| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/28/2006 | US7006747 Optical devices incorporating photo reactive polymers |
| 02/28/2006 | US7006595 Illumination system particularly for microlithography |
| 02/28/2006 | US7006308 Retainer, exposure apparatus, and device fabrication method |
| 02/28/2006 | US7006304 Catadioptric reduction lens |
| 02/28/2006 | US7006295 Illumination system and method for efficiently illuminating a pattern generator |
| 02/28/2006 | US7006284 Apparatus for viewing and analyzing ultraviolet beams |
| 02/28/2006 | US7006235 Methods and systems for determining overlay and flatness of a specimen |
| 02/28/2006 | US7006226 Alignment method, alignment apparatus, exposure apparatus using the same, and device manufactured by using the same |
| 02/28/2006 | US7006225 Alignment mark, alignment apparatus and method, exposure apparatus, and device manufacturing method |
| 02/28/2006 | US7006209 Method and apparatus for monitoring and controlling imaging in immersion lithography systems |
| 02/28/2006 | US7006208 Defect compensation of lithography on non-planar surface |
| 02/28/2006 | US7006202 Mask holder for irradiating UV-rays |
| 02/28/2006 | US7006201 Photosensitive tabular member suction mechanism and image recording device |
| 02/28/2006 | US7006200 Substrate exposure system |
| 02/28/2006 | US7006198 System and method for laser beam expansion |
| 02/28/2006 | US7006197 Optical projection system |
| 02/28/2006 | US7006196 Real time image resizing for dynamic digital photolithography |
| 02/28/2006 | US7006195 Method and system for improving exposure uniformity in a step and repeat process |
| 02/28/2006 | US7006194 Projection optical system, exposure apparatus and method using the same |
| 02/28/2006 | US7005823 Positioning system and positioning method |
| 02/28/2006 | US7005660 Surface processing apparatus |
| 02/28/2006 | US7005658 Charged particle beam exposure apparatus and method |
| 02/28/2006 | US7005649 Mask blanks inspection method and mask blank inspection tool |
| 02/28/2006 | US7005249 Apparatus for processing substrate and method of processing the same |
| 02/28/2006 | US7005247 Controlled selectivity etch for use with optical component fabrication |
| 02/28/2006 | US7005246 Forming antireflective films for liquid crystal displays byshifting a laser or electronic beam against the process target material and simultaneously repeating irradiation in an intermittent mannerto form convex microstructures; accuracy |
| 02/28/2006 | US7005245 Controlled transmissin of a light signal through selected nonphotooxidiaed and photooxidized discrete regions with different indexes of refraction; plasma polymerization to form interstitial compounds of hydrocarbon polymer and silicones; photonics |
| 02/28/2006 | US7005244 Applying a negative photoresist pattern to the substrate; forming a sacrificial layer having a planarized top surface in a space surrounded by the passage; controlling the shape and uniformity of the ink passage; avoiding generated gas |
| 02/28/2006 | US7005243 Method for producing a light guide plate mold having V-shaped grooves |
| 02/28/2006 | US7005242 Magnetic head and method of making the same using an etch-stop layer for removing portions of the capping layer |
| 02/28/2006 | US7005241 Process for making circuit board or lead frame |
| 02/28/2006 | US7005238 Exposing a chemically amplified photoresist on a substrate supported by a heating plate having a porous partition facing the surface where in the space over the partion an air stream formation mechanism discharges the acid evaporated formed |
| 02/28/2006 | US7005237 Method of making information storage devices by molecular photolithography |
| 02/28/2006 | US7005236 Laying down two separate photoresist layers to eliminate distortion of features in the resist image close to cavity edge; the first reduces problems, e.g., air bubbles; the second's processed normally; thickness; uniformity; integrated circuits |
| 02/28/2006 | US7005235 Substrate is covered with a photosensitive material and is exposed by a standing wave interference pattern produced by the superposition of two coherent laser beams; rotating; exposure, coverin by a non-critical photomask, development |
| 02/28/2006 | US7005234 Planographic printing plate precursor and planographic printing method |
| 02/28/2006 | US7005233 An octafunctional epoxidized novolac resin, solvent, photoinitiator, a diester plasticizer and an adhesion promoter selected from glycidoxy-, mercapto, and aminopropyltrimethoxysilane; noncracking; stress resistance; antipeeling agents; wafers |
| 02/28/2006 | US7005232 Highly reflective substrates for the digital processing of photopolymer printing plates |
| 02/28/2006 | US7005231 A curable composition using general-purpose hydrolyzable silane compounds without using special hydrolyzable silane compound monomers; also photoacid generator and a basic compound; accuracy; optical waveguides having reduced waveguide loss |
| 02/28/2006 | US7005230 Acrylic resin insoluble in alkali becoming alkalii-soluble by action of an acid on ester groups, a photoacid generator and a polycyclic compound; chemically-amplified photoresist for microfabrication utilizing deep UV rays; radiation transparent |
| 02/28/2006 | US7005229 Multiphoton photosensitization method |
| 02/28/2006 | US7005228 Polymers, resist compositions and patterning process |
| 02/28/2006 | US7005227 One component EUV photoresist |
| 02/28/2006 | US7005221 Method and apparatus to easily measure reticle blind positioning with an exposure apparatus |
| 02/28/2006 | US7005220 Method for structuring a lithography mask |
| 02/28/2006 | US7005219 Defect repair method employing non-defective pattern overlay and photoexposure |
| 02/28/2006 | US7005217 Chromeless phase shift mask |
