| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/02/2006 | WO2005029183A3 Method and apparatus for protecting a reticle used in chip production from contamination |
| 03/02/2006 | US20060046497 Manufacturing method |
| 03/02/2006 | US20060046451 Methods of forming transistor gates; and methods of forming programmable read-only memory constructions |
| 03/02/2006 | US20060046361 Stripping composition for removing a photoresist and method of manufacturing tft substrated for a liquid crystal display device using the same |
| 03/02/2006 | US20060046213 Method for optimizing wafer edge patterning |
| 03/02/2006 | US20060046212 Integrated circuit lithography |
| 03/02/2006 | US20060046211 Effectively water-free immersion lithography |
| 03/02/2006 | US20060046210 photolithography; wafer blank |
| 03/02/2006 | US20060046208 Film pattern producing method, and producing method for electronic device, electron-emitting device and electron source substrate utilizing the same |
| 03/02/2006 | US20060046207 Exposure method |
| 03/02/2006 | US20060046206 Photoactive resist capping layer |
| 03/02/2006 | US20060046205 Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device |
| 03/02/2006 | US20060046203 Method for producing a thin film transistor and a device of the same |
| 03/02/2006 | US20060046202 forming circuit patterns on surfaces of clad metals, then applying photoresists, exposing, conditioning, stripping and plating with dielectrics, to form multilayer printed circuit with expandable electrical resistance; stability |
| 03/02/2006 | US20060046201 Method to align mask patterns |
| 03/02/2006 | US20060046200 Mask material conversion |
| 03/02/2006 | US20060046199 Imagewise exposing printing plate precursor comprising a support,image recording layer andprotective layer; rubbing the plate surface by an automatic rubbing processor in the presence of a non-alkaline developerto remove the protective layer and the image recording layer in the unexposed area |
| 03/02/2006 | US20060046168 Method for designing an illumination light source, method for designing a mask pattern, method for manufacturing a photomask, method for manufacturing a semiconductor device and a computer program product |
| 03/02/2006 | US20060046162 Manufacturing method of semiconductor device |
| 03/02/2006 | US20060046010 Stereolithographic seal and support structure for semiconductor wafer |
| 03/02/2006 | US20060045988 Pretreatment process of a substrate in micro/nano imprinting technology |
| 03/02/2006 | US20060044639 3-d holographic recording method and 3-d holographic recording system |
| 03/02/2006 | US20060044537 Stage alignment apparatus and its control method, exposure apparatus, and semiconductor device manufacturing method |
| 03/02/2006 | US20060044536 Exposure apparatus equipped with interferometer and exposure apparatus using the exposure apparatus |
| 03/02/2006 | US20060044533 System and method for reducing disturbances caused by movement in an immersion lithography system |
| 03/02/2006 | DE112004000566T5 Verfahren zum Herstellen eines Maskenrohlings und Verfahren zum Herstellen einer Maske A method for producing a mask blank and method for making a mask |
| 03/02/2006 | DE102004055248B3 Verfahren zum Ausbilden eines Kontaktes in einer Halbleiterscheibe A method of forming a contact in a semiconductor wafer |
| 03/02/2006 | DE102004041197A1 Strahlungsempfindliche Masse Radiation-sensitive composition |
| 03/02/2006 | DE102004019835A1 Beleuchtungskondensor für ein Partikeloptik-Projektionssystem Illumination condenser for a particle optics projection system |
| 03/02/2006 | DE10026029B4 Verfahren zum Ablösen von Photoresistlacken Method for stripping photoresists |
| 03/02/2006 | CA2575991A1 Cleaning compositions for microelectronics substrates |
| 03/02/2006 | CA2575238A1 Photopolymerizable silicone materials forming semipermeable membranes for sensor applications |
| 03/01/2006 | EP1630857A1 Position information measuring method and device, and exposure method and system |
| 03/01/2006 | EP1630856A1 Mutilayer film reflector and x-ray exposure system |
| 03/01/2006 | EP1630618A2 Production method of lithographic printing plate, lithographic printing plate precursor and lithographic printing method |
| 03/01/2006 | EP1630617A2 A method of performing resist process calibration and optimisation, and a method of performing optimisation of the diffractive optical element (DOE) for providing optical proximity effect (OPE) matching between different lithography systems |
| 03/01/2006 | EP1630616A2 System for reducing movement induced disturbances in immersion lithography |
| 03/01/2006 | EP1630615A2 Adjustable resolution interferometric lithography system |
| 03/01/2006 | EP1630614A1 Method for designing an illumination light source, method for designing a mask pattern, method for manufacturing a photomask, method for manufacturing a semiconductor device and a computer program product |
| 03/01/2006 | EP1630613A2 Patterned mask holding device and method using two holding systems |
| 03/01/2006 | EP1630612A2 Method for manufacturing a microstructure, exposure device, and electronic apparatus |
| 03/01/2006 | EP1630611A2 Planographic printing plate precursor |
