Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2014
04/16/2014CN102681046B Method for preparing large-area NOA73 curved-surface micro lens array
04/16/2014CN102675514B Preparation method of aqueous nano-pigment dispersion liquid
04/16/2014CN102608869B Photoetching method under low-k1 condition
04/16/2014CN102591143B Device and method for large-area nano imprinting photoetching
04/16/2014CN102589686B Calibration method of energy sensors
04/16/2014CN102576093B Titanium black dispersion, photosensitive resin composition, wafer level lens, light blocking film, method for producing the light blocking film, and solid-state image pickup element
04/16/2014CN102508353B High-resolution Forbes aspherical photoetching objective lens
04/16/2014CN102486622B Mask prealignment device of photoetching machine and method thereof
04/16/2014CN102479280B Method and apparatus for achieving multiple patterning technology compliant design layout
04/16/2014CN102417758B Liquid photoreceptive solder resist ink
04/16/2014CN102346384B Method for regulating optimum focal plane for silicon chip and exposure device thereof
04/16/2014CN102317869B Developer waste reuse
04/16/2014CN102299085B Packaged semiconductor device having improved locking properties
04/16/2014CN102298265B Photoetching dielectric compositions and electrical or electronic device
04/16/2014CN102165371B Projection exposure apparatus with optimized adjustment possibility
04/16/2014CN102150218B Method for smoothing optical member for EUVL and optical member for EUVL having smoothed optical surface
04/16/2014CN102132213B Spectral purity filter, lithographic apparatus including such spectral purity filter and device manufacturing method
04/16/2014CN102087473B Radiation sensitive resin composition, interlayer dielectric, and method for producing thereof
04/16/2014CN101971061B Optical sheets
04/16/2014CN101952248B Sulphonium salt initiators
04/16/2014CN101918896B Composition for mold sheet and method for preparing mold sheet using same
04/16/2014CN101900937B Imprint lithography method and apparatus
04/16/2014CN101846755B Methods of manufacturing anti-dazzle film and die for making anti-dazzle film
04/16/2014CN101750894B Colored photosensitive resin composition
04/16/2014CN101727002B Radiation-sensitive resin composition, interlayer insulating film and microlens, and method for forming the same
04/16/2014CN101687214B Coat film forming method and coat film forming apparatus
04/16/2014CN101657482B Novel polyimide precursor composition and use thereof
04/16/2014CN101556438B Lithographic apparatus and device manufacturing method
04/16/2014CN101550265B Composition for formation of underlayer film for lithography containing epoxy compound and carboxylic acid compound
04/16/2014CN101100543B Coloring photosensitive resin composition
04/15/2014US8700355 Positioning apparatus judging moving method to control positioning timing
04/15/2014US8699841 Photosensitive resin composition, optical waveguide film, film for forming optical waveguide, optical interconnect, opto-electric hybrid circuit board, electronic device, and a method of manufacturing an optical waveguide film
04/15/2014US8699001 Object moving apparatus, object processing apparatus, exposure apparatus, object inspecting apparatus and device manufacturing method
04/15/2014US8698998 Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
04/15/2014US8697346 Diffraction unlimited photolithography
04/15/2014US8697345 Photoresist stripping solution and a method of stripping photoresists using the same
04/15/2014US8697344 Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern
04/15/2014US8697343 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
04/15/2014US8697342 Method of modifying chemically amplified resist pattern, modifier for chemically amplified resist pattern, and resist pattern structure
04/15/2014US8697341 Aromatic ring containing polymer, underlayer composition including the same, and associated methods
04/15/2014US8697340 Semiconductor structure and method of fabricating the same
04/15/2014US8697339 Semiconductor device manufacturing methods
04/15/2014US8697338 Photolithographic methods
04/15/2014US8697336 Composition for forming a developable bottom antireflective coating
04/15/2014US8697335 Radiation-sensitive resin composition and compound
04/15/2014US8697334 Miniaturized microparticles
04/15/2014US8697333 Photocurable resin composition, dry film thereof, pattern forming method, and electrical/electronic part protective film
04/15/2014US8697332 Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, pattern forming method using the photosensitive resin composition and products comprising the same
04/15/2014US8697331 Compound, polymer, and radiation-sensitive composition
