| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/08/2006 | CN1731282A An imaging interference photo etching method adopting grating combination and photo etching system therefor |
| 02/08/2006 | CN1731281A Method for manufacturing special purpose ultrahigh smoothness flexible mold for large-area micro-imprinting |
| 02/08/2006 | CN1731280A Manufacturing process of MEMS impression template based on wet etching |
| 02/08/2006 | CN1731279A Method for preparing three-dimensional micro-configuration of unidimensional nanometer material |
| 02/08/2006 | CN1731278A EUV magnetic contrast lithography mask and manufacture thereof |
| 02/08/2006 | CN1731276A A photosensitive-thermosensitive microcapsule and photosensitive-thermosensitive recording material containing same |
| 02/08/2006 | CN1731249A Mask, thin film transistor substrate, method of manufacturing the thin film transistor substrate using the mask, and display apparatus using the thin film transistor substrate |
| 02/08/2006 | CN1241072C Thinner for rinsing photoresist and method of treating photoresist layer |
| 02/08/2006 | CN1241071C 湿蚀刻装置 Wet etching apparatus |
| 02/08/2006 | CN1241070C Method to enhance resolution of a chemically amplified photoresist |
| 02/08/2006 | CN1241069C Pattern writing apparatus, pattern writing method and substrate |
| 02/08/2006 | CN1241068C Base plate exposure device and method |
| 02/08/2006 | CN1241067C Method for adjusting focus position |
| 02/08/2006 | CN1241066C Negative photosensitive resin composition and display device using same |
| 02/08/2006 | CN1241065C Photoresist composition with optical acid-generating agent containing optical free radical generating agent |
| 02/08/2006 | CN1241064C Chemically amplified resist composition |
| 02/08/2006 | CN1241063C X-ray mask and quartz ring ultraviolet solidifying apparatus and method for using |
| 02/08/2006 | CN1241062C Pregaining sensitive flat printing plate |
| 02/08/2006 | CN1240816C Liquid detergent for removing photoresist |
| 02/08/2006 | CN1240790C UV curing intaglo ink |
| 02/08/2006 | CN1240741C carbamate oligomer, resin composition thereof, and cured article thereof |
| 02/08/2006 | CN1240666C Photoresist monomer, its copolymer and composition using the same |
| 02/08/2006 | CN1240554C Laser thermal transfer recording method |
| 02/07/2006 | US6996449 Semiconductor manufacturing apparatus control system |
| 02/07/2006 | US6996141 Device for reducing the peak power of a pulsed laser light source |
| 02/07/2006 | US6995930 Catadioptric projection objective with geometric beam splitting |
| 02/07/2006 | US6995918 Projection optical system and projection exposure apparatus |
| 02/07/2006 | US6995908 Methods for reducing aberration in optical systems |
| 02/07/2006 | US6995833 Projection optical system, exposure apparatus, and device manufacturing method |
| 02/07/2006 | US6995832 Apparatus for forming pattern |
| 02/07/2006 | US6995831 Lithographic apparatus with alignment subsystem, device manufacturing method, using alignment, and alignment structure |
| 02/07/2006 | US6995830 Lithographic projection apparatus and device manufacturing method |
| 02/07/2006 | US6995829 Projection optical system, exposure apparatus, and device manufacturing method |
| 02/07/2006 | US6995828 Exposure apparatus and aberration correction method |
| 02/07/2006 | US6995747 Capacitive sensing and data input device power management |
| 02/07/2006 | US6995528 Linear motor apparatus |
| 02/07/2006 | US6995379 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 02/07/2006 | US6995378 Lens array with a laterally movable optical axis for corpuscular rays |
| 02/07/2006 | US6995290 alpha-methylstyrene oligomeric somers( containing indene ring and hydroxy and carbonyl groups) are useful as photoinitiators in light-induced radical photopolymerisation of acrylic monomers |
| 02/07/2006 | US6995215 Interpenetrating polymer networks; particle reinforcement |
| 02/07/2006 | US6995193 Photocurable composition, process for producing photocurable composition, photocurable pressure-sensitive adhesive sheet, process for producing photocurable pressure-sensitive adhesive sheet, and method of bonding |
| 02/07/2006 | US6995080 Methods of forming transistor gates |
| 02/07/2006 | US6994950 Method for integrating micro- and nanoparticles into MEMS and apparatus including the same |
| 02/07/2006 | US6994949 Control distortion of a profile on a corner of a trench, and to prevent capacitance value increasing |
| 02/07/2006 | US6994948 Aqueous developable photoimageable thick film compositions |
| 02/07/2006 | US6994946 comprises pendant polysilsequioxanes which improve alkali solubility under the action of an acid; photoresists have improved resistance to etching |
| 02/07/2006 | US6994945 Silicon-containing polymer, resist composition and patterning process |
| 02/07/2006 | US6994944 Radiation sensitive resin composition, cathode separator and EL display device |
| 02/07/2006 | US6994940 Phase shift mask, method for forming pattern using phase shift mask and manufacturing method for electronic device |
| 02/07/2006 | US6994938 Exposure method for producing a hologram mask |
| 02/07/2006 | US6994507 Transport apparatus |
| 02/07/2006 | US6994444 Method and apparatus for managing actinic intensity transients in a lithography mirror |
| 02/07/2006 | US6994028 Development process on a press of planographic printing plate material and printing process |
| 02/02/2006 | WO2006012062A2 Method and apparatus for gas discharge laser output light coherency reduction |
| 02/02/2006 | WO2006011607A1 Material for forming resist protective film and method for forming resist pattern using same |
