| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/23/2006 | US20060038746 Low-Cost Lithography |
| 02/23/2006 | US20060038316 Methods for forming molds |
| 02/23/2006 | US20060038262 Semiconductor processing methods |
| 02/23/2006 | US20060038171 Semiconductor integrated circuit design tool, computer implemented method for designing semiconductor integrated circuit, and method for manufacturing semiconductor integrated circuit |
| 02/23/2006 | US20060037943 Integrated circuits ; using chelate compounds as etchants; overcoating dielectric with patterned mask |
| 02/23/2006 | US20060037362 Photolithography methods and systems |
| 02/23/2006 | DE202005020274U1 Beschichtungsanlage für Wafer Coating machine for wafer |
| 02/23/2006 | DE112004000257T5 Strahlungsempfindliche Harzzusammensetzung, Verfahren zur Herstellung derselben und Verfahren zur Herstellung einer Halbleiteranordnung mit derselben The radiation sensitive resin composition, method of producing the same and method of manufacturing a semiconductor device comprising the same |
| 02/23/2006 | DE10337037B4 Verfahren zur Vermessung einer Belichtungsintensität auf einem Wafer Method for measuring an exposure intensity on a wafer |
| 02/23/2006 | DE10258248B4 System zur interferometrischen Passeprüfung System for interferometric testing Passe |
| 02/23/2006 | DE102005036256A1 Optisches System zum räumlichen Steuern der Lichtpolarisation und Verfahren zum Herstellen desselben Of the same optical system for spatially controlling the light polarization and methods for preparing |
| 02/23/2006 | DE102004049865A1 Vorrichtung und Verfahren zum Drucken, insbesondere zum Drucken von Mikrostrukturen Apparatus and method for printing, particularly for printing microstructures |
| 02/23/2006 | DE102004041679A1 Method of lithographic production of structures in a radiation sensitive layer especially for semiconductor devices such as DRAM chips uses radiation absorbing layer |
| 02/23/2006 | DE102004040535A1 Polarisationsselektiv geblazetes diffraktives optisches Element Polarization selective blazed diffractive optical element |
| 02/23/2006 | DE102004039763A1 Hard mask layer`s thickness determining method for manufacturing high integrated circuits, involves recording intensity of photoelectrons produced by x-ray energy, and finding layer thickness from intensity and/or energy of photoelectrons |
| 02/23/2006 | DE102004024755B4 Halterung für optische Elemente Holder for optical elements |
| 02/23/2006 | DE10155711B4 Im EUV-Spektralbereich reflektierender Spiegel In the EUV spectral reflective mirror |
| 02/23/2006 | DE10024111B4 Verfahren zur Herstellung eines Bauelements aus übereinander gestapelten miteinander verlöteten Platten A method for producing a component of stacked plates soldered together |
| 02/23/2006 | CA2575046A1 Oxime ester photoinitiators |
| 02/23/2006 | CA2573788A1 Non-aqueous microelectronic cleaning compositions containing fructose |
| 02/22/2006 | EP1628330A1 Exposure method, exposure device, and device manufacturing method |
| 02/22/2006 | EP1628329A1 Exposure device and device manufacturing method |
| 02/22/2006 | EP1628164A2 Method and apparatus for angular-resolved spectroscopic lithography characterisation |
| 02/22/2006 | EP1628163A2 Lithographic apparatus and device manufacturing method |
| 02/22/2006 | EP1628162A2 Lithographic apparatus and device manufacturing method |
| 02/22/2006 | EP1628161A2 Lithographic apparatus and device manufacturing method |
| 02/22/2006 | EP1628160A2 Resist composition and patterning process |
| 02/22/2006 | EP1628159A2 Chemical amplification resist composition and pattern-forming method using the same |
| 02/22/2006 | EP1628158A1 Photosensitive structure for flexographic printing |
| 02/22/2006 | EP1628157A1 Lithographic apparatus, method and a computer program product for generating a mask pattern on an addressable mask and device manufacturing method using same |
| 02/22/2006 | EP1627732A1 Planographic printing plate precursor |
| 02/22/2006 | EP1627718A1 Method of decorating surface of mold and mold |
| 02/22/2006 | EP1627429A2 Supercritical fluid-based cleaning compositions and methods |
| 02/22/2006 | EP1627406A1 Unbaked laminate for producing front plate of plasma display device, and method for producing front plate of plasma display device |
| 02/22/2006 | EP1627259A1 Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof |
| 02/22/2006 | EP1627258A2 System and method for characterizing lithography effects on a wafer |
| 02/22/2006 | EP1627256A2 An intergrated, in-line bumping and exposure system |
| 02/22/2006 | EP1474844A4 Vibration control utilizing signal detrending |
| 02/22/2006 | EP1373877A4 Base stabilization system |
| 02/22/2006 | EP0921440B1 Methods of forming raised and recessed patterns and use of the patterns in the manufacture of liquid crystal display color filters |
| 02/22/2006 | CN2760614Y Optical mask chrome mask laser micro-repair powder sending device |
| 02/22/2006 | CN1739224A 电磁辐射脉冲定时控制 Timing control pulse of electromagnetic radiation |
| 02/22/2006 | CN1739152A Method of manufacturing an optical data storage medium, optical data storage medium and apparatus for performing said method |
| 02/22/2006 | CN1739065A Method of patterning photoresist on a wafer using a transmission mask with a carbon layer |
| 02/22/2006 | CN1739063A Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties |
| 02/22/2006 | CN1739054A Optical devices incorporating photo reactive polymers |
| 02/22/2006 | CN1739015A Method and system for determining characteristics of substrates employing fluid geometries |
