| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/14/2006 | US6999172 Optical apparatus |
| 02/14/2006 | US6999162 Stage device, exposure system, method of device manufacture, and device |
| 02/14/2006 | US6999161 Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 02/14/2006 | US6999160 Optimization method of aperture type of projection aligner |
| 02/14/2006 | US6999159 Exposure apparatus and device manufacturing method including gas purging of a space containing optical components |
| 02/14/2006 | US6999158 Apparatus for forming pattern |
| 02/14/2006 | US6999157 Illumination optical system and method, and exposure apparatus |
| 02/14/2006 | US6998787 Method of operating a microcavity discharge device |
| 02/14/2006 | US6998738 comprises stable/flat platen and support; miniaturization |
| 02/14/2006 | US6998737 Lithographic apparatus and device manufacturing method |
| 02/14/2006 | US6998621 Cooling of a device for influencing an electron beam |
| 02/14/2006 | US6998620 Stable energy detector for extreme ultraviolet radiation detection |
| 02/14/2006 | US6998442 Prevents back reflection of lower film layers and eliminates standing wave that occurs as a result of thickness changes of photoresist and light; semiconductors |
| 02/14/2006 | US6998352 Cleaning method, method for fabricating semiconductor device and cleaning solution |
| 02/14/2006 | US6998226 Heating temperatures between the first bake and the second bake is about 35 degrees C.*55 degrees C.; semiconductor, photolithography, antireflection coatings |
| 02/14/2006 | US6998225 Lift-off process; resist remover consists of an amine or a cyclic nitrogen compound so that the residual resist mask need not be removed by ashing. |
| 02/14/2006 | US6998224 Plasma deposited optical waveguide |
| 02/14/2006 | US6998222 Producing an electrically-conductive structure on a non-planar surface |
| 02/14/2006 | US6998221 patterning an opening of predetermined width in a photoresist layer located over an intermediate layer covering a substrate, etching into the intermediate layer such that an intermediate opening is formed with decreased width, forming a via opening |
| 02/14/2006 | US6998219 Three-dimensional multilayer structure; photolithography; generating ultraviolet light; forming pattern |
| 02/14/2006 | US6998218 Apparatus and method for thermally developing flexographic printing sleeves |
| 02/14/2006 | US6998217 Gray scale lithography; accurate, uniform reticle writing smaller features |
| 02/14/2006 | US6998215 Negative resist process with simultaneous development and chemical consolidation of resist structures |
| 02/14/2006 | US6998213 Comprises polyesters; improved abrasion resistance and light-/color-fastness, free from blocking during roll storage |
| 02/14/2006 | US6998206 coating a photomask substrate with a chemically amplified photoresist containing a modified phenolic polymer, and an onium salt-containing chemical amplifier; coating ; baking such chemically amplified photoresist on said photomask substrate |
| 02/14/2006 | US6998200 Reflection layer on a substrate, an absorber pattern on the reflection layer, and a capping layer on the reflection layer. The capping layer may be selected to decrease a reflectivity of the reflection photomask by less than about |
| 02/14/2006 | US6998199 Alternating phase shifting masking; generating destructive interference |
| 02/14/2006 | US6998198 Contact hole printing by packing and unpacking |
| 02/09/2006 | WO2006015142A2 Catadioptric imaging system exhibiting enhanced deep ultraviolet spectral bandwidth |
| 02/09/2006 | WO2006014193A1 Processing system and method for chemically treating a tera layer |
| 02/09/2006 | WO2006013856A1 Stage device and exposure system |
| 02/09/2006 | WO2006013806A1 Exposure equipment, exposure method and device manufacturing method |
| 02/09/2006 | WO2006013475A2 Photoresist compositions |
| 02/09/2006 | WO2006013257A1 Surface microstructuring device |
| 02/09/2006 | WO2006013100A2 Projection objective for microlithography |
| 02/09/2006 | WO2006000217A3 Method and system for exposing an area according to digital image data |
| 02/09/2006 | WO2005089130A3 A high repetition rate laser produced plasma euv light source |
| 02/09/2006 | WO2005059617A3 Projection objective having a high aperture and a planar end surface |
| 02/09/2006 | WO2005015311A3 Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method |
| 02/09/2006 | US20060030068 Fabrication method for phase change diode memory cells |
| 02/09/2006 | US20060029887 Semiconductor devices having a support structure for an active layer pattern and methods of forming the same |
| 02/09/2006 | US20060029885 Capable of forming a high resolution resist pattern with good shape and little film thinning; forming a resist layer from a chemically amplified positive resist; exposing; developing layer using an aqueous alkyl ammonium hydroxide solution |
| 02/09/2006 | US20060029883 Photosensitive resin bag for non-pre-sensitized printing plate making |
| 02/09/2006 | US20060029447 Image forming apparatus and image forming method |
| 02/09/2006 | US20060028715 Catadioptric projection optical system, exposure apparatus having the same, device fabrication method |
| 02/09/2006 | US20060028634 Multiple exposures of photosensitve material |
| 02/09/2006 | US20060028632 Environmental system including vacuum scavenge for an immersion lithography apparatus |
| 02/09/2006 | US20060028631 Exposure apparatus and exposure method |
| 02/09/2006 | US20060028629 Exposure apparatus |
| 02/09/2006 | US20060028310 Alignment apparatus, exposure apparatus, and device manufacturing method |
| 02/09/2006 | US20060027949 Device of microstructure imprint for pattern transfer and method of the same |
| 02/09/2006 | US20060027538 Pattern generation methods and apparatuses |
| 02/09/2006 | US20060027164 Method and apparatus for coating a photosensitive material |
