| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/09/2006 | DE102004040798A1 Mask for a semiconductor structure formed by applying a moulding layer over the whole structure, structuring, applying a hard mask, planarising and removing the remaining moulded layer |
| 03/09/2006 | CA2743544A1 Method and device for producing a base material for screen-printing, and base material of this type |
| 03/08/2006 | EP1632995A2 Oxygen free plasma stripping process |
| 03/08/2006 | EP1632992A1 Method for improving surface roughness of processed film of substrate and apparatus for processing substrate |
| 03/08/2006 | EP1632991A1 Exposure method, exposure device, and device manufacturing method |
| 03/08/2006 | EP1632953A1 Supporting unit, and moving table device and linear-motion guiding device using the supporting unit |
| 03/08/2006 | EP1632813A2 Exposure system and pattern formation method |
| 03/08/2006 | EP1632812A1 Projection exposure apparatus and method for producing a printed circuit board |
| 03/08/2006 | EP1632811A1 Composition for photoresist protective film, photoresist protective film and photoresist pattern formation process |
| 03/08/2006 | EP1632810A2 Light exposure apparatus and method of light exposure |
| 03/08/2006 | EP1632799A1 Optical element holding device, lens barrel, exposing device, and device producing method |
| 03/08/2006 | EP1631995A2 Manufacture of a polymer device |
| 03/08/2006 | EP1631863A2 Photoresist composition for deep uv and imaging process thereof |
| 03/08/2006 | EP1631853A1 Method for high precision printing of patterns |
| 03/08/2006 | EP1631616A1 Novel surface-active polysiloxane photoinitiators |
| 03/08/2006 | EP1579273A4 System and method for aerial image sensing |
| 03/08/2006 | EP1488285A4 Processless digitally imaged printing plate using microspheres |
| 03/08/2006 | EP1449284A4 Timing control for two-chamber gas discharge laser system |
| 03/08/2006 | EP1438774A4 Very narrow band, two chamber, high rep rate gas discharge laser system |
| 03/08/2006 | EP1397260A4 Polymeric antireflective coatings deposited by plasma enhanced chemical vapor deposition |
| 03/08/2006 | EP1297594A4 Gas discharge laser long life electrodes |
| 03/08/2006 | EP0870188B8 Variable spot-size scanning apparatus |
| 03/08/2006 | CN1745457A Projection optical system, exposure apparatus, and exposure method |
| 03/08/2006 | CN1745455A Apparatus and methods for dispensing fluids with rotatable dispense arms |
| 03/08/2006 | CN1745405A Display, wiring board, and method of manufacturing the same |
| 03/08/2006 | CN1745338A Development device, development method, and developer circulating method |
| 03/08/2006 | CN1745114A Resist polymer and resist composition |
| 03/08/2006 | CN1745088A Novel compounds capable of forming photoconvertible organic thin films and articles having organic thin films |
| 03/08/2006 | CN1744300A Method of manufacturing a thin film transistor substrate and stripping composition |
| 03/08/2006 | CN1743965A Environmental-protection type regenerative PS plate ink and photoresists stripping agent and its preparing method |
| 03/08/2006 | CN1743964A Apparatus and method for soft baking photoresist on substrate |
| 03/08/2006 | CN1743963A Method for developing processing and apparatus for supplying developing solution |
| 03/08/2006 | CN1743962A Apparatus for processing photosensitive material and area measurement method |
| 03/08/2006 | CN1743961A Projection exposure apparatus and method for producing a printed circuit board |
| 03/08/2006 | CN1743960A Exposure light source |
| 03/08/2006 | CN1743959A Infrared light source based on microelectronic mechanical system technique and its preparing method |
| 03/08/2006 | CN1743958A Method for correcting exposure metering device by exposure critical energy value |
| 03/08/2006 | CN1743957A Apparatus and method for coating photoresist |
| 03/08/2006 | CN1743956A Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same |
| 03/08/2006 | CN1743955A Positive-type photosensitive composition |
| 03/08/2006 | CN1743954A Etch-resisting pattern formation method, fine pattern formed thereby and method for making liquid crystal displaying component |
| 03/08/2006 | CN1743953A Thermosensitive laser sculpturing machine and its sculpturing method |
| 03/08/2006 | CN1743952A Optical engine and thermosensitive laser platemaking machine with same and platemaking method |
| 03/08/2006 | CN1743951A Screen print lattice-point printing process |
| 03/08/2006 | CN1743930A Method for making organic thin film transistor and method for making liquid crystal display using same |
| 03/08/2006 | CN1244956C Method for forming pattern |
| 03/08/2006 | CN1244954C Method for producing thin film semiconductor and method for forming resist pattern thereof |
| 03/08/2006 | CN1244719C Semiconductor stripping composition containing 1,3-dicarbonyl compounds |
