure for optical member, optical apparatus, exposure apparatus, and device production method |
| 01/26/2006 | WO2006009046A1 Development processing device and development processing method |
| 01/26/2006 | WO2006009045A1 Substrate heating equipment substrate heating method |
| 01/26/2006 | WO2006008415A1 Method for producing a biochip blank, and corresponding blank and biochip |
| 01/26/2006 | WO2006008073A2 Lithographic printing plates with high print run stability |
| 01/26/2006 | WO2005101082A3 Optical element and fixture for an optical element |
| 01/26/2006 | WO2005083513A3 Composite patterning with trenches |
| 01/26/2006 | WO2005077032A3 Uv radiation blocking protective layers compatible with thick film pastes |
| 01/26/2006 | WO2005066716A3 Lithographic apparatus and device manufacturing method |
| 01/26/2006 | WO2005012384A8 Modified epoxy resin, process for production thereof, photosensitive resin compositions and photosensitive elements |
| 01/26/2006 | US20060020068 Photosensitive compositions based on polycyclic polymers for low stress, high temperature films |
| 01/26/2006 | US20060019439 Process for obtaining spatially-organised nanostructures on thin films |
| 01/26/2006 | US20060019309 Self-assembling peptide surfaces for cell patterning and interactions |
| 01/26/2006 | US20060019204 Exposure system, exposure method and method for fabricating semiconductor device |
| 01/26/2006 | US20060019202 at least one sub-resolution feature connecting the first and second main features; greater flexibility and optimization of proximity correction performance without mask inspection problems |
| 01/26/2006 | US20060019200 Method for making a negative working, heat-sensitive lithographic printing plate precursor |
| 01/26/2006 | US20060019197 Sensitizer dyes for photoacid generating systems |
| 01/26/2006 | US20060019195 Photoresist undercoat-forming material and patterning process |
| 01/26/2006 | US20060019192 Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same |
| 01/26/2006 | US20060019184 Multi-exposure lithography method and system providing increased overlay accuracy |
| 01/26/2006 | US20060019181 [method of manufacturing color filter array and thin film] |
| 01/26/2006 | US20060019180 Photo mask, focus measuring method using the mask, and method of manufacturing semiconductor device |
| 01/26/2006 | US20060019179 Method of reducing the impact of stray light during optical lithography, devices obtained thereof and masks used therewith |
| 01/26/2006 | US20060019177 Lithographic mask and manufacturing method thereof |