| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 03/21/2006 | US7015050 Misalignment test structure and method thereof |
| 03/21/2006 | US7014988 such as waveguides; using multiphoton, multi-step photocuring to fabricate encapsulated optical element(s) within a body of a photopolymerizable composition; good hardness, durability, dimensional stability, resilience, and toughness |
| 03/21/2006 | US7014986 Writing device and writing method |
| 03/21/2006 | US7014985 Surface of aluminum support has a grained structure with medium undulation with a specified aperture diameter and a grained structure with small undulation with a specified aperture diameter are superimposed. |
| 03/21/2006 | US7014984 Polymerizable photosensitive layer and a protective layer containing polyvinyl alcohol and a polyoxyethylene castor oil ether surfactant on a support; direct plate making of the lithographic printing plate precursor without using a film original |
| 03/21/2006 | US7014983 Multilayer imageable element |
| 03/21/2006 | US7014982 Substrate coated with a melamine material and a layer of a chemically-amplified positive photoresist; resin binder and a compound capable of causing a thermally induced crosslinking reaction of said binder, increasing adhesion |
| 03/21/2006 | US7014980 Photoresist composition |
| 03/21/2006 | US7014979 Method of forming the metal alloy pattern using the same, wherein the metal alloy pattern having improved adhesive force to a substrate, heat resistance, and resistance to atmospheric corrosion can be readily formed using the |
| 03/21/2006 | US7014966 Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems |
| 03/21/2006 | US7014965 The short sides of the rectangular patterns of two separate reticles are parallel to the scanning direction in each photolithography; rotating the wafer to form two transferred patterns with orthogonal overlay structures; overlap errors improved |
| 03/21/2006 | US7014786 Methods and apparatus for forming submicron patterns on films |
| 03/21/2006 | US7014715 Photoresist supply apparatus and method of controlling the operation thereof |
| 03/21/2006 | US7013806 Method and apparatus for applying a film of developer fluid onto a lithographic printing plate in a developing station |
| 03/21/2006 | CA2399878C An x-ray lithography device |
| 03/21/2006 | CA2345517C Method and assembly for producing printing plates |
| 03/21/2006 | CA2127238C Photopolymerisable compositions |
| 03/16/2006 | WO2006028282A1 Nanoimprint mold, method of forming a nanopattern, and a resin-molded product |
| 03/16/2006 | WO2006028188A1 Stage apparatus and exposure apparatus |
| 03/16/2006 | WO2006028071A1 Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon |
| 03/16/2006 | WO2006028060A1 Pattern forming material, and pattern forming device and pattern forming method |
| 03/16/2006 | WO2006028014A1 Resist composition and process for formation of resist patterns |
| 03/16/2006 | WO2006027997A1 Electron-beam or euv (extreme ultraviolet) resist composition and process for the formation of resist patterns |
| 03/16/2006 | WO2006027996A1 Resist composition for euv and method of forming resist pattern |
| 03/16/2006 | WO2006027942A1 Immersion liquid for liquid immersion lithography process and method for forming resist pattern using such immersion liquid |
| 03/16/2006 | WO2006027891A1 Substrate cleaning method and developing apparatus |
| 03/16/2006 | WO2006027246A2 Healing algorithm |
| 03/16/2006 | WO2006026941A2 Method and device for structuring a substrate |
| 03/16/2006 | WO2005119370A3 High speed lithography machine and method |
| 03/16/2006 | WO2005078521A8 Method for providing a thin film having a chemical composition that is spatially structured on a micrometric or nanometric scale on a substrate |
| 03/16/2006 | WO2003066340A3 Device for positioning a curing radiation source on an engraving cylinder or an engraving plate holder |
| 03/16/2006 | US20060059501 Method of manufacturing an optical data storage medium, optical data storage medium and apparatus for performing said method |
| 03/16/2006 | US20060058489 Silicon-containing compositions for spin-on arc/hardmask materials |
| 03/16/2006 | US20060058480 Polymerizable monomer polymeric compound resin compositions for photoresist and method for producing semiconductor |
| 03/16/2006 | US20060058472 Functionalized polymer |
| 03/16/2006 | US20060057507 Forming bottom anti-reflective coating(BARC) layer on substrate, treating BARC layer to make its surface hydrophilic, forming photoresist layer on treated BARC layer, exposing photoresist layer to predetermined pattern, and developing photoresist layer to form patterned photoresist; improved adhesion |
| 03/16/2006 | US20060057506 Controlling resist profiles through substrate modification |
| 03/16/2006 | US20060057504 helical, ring bar and tunnel ladder slow wave structures (SWSs). Embodiments of methods of micro-fabricating such SWSs are also disclosed. Embodiments of high frequency electromagnetic devices including such SWSs are also disclosed. high frequency electromagnetic devices may include a traveling wave tube |
| 03/16/2006 | US20060057502 Method of forming a conductive wiring pattern by laser irradiation and a conductive wiring pattern |
| 03/16/2006 | US20060057500 Method of manufacturing lithographic printing plate support |
| 03/16/2006 | US20060057499 Highly reflective substrates for the digital processing of photopolymer printing plates |
| 03/16/2006 | US20060057498 Substituted benzene developing solvent for photopolymerizable printing plates |
| 03/16/2006 | US20060057496 Photoresist compositions comprising diamondoid derivatives |
| 03/16/2006 | US20060057495 Negative-working photosensitive resin composition and photosensitive resin plate using the same |
| 03/16/2006 | US20060057491 Coating compositions for use with an overcoated photoresist |