04/15/2014US8697330 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same
04/15/2014US8697329 Positive resist composition and pattern forming method using the same
04/15/2014US8697328 Film type photodegradable transfer material
04/15/2014US8697320 Phenol compounds and positive photosensitive resin composition including the same
04/15/2014US8697319 Exposure method, color filter manufacturing method, and exposure device
04/15/2014US8695640 Microfabricated elastomeric valve and pump systems
04/15/2014US8695501 Method of forming a contact printing stamp
04/15/2014CA2668612C Waterless planographic printing plate precursor
04/10/2014WO2014055585A1 Blade for substrate edge protection during photolithography
04/10/2014WO2014055582A1 Multiple-blade device for substrate edge protection during photolithography
04/10/2014WO2014055335A1 Planar motor system with increased efficiency
04/10/2014WO2014054690A1 Exposure device and exposure method, and device-manufacturing method
04/10/2014WO2014054606A1 Composition for forming fine resist pattern and pattern formation method using same
04/10/2014WO2014054530A1 Conductive pattern fabrication method
04/10/2014WO2014054455A1 Negative photosensitive resin composition
04/10/2014WO2014054250A1 Micro-structure body fabrication method, and micro-structure body
04/10/2014WO2014053296A1 A method for calibration of an encoder scale and a lithographic apparatus
04/10/2014WO2014053248A1 Monitor system for determining orientations of mirror elements and euv lithography system
04/10/2014WO2014026819A3 Method and apparatus for measuring asymmetry of a microstructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing method
04/10/2014WO2014012643A3 System correction from long timescales
04/10/2014US20140100151 Stripping and Cleaning Compositions for Removal of Thick Film Resist
04/10/2014US20140099799 Lithography Masks, Systems, and Manufacturing Methods
04/10/2014US20140099583 Simultaneous photoresist development and neutral polymer layer formation
04/10/2014US20140099581 Negative Photosensitive Resin Composition And Cured Product Of Same
04/10/2014US20140099580 Spatial and temporal control of brush formation on surfaces
04/10/2014US20140099573 Photoinitiated olefin methathesis polymerization
04/10/2014US20140099572 Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern
04/10/2014US20140099480 Registration system for phototools
04/10/2014US20140099243 Photosensitive resin composition for forming biochip, and biochip
04/10/2014US20140098357 Lithographic apparatus and device manufacturing method
04/10/2014US20140098356 Optical system, inspection system and manufacturing method
04/10/2014US20140098355 Catoptric objectives and systems using catoptric objectives
04/10/2014US20140098353 Lithographic apparatus and device manufacturing method
04/10/2014US20140098352 Device for controlling temperature of an optical element
04/10/2014US20140097152 Self-assembled pattern forming method
04/10/2014DE102012218221A1 Monitorsystem zum Bestimmen von Orientierungen von Spiegelelementen und EUV-Lithographiesystem Monitor system for determining orientations of mirror elements and EUV lithography system
04/10/2014DE102012218076A1 Illumination optics for extreme UV projection lithography, is designed such that any pairs of illumination light sub-bundles which are guided by different channels hit illumination field point during operation of optics
04/09/2014EP2717295A1 Exposure apparatus, exposure method, and method for producing a device
04/09/2014EP2717098A1 Environmental system including vaccum scavange for an immersion lithography apparatus
04/09/2014EP2717097A1 Photosensitive resin composition for forming biochip, and biochip
04/09/2014EP2716671A1 Phenolic resin and material for forming underlayer film for lithography
04/09/2014EP2716467A1 Presensitized plate for lithographic printing and method for processing same
04/09/2014EP2715453A1 Printing periodic patterns using multiple lasers
04/09/2014EP2715452A1 Imaging optical unit
04/09/2014EP2715451A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
04/09/2014EP2715450A1 Method for producing three-dimensional monolithic microfluidic devices
04/09/2014EP2715416A1 Colored radiation-sensitive composition for color filter, pattern forming method, color filter and method of producing the same, and solid-state image sensor
04/09/2014CN203535381U Climbing mechanism and glue baking machine adopting same
04/09/2014CN203535380U Shutter device and photoetching equipment
04/09/2014CN203535379U Re-exposure correcting device of exposure machine
04/09/2014CN1766731B Method for removal of deposition, method for protection of optical element, device manufacturing method and lithographic apparatus
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