| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/15/2006 | CN1748181A Radiation-sensitive resin composition, process for producing the same and process for producing semiconductor device therewith |
| 03/15/2006 | CN1748180A Process for refining crude resin for resist |
| 03/15/2006 | CN1747917A Radiation durable organic compounds with high transparency in the vaccum ultraviolet, and method for preparing |
| 03/15/2006 | CN1746878A Parameter adaptive method of analog photoetching process of computer |
| 03/15/2006 | CN1746776A Substrate processing apparatus and substrate positioning device |
| 03/15/2006 | CN1746775A Lithographic apparatus and device manufacturing method |
| 03/15/2006 | CN1746774A Exposure system and pattern formation method |
| 03/15/2006 | CN1746773A Pattern transferring method of conductive structure |
| 03/15/2006 | CN1746772A Method for reducing lead wire figure by T-shaped photoresist pattern |
| 03/15/2006 | CN1746771A Improved cylinder gluer |
| 03/15/2006 | CN1746770A 光敏糊状物组合物 The photosensitive paste composition |
| 03/15/2006 | CN1746769A Lithographic apparatus, method and a computer program product for generating a mask pattern on an addressable mask and device manufacturing method using same |
| 03/15/2006 | CN1746726A Polarizing reticle |
| 03/15/2006 | CN1746705A Production of differential silica waveguide with high refractive index by ultraviolet laser written in |
| 03/15/2006 | CN1746204A Water photosensitive resin emulsion and preparation thereof |
| 03/15/2006 | CN1245669C Micro imaging method capable of reducing influence of lens aberration |
| 03/15/2006 | CN1245668C Exposure system and method thereof |
| 03/15/2006 | CN1245667C Graph forming method |
| 03/15/2006 | CN1245666C Method for baking photoresistive in multistage in order to improve photolithograph quality |
| 03/15/2006 | CN1245665C Positive photosensitive polyimide resin composition |
| 03/15/2006 | CN1245664C Radiation-sensitive composition changing in refractive index and method of changing refractive index |
| 03/15/2006 | CN1245662C Optical hood for reducing lens aberration and pattern shifting and method |
| 03/15/2006 | CN1245657C Method for producing light interference type display unit |
| 03/14/2006 | US7013453 Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution ERA |
| 03/14/2006 | US7012763 Aperture plate for lithography systems |
| 03/14/2006 | US7012690 Substrate processing apparatus |
| 03/14/2006 | US7012674 Maskless optical writer |
| 03/14/2006 | US7012673 Lithographic apparatus and device manufacturing method |
| 03/14/2006 | US7012672 Lithographic apparatus, system, method, computer program, and apparatus for height map analysis |
| 03/14/2006 | US7012671 Exposure apparatus and method |
| 03/14/2006 | US7012670 Method and apparatus for adjusting a photo-exposure time |
| 03/14/2006 | US7012629 Temperature compensating image recording device |
| 03/14/2006 | US7012398 Electromagnetic alignment and scanning apparatus |
| 03/14/2006 | US7012291 Monolithic three-dimensional structures |
| 03/14/2006 | US7012270 Photolithography system having multiple adjustable light sources |
| 03/14/2006 | US7012265 Lithographic apparatus, integrated circuit device manufacturing method, and integrated circuit device manufactured thereby |
| 03/14/2006 | US7012264 Lithographic apparatus and device manufacturing method |
| 03/14/2006 | US7012161 Compound, fluorine-containing polymerizable cyclic olefin compound |
| 03/14/2006 | US7012125 Spin-on-glass anti-reflective coatings for photolithography |
| 03/14/2006 | US7012051 Using mixture containing hydroxylamine compound |
| 03/14/2006 | US7012031 Photoresist pattern, method of fabricating the same, and method of assuring the quality thereof |
| 03/14/2006 | US7011936 Photomask and method of structuring a photoresist by double exposure with imaging auxiliary structures and different exposure tools |
| 03/14/2006 | US7011935 Method for the removal of an imaging layer from a semiconductor substrate stack |
| 03/14/2006 | US7011934 Forming a first molecular layer of trimethylsilyl groups on underlying film by reaction with hexamethyldisilazane while annealing; allowing the film to stand outside the firstchamber; forming a trimethylsilyl layer on the first |
| 03/14/2006 | US7011933 photoresist patterning and development method for achieving convex or concave micro-structural features |
| 03/14/2006 | US7011931 For front or back plate of panel, comprises conductive paste and black pigment |
| 03/14/2006 | US7011929 Forming barrier sidewall spacers; overcoating substrate with dielectric; anisotropic etching |
| 03/14/2006 | US7011928 Image formation method of planographic printing plate material |
| 03/14/2006 | US7011926 Gap forming pattern fracturing method for forming optical proximity corrected masking layer |
| 03/14/2006 | US7011924 Photoresist polymers and photoresist compositions comprising the same |
| 03/14/2006 | US7011923 Negative photoresist and method of using thereof |
| 03/14/2006 | US7011922 Thermal recording material |
| 03/14/2006 | US7011915 Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same |
| 03/14/2006 | US7011889 Organosiloxanes |
| 03/14/2006 | US7011381 Counter top ticket dispenser, display, and writing stand |
| 03/14/2006 | US7010958 High-resolution gas gauge proximity sensor |