| 03/07/2006 | US7010434 Complementary division condition determining method and program and complementary division method |
| 03/07/2006 | US7010380 Management system, management method and apparatus, and management apparatus control method |
| 03/07/2006 | US7010137 Hearing aid |
| 03/07/2006 | US7009769 Correction of birefringence in cubic crystalline optical systems |
| 03/07/2006 | US7009768 Optical component and method of manufacturing same |
| 03/07/2006 | US7009753 Pattern generator |
| 03/07/2006 | US7009689 Holder of photomask |
| 03/07/2006 | US7009688 Printing by active tiling |
| 03/07/2006 | US7009687 Support unit, optical unit and exposure apparatus, and device manufacturing method |
| 03/07/2006 | US7009686 Exposure method |
| 03/07/2006 | US7009685 Bearing arrangement for reaction mass in a controlled environment |
| 03/07/2006 | US7009684 Exposure apparatus and exposure method |
| 03/07/2006 | US7009683 Exposure apparatus |
| 03/07/2006 | US7009682 Lithographic apparatus and device manufacturing method |
| 03/07/2006 | US7009681 Exposure apparatus and method, and device fabricating method using the same |
| 03/07/2006 | US7009359 Foam core chuck for the scanning stage of a lithography system |
| 03/07/2006 | US7009148 Method of processing a substrate, heating apparatus, and method of forming a pattern |
| 03/07/2006 | US7008883 Photoresist composition for forming an insulation film, insulation film for organic electroluminescence devices and process for producing the insulation film |
| 03/07/2006 | US7008758 Photomasks; photolithography; plasma enhanced chemical vapor deposition |
| 03/07/2006 | US7008757 Patterned structures of high refractive index materials |
| 03/07/2006 | US7008756 Method of fabricating an X/Y alignment vernier |
| 03/07/2006 | US7008755 Method for forming a planarized layer of a semiconductor device |
| 03/07/2006 | US7008754 Method for forming image on object surface including circuit substrate |
| 03/07/2006 | US7008752 Photosensitive resin composition and use of the same |
| 03/07/2006 | US7008751 Thermally switchable imageable elements containing betaine-containing co-polymers |
| 03/07/2006 | US7008750 Processes for producing polysiloxanes and photoresist compositions comprising same |
| 03/07/2006 | US7008749 High resolution resists for next generation lithographies |
| 03/07/2006 | US7008737 Gray scale x-ray mask |
| 03/07/2006 | US7008736 exposure light flux is transmitted and inverted through the shifter edge region contacted with the border of the opening region; destructive interference between exposure light fluxes improves resolution; microminiaturization, increased integration; photolithography |
| 03/07/2006 | US7008731 Method of manufacturing a photomask and method of manufacturing a semiconductor device using the photomask |
| 03/07/2006 | US7008556 crosslinking a polyarylether with a pendant crosslinkable group; light-emitting diodes, solvent resistance |
| 03/07/2006 | US7008480 Apparatus for coating photoresist |
| 03/07/2006 | US7008476 crosslinkable acetyl alginate modified with an epoxy ether or carboxylic ether light-absorber; crosslinking agent is an aminoplast, isocyanate, an allyl compound or allyl homo- or copolymer; semiconductor thin films; photolithography |
| 03/07/2006 | US7008282 Method for eliminating materials, method for reclaiming base, method for manufacturing display, and electronic appliances comprising display manufactured by the manufacturing method |
| 03/07/2006 | US7008124 Method and device for processing substrate |
| 03/07/2006 | US7008123 Image forming device having a brush type processing member |
| 03/02/2006 | WO2006023667A1 Lithographic printing plate precursor |
| 03/02/2006 | WO2006023489A2 Cyclic error compensation in interferometry systems |
| 03/02/2006 | WO2006022312A1 Method for manufacturing conductive pattern material |
| 03/02/2006 | WO2006022200A1 Stage apparatus and exposure apparatus |
| 03/02/2006 | WO2006021540A2 Optical system, i.e. lens or illumination device of a microlithographic projection exposure apparatus |
| 03/02/2006 | WO2006021447A1 Process for the production of a lithographic printing plate |
| 03/02/2006 | WO2006021406A2 Pupil improvement of incoherent imaging systems for enhanced cd linearity |
| 03/02/2006 | WO2005124460A8 Binder-free photopolymerizable compositions |
| 03/02/2006 | WO2005121843A8 Transmissive element |
| 03/02/2006 | WO2005119365A3 A high-efficiency spectral purity filter for euv lithography |
| 03/02/2006 | WO2005085956A3 Pellicle for a lithographic lens |
| 03/02/2006 | WO2005078522A3 Illumination system for a microlithographic projection exposure apparatus |
| 03/02/2006 | WO2005069055A3 Catadioptric projection objective |
| 03/02/2006 | WO2005064410A3 Lithographic apparatus and method of calibration |
| 03/02/2006 | WO2005064408A3 Wafer with optical control modules in exposure fields |
| 03/02/2006 | WO2005060055A3 Gas discharge laser light source beam delivery unit |