| 02/02/2006 | WO2006011442A1 Positive resist composition and method of forming resist pattern |
| 02/02/2006 | WO2006011427A1 Fluorine-containing compound, fluorine-containing polymer, resist composition and resist protective film composition |
| 02/02/2006 | WO2006011338A1 Pigment dispersion composition, use thereof and compound for treating pigment |
| 02/02/2006 | WO2006011105A2 Optical system having a cleaning arrangement |
| 02/02/2006 | WO2005119363A3 Assembly for supporting a workpiece or specimen in a charged particle beam system |
| 02/02/2006 | WO2005119362A3 Laser interferometer mirror assembly |
| 02/02/2006 | WO2005103819A3 Method of emulation of lithographic projection tools |
| 02/02/2006 | WO2005081060A3 Device consisting of at least one optical element |
| 02/02/2006 | WO2005057280A3 Lithographic apparatus and device manufacturing method |
| 02/02/2006 | US20060025549 Process for using protective layers in the fabrication of electronic devices |
| 02/02/2006 | US20060025540 Polymeric compositions and uses therefor |
| 02/02/2006 | US20060024622 Developing method and apparatus |
| 02/02/2006 | US20060024621 Method of producing a structure on the surface of a substrate |
| 02/02/2006 | US20060024618 Magnetic read sensors that utilize the giant magnetoresistive (GMR) effect for their operation are patterned to produce a required trackwidt; forming a bilayer lift-off mask having sharply defined edge and corner regions, includes use of ozone to assist in the controlled dissolution of mask underlayer |
| 02/02/2006 | US20060024611 Photosensitive composition and lithographic printing plate precursor |
| 02/02/2006 | US20060024609 Process for the production of negative working lithographic printing plate precursors with a coating comprising diazo resin |
| 02/02/2006 | US20060024594 Method for exposing a substrate with a structure pattern which compensates for the optical proximity effect |
| 02/02/2006 | US20060024591 Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product |
| 02/02/2006 | US20060023931 System for evaluating a design of a mask, exposure system, method for evaluating a design of a mask, method for manufacturing a semiconductor device and mask |
| 02/02/2006 | US20060023309 Projection aligner, aberration estimating mask pattern, aberration quantity estimating method, aberration eliminating filter and semiconductor manufacturing method |
| 02/02/2006 | US20060023206 Gantry-type XY stage |
| 02/02/2006 | US20060023195 Levitated reticle-masking blade stage |
| 02/02/2006 | US20060023193 Projection exposure system for microlithography and method for generating microlithographic images |
| 02/02/2006 | US20060023189 Lithographic apparatus and device manufacturing method |
| 02/02/2006 | US20060023188 Exposure apparatus and method for manufacturing device |
| 02/02/2006 | US20060023187 Environmental system including an electro-osmotic element for an immersion lithography apparatus |
| 02/02/2006 | US20060023186 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine |
| 02/02/2006 | US20060023185 Cleanup method for optics in immersion lithography |
| 02/02/2006 | US20060023184 Immersion lithography fluid control system |
| 02/02/2006 | US20060023183 Liquid jet and recovery system for immersion lithography |
| 02/02/2006 | US20060023182 Environmental system including a transport region for an immersion lithography apparatus |
| 02/02/2006 | US20060023181 Run-off path to collect liquid for an immersion lithography apparatus |
| 02/02/2006 | US20060022982 Drawing apparatus and drawing method |
| 02/02/2006 | US20060021964 Composition for forming antireflection coating |
| 02/02/2006 | DE19945140B4 Verfahren zur Herstellung einer Maskenschicht mit Öffnungen verkleinerter Breite A process for producing a mask layer with a reduced width openings |
| 02/02/2006 | DE112004000333T5 Silesquioxan-Harz, Positiv-Resist-Zusammensetzung, Resist-Laminat und Methode zur Bildung eines Resist-Musters Silsesquioxane resin, positive resist composition, the resist laminate and method for forming a resist pattern |
| 02/02/2006 | DE102005030543A1 Polarizer device for illumination system, has interference device converting light beam with angular distribution to another beam, and decoupling device receiving latter beam and emitting beam with another angular distribution |
| 02/02/2006 | DE102005029499A1 Lithographische Maske und Herstellungsverfahren hierfür Lithographic mask and manufacturing method thereof |
| 02/02/2006 | DE102005029330A1 Re-usable printing form with a printing area, useful in both wet- and dry offset printing, comprises printing area with a fluoridated phosphonic acid treated metallic oxide surface |
| 02/02/2006 | DE102004063519A1 Verfahren zur Bildung einer Verbindungsleitung in einem Halbleiterbauelement uner Verwendung einer Phasenverschiebungsfotomaske A method of forming a connection line in a semiconductor device using an unwanted phase shift photomask |
| 02/02/2006 | DE102004034416A1 Flüssige, strahlunghärtende Zusammensetzungen Liquid compositions strahlunghärtende |
| 02/02/2006 | DE102004030961A1 Verfahren zum Bestimmen einer Matrix von Transmissionskreuzkoeffizienten bei einer optischen Näherungskorrektur von Maskenlayouts A method for determining a matrix of the transmission cross coefficient in an optical proximity correction mask layout |
| 02/02/2006 | DE10063819B4 Maskenerstellung zur Herstellung einer Druckform Mask creation of producing a printing forme |
| 02/01/2006 | EP1622191A1 Projection optical system, exposure apparatus, and exposure method |
| 02/01/2006 | EP1621933A2 Lithographic apparatus and method for calibrating the same |