| 02/28/2006 | US7005216 Krypton fluoride laser lithography; photoresist pattern |
| 02/28/2006 | US7005215 Mask repair using multiple exposures |
| 02/28/2006 | US7005009 Film forming apparatus, film forming method and tray for substrate |
| 02/28/2006 | US7004812 Paste, display member, and process for production of display member |
| 02/28/2006 | US7004717 Plate cassette loader for platesetter |
| 02/28/2006 | US7004715 Apparatus for transferring and loading a reticle with a robotic reticle end-effector |
| 02/28/2006 | US7004181 Apparatus for cleaning a substrate |
| 02/23/2006 | WO2006020080A2 Systems and methods for reducing the influence of plasma-generated debris on the internal components of an euv light source |
| 02/23/2006 | WO2006019617A1 Alignment using latent images |
| 02/23/2006 | WO2006019581A2 Apparatus and method for thermally developing flexographic printing elements |
| 02/23/2006 | WO2006019416A2 System and method for proximity effect correction in imaging systems |
| 02/23/2006 | WO2006019402A1 Non-aqueous microelectronic cleaning compositions containing fructose |
| 02/23/2006 | WO2006019178A1 Exposure method and device |
| 02/23/2006 | WO2006019124A1 Exposure apparatus and device manufacturing method |
| 02/23/2006 | WO2006019089A1 Photosensitive transfer material and pattern forming method and pattern |
| 02/23/2006 | WO2006018972A1 Lighting optical device, regulation method for lighting optical device, exposure system, and exposure method |
| 02/23/2006 | WO2006018960A1 Developing method |
| 02/23/2006 | WO2005116761A3 Uv radiation blocking protective layers compatible with thick film pastes |
| 02/23/2006 | WO2005093513A3 Positive-working photoimageable bottom antireflective coating |
| 02/23/2006 | WO2005079470A3 Photomask and method for conveying information associated with a photomask substrate |
| 02/23/2006 | WO2005064407A3 Lithographic projection apparatus and device manufacturing method |
| 02/23/2006 | WO2005064363A3 Light-redirecting optical structure with linear prisms, and process for forming same |
| 02/23/2006 | WO2005040917A3 System and method for lithography simulation |
| 02/23/2006 | WO2005029182A3 Method and apparatus for protecting a reticle used in chip production from contamination |
| 02/23/2006 | WO2005029181A3 Method and apparatus for compensating for the effects of gravity on a pellicle used for protecting a reticle from contamination |
| 02/23/2006 | WO2005022265A3 Method of forming optical images, apparatus for carrying out said method and process for manufacturing a device using said method |
| 02/23/2006 | US20060041851 Renesting interaction map into design for efficient long range calculations |
| 02/23/2006 | US20060041080 Process for the preparation of hydroxy-vinyl-aromatic polymers or copolymers by anionic or controlled radical polymerization |
| 02/23/2006 | US20060041078 Polymer having a hydroxy group or a carboxy group; crosslinking agent; and an alkali-dissolution rate regulator that is a naphthoquinone compound or a compound having a t-butoxycarbonyl group, a hydroxy group, a carboxy group, or a phenyl group; for use in dual damascene processes |
| 02/23/2006 | US20060041053 Color filter black matrix resist composition and carbon black dispersion composition used for the composition |
| 02/23/2006 | US20060041052 Photosensitive resin compostion and process for the formation of hydrogel |
| 02/23/2006 | US20060040840 Supercritical carbon dioxide/chemical formulation for removal of photoresists |
| 02/23/2006 | US20060040506 Semiconductor fabrication methods and apparatus |
| 02/23/2006 | US20060040474 Low oxygen content photoresist stripping process for low dielectric constant materials |
| 02/23/2006 | US20060040216 Method of patterning photoresist film |
| 02/23/2006 | US20060040215 Amplification; exposure to radiation while aqueous solution of triphenylsulfonium nonaflate |
| 02/23/2006 | US20060040213 Tunable lithography with a refractive mask |
| 02/23/2006 | US20060040212 Lithographic printing plate support and presensitized plate |
| 02/23/2006 | US20060040211 Method of manufacturing light sensitive planographic printing plates and method of using the same |
| 02/23/2006 | US20060040210 Reusable printing plate, printing press and printing unit having the printing plate, process for imaging the printing plate and process for preparation of a fluorinated organic phosphonic acid |
| 02/23/2006 | US20060040202 Positive working photosensitive composition |
| 02/23/2006 | US20060040201 Radiation sensitive resin composition |
| 02/23/2006 | US20060040191 Detection method for optimum position detection formula, alignment method, exposure method, device production method, device, and measurement and/or inspection apparatus |
| 02/23/2006 | US20060040186 Apparatus for producing a hologram mask |
| 02/23/2006 | US20060040109 Thin film sol-gel derived glass |
| 02/23/2006 | US20060040058 Multilayer nano imprint lithography |
| 02/23/2006 | US20060039651 Patterning apparatuses and methods for the same |
| 02/23/2006 | US20060039595 Overlay marks, methods of overlay mark design and methods of overlay measurements |
| 02/23/2006 | US20060039435 Apparatus for generating light in the extreme ultraviolet and use in a light source for extreme ultraviolet lithography |
| 02/23/2006 | US20060039067 Wavefront splitting element for EUV light and phase measuring apparatus using the same |
| 02/23/2006 | US20060039011 Method and apparatus for manufacturing semiconductor device |
| 02/23/2006 | US20060038968 Lithographic apparatus and device manufacturing method |
| 02/23/2006 | US20060038944 Mask, thin film transistor substrate, method of manufacturing the thin film transistor substrate using the mask, and display apparatus using the thin film transistor substrate |