| 02/22/2006 | CN1738875A Colored image-forming composition containing phthalocyanine compound, inks, inkjet inks, inkjet recording method and method of improving tolerance to decoloration due to ozone gas |
| 02/22/2006 | CN1738710A Method for manufacturing of polymer micro needle array with LIGA process |
| 02/22/2006 | CN1737995A Substrate processing apparatus |
| 02/22/2006 | CN1737693A Wafer bake apparatus |
| 02/22/2006 | CN1737692A Developing apparatus and method |
| 02/22/2006 | CN1737691A Lithographic apparatus and device manufacturing method |
| 02/22/2006 | CN1737690A Lithographic apparatus and device manufacturing method |
| 02/22/2006 | CN1737689A Pellicle frame and pellicle for photolithography using the same |
| 02/22/2006 | CN1737688A Lithographic apparatus and device manufacturing method |
| 02/22/2006 | CN1737687A Passivation of multi-layer mirror for extreme ultraviolet lithography |
| 02/22/2006 | CN1737686A Method and mechanism for suppressing adverse influence on imaging of symptoms of optical elements |
| 02/22/2006 | CN1737685A Compositions and processes for immersion lithography |
| 02/22/2006 | CN1737684A Photosensitive paste composition, PDP electrode manufactured using the composition, and PDP comprising the PDP electrode |
| 02/22/2006 | CN1737683A Planographic printing plate precursor |
| 02/22/2006 | CN1737682A Planographic printing plate precursor |
| 02/22/2006 | CN1737680A Advanced oriented assist features for integrated circuit hole patterns |
| 02/22/2006 | CN1737611A Holographic grating etching method used for intermediate infrared distributed feedback quanta cascaded laser |
| 02/22/2006 | CN1737000A Polymer, chemical range enlargement erosion resistant component and forming method |
| 02/22/2006 | CN1736735A Technique for making metal traditional opera facial mask |
| 02/22/2006 | CN1243366C Process and apparatus for removing residues from microstructure of object |
| 02/22/2006 | CN1243287C Developing machine bench with edge scrubbing device |
| 02/22/2006 | CN1243286C Method for producing polymer light wave guide device based on silicon lining |
| 02/22/2006 | CN1243285C Exposure mask for fabricating liquid crystal display and method for exposing substrate in fabricating liquid crystal display using the mask |
| 02/22/2006 | CN1243284C Automatic feedback modified exposure method and system |
| 02/22/2006 | CN1243283C Novolac resin solution, homocercal photoresist composition and its preparing method |
| 02/22/2006 | CN1243282C Photosensitive insulation paste and thick film multilayer circuit substrate |
| 02/21/2006 | US7003758 System and method for lithography simulation |
| 02/21/2006 | US7003757 Dissection of edges with projection points in a fabrication layout for correcting proximity effects |
| 02/21/2006 | US7003756 Method and apparatus for controlling rippling during optical proximity correction |
| 02/21/2006 | US7003755 User interface for a networked-based mask defect printability analysis system |
| 02/21/2006 | US7003149 Method and device for optically monitoring fabrication processes of finely structured surfaces in a semiconductor production |
| 02/21/2006 | US7003012 Discharge laser with porous insulating layer covering anode discharge surface |
| 02/21/2006 | US7002747 Diffuser plate and method of making same |
| 02/21/2006 | US7002668 Stage positioning unit for photo lithography tool and for the like |
| 02/21/2006 | US7002667 Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby |
| 02/21/2006 | US7002666 Lithographic apparatus and device manufacturing method |
| 02/21/2006 | US7002663 Both side projection exposure apparatus |
| 02/21/2006 | US7002167 Charged-particle beam writer |
| 02/21/2006 | US7002165 Apparatus and method for repairing resist latent images |
| 02/21/2006 | US7002164 Source multiplexing in lithography |
| 02/21/2006 | US7001978 methods for preparing high performance photosensitive polyarylene ether polymers from haloalkylated intermediate polymers, wherein resulting polymers have a desirably low halogen content and, when cured, exhibit desirably low crosslink density |
| 02/21/2006 | US7001930 Acrylic resin formulations curable to clear, heat-resistant bodies |
| 02/21/2006 | US7001874 Non-corrosive cleaning composition for removing plasma etching residues |
| 02/21/2006 | US7001847 Micro pattern forming method and semiconductor device manufacturing method |
| 02/21/2006 | US7001838 Method of wet etching an inorganic antireflection layer |
| 02/21/2006 | US7001830 System and method of pattern recognition and metrology structure for an X-initiative layout design |
| 02/21/2006 | US7001713 Large and small active region patterns are shrunk until the small one disappears and the large one is then enlarged to a dimension slightly smaller than the original |
| 02/21/2006 | US7001712 Depositing a positive type photoresist film over a semiconductor substrate;exposing a first mask pattern;exposing a second mask pattern; performing development treatment; etching |
| 02/21/2006 | US7001710 Method for forming ultra fine contact holes in semiconductor devices |
| 02/21/2006 | US7001707 blend of a cyclic polymer having alcoholic groups as soluble groups and featuring high transparency with a polymer having carboxyl or hexafluoroalcohol groups whose hydrogen atoms are replaced by acid labile group |
| 02/21/2006 | US7001706 an aromatic sulfonate compound containing an admantane ester group and a onium counter ion group; a resin which contains a structural unit having an acid labile group |
| 02/21/2006 | US7001705 Positively photosensitive resin composition and method of pattern formation |
| 02/21/2006 | US7001704 Presensitized lithographic plate comprising microcapsules |