| 02/09/2006 | US20060027117 Method for manufacturing and controlling structures and patterns of soluble and colloidal substances by printing on the micrometer and nanometer scale and with reduction of the dimensions of the stamp's features |
| 02/09/2006 | DE10341467A1 Kristallisationsapparat, Kristallisationsverfahren und Phasenschieber Crystallization apparatus, crystallization method and phase shifter |
| 02/09/2006 | DE10208786B4 Verfahren zur Modifikation von Resiststrukturen und Resistschichten aus wässriger Phase A process for the modification of resist patterns and resist layers from the aqueous phase |
| 02/09/2006 | DE102005032937A1 Illumination system for light projection lithographic systems has concave mirror with circular partial surfaces reflecting different beams of light corresponding to different angles |
| 02/09/2006 | DE102004034572A1 Verfahren zum Herstellen einer Struktur auf der Oberfläche eines Substrats A method of producing a structure on the surface of a substrate |
| 02/09/2006 | DE102004034362A1 Lithographie-Druckplatten mit hoher Auflagenbeständigkeit Lithographic printing plates with high print durability |
| 02/09/2006 | DE102004033350A1 Method for correction of systematic line width fluctuations during transmission of pattern onto substrate is by exposure apparatus with aperture through local variation of width and/or transparency of aperture along one direction |
| 02/09/2006 | DE102004031688A1 Verfahren zur Anpassung von Strukturabmessungen bei der photolithographischen Projektion eines Musters von Strukturelementen auf einen Halbleiterwafer A method for adjustment of the structural dimensions in photolithographic projection of a pattern of structural elements on a semiconductor wafer |
| 02/09/2006 | DE102004031398A1 Verfahren zur photolithographischen Projektion eines Musters auf einen Halbleiterwafer mit einer alternierenden Phasenmaske Photolithographic process for projecting a pattern on a semiconductor wafer with an alternating phase mask |
| 02/09/2006 | CA2572725A1 Surface microstructuring device |
| 02/08/2006 | EP1624481A1 Exposure apparatus and method for manufacturing device |
| 02/08/2006 | EP1624480A1 Exposure method, mask, semiconductor device manufacturing method, and semiconductor device |
| 02/08/2006 | EP1624467A2 Lithographic apparatus and device manufacturing method |
| 02/08/2006 | EP1624344A2 Method and apparatus for thermal development with a non-rotating supporting surface for a development medium |
| 02/08/2006 | EP1624343A2 Method and apparatus for thermal development with development medium remover |
| 02/08/2006 | EP1624342A2 Lithographic apparatus, an apparatus comprising an illumination system, an apparatus comprising a projection system, an optical element for a lithographic apparatus and device manufacturing method |
| 02/08/2006 | EP1624341A2 Liquid immersion exposure apparatus, method of controlling the same, and device manufacturing method |
| 02/08/2006 | EP1624340A2 Photoresist compositions comprising blends of ionic and non-ionic photoaced generators |
| 02/08/2006 | EP1624339A1 Photosensitive dielectric compositions, tapes, and method of application of a dielectric sheet using the same |
| 02/08/2006 | EP1623828A2 Method and means for imaging a printing plate |
| 02/08/2006 | EP1623789A2 Source of laser radiation |
| 02/08/2006 | EP1623278A1 Resist composition and organic solvent for removing resist |
| 02/08/2006 | EP1623277A2 Stereolithographic seal and support structure for semiconductor wafer |
| 02/08/2006 | EP1623276A2 Maskless lithographic system |
| 02/08/2006 | EP1623275A2 Method providing an improved bi-layer photoresist pattern |
| 02/08/2006 | EP1623274A2 Photoresist compositions |
| 02/08/2006 | EP1623273A2 Use of spin-on, photopatternable, interplayer dielectric materials and intermediate semiconductor device structure utilizing the same |
| 02/08/2006 | EP1382095A4 Laser wavelength control unit with piezoelectric driver |
| 02/08/2006 | EP1141781B1 Large-apertured projection lens with minimal diaphragm error |
| 02/08/2006 | EP1011970B1 Thermal imaging element and lithographic printing plate precursor |
| 02/08/2006 | CN2757182Y Column spray developing and mist spray developing interchangeable developing device |
| 02/08/2006 | CN1732575A Method for roughening a surface of a body, and optoelectronic component |
| 02/08/2006 | CN1732555A Coating device and coating film forming method |
| 02/08/2006 | CN1732412A A method of determining best process setting for optimum process window optimizing process performance determining optimum process window for a lithographic process |
| 02/08/2006 | CN1732411A Method of measuring the performance of an illumination system |
| 02/08/2006 | CN1732410A Alkali-soluble gap filling material forming composition for lithography |
| 02/08/2006 | CN1732409A Positive resist composition and method for forming resist pattern |
| 02/08/2006 | CN1732408A 辐射敏感性树脂组合物 The radiation-sensitive resin composition |
| 02/08/2006 | CN1732407A Curable resin composition and flexographic printing plate material using the same |
| 02/08/2006 | CN1732238A Radiation curable aqueous compositions |
| 02/08/2006 | CN1732214A Method for modifying the surface of a polymeric substrate |
| 02/08/2006 | CN1731288A Liquid immersion exposure apparatus, method of controlling the same, and device manufacturing method |
| 02/08/2006 | CN1731287A Method for double-face etching of wafer |
| 02/08/2006 | CN1731286A Method of through hole etching for RF device products |
| 02/08/2006 | CN1731285A Color screen manufacturing method and exposure device |
| 02/08/2006 | CN1731284A Imaging interference photo etching method adopting gated shutter and trapezoidal prism and photo etching system therefor |
| 02/08/2006 | CN1731283A Imaging interference photo etching method using two quadrature acousto-optic modulators and photo etching system |