| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/21/2006 | US7001696 Near-field light exposure mask with avoidance of overlap of near-field light, method for manufacturing the same, exposure apparatus and method using near-field light exposure mask, and method for manufacturing device |
| 02/21/2006 | US7001695 Multiple alternating phase shift technology for amplifying resolution |
| 02/21/2006 | US7001674 Polishing semiconductors, integrated circuits; multistage process; transferring pattern, masking |
| 02/21/2006 | US7001644 Surface-active photoinitiators |
| 02/21/2006 | US7001462 Method for making an oriented optical fluoride crystal blank |
| 02/21/2006 | US7001461 Crystallization apparatus, crystallization method, and phase shifter |
| 02/21/2006 | US7001086 Developing method, substrate treating method, and substrate treating apparatus |
| 02/16/2006 | WO2006017791A2 Aqueous developable photo-imageable composition precursors for use in photo-patterning methods |
| 02/16/2006 | WO2006017035A1 Photosensitive dielectric resin compositions and their uses |
| 02/16/2006 | WO2006016925A1 Photosensitive compositions based on polycyclic polymers |
| 02/16/2006 | WO2006016619A1 Substrate processing apparatus, use state ascertaining method, and false use preventing method |
| 02/16/2006 | WO2006016584A1 Optical characteristic measuring device, optical characteristic measuring method, exposure device, exposure method, and device manufacturing method |
| 02/16/2006 | WO2006016551A1 Method for controlling exposure system, exposure method and system using same, and method for manufacturing device |
| 02/16/2006 | WO2006016489A1 Substrate processing method |
| 02/16/2006 | WO2006016469A1 Illumination optical equipment, exposure system and method |
| 02/16/2006 | WO2005064412A3 Lithographic apparatus and device manufacturing method |
| 02/16/2006 | WO2005045527A3 Method of lacquering semiconductor substrates |
| 02/16/2006 | WO2004107413A3 Plasma ashing apparatus and endpoint detection process |
| 02/16/2006 | WO2004097519A3 Method and mark for metrology of phase errors on phase shift masks |
| 02/16/2006 | WO2004088414A3 Positive tone bi-layer imprint lithography method and compositions therefor |
| 02/16/2006 | US20060036023 Color filter black matrix resist composition |
| 02/16/2006 | US20060035472 Master base for fabrication and method for manufacturing the same |
| 02/16/2006 | US20060035176 Photoresist stripping solution and a method of stripping photoresists using the same |
| 02/16/2006 | US20060035174 Pixel structure of a thin film transistor liquid crystal display and fabricating method thereof |
| 02/16/2006 | US20060035173 Patterning thin metal films by dry reactive ion etching |
| 02/16/2006 | US20060035170 Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same |
| 02/16/2006 | US20060035169 Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same |
| 02/16/2006 | US20060035167 Ultrathin polymeric photoacid generator layer and method of fabricating at least one of a device and a mask by using said layer |
| 02/16/2006 | US20060035165 Positive resist composition and method of forming a resist pattern using the same |
| 02/16/2006 | US20060035164 Replication and transfer of microstructures and nanostructures |
| 02/16/2006 | US20060035158 Flowing a reference pattern and an inspection pattern with a first line and a number of parallel second lines and a reference pattern in the orthogonal direction to that in which the first line extends by heating the resist; measuring the distance between the centers of the patterns; checking variations |
| 02/16/2006 | US20060035157 Depositing resist on portion of workpiece, transferring pattern on mask by exposing to light from light guiding cable with connector, mask removable by connector, developing, forming pattern by etching |
| 02/16/2006 | US20060034344 Apparatus and method for forming pattern |
| 02/16/2006 | US20060034004 Optical element holder, exposure apparatus, and device fabricating method |
| 02/16/2006 | US20060033917 Calibration wafer for a stepper |
| 02/16/2006 | US20060033916 Selection method, exposure method, selection unit, exposure apparatus, and device manufacturing method |
| 02/16/2006 | US20060033904 Substrate holding device, semiconductor manufacturing apparatus and device manufacturing method |
| 02/16/2006 | US20060033901 Exposure apparatus and method for manufacturing device |
| 02/16/2006 | US20060033900 Exposure method and apparatus |
| 02/16/2006 | US20060033899 Environmental system including vacuum scavenge for an immersion lithography apparatus |
| 02/16/2006 | US20060033898 Lithographic apparatus and device manufacturing method |
| 02/16/2006 | US20060033895 Illumination system having a more efficient collector optic |
| 02/16/2006 | US20060033894 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine |
| 02/16/2006 | US20060033893 Exposure technique |
| 02/16/2006 | US20060033892 Lithographic apparatus and device manufacturing method |
| 02/16/2006 | US20060033876 Liquid crystal displays with post spacers, and their manufacture |
| 02/16/2006 | US20060033800 Exposure apparatus |
| 02/16/2006 | US20060033055 Surface position detection apparatus and method, and exposure apparatus and device manufacturing method using the exposure apparatus |