| 03/16/2006 | US20060057473 photomasks; phase shifting |
| 03/16/2006 | US20060057469 Photomask blank, photomask, and pattern transfer method using photomask |
| 03/16/2006 | US20060057468 Method of pattern formation using ultrahigh heat resistant positive photosensitive composition |
| 03/16/2006 | US20060056597 Optical device |
| 03/16/2006 | US20060056478 Laser gas replenishment method |
| 03/16/2006 | US20060056083 Retainer, exposure apparatus, and device fabrication method |
| 03/16/2006 | US20060056038 Aberration correcting optical system |
| 03/16/2006 | US20060055940 Phase measuring method and apparatus for measuring characterization of optical thin films |
| 03/16/2006 | US20060055911 High resolution printer and a method for high resolution printing |
| 03/16/2006 | US20060055907 Projection optical system, exposure apparatus, and device manufacturing method |
| 03/16/2006 | US20060055903 Method and apparatus for printing large data flows |
| 03/16/2006 | US20060055834 Illumination optical system, exposure apparatus, and exposure method |
| 03/16/2006 | US20060055310 Field emission device, and method of manufacturing such a device |
| 03/16/2006 | US20060055090 Method for manufacturing of polymer micro needle array with liga process |
| 03/16/2006 | US20060055088 Novel aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping and method of optically forming tree-dimensional shape |
| 03/16/2006 | US20060054836 Mask blanks inspection method and mask blank inspection tool |
| 03/16/2006 | US20060054774 High-performance non-contact support platforms |
| 03/16/2006 | DE10394220T5 Modifizierte Cycloolefin-Copolymere, Verfahren zu deren Herstellung und Verwendungen dieser Polymere Modified cycloolefin copolymers, processes for their production and uses of these polymers |
| 03/16/2006 | DE102005038796A1 System for illuminating an article, especially for microlithography, comprises devices for producing a parallel annular beam without any parts of the beam crossing |
| 03/16/2006 | DE102005034386A1 Tiefe Justiermarken auf Rand-Chips zum anschließenden Ausrichten von opaken Schichten Depth marks on edge chips for subsequent alignment of opaque layers |
| 03/16/2006 | DE102004041610A1 Verfahren zur Herstellung einer Lithographie-Druckplatte A method for preparing a lithographic printing plate |
| 03/16/2006 | DE102004037949A1 Verfahren zur Herstellung von Photonischen Kristallen A process for producing photonic crystals |
| 03/16/2006 | DE102004037346A1 Lithography arrangement for printing technologies, has mask illuminated by TM-polarized light, and lens provided for rotation of polarized direction of transmitted electromagnetic radiation via mask |
| 03/16/2006 | CA2579603A1 A flexible nano-imprint stamp |
| 03/16/2006 | CA2579290A1 Holographic sensor |
| 03/15/2006 | EP1635382A1 Exposure device and device producing method |
| 03/15/2006 | EP1635224A2 Composition for removing a photoresist residue and polymer residue, and residue removal process using the same |
| 03/15/2006 | EP1635223A2 Processing apparatus for lithographic printing plate and process for processing the same |
| 03/15/2006 | EP1635222A2 A method for performing full-chip manufacturing reliability checking and correction |
| 03/15/2006 | EP1635221A1 Method and apparatus for conditioning moisture of object |
| 03/15/2006 | EP1635220A2 Oxime derivatives and the use thereof as photoinitiators |
| 03/15/2006 | EP1635219A1 Photosensitive lithographic printing plate |
| 03/15/2006 | EP1635218A2 Photosensitive composition, compound for use in the photosensitive composition, and pattern-forming method using the photosensitive composition |
| 03/15/2006 | EP1635217A1 Process for fabricating semiconductor device and method for generating mask pattern data |
| 03/15/2006 | EP1635202A1 Microfabrication of organic optical elements |
| 03/15/2006 | EP1635199A1 Wire grid polarizer and manufacturing method thereof |
| 03/15/2006 | EP1634917A1 Hydroxy-amino thermally cured undercoat for 193 MN lithography |
| 03/15/2006 | EP1634916A1 Hydroxy-amino thermally cured undercoat for 193 NM lithography |
| 03/15/2006 | EP1634898A2 Polymer having polymerizable group, polymerizable composition, planographic printing plate precursor, and planographic printing method using the same |
| 03/15/2006 | EP1634126A2 Developer composition for resists and method for formation of resist pattern |
| 03/15/2006 | EP1634125A2 Lithographic method for producing microcomponents |
| 03/15/2006 | EP1634124A1 Photocurable resin composition |
| 03/15/2006 | EP1634123A1 Photosensitive resin composition, ink-jet recording head using the composition, and production method for the same |
| 03/15/2006 | EP1634122A1 Method for evaluating the effects of multiple exposure processes in lithography |
| 03/15/2006 | EP1634120A1 Highly reflectivesubstrates for the digital processing of photopolymer printing plates |
| 03/15/2006 | EP1633545A2 Method to reduce adhesion between a conformable region and a pattern of a mold |
| 03/15/2006 | EP1499645B1 Incorporable photoinitiator |
| 03/15/2006 | EP1378038A4 Injection seeded f2 laser with wavelength control |
| 03/15/2006 | EP1364231B1 A self-cleaning optic for extreme ultraviolet lithography |
| 03/15/2006 | EP1334408B1 Photoresist stripper/cleaner compositions containing aromatic acid inhibitors |
| 03/15/2006 | EP1192689A4 Tangential fan with cutoff assembly and vibration control for electric discharge laser |
| 03/15/2006 | EP1147582A4 ArF LASER WITH LOW PULSE ENERGY AND HIGH REP RATE |
| 03/15/2006 | EP1141778B1 Novolac polymer planarization films with high temperature stability |
| 03/15/2006 | EP1137054B1 Exposure system comprising a parallel link mechaniam and exposure method |
| 03/15/2006 | CN1748288A Mask processing device, mask processing method, program, and mask |