| 03/01/2006 | EP1630610A1 Protective film-forming composition for immersion exposure and pattern forming method using the same |
| 03/01/2006 | EP1630609A1 Printing plate material and printing plate |
| 03/01/2006 | EP1630608A2 Planographic printing plate precursor |
| 03/01/2006 | EP1630607A2 Positive resist composition and pattern forming method utilizing the same |
| 03/01/2006 | EP1630606A1 Positive photosensitive composition |
| 03/01/2006 | EP1630605A1 Photosensitive resin composition, and electronic component and display using same |
| 03/01/2006 | EP1630604A2 Photosensitive lithographic printing plate |
| 03/01/2006 | EP1630603A1 Photosensitive composition, photosensitive lithography plate and method for producing lithography plate |
| 03/01/2006 | EP1630602A2 Polymerizable composition, hydrophilic film formed by curing said composition and planographic printing plate precursor |
| 03/01/2006 | EP1630601A2 A mask manufacturing method, a method for optical proximity correction, a device manufacturing method, a computer program and a computer readable storage medium |
| 03/01/2006 | EP1630600A2 Hot melt composition and method involving forming a masking pattern |
| 03/01/2006 | EP1630585A1 Projection optical system, and exposure apparatus and exposure method |
| 03/01/2006 | EP1630575A1 Microlens array sheet having black matrix and method of manufacturing the same |
| 03/01/2006 | EP1630127A1 Method for realising a hosting structure of nanometric elements |
| 03/01/2006 | EP1629976A2 Planographic printing plate precursors, stacks of planographic printing plate precursors , and methods of making planographic printing plates |
| 03/01/2006 | EP1629507A2 Scanning probe microscopy probe and method for scanning probe contact printing |
| 03/01/2006 | EP1629316A2 Micro-lens array with precisely aligned aperture mask and methods of producing same |
| 03/01/2006 | EP1629268A2 Method and device for cleaning at least one optical component |
| 03/01/2006 | EP1629246A2 Heat pipe with temperature control |
| 03/01/2006 | EP1629046A2 Curable polymer compound |
| 03/01/2006 | EP1540459A4 Reticle manipulating device |
| 03/01/2006 | EP1309437B1 Differentially cured materials and process for forming same |
| 03/01/2006 | EP1252028A4 Temporary bridge for micro machined structures |
| 03/01/2006 | EP1157310B1 A method for replicating a surface relief and an article for holding a surface relief |
| 03/01/2006 | EP1157307B1 Photoresist dispense method by compensation for substrate reflectivity |
| 03/01/2006 | EP1108275A4 Tangential fan with cutoff assembly and vibration control for electric discharge laser |
| 03/01/2006 | EP1044074A4 Photoresist coating process control with solent vapor sensor |
| 03/01/2006 | EP0980542A4 Method of patterning sub-0.25 lambda line features with high transmission, "attenuated" phase shift masks |
| 03/01/2006 | CN2762187Y Nano-class pattern impression device |
| 03/01/2006 | CN1742413A Injection seeded F2 laser with wavelength control |
| 03/01/2006 | CN1742235A Binder diffusion transfer patterning of a thick film paste layer |
| 03/01/2006 | CN1742234A 抗蚀剂组合物 The resist composition |
| 03/01/2006 | CN1742233A Positive imageable thick film compositions |
| 03/01/2006 | CN1742077A Detergent composition for alkali development apparatus |
| 03/01/2006 | CN1742063A Coating composition, antireflection film, photoresist and pattern formation method using it |
| 03/01/2006 | CN1742029A Process for refining crude resin for electronic material |
| 03/01/2006 | CN1741863A Method for cleaning an article |
| 03/01/2006 | CN1740916A System and method for reducing movement induced disturbances in immersion lithography |
| 03/01/2006 | CN1740915A Method for manufacturing a microstructure, exposure device, and electronic apparatus |
| 03/01/2006 | CN1740914A Exposure apparatus |
| 03/01/2006 | CN1740913A Optical micro-electromechanical component and producing method thereof |
| 03/01/2006 | CN1740912A Method for correcting photoetching technology and method for forming superimposed mark |
| 03/01/2006 | CN1740911A Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device |
| 03/01/2006 | CN1740910A Patterned mask holding device and method using two holding systems |
| 03/01/2006 | CN1740908A Method for producing quartz/Az photoresist ultraviolet photoetched mask |
| 03/01/2006 | CN1740842A Lighting optical device |
| 03/01/2006 | CN1740827A Method for producing reflective metal optical grating |
| 03/01/2006 | CN1739976A Method for producing printing plate |
| 03/01/2006 | CN1739912A Molding process |
| 03/01/2006 | CN1244023C Stripping liquor for photoresist and photoresist stripping method therewith |
| 03/01/2006 | CN1244022C 曝光装置 Exposure device |
| 03/01/2006 | CN1244021C Photoetching device and exposure method |
| 03/01/2006 | CN1244020C Exposure device |
| 03/01/2006 | CN1244019C Exposure apparatus and exposure method |
| 03/01/2006 | CN1244018C Exposure method and equipment |
| 03/01/2006 | CN1244017C Method of molecular-scale pattern imprinting at surface |
| 03/01/2006 | CN1244016C Exposure controlling light mask and production method thereof |
| 03/01/2006 | CN1243744C Process for producing epoxy compound |