| 02/16/2006 | US20060033051 Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program |
| 02/16/2006 | US20060033050 Electron-beam drawing apparatus and electron-beam drawing method |
| 02/16/2006 | US20060033019 Polarization state detecting system, light source, and exposure apparatus |
| 02/16/2006 | US20060033012 System for compensating for dark current in sensors |
| 02/16/2006 | US20060032835 Method and apparatus for simulating standard test wafers |
| 02/16/2006 | US20060032569 Tire with raised indicia |
| 02/16/2006 | DE10323664B4 Belichtungsvorrichtung mit Dosissensorik Exposure apparatus with dose Sensors |
| 02/16/2006 | DE102005033916A1 Ausrichtung eines MTJ-Stapels an Leiterbahnen in Abwesenheit von Topographie Orientation of a MTJ stack of printed conductors in the absence of topography |
| 02/16/2006 | DE102005026632A1 Illumination system for a microlithographic projector comprises a transmission filter for correcting the light distribution reaching a mask |
| 02/16/2006 | DE102005021346A1 Adjustable layer (reversibly adjusted from hydrophobic to hydrophilic condition), useful e.g. in printing plate surfaces, comprises oxide of e.g. titanium; heteroanalogous carbonyl compounds; and carbonyl compounds formed as polymer |
| 02/15/2006 | EP1626310A1 Lithographic projection apparatus and device manufacturing method |
| 02/15/2006 | EP1626309A2 Hologram recording material, hologram recording method and holographic optical element |
| 02/15/2006 | EP1626106A2 Method of forming a conductive wiring pattern by laser irradiation and a conductive wiring pattern |
| 02/15/2006 | EP1625952A1 Tire with raised indicia |
| 02/15/2006 | EP1625610A2 Plasma ashing apparatus and endpoint detection process |
| 02/15/2006 | EP1625580A1 Multi-layer structure and method of drawing microscopic structure therein |
| 02/15/2006 | EP1625447A2 Photoacid generators with perfluorinated multifunctional anions |
| 02/15/2006 | EP1418059B1 Multicolor image forming material and multicolor image forming method using the same |
| 02/15/2006 | EP1360554B1 Process control |
| 02/15/2006 | EP1086156B1 Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations |
| 02/15/2006 | EP0728788B1 Process for producing photosensitive resin and liquid photosensitive resin composition |
| 02/15/2006 | CN1735959A Exposure device, exposure method, and semiconductor device manufacturing method |
| 02/15/2006 | CN1735839A Device and method for producing flexographic plates using digital imaging, for newspaper printing |
| 02/15/2006 | CN1735655A Organic bottom anti-reflective composition and patterning method using the same |
| 02/15/2006 | CN1735319A Photomask apparatus, photomask manufacturing method, and mask pattern forming method |
| 02/15/2006 | CN1735171A Method of manufacturing substrate having recessed portions for microlenses and transmissive screen |
| 02/15/2006 | CN1734715A Small lot size lithography bays |
| 02/15/2006 | CN1734713A Substrate treating apparatus |
| 02/15/2006 | CN1734355A Apparatus for forming image on plate and inter-sleeve raster scanning method |
| 02/15/2006 | CN1734354A Lithographic apparatus, an apparatus comprising an illumination system, and device manufacturing method |
| 02/15/2006 | CN1734353A Photolithography device and method for manufacturing the same |
| 02/15/2006 | CN1734352A Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device |
| 02/15/2006 | CN1734351A Photosensitive resin composition for isolator |
| 02/15/2006 | CN1734350A Composition for forming organic insulating film and method for forming pattern of organic insulating film using the same |
| 02/15/2006 | CN1734349A Photosensitive dielectric compositions, tapes, and method of application of a dielectric sheet using the same |
| 02/15/2006 | CN1734337A 掩模 Mask |
| 02/15/2006 | CN1734334A Liquid crystal display device and fabrication method thereof |
| 02/15/2006 | CN1734332A Pixel structure of thin film transistor LCD and manufacturing method thereof |
| 02/15/2006 | CN1734327A Method for preparing photo-patterned light polarizing films |
| 02/15/2006 | CN1734302A Process for producing optical waveguide |
| 02/15/2006 | CN1734296A Radiation inductive combination used for color screen, color screen and color liquid crystal display element |
| 02/15/2006 | CN1242465C Interface device for transmitting filling box |
| 02/15/2006 | CN1242455C Patterning method for integrated circuit |
| 02/15/2006 | CN1242452C Image forming method, exposure mask for forming image and its making process |
| 02/15/2006 | CN1242303C Agent for lowering dependence of substrate |
| 02/15/2006 | CN1241950C Polymerizable composition |
| 02/15/2006 | CN1241737C Chemical imaging of a lithographic printing plate |
| 02/14/2006 | USRE38980 forms highly resolved relief images of submicron dimension with vertical sidewalls, uniformly imaged across the full width of a wafer over which the photoresist is coated, regardless of the temperature differential across the surface of resist |
| 02/14/2006 | US7000216 Exposure pattern forming method and exposure pattern |
| 02/14/2006 | US7000215 Method of and computer program product for designing patterns, and method of manufacturing semiconductor device |
| 02/14/2006 | US6999893 Position detecting device and position detecting method |
| 02/14/2006 | US6999254 Refractive index system monitor and control for immersion lithography |