| 03/10/2006 | CA2502123A1 Substituted benzene developing solvent for photopolymerizable printing plates |
| 03/09/2006 | WO2006026765A2 Plasma ashing process for increasing photoresist removal rate and plasma apparatus wuth cooling means |
| 03/09/2006 | WO2006026665A2 Increasing adhesion in an imprinting procedure |
| 03/09/2006 | WO2006025760A2 Method for producing an image on a material sensitive to a used radiation, method for obtaining a binary hologram (variants) and methods for producing an image by using said hologram |
| 03/09/2006 | WO2006025408A1 Exposure apparatus and device manufacturing method |
| 03/09/2006 | WO2006025389A1 Pattern-forming material, pattern-forming apparatus and pattern-forming method |
| 03/09/2006 | WO2006025386A1 Aligning method, processing system, substrate loading repeatability measuring method, position measuring method, exposure method, substrate processing apparatus, measuring method and measuring apparatus |
| 03/09/2006 | WO2006025341A1 Substrate holder, stage apparatus, and exposure apparatus |
| 03/09/2006 | WO2006025292A1 Developing solution composition for lithography and method for resist pattern formation |
| 03/09/2006 | WO2006025266A1 Display member exposing method and plasma display member manufacturing method |
| 03/09/2006 | WO2006025023A1 A collimator for use in a backlight liquid crystal display system |
| 03/09/2006 | WO2006024998A2 A laser projection system |
| 03/09/2006 | WO2006024908A2 Imprint lithographic apparatus, device manufacturing method and device manufactured thereby |
| 03/09/2006 | WO2006024618A1 Cyanopyridine-based azo dyes |
| 03/09/2006 | WO2006024373A2 Device for producing molded bodies |
| 03/09/2006 | WO2006009626A3 Imprinting lithography using the liquid/solid transition of metals and their alloys |
| 03/09/2006 | WO2005081299A3 Device manufacturing method and substrate comprising radiation sensitive material |
| 03/09/2006 | WO2005064409A3 Removable pellicle for immersion lithography |
| 03/09/2006 | WO2005064405A3 Lithographic apparatus and device manufacturing method |
| 03/09/2006 | WO2005064400A3 Chuck system, lithographic apparatus using the same and device manufacturing method |
| 03/09/2006 | WO2004107051A3 Photoacid generators with perfluorinated multifunctional anions |
| 03/09/2006 | US20060052569 Silyl alkyl esters of anthracene-and phenanthrene carboxylic acids |
| 03/09/2006 | US20060052498 Applicability improver for photosensitive resin composition and photosensitive resin composition containing the same |
| 03/09/2006 | US20060051979 Apparatus and method of exposing a semiconductor device having a curved surface to light |
| 03/09/2006 | US20060051956 Imageable bottom anti-reflective coating for high resolution lithography |
| 03/09/2006 | US20060051709 Exposure system and pattern formation method |
| 03/09/2006 | US20060051706 Chemicallyamplified positive tone photoresist comprising a phenolic resin; a sulfonium or iodinium photoacid-generating compound; and an ether, ester, or amide; relief images; enhanced resolution |
| 03/09/2006 | US20060051703 decreased fish eye defects; improved workability |
| 03/09/2006 | US20060051699 Coating on hydrophilic surface a free-radical polymerizable monomer, oligomer, polymer or mixture thereof with at least one ethylenically unsaturated group; photoinitiator or sensitizer; and stabilizer comprising organic phosphonate, phosphate, or phosphoamidate; lithographic printing |
| 03/09/2006 | US20060051685 Negative dye-containing curable composition, color filter and method of producing the same |
| 03/09/2006 | US20060051679 Lithographic method for wiring a side surface of a substrate |
| 03/09/2006 | US20060050400 Correction of birefringence in cubic crystalline optical systems |
| 03/09/2006 | US20060050274 Management system, apparatus, and method, exposure apparatus, and control method therefor |
| 03/09/2006 | US20060050259 Exposure apparatus and method, and device fabricating method using the same |
| 03/09/2006 | US20060050258 Projection system for EUV lithography |
| 03/09/2006 | US20060050257 Exposure apparatus and device manufacturing method |
| 03/09/2006 | US20060050255 Multiple level photolithography |
| 03/09/2006 | US20060050254 Projection exposure apparatus and method for producing a printed circuit board |
| 03/09/2006 | US20060049838 Pattern evaluation method, manufacturing method of semiconductor device, correction method of mask pattern and manufacturing method of exposure mask |
| 03/09/2006 | US20060048893 Atmospheric pressure plasma processing reactor |
| 03/09/2006 | DE19721694B4 N-Vinyllactamderivate enthaltende Copolymere, Herstellungsverfahren hierfür und hieraus hergestellte Photoresists N-vinyllactam containing copolymers, manufacturing method thereof, and produced therefrom photoresist |
| 03/09/2006 | DE19623450B4 Fotomaske und deren Verwendung Photomask and their use |
| 03/09/2006 | DE10215193B4 Verfahren zur Kompensation von Streu-/Reflexionseffekten in der Teilchenstrahllithographie A method for compensating for scattering / reflection effects in the Teilchenstrahllithographie |
| 03/09/2006 | DE102005038913A1 Oberste Antireflektionsbeschichtungszusammensetzung und Verfahren zur Musterausbildung für eine Halbleitervorrichtung unter Verwendung derselbigen Top anti-reflective coating composition and method for patterning a semiconductor device